公开(公告)号：US12235096B2

公开(公告)日：2025-02-25

申请号：US18486811

申请日：2023-10-13

Applicant: ASML Netherlands B.V.

Inventor： Henricus Petrus Maria Pellemans ,  Arie Jeffrey Den Boef

IPC: G01B11/24 ,  G03F7/00

Abstract: A scatterometer for measuring a property of a target on a substrate includes a radiation source, a detector, and a processor. The radiation source produces a radiated spot on the target. The scatterometer adjusts a position of the radiated spot along a first direction across the target and along a second direction that is at an angle with respect to the first direction. The detector receives radiation scattered by the target. The received radiation is associated with positions of the radiated spot on the target along at least the first direction. The detector generates measurement signals based on the positions of the radiated spot on the target. The processor outputs, based on the measurement signals, a single value that is representative of the property of the target. The processor also combines the measurement signals to output a combined signal and derives, based on the combined signal, the single value.

公开(公告)号：US20250060682A1

公开(公告)日：2025-02-20

申请号：US18724144

申请日：2022-11-22

Applicant: ASML Netherlands B.V.

Inventor： Armin Bernhard RIDINGER ,  Muchen XU

IPC: G03F7/00

Abstract: A lithographic apparatus includes an illumination system to illuminate a pattern of a patterning device and a projection system to project an image of the pattern onto a substrate. The illumination system includes a first and second enclosures, a scaling device, and a protective device. The first enclosure encloses a first environment and includes a first opening and first connection corresponding to the first opening. The second enclosure includes a second connection structure to couple to the first connection structure to prevent mixing of substances between the first environment and a second environment outside of the first and second enclosures. The sealing device is disposed between the first and second connection structures. The material of the sealing device is chemically reactive to the first environment. The protective device is disposed on the sealing device proximal to the first environment to shield the sealing device from the first environment.

公开(公告)号：US20250060680A1

公开(公告)日：2025-02-20

申请号：US18721405

申请日：2022-12-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Aabid PATEL ,  Joshua ADAMS ,  Lisa DIXON ,  Igor Matheus Petronella AARTS

IPC: G03F7/00 ,  G01B11/27

Abstract: Generating an alignment signal for alignment of features in a layer of a substrate as part of a semiconductor manufacturing process is described. The present systems and methods can be faster and/or generate more information than typical methods for generating alignment signals because they utilize one or more existing structures in a patterned semiconductor wafer instead of a dedicated alignment structure. A feature (not a dedicated alignment mark) of the patterned semiconductor wafer is continuously scanned, where the scanning includes: continuously irradiating the feature with radiation; and continuously detecting reflected radiation from the feature. The scanning is performed perpendicular to the feature, along one side of the feature, or along both sides of the feature.

公开(公告)号：US12230469B2

公开(公告)日：2025-02-18

申请号：US17566518

申请日：2021-12-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Albertus Victor Gerardus Mangnus ,  Maikel Robert Goosen

IPC: H01J37/153 ,  H01J37/28

Abstract: Disclosed among other aspects is a charged particle inspection system including a phaseplate configured and arranged to modify the local phase of charged particles in a beam to reduce the effects of lens aberrations. The phaseplate is made up of an array of apertures with the voltage and/or a degree of obscuration of the apertures being controlled individually or in groups.

公开(公告)号：US20250053097A1

公开(公告)日：2025-02-13

申请号：US18716806

申请日：2022-11-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Kui-Jun HUANG ,  Liping REN

IPC: G03F7/00

Abstract: A correction to an error of overlay measurement which accounts for target structure asymmetry using a neural network is described. According to embodiments, an overlay measurement accuracy can be improved by accounting for multiple and/or asymmetric perturbations in the target structure. A trained neural network is described which generates a correction value for overlay measurement based on a measure of asymmetry. Based on an as-measured overlay measurement, which may not account for target structure asymmetry, and the correction value, a true overlay measurement is determined-which can exhibit improved accuracy and reduced uncertainty versus uncorrected values.

公开(公告)号：US20250044715A1

公开(公告)日：2025-02-06

申请号：US18717286

申请日：2022-12-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Ahmet Burak CUNBUL ,  Ferry ZIJP ,  Teunis Willem TUKKER ,  Peter Fernand William Jozef DENDAS ,  Abraham Franciscus Hubertus VAN GESSEL

IPC: G03F9/00

Abstract: A projection unit for a level sensor, the projection unit including: a first light pipe having a first inlet configured to receive radiation from a source and a first outlet; and a second light pipe having a second inlet configured to receive the radiation from the first light pipe and a second outlet. The unit may include a lens device configured to receive radiation from the second outlet and to output radiation having a predetermined distribution of intensity and irradiance.

公开(公告)号：US20250044710A1

公开(公告)日：2025-02-06

申请号：US18714547

申请日：2022-12-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Jiyou FU ,  Jing SU ,  Chenxi LIN ,  Jiao LIANG ,  Guangqing CHEN ,  Yi ZOU

IPC: G03F7/00 ,  G03F9/00 ,  G06T7/00 ,  G06T7/33 ,  H01L21/66

Abstract: A method of image template matching for multiple process layers of, for example, semiconductor substrate with an adaptive weight map is described. An image template is provided with a weight map, which is adaptively updated based during template matching based on the position of the image template on the image. A method of template matching a grouped pattern or artifacts in a composed template is described, wherein the pattern comprises deemphasized areas weighted less than the image templates. A method of generating an image template based on a synthetic image is described. The synthetic image can be generated based on process and image modeling. A method of selecting a grouped pattern or artifacts and generating a composed template is described. A method of per layer image template matching is described.

公开(公告)号：US12217927B2

公开(公告)日：2025-02-04

申请号：US17633556

申请日：2020-08-04

Applicant: ASML NETHERLANDS B.V.

Inventor： Jian Zhang ,  Ning Ye ,  Zhiwen Kang ,  Yixiang Wang

IPC: H01J37/26 ,  G02B27/09 ,  H01J37/02 ,  H01J37/28

Abstract: A system and a method for manipulating a beam of an Advanced Charge Controller module in different planes in an e-beam system are provided. Some embodiments of the system include a lens system configured to manipulate a beam in the tangential plane and the sagittal plane such that the beam spot is projected onto the wafer with high luminous energy. Some embodiments of the system include a lens system comprising at least two cylindrical lens.

公开(公告)号：US20250037966A1

公开(公告)日：2025-01-30

申请号：US18910626

申请日：2024-10-09

Applicant: ASML Netherlands B.V.

Inventor： Jinmei YANG ,  Jian ZHANG ,  Zhiwen KANG ,  Yixiang WANG

IPC: H01J37/28 ,  G01N23/2251 ,  H01J37/26

Abstract: A sensor may be used to measure a degree of tilt of a sample. The sensor may include an apparatus having a light source, first, second, and third optical elements, a lens, and an aperture. The first optical element may supply light from the light source toward the sample, and may supply light input into the first optical element from the sample toward the second optical element. The second optical element may supply light toward first and second sensing elements. An aperture may be arranged on a focal plane of the lens. A light beam incident on the first sensing element may be a reference beam.

公开(公告)号：US20250031294A1

公开(公告)日：2025-01-23

申请号：US18716468

申请日：2022-12-07

Applicant: ASML Netherlands B.V.

Inventor： Roger Anton Marie TIMMERMANS ,  Alexander Evgenevich LINKOV ,  Bas Willem Johannes Johanna Anna VAN DORP ,  Thomas William Georg KHOURI ,  Paul Peter Anna Antonius BROM

IPC: H05G2/00 ,  G01B11/27 ,  G02B5/00 ,  G03F7/00

Abstract: An aperture for detecting a laser beam misalignment, the aperture comprising: a body including a first opening and defining a first axis; a beam dump; an optical element including a second opening wherein the first opening and the second opening are coaxial with the first axis, the optical element being configured to redirect a misaligned laser beam to a detector or to split a misaligned laser beam into at least two sub-beams; a laser beam detection system configured to detect laser light, wherein the optical element is configured to direct a first sub-beam to the beam dump, and to direct a second sub-beam to the laser beam detection system. Also described is an aperture including an enclosure, a method of detecting misalignment of a laser beam, a radiation source comprising such an aperture, a lithographic apparatus comprising such a radiation source or aperture, and the use of the same in a lithographic apparatus or method.