公开(公告)号：US20240004283A1

公开(公告)日：2024-01-04

申请号：US18227833

申请日：2023-07-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Maxim Aleksandrovich Nasalevich ,  Erik Achilles ABEGG ,  Nirupam BANERJEE ,  Michiel Alexander BLAUW ,  Derk Servatius Gertruda BROUNS ,  Paul JANSSEN ,  Matthias KRUIZINGA ,  Egbert LENDERINK ,  Nicolae MAXIM ,  Andrey NIKIPELOV ,  Arnoud Willem NOTENBOOM ,  Claudia PILIEGO ,  Mária PÉTER ,  Gijsbert RISPENS ,  Nadja SCHUH ,  Marcus Adrianus VAN DE KERKHOF ,  Willem Joan VAN DER ZANDE ,  Pieter-Jan VAN ZWOL ,  Antonius Willem VERBURG ,  Johannes Petrus Martinus Bernardus VERMEULEN ,  David Ferdinand VLES ,  Willem-Pieter VOORTHUIJZEN ,  Aleksandar Nikolov ZDRAVKOV

IPC: G03F1/62 ,  G03F7/00 ,  G03F1/82 ,  G02B5/20 ,  G02B5/28

CPC classification number: G03F1/62 ,  G03F7/70191 ,  G03F7/70983 ,  G03F1/82 ,  G03F7/70916 ,  G03F7/70958 ,  G03F7/70575 ,  G02B5/208 ,  G02B5/283

Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer including an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.

公开(公告)号：US20230063156A1

公开(公告)日：2023-03-02

申请号：US17794897

申请日：2020-12-24

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Ronald Peter ALBRIGHT ,  Kursat BAL ,  Vadim Yevgenyevich BANINE ,  Richard Joseph BRULS ,  Sjoerd Frans DE VRIES ,  Olav Waldemar Vladimir FRIJNS ,  Yang-Shan HUANG ,  Zhuangxiong HUANG ,  Johannes Henricus Wilhelmus JACOBS ,  Johannes Hubertus Josephina MOORS ,  Georgi Nanchev NENCHEV ,  Andrey NIKIPELOV ,  Thomas Maarten RAASVELD ,  Manish RANJAN ,  Edwin TE SLIGTE ,  Karl Robert UMSTADTER ,  Eray UZGÖREN ,  Marcus Adrianus VAN DE KERKHOF ,  Parham YAGHOOBI

IPC: G03F7/20

Abstract: An apparatus comprising: a radiation receiving apparatus provided with an opening operable to receive radiation from a radiation source through the opening; wherein the radiation receiving apparatus comprises a deflection apparatus arranged to change a trajectory of a particle through the opening arriving at the radiation receiving apparatus.

公开(公告)号：US20220276553A1

公开(公告)日：2022-09-01

申请号：US17637891

申请日：2020-08-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Andrey NIKIPELOV ,  Sander BALTUSSEN ,  Vadim Yevgenyevich BANINE ,  Alexandr DOLGOV ,  DONMEZ NOYAN ,  Zomer Silvester HOUWELING ,  Arnoud Willem NOTENBOOM ,  Marcus Adrianus VAN DE KERKHOF ,  Ties Wouter VAN DER WOORD ,  Paul Alexander VERMEULEN ,  David Ferdinand VLES ,  Victoria VORONINA ,  Halil Gökay YEGEN

IPC: G03F1/62 ,  C01B32/158 ,  G03F7/20

Abstract: A pellicle membrane for a lithographic apparatus, the membrane including uncapped carbon nanotubes. A method of regenerating a pellicle membrane, the method including decomposing a precursor compound and depositing at least some of the products of decomposition onto the pellicle membrane. A method of reducing the etch rate of a pellicle membrane, the method including providing an electric field in the region of the pellicle membrane to redirect ions from the pellicle, or heating elements to desorb radicals from the pellicle, preferably wherein the pellicle membrane is a carbon nanotube pellicle membrane. An assembly for a lithographic apparatus, the assembly including a biased electrode near or including the pellicle membrane or heating means for the pellicle membrane.

公开(公告)号：US20200096880A1

公开(公告)日：2020-03-26

申请号：US16571956

申请日：2019-09-16

Applicant: ASML Netherlands B.V.

Inventor： Andrey NIKIPELOV ,  Vadim Yevgenyevich Banine ,  Christian Gerardus Norbertus Cloin ,  Edwin Te Sligte ,  Marcus Adrianus Van De Kerkhof ,  Ferdinandus Martinus Jozef Henri Van De Weterring

IPC: G03F7/20

Abstract: A component for use in a patterning device environment including a patterning device, wherein the component is treated to suppress EUV plasma-induced contaminant release and/or atomic hydrogen or other radicals induced defectivity. A conduit array comprising at least one conduit, wherein the at least one conduit has been treated to promote adhesion of a contaminant to the at least one conduit.

公开(公告)号：US20230314930A1

公开(公告)日：2023-10-05

申请号：US18022476

申请日：2021-07-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Vadim Yevgenyevich BANINE ,  Paul Alexander VERMEULEN ,  Cornelis Adrianus DE MEIJERE ,  Johnnes Hubertus Josephina MOORS ,  Andrey NIKIPELOV ,  Guido SALMASO ,  Marcus Adrianus VAN DE KERKHOF ,  Parham YAGHOOBI

IPC: G03F1/64 ,  G03F7/20

CPC classification number: G03F1/64 ,  G03F7/70983

Abstract: An apparatus for reducing a partially oxidized reticle and pellicle assembly, the apparatus including: a support; a hydrogen supply; and an electron source. The support is for supporting a reticle and pellicle assembly. The hydrogen supply is operable to supply hydrogen in the vicinity of a pellicle of a reticle and pellicle assembly when supported by the support. The electron source is operable to direct electrons so as to be incident on a pellicle of a reticle and pellicle assembly when supported by the support.

公开(公告)号：US20220008963A1

公开(公告)日：2022-01-13

申请号：US17294013

申请日：2019-11-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Andrey NIKIPELOV ,  Dmitry KURILOVICH ,  Fabio SBRIZZAI ,  Marcus Adrianus VAN DE KERKHOF ,  Ties Wouter VAN DER WOORD ,  Willem Joan VAN DER ZANDE ,  Jeroen VAN DUIVENBODE ,  David Ferdinand VLES

IPC: B08B6/00 ,  B08B7/02 ,  B08B7/04 ,  G03F1/62 ,  G03F1/82

Abstract: A membrane cleaning apparatus for removing particles from a membrane, the apparatus including a membrane support and an electric field generating mechanism. The membrane support is for supporting the membrane. The electric field generating mechanism is for generating an electric field in the vicinity of the membrane when supported by the membrane support. The electric field generating mechanism may include: one or more collector electrodes; and a mechanism for applying a voltage across a membrane supported by the membrane support and the or each of the one or more collector electrodes.

公开(公告)号：US20210397100A1

公开(公告)日：2021-12-23

申请号：US17279133

申请日：2019-09-25

Applicant: ASML NETHERLANDS B.V.

Inventor： Andrey NIKIPELOV ,  Johan Franciscus Maria BECKERS

IPC: G03F7/20 ,  C23C14/08 ,  C23C16/40

Abstract: An object, such as a sensor for an immersion lithographic apparatus, has an outer layer which comes in contact with immersion liquid and wherein the outer layer has a composition including a rare earth element. There is also provided an immersion lithographic apparatus having such an object and a method for manufacturing such an object.

公开(公告)号：US20210132517A1

公开(公告)日：2021-05-06

申请号：US16472712

申请日：2017-11-27

Applicant: ASML NETHERLANDS B.V.

Inventor： Andrey NIKIPELOV ,  Vadim Yevgenyevich BANINE ,  Joost André KLUGKIST ,  Maxim Aleksandrovich NASALEVICH ,  Roland Johannes Wilhelmus STAS ,  WRICKE Sandro

IPC: G03F9/00

Abstract: A lithographic apparatus has an object, the object includes: a substrate and optionally a lower layer on the substrate; an upper layer; and an intermediate layer between the upper layer and the substrate, wherein a bond strength between the intermediate layer and the substrate or lower layer is greater than a bond strength between the intermediate layer and the upper layer and the intermediate layer has a Young's Modulus and/or a Poisson ratio within 20% of that of the upper layer.

公开(公告)号：US20200064183A1

公开(公告)日：2020-02-27

申请号：US16488259

申请日：2018-02-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Joost André KLUGKIST ,  Vadim Yevgenyevich BANINE ,  Johan Franciscus Maria BECKERS ,  Madhusudhanan JAMBUNATHAN ,  Maxim Aleksandrovich NASALEVICH ,  Andrey NIKIPELOV ,  Roland Johannes Wilhelmus STAS ,  David Ferdinand VLES ,  Wilhelmus Jacobus Johannes WELTERS ,  Sandro WRICKE

IPC: G01J1/42

Abstract: A sensor mark including: a substrate having: a deep ultra violet (DUV) radiation absorbing layer including a first material which substantially absorbs DUV radiation; and a protecting layer including a second material, wherein: the DUV radiation absorbing layer has a through hole in it; the protecting layer is positioned, in plan, in the through hole and the protecting layer in the through hole has a patterned region having a plurality of through holes; and the second material is more noble than the first material.

公开(公告)号：US20160278196A1

公开(公告)日：2016-09-22

申请号：US15035983

申请日：2014-10-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Rolf Theodorus Nicolaas BEIJSENS ,  Kornelis Frits FEENSTRA ,  Arjen Teake DE JONG ,  Reinier Theodorus Martinus JILISEN ,  Niek Antonius Jacobus Maria KLEEMANS ,  Andrey NIKIPELOV ,  Pavel SEROGLAZOV ,  Nicolaas Antonius Allegondus Johannes VAN ASTEN ,  Harald Ernest VERBRAAK

IPC: H05G2/00

Abstract: A radiation system to generate a radiation emitting plasma, the radiation system include a fuel emitter to provide a fuel target at a plasma formation region, a first laser arranged to provide a first laser beam at the plasma formation region incident on the fuel target to generate a radiation emitting plasma, an imaging device arranged to obtain a first image of the radiation emitting plasma at the plasma formation region, the first image indicating at least one image property of the radiation emitting plasma, and a controller. The controller is arranged to receive the first image, and to generate at least one instruction based on the at least one image property of the radiation emitting plasma to modify operation of at least one component of the radiation system to reduce a detrimental effect of debris.

Abstract translation: 一种用于产生辐射发射等离子体的辐射系统，所述辐射系统包括燃料发射器，以在等离子体形成区域处提供燃料靶;布置成在入射到燃料靶上的等离子体形成区域处提供第一激光束的第一激光器，以产生 辐射发射等离子体，成像装置，被配置为获得等离子体形成区域处的发射等离子体的第一图像，第一图像表示发射等离子体的至少一个图像特性，以及控制器。 控制器布置成接收第一图像，并且基于辐射发射等离子体的至少一个图像特性生成至少一个指令，以修改辐射系统的至少一个分量的操作，以减少碎片的有害影响。