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    Vibration damping system for charged particle beam apparatus
    2.
    发明授权
    Vibration damping system for charged particle beam apparatus 有权

    公开(公告)号：US11664185B2

    公开(公告)日：2023-05-30

    申请号：US17536223

    申请日：2021-11-29

    申请人： Hitachi High-Tech Corporation

    发明人： Jun Etoh ,  Hironori Ogawa ,  Shuichi Nakagawa ,  Terunobu Funatsu

    IPC分类号： H01J37/02 ,  B06B1/02 ,  H03G3/20

    CPC分类号： H01J37/023 ,  B06B1/0253 ,  B06B2201/30 ,  H01J2237/0216 ,  H03G3/20

    摘要： A vibration damping system for a charged particle beam apparatus according to the present invention includes a column through which a charged particle beam passes, a vibration detection unit that detects vibration of the column, a damping mechanism that applies vibration to the column to suppress the vibration of the column, and a control device that controls the damping mechanism. The control device includes a damping gain control unit that amplifies a detection signal of the vibration detection unit with a set amplification factor and outputs an amplified detection signal as a control signal to the damping mechanism, and a saturation suppression unit that adjusts a feedback gain value of the damping gain control unit according to a detection signal of the vibration detection unit, a signal of the damping mechanism, and a maximum output value and a minimum output value of the damping mechanism.

    CHARGED PARTICLE BEAM APPARATUS
    6.
    发明申请
    CHARGED PARTICLE BEAM APPARATUS 审中-公开

    公开(公告)号：US20170278664A1

    公开(公告)日：2017-09-28

    申请号：US15468290

    申请日：2017-03-24

    申请人： HITACHI HIGH-TECH SCIENCE CORPORATION

    发明人： Makoto SATO ,  Satoshi TOMIMATSU ,  Atsushi UEMOTO ,  Tatsuya ASAHATA

    IPC分类号： H01J37/02 ,  H01J37/20

    CPC分类号： H01J37/023 ,  H01J37/20 ,  H01J37/3023 ,  H01J37/304 ,  H01J37/3056 ,  H01J2237/208 ,  H01J2237/31745

    摘要： A charged particle beam apparatus which automatically prepares a sample piece from a sample, includes: a charged particle beam irradiation optical system configured to perform irradiation of a charged particle beam; a sample stage configured to move, the sample being placed on the sample stage; a sample piece relocation unit configured to hold and transport the sample piece which is separated and picked up from the sample; a holder fixing stage which holds a sample piece holder to which the sample piece is relocated; and a computer which performs positional control in relation to a target object based on a template and positional information which is obtained from an image of the target object, the template being generated based on an absorption current image of the target object which is acquired using the irradiation of the charged particle beam.

    Workpiece transport and positioning apparatus
    8.
    发明授权
    Workpiece transport and positioning apparatus 有权
    工件运输和定位装置

    公开(公告)号：US09449785B2

    公开(公告)日：2016-09-20

    申请号：US14538391

    申请日：2014-11-11

    申请人： Howard Hughes Medical Institute

    发明人： John H. Price ,  Dravida Bock

    IPC分类号： H01J37/00 ,  H01J37/20 ,  H01J37/26 ,  H01J37/02 ,  H01J37/18 ,  G01N35/00 ,  G01N1/32

    CPC分类号： H01J37/20 ,  G01N1/32 ,  G01N35/00732 ,  H01J37/023 ,  H01J37/185 ,  H01J37/261 ,  H01J2237/2007 ,  H01J2237/201 ,  H01J2237/20278 ,  H01J2237/20285 ,  H01J2237/20292 ,  H01J2237/204 ,  H01J2237/26 ,  H01J2237/2602

    摘要： An automated workpiece processing apparatus including a processing section including a processing module configured for processing a workpiece at a process location, a transport module including a first shuttle stage, a second shuttle stage independent of the first stage, and an end effector connected to at least one of the first and second stages, the end effector being configured to hold and transport the workpiece into and out of the processing module, and having a range of motion, defined by a combination of the first and second stage, extending from a workpiece holding station outside the processing module to the processing location inside the processing module so the end effector defines a processing stage of the processing module, and an automated loading and transport section including a load port module through which workpieces are loaded into the automated loading and transport section, and being communicably connected to the transport module.

    摘要翻译： 一种自动化工件处理装置，包括处理部分，其包括处理模块，所述处理模块被配置为在处理位置处理工件;传输模块，包括第一穿梭台，独立于所述第一阶段的第二梭动台，以及至少连接至少 第一和第二阶段中的一个，末端执行器被构造成保持和输送工件进出处理模块，并且具有由第一和第二平台的组合限定的运动范围，该范围从工件夹持 处理模块外部的处理站内的处理位置，使得末端执行器限定处理模块的处理阶段，以及自动装载和传送部分，其包括装载端口模块，通过该装载端口模块将工件装载到自动装载和传送部分中 并且可传输地连接到传送模块。

    Integrated optical and charged particle inspection apparatus
    9.
    发明授权
    Integrated optical and charged particle inspection apparatus 有权
    集成光学和带电粒子检测仪器

    公开(公告)号：US09378921B2

    公开(公告)日：2016-06-28

    申请号：US14428163

    申请日：2013-09-16

    申请人： DELMIC B.V.

    发明人： Jacob Pieter Hoogenboom ,  Aernout Christiaan Zonnevylle ,  Pieter Kruit ,  Angela Carolina Narváez-González

    IPC分类号： H01J37/28 ,  H01J37/21 ,  H01J37/02 ,  H01J37/22

    CPC分类号： H01J37/023 ,  H01J37/222 ,  H01J37/228 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/2482 ,  H01J2237/2801 ,  H01J2237/2808

    摘要： The present invention relates to a method for mutually aligning a scanning electron microscope SEM and a light microscope LM by creating a change (61) in the detected light signal of the light microscope LM by illuminating a substrate with an electron beam, correlating the position of the electron beam in the coordinate system of the scanning electron microscope SEM to the position of the observed change in the detected light signal in the coordinate system of the light microscope LM, and relatively shifting the scanning electron microscope SEM and the light microscope LM with respect to one another to a desired relative position of the coordinate systems (60, 62).

    摘要翻译： 本发明涉及通过用电子束照射基板来在光显微镜LM的检测光信号中产生变化（61）来相互对准扫描电子显微镜SEM和光学显微镜LM的方法， 扫描电子显微镜SEM的坐标系中的电子束到光显微镜LM的坐标系中检测到的光信号的观察位置的位置，并相对移动扫描电子显微镜SEM和光学显微镜LM，相对于 彼此相对于坐标系（60,62）的期望的相对位置。

    TARGET PROCESSING UNIT
    10.
    发明申请
    TARGET PROCESSING UNIT 审中-公开
    目标处理单位

    公开(公告)号：US20160126055A1

    公开(公告)日：2016-05-05

    申请号：US14992049

    申请日：2016-01-11

    申请人： Mapper Lithography IP B.V.

    发明人： Johan Joost Koning ,  David Johannes van den Bergen

    IPC分类号： H01J37/02 ,  H01J37/20

    CPC分类号： H01J37/023 ,  B01J19/12 ,  G03F7/708 ,  G03F7/70825 ,  G03F7/70833 ,  G03F7/70891 ,  G03F7/709 ,  G03F7/70975 ,  H01J37/10 ,  H01J37/20 ,  H01J37/3007 ,  H01J37/3177

    摘要： The invention relates to a target processing unit (10) comprising a vacuum chamber (30) for accommodating a target to be processed, a projection column (46) within the vacuum chamber for generating a beam and projecting the beam towards the target, and a first conduit arrangement (26,36,37,60) for connecting the projection column to external equipment (22). The vacuum chamber can comprise a positioning system (114) for supporting the target, and a second conduit arrangement (110) distinct from the first conduit arrangement for connecting the positioning system to external equipment, wherein the positioning system is moveably arranged with respect to the projection column, and wherein the positioning system and the projection column occupy spatially distinct portions of the vacuum chamber. The first conduit arrangement extends through an upper side of the vacuum chamber, and the second conduit arrangement extends through a lower side of the vacuum chamber.

    摘要翻译： 本发明涉及一种目标处理单元（10），其包括用于容纳待处理目标物的真空室（30），真空室内的用于产生光束并将光束朝向目标物投影的突出柱（46），以及 用于将投影柱连接到外部设备（22）的第一导管装置（26,36,37,60）。 真空室可以包括用于支撑靶的定位系统（114）和与第一导管装置不同的第二导管装置（110），用于将定位系统连接到外部设备，其中定位系统可相对于 投影柱，并且其中定位系统和投影柱占据真空室的空间上不同的部分。 第一导管装置延伸穿过真空室的上侧，第二导管装置延伸穿过真空室的下侧。