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公开(公告)号：US20180277334A1
公开(公告)日：2018-09-27
申请号：US15985763
申请日：2018-05-22
IPC分类号： H01J37/153 , H01J37/12 , H01J37/09
CPC分类号： H01J37/153 , H01J37/023 , H01J37/065 , H01J37/09 , H01J37/12 , H01J37/3177 , H01J2237/0213 , H01J2237/0264 , H01J2237/0453 , H01J2237/1207 , H01J2237/1534 , H01J2237/1825 , H01J2237/188 , H01J2237/31774 , H01J2237/31793
摘要： A lens element of a charged particle system comprises an electrode having a central opening. The lens element is configured for functionally cooperating with an aperture array that is located directly adjacent said electrode, wherein the aperture array is configured for blocking part of a charged particle beam passing through the central opening of said electrode. The electrode is configured to operate at a first electric potential and the aperture array is configured to operate at a second electric potential different from the first electric potential. The electrode and the aperture array together form an aberration correcting lens.
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公开(公告)号：US20170250053A1
公开(公告)日：2017-08-31
申请号：US15594712
申请日：2017-05-15
IPC分类号： H01J37/09 , H01J37/302 , H01J37/147 , H01J37/30 , H01J37/317
CPC分类号： H01J37/09 , B82Y10/00 , B82Y40/00 , H01J37/147 , H01J37/3007 , H01J37/302 , H01J37/3174 , H01J37/3177 , H01J2237/002 , H01J2237/026 , H01J2237/0262 , H01J2237/0264 , H01J2237/16 , H01J2237/182 , H01J2237/188
摘要： The invention relates to a charged particle beam generator. The generator may comprise a high voltage shielding arrangement (201) for shielding components outside the shielding arrangement from high voltages within the shielding arrangement, and a vacuum pump (220) located outside the shielding arrangement for regulating a pressure of a space within the shielding arrangement. The generator may comprise a collimator system with a cooling arrangement (405a/407a-407b/405b) comprising cooling channels inside electrodes of the collimator system.
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公开(公告)号：US20140014850A1
公开(公告)日：2014-01-16
申请号：US13937321
申请日：2013-07-09
发明人： Marco Jan-Jaco WIELAND , Remco JAGER , Alexander Hendrik Vincent VAN VEEN , Stijn Willem Herman Karel STEENBRINK
IPC分类号： H01J37/317
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J37/045 , H01J37/07 , H01J37/3174 , H01J2237/0262 , H01J2237/0435 , H01J2237/0437 , H01J2237/31774
摘要： The invention relates to a charged particle lithography system for patterning a target. The lithography system has a beam generator for generating a plurality of charged particle beamlets, a beam stop array with a beam-blocking surface provided with an array of apertures; and a modulation device for modulating the beamlets by deflection. The modulation device has a substrate provided with a plurality of modulators arranged in arrays, each modulator being provided with electrodes extending on opposing sides of a corresponding aperture. The modulators are arranged in groups for directing a group of beamlets towards a single aperture in the beam stop array. Individual modulators within each group have an orientation such that a passing beamlet, if blocking is desired, is directed to a blocking position onto the beam stop array. Beamlet blocking positions for different beamlets are substantially homogeneously spread around the corresponding single aperture in the beam stop array.
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公开(公告)号：US20170221674A1
公开(公告)日：2017-08-03
申请号：US15493159
申请日：2017-04-21
摘要： The invention relates to charged particle beam generator comprising a charged particle source for generating a charged particle beam, a collimator system comprising a collimator structure with a plurality of collimator electrodes for collimating the charged particle beam, a beam source vacuum chamber comprising the charged particle source, and a generator vacuum chamber comprising the collimator structure and the beam source vacuum chamber within a vacuum, wherein the collimator system is positioned outside the beam source vacuum chamber. Each of the beam source vacuum chamber and the generator vacuum chamber may be provided with a vacuum pump.
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