公开(公告)号：US20250157783A1

公开(公告)日：2025-05-15

申请号：US19025881

申请日：2025-01-16

Applicant: ASML Netherlands B.V.

Inventor： Xuerang HU ,  Weiming REN ,  Xuedong LIU ,  Zhong-wei CHEN

IPC: H01J37/147 ,  H01J37/12 ,  H01J37/26

Abstract: Disclosed herein is an apparatus comprising: a first electrically conductive layer; a second electrically conductive layer; a plurality of optics element s between the first electrically conductive layer and the second electrically conductive layer, wherein the plurality of optics elements are configured to influence a plurality of beams of charged particles; a third electrically conductive layer between the first electrically conductive layer and the second electrically conductive layer; and an electrically insulating layer physically connected to the optics elements, wherein the electrically insulating layer is configured to electrically insulate the optics elements from the first electrically conductive layer, and the second electrically conductive layer.

公开(公告)号：US20250147435A1

公开(公告)日：2025-05-08

申请号：US18690979

申请日：2022-08-26

Applicant: ASML Netherlands B.V.

Inventor： Marie-Claire VAN LARE ,  Wilhelmus Patrick Elisabeth Maria OP T ROOT

IPC: G03F7/00

Abstract: Disclosed is a method for determining a focus parameter from a target on a substrate. The target comprises an isofocal first sub-target and a second non-isofocal sub-target. The method comprises obtaining a first measurement signal relating to measurement of the first sub-target, a second measurement signal relating to measurement of the second sub-target and at least one trained relationship and/or model which relates at least said second measurement signal to said focus parameter. A value for said focus parameter is determined from said first measurement signal, second measurement signal and said at least one trained relationship and/or model.

公开(公告)号：US20250138440A1

公开(公告)日：2025-05-01

申请号：US19009394

申请日：2025-01-03

Applicant: ASML NETHERLANDS B.V

Inventor： Nicolaas TEN KATE ,  Joost Jeroen OTTENS ,  Bastiaan Andreas Wilhelmus Hubertus KNARREN ,  Robbert Jan VOOGD ,  Giovanni Francisco NINO ,  Marinus Jan REMIE ,  Johannes Henricus Wilhelmus JACOBS ,  Thibault Simon Mathieu LAURENT ,  Johan Gertrudis Cornelis KUNNEN

IPC: G03F7/00

Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.

公开(公告)号：US20250138433A1

公开(公告)日：2025-05-01

申请号：US19009546

申请日：2025-01-03

Applicant: ASML NETHERLANDS B.V.

Inventor： Xingyue PENG ,  Zhan SHI ,  Duan-Fu Stephen HSU ,  Rafael C. HOWELL ,  Gerui LIU

IPC: G03F7/00

Abstract: Scanner aberration impact modeling in a semiconductor manufacturing process, which may facilitate co-optimization of multiple scanners. Scanner aberration impact modeling may include executing a calibrated model and controlling a scanner based on output from the model. The model is configured to receive patterning system aberration data. The model is calibrated with patterning system aberration calibration data and corresponding patterning process impact calibration data. New patterning process impact data may be determined, based on the model, for the received patterning system aberration data. The model includes a hyperdimensional function configured to correlate the received patterning system aberration data with the new patterning process impact data. The hyperdimensional function is configured to correlate the received patterning system aberration data with the new patterning process impact data in an approximation form, in lieu of a full simulation, without involving calculation of an aerial image or a representation thereof.

公开(公告)号：US12287583B2

公开(公告)日：2025-04-29

申请号：US18001869

申请日：2021-05-18

Applicant: ASML Netherlands B.V.

Inventor： Edo Maria Hulsebos

IPC: G03F7/00 ,  G03F9/00

Abstract: Disclosed is a method for modeling measurement data over a substrate area and associated apparatus. The method comprises obtaining measurement data relating to a first layout; modeling a second model based on said first layout; evaluating the second model on a second layout, the second layout being more dense than said first layout; and fitting a first model to this second model according to the second layout.

公开(公告)号：US12278081B2

公开(公告)日：2025-04-15

申请号：US17598841

申请日：2020-03-06

Applicant: ASML Netherlands B.V.

Inventor： Qingpo Xi ,  Xuerang Hu ,  Xuedong Liu ,  Weiming Ren ,  Zhong-Wei Chen

IPC: H01J37/05 ,  H01J37/147

Abstract: A multi-beam inspection apparatus including an adjustable beam separator is disclosed. The adjustable beam separator is configured to change a path of a secondary particle beam. The adjustable beam separator comprises a first Wien filter and a second Wien filter. Both Wien filters are aligned with a primary optical axis. The first Wien filter and the second Wien filter are independently controllable via a first excitation input and a second excitation input, respectively. The adjustable beam separator is configured move the effective bending point of the adjustable beam separator along the primary optical axis based on the first excitation input and the second excitation input.

公开(公告)号：US12271114B2

公开(公告)日：2025-04-08

申请号：US17441729

申请日：2020-03-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Scott Anderson Middlebrooks ,  Adrianus Cornelis Matheus Koopman ,  Markus Gerardus Martinus Maria Van Kraaij ,  Maxim Pisarenco ,  Stefan Hunsche

IPC: G03F7/00 ,  G06N3/08 ,  G06T7/00

Abstract: A method for training a machine learning model configured to predict a substrate image corresponding to a printed pattern of a substrate as measured via a metrology tool. The method involves obtaining a training data set including (i) metrology data of the metrology tool used to measure the printed pattern of the substrate, and (ii) a representation of a mask pattern employed for imaging the printed pattern on the substrate; and training, based on the training data set, a machine learning model to predict the substrate image of the substrate as measured by the metrology tool such that a cost function is improved, wherein the cost function includes a relationship between the predicted substrate image and the metrology data.

公开(公告)号：US20250112023A1

公开(公告)日：2025-04-03

申请号：US18829217

申请日：2024-09-09

Applicant: ASML Netherlands B.V.

Inventor： Weiming REN ,  Shuai LI ,  Xuedong LIU ,  Zhongwei CHEN

IPC: H01J37/28 ,  H01J37/12 ,  H01J37/147

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.

公开(公告)号：US20250103855A1

公开(公告)日：2025-03-27

申请号：US18723265

申请日：2022-12-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Wenjie JIN

IPC: G06N3/045 ,  G03F7/00 ,  G06N3/044 ,  G06N3/0464 ,  G06N3/0499 ,  G06N3/092

Abstract: A method of generating control actions for controlling a production system, such as by transmitting the control actions to a control system of the production system. The method includes receiving, by a memory unit, a set of observation data characterizing a current state of the production system; processing, by a first neural network module of the memory unit, an input based on at least part of the observation data to generate encoded observation data; updating, by a second neural network module of the memory unit, history information stored in an internal memory of the second module using an input based on at least part of the observation data; obtaining, based on the encoded observation data and the updated history information, state data; and generating, based on the state data, one or more control actions.

公开(公告)号：US20250102902A1

公开(公告)日：2025-03-27

申请号：US18727598

申请日：2023-01-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Tim Willem Johan VAN DE GOOR ,  Ernst GALUTSCHEK ,  Andrei Mikhailovich YAKUNIN ,  Paul JANSEN ,  Abraham Jan WOLF ,  Paul Alexander VERMEULEN ,  Zomer Silvester HOUWELING ,  Lucas Christiaan Johan HEIJMANS ,  Andrey NIKIPELOV

IPC: G03F1/62 ,  G03F7/00

Abstract: An assembly for a lithographic apparatus, wherein the assembly is configured to heat a pellicle membrane by one of or a combination selected from: i) provision of heated gas, ii) radiative heating, iii) resistive heating, and/or iv) inductive heating, and/or by illuminating the pellicle membrane with light having a wavelength of from around 91 nm to around 590 nm. Also a method of extending the operative lifespan of a pellicle membrane, the method including heating at least a portion of a pellicle membrane when illuminated by EUV by one of or a combination selected from: i) providing heated gas, ii) radiative heating, iii) resistive heating, and/or iv) inductive heating to effect heating of the at least one portion of the pellicle membrane, and/or by illuminating the pellicle membrane with light having a wavelength of from around 91 nm to around 590 nm.