公开(公告)号：US12125671B2

公开(公告)日：2024-10-22

申请号：US17778036

申请日：2020-11-19

Applicant: ASML NETHERLANDS B.V.

Inventor： Stijn Wilem Herman Karel Steenbrink ,  Marco Jan-Jaco Wieland ,  Albertus Victor Gerardus Mangnus

IPC: H01J37/317 ,  H01J37/141 ,  H01J37/147 ,  H01J37/28

CPC classification number: H01J37/3177 ,  H01J37/141 ,  H01J37/1474 ,  H01J37/28 ,  H01J2237/0453 ,  H01J2237/2817

Abstract: A multi-source illumination apparatus for illuminating a sample with charged particles, wherein beams, from a plurality of sources, are arranged such that a beam from at least one source intersects, at a plane of a condenser lens, with at least part of one other beam from a different one of the plurality of sources. The condenser lens is configured to separately collimate the received beams from each source. A manipulator array arrangement is configured to manipulate the collimated beams to generate one or more beams, in a single column, that include charged particles from the plurality of sources. The manipulator array arrangement includes a multi-beam generator configured to receive the plurality of substantially parallel substantially collimated beams generated by the deflector array, and generate a multibeam in dependence on the received plurality of substantially parallel substantially collimated beams, wherein the multi-beam includes a plurality of substantially collimated sub-beams.

公开(公告)号：US20240347316A1

公开(公告)日：2024-10-17

申请号：US18753972

申请日：2024-06-25

Applicant: Carl Zeiss MultiSEM GmbH

Inventor： Hans Fritz ,  Ingo Mueller

IPC: H01J37/317 ,  H01J37/10 ,  H01J37/145 ,  H01J37/147 ,  H01J37/26 ,  H01J37/302

CPC classification number: H01J37/3177 ,  H01J37/10 ,  H01J37/145 ,  H01J37/147 ,  H01J37/263 ,  H01J37/3023 ,  H01J2237/0453 ,  H01J2237/04926

Abstract: A method includes operating a multiple particle beam system at different working points. The numerical aperture can be set for each of the working points in such a way that the resolution of the multiple particle beam system is optimal. In the process, the beam pitch between adjacent individual particle beams on the sample to be scanned is kept constant as a boundary condition. There are no mechanical reconfigurations of the system whatsoever for the purposes of varying the numerical aperture.

公开(公告)号：US20240339295A1

公开(公告)日：2024-10-10

申请号：US18744367

申请日：2024-06-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Tzu-Chao CHEN ,  Te-Sheng WANG

IPC: H01J37/317 ,  G03F9/00 ,  H01J37/244 ,  H01J37/26 ,  H01J37/28

CPC classification number: H01J37/3177 ,  G03F9/7046 ,  H01J37/244 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/24578 ,  H01J2237/24592 ,  H01J2237/2817

Abstract: Methods are disclosed for generating a sample map and processing a sample. In one arrangement, a method comprises measuring a position of a first mark in each of a plurality of field regions on sample. A first model is fitted to the measured positions of the first marks. The fitted first model represents positions of the field regions. The method comprises measuring positions of a plurality of second marks in one field region or in each of a plurality of field regions. A second model is fitted to the measured positions of the second marks. The fitted second model represents a shape of each field region. A sample map is output using the fitted first and second models.

公开(公告)号：US20240304413A1

公开(公告)日：2024-09-12

申请号：US18597676

申请日：2024-03-06

Applicant: IMS Nanofabrication GmbH

Inventor： Christoph Spengler ,  Michael Haberler

IPC: H01J37/304 ,  H01J37/04 ,  H01J37/153 ,  H01J37/22 ,  H01J37/302 ,  H01J37/317

CPC classification number: H01J37/304 ,  H01J37/045 ,  H01J37/153 ,  H01J37/222 ,  H01J37/3023 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/31777

Abstract: The invention proposes adjusting the optical imaging system of a charged-particle multi-beam processing apparatus with regard to spatial and angular image distortion of the beam field, which describes the deviation of landing positions and landing angles of beamlets from respective nominal values within the beam field. Starting from a determination of the image distortion, so-called fingerprints are determined, which represent the change of image distortion effected by a unit change of a respective operating parameter of a component of the projection optics; then values of operating parameters are obtained which optimize a corrected distortion obtained from a superposition of the image distortion and a change of operating parameters that causes a variation of the image distortion, as expressed by a linear combination of said fingerprints. The optimizing values thus obtained are applied to the respective optical elements of the projection optics. The procedure may suitable be iterated until the distortion is suitably optimized.

公开(公告)号：US20240170252A1

公开(公告)日：2024-05-23

申请号：US18423564

申请日：2024-01-26

Applicant: Carl Zeiss MultiSEM GmbH

Inventor： Yanko Sarov ,  Dirk Zeidler ,  Thomas Schmid ,  Georg Kurij ,  Marcus Kaestner ,  Ulrich Bihr ,  Wolfgang Singer

IPC: H01J37/317 ,  H01J37/09 ,  H01J37/12 ,  H01J37/153 ,  H01J37/28 ,  H01J37/30

CPC classification number: H01J37/3177 ,  H01J37/09 ,  H01J37/12 ,  H01J37/153 ,  H01J37/3007 ,  H01J37/28 ,  H01J2237/0453 ,  H01J2237/1205 ,  H01J2237/1516 ,  H01J2237/1534 ,  H01J2237/20207 ,  H01J2237/30488

Abstract: A multi-beam generation unit for a multi-beam system has larger individual focusing power for each of a plurality of primary charged particle beamlets. The multi-beam generation unit comprises an active terminating multi-aperture plate. The terminating multi-aperture plate can be used for a larger focusing range for an individual stigmatic focus spot adjustment of each beamlet of a plurality of primary charged particle beamlets.

公开(公告)号：US11961698B2

公开(公告)日：2024-04-16

申请号：US17344446

申请日：2021-06-10

Applicant: ASML Netherlands B.V.

Inventor： Christiaan Otten ,  Peter-Paul Crans ,  Marc Smits ,  Laura Del Tin ,  Christan Teunissen ,  Yang-Shan Huang ,  Stijn Wilem Herman Karel Steenbrink ,  Xuerang Hu ,  Qingpo Xi ,  Xinan Luo ,  Xuedong Liu

IPC: H01J37/15 ,  H01J37/02 ,  H01J37/14 ,  H01J37/147 ,  H01J37/18 ,  H01J37/244 ,  H01J37/28 ,  H01J37/20 ,  H01J37/317

CPC classification number: H01J37/15 ,  H01J37/023 ,  H01J37/14 ,  H01J37/1477 ,  H01J37/18 ,  H01J37/244 ,  H01J37/28 ,  H01J37/20 ,  H01J37/3177 ,  H01J2237/2006 ,  H01J2237/20214 ,  H01J2237/2817

Abstract: Disclosed herein is a module for supporting a device configured to manipulate charged particle paths in a charged particle apparatus, the module comprising: a support arrangement configured to support the device, wherein the device is configured to manipulate a charged particle path within the charged particle apparatus; and a support positioning system configured to move the support arrangement within the module; wherein the module is arranged to be field replaceable in the charged particle apparatus.

公开(公告)号：US20240038485A1

公开(公告)日：2024-02-01

申请号：US18486106

申请日：2023-10-12

Applicant: ASML Netherlands B.V.

Inventor： Stijn Wilem Herman Karel STEENBRINK

IPC: H01J37/244 ,  H01J37/317 ,  H01J37/28

CPC classification number: H01J37/244 ,  H01J37/3177 ,  H01J37/28 ,  H01J2237/1516 ,  H01J2237/0453 ,  H01J2237/2817

Abstract: Disclosed herein is a charged-particle apparatus configured to inspect a sample with a charged-particle beam. The charged-particle apparatus comprises a detector assembly or an array of multipole elements. The charged-particle apparatus comprises an electronic device, a power source configured to output radiation, and a power converter configured to receive radiation from the power source, to convert the received radiation into electrical energy and to output the electrical energy to the electronic device. The power source is electrically isolated from the power converter.

公开(公告)号：US20230335366A1

公开(公告)日：2023-10-19

申请号：US18213229

申请日：2023-06-22

Applicant: ASML Netherlands B.V.

Inventor： Alexander Hendrik Vincent VAN VEEN ,  Derk Ferdinand WALVOORT

IPC: H01J37/04 ,  H01J37/317

CPC classification number: H01J37/045 ,  H01J37/3177 ,  H01J2237/002 ,  H01J2237/0437

Abstract: The invention relates to an exposure apparatus and a method for projecting a charged particle beam onto a target. The exposure apparatus comprises a charged particle optical arrangement comprising a charged particle source for generating a charged particle beam and a charged particle blocking element and/or a current limiting element for blocking at least a part of a charged particle beam from a charged particle source. The charged particle blocking element and the current limiting element comprise a substantially flat substrate provided with an absorbing layer comprising Boron, Carbon or Beryllium. The substrate further preferably comprises one or more apertures for transmitting charged particles. The absorbing layer is arranged spaced apart from the at least one aperture.

公开(公告)号：US11791132B2

公开(公告)日：2023-10-17

申请号：US16830204

申请日：2020-03-25

Applicant: ASML Netherlands B.V.

Inventor： Albertus Victor Gerardus Mangnus ,  Maikel Robert Goosen ,  Erwin Paul Smakman

IPC: H01J37/317 ,  H01J37/24 ,  H01J37/244 ,  H01J37/304

CPC classification number: H01J37/3177 ,  H01J37/243 ,  H01J37/244 ,  H01J37/3045 ,  H01J2237/0435

Abstract: Systems and methods of measuring beam current in a multi-beam apparatus are disclosed. The multi-beam apparatus may include a charged-particle source configured to generate a primary charged-particle beam, and an aperture array. The aperture array may comprise a plurality of apertures configured to form a plurality of beamlets from the primary charged-particle beam, and a detector including circuitry to detect a current of at least a portion of the primary charged-particle beam irradiating the aperture array. The method of measuring beam current may include irradiating the primary charged-particle beam on the aperture array and detecting an electric current of at least a portion of the primary charged-particle beam.

公开(公告)号：US11756765B2

公开(公告)日：2023-09-12

申请号：US17304307

申请日：2021-06-17

Applicant: D2S, Inc.

Inventor： Akira Fujimura ,  Harold Robert Zable ,  Nagesh Shirali ,  Abhishek Shendre ,  William E. Guthrie ,  Ryan Pearman

IPC: H01J37/302 ,  H01J37/317 ,  G03F1/36 ,  G03F1/70 ,  G03F7/20

CPC classification number: H01J37/3026 ,  G03F1/36 ,  G03F1/70 ,  G03F7/2061 ,  H01J37/3177 ,  H01J2237/31761 ,  H01J2237/31771 ,  H01J2237/31774 ,  H01J2237/31776

Abstract: Methods for exposing a desired shape in an area on a surface using a charged particle beam system include determining a local pattern density for the area of the desired shape based on an original set of exposure information. A backscatter for a sub area is calculated, based on the original set of exposure information. Dosage for at least one pixel in a plurality of pixels in the sub area is increased, in a location where the backscatter of the sub area is below a pre-determined threshold, thereby increasing the backscatter of the sub area. A pre-PEC maximum dose is determined for the local pattern density, based on a pre-determined target post-PEC maximum dose. The original set of exposure information is modified with the pre-PEC maximum dose and the increased dosage of the at least one pixel in the sub area to create a modified set of exposure information.