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公开(公告)号：US20250044715A1
公开(公告)日：2025-02-06
申请号：US18717286
申请日：2022-12-05
Applicant: ASML NETHERLANDS B.V.
Inventor： Ahmet Burak CUNBUL , Ferry ZIJP , Teunis Willem TUKKER , Peter Fernand William Jozef DENDAS , Abraham Franciscus Hubertus VAN GESSEL
IPC: G03F9/00
Abstract: A projection unit for a level sensor, the projection unit including: a first light pipe having a first inlet configured to receive radiation from a source and a first outlet; and a second light pipe having a second inlet configured to receive the radiation from the first light pipe and a second outlet. The unit may include a lens device configured to receive radiation from the second outlet and to output radiation having a predetermined distribution of intensity and irradiance.
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公开(公告)号：US20180004095A1
公开(公告)日：2018-01-04
申请号：US15639467
申请日：2017-06-30
Applicant: ASML Netherlands B.V.
Inventor： Teunis Willem TUKKER , Nitesh Pandey , Coen Adrianus Verschuren
IPC: G03F7/20 , F21V9/16 , F21V14/08 , F21Y2115/10
CPC classification number: G03F7/70191 , F21V9/30 , F21V14/08 , F21Y2115/10 , G03F7/7005 , G03F7/70575 , G03F7/70625 , G03F7/70633
Abstract: An illumination system has a microLED array 502. The microLED array 502 is imaged or placed very close to a phosphor coated glass disc 504 which upconverts the light from the microLED array into a narrow band emission. The plate has at least two different photoluminescent materials arranged to be illuminated by the microLED array and to thereby emit output light. The different photoluminescent materials have different emission spectral properties of the output light, e.g. different center wavelength and optionally different bandwidth. Illumination of different photoluminescent materials by the illumination sources is selectable, by selective activation of the microLEDs or by movement of the photoluminescent materials relative to the illumination sources, to provide different illumination of the different photoluminescent materials. This provides tunable spectral properties of the output light. Selectively configurable filters 506 are arranged to filter the output light in accordance with the selected illumination of the different photoluminescent materials.
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公开(公告)号：US20240345489A1
公开(公告)日：2024-10-17
申请号：US18291534
申请日：2022-06-08
Applicant: ASML Netherlands B.V.
Inventor： Vasco Tomas TENNER , Hugo Augustinus Joseph CRAMER , Teunis Willem TUKKER , Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN
IPC: G03F7/00
CPC classification number: G03F7/706851 , G03F7/7065 , G03F7/706849
Abstract: Disclosed is a metrology device operable to measure a sample with measurement radiation and associated method. The metrology device comprises: an illumination branch operable to propagate measurement radiation to a sample, a detection branch operable to propagate one or more components of scattered radiation, scattered from said sample as a result of illumination of the sample by said measurement radiation; and a dispersive arrangement in either of said illumination branch or said detection branch. The dispersive arrangement is arranged to maintain one or more components of said scattered radiation at substantially a same respective location in a detection pupil plane over a range of wavelength values for said measurement radiation.
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公开(公告)号：US20190072853A1
公开(公告)日：2019-03-07
申请号：US16117589
申请日：2018-08-30
Applicant: ASML Netherlands B.V.
Inventor： Sietse Thijmen VAN DER POST , Stefan Michael Bruno BÄUMER , Peter Danny VAN VOORST , Teunis Willem TUKKER , Ferry ZIJP , Han-Kwang NIENHUYS , Jacobus Maria Antonius VAN DEN EERENBEEMD
Abstract: An optical system (OS) for focusing a beam of radiation (B) on a region of interest in a metrology apparatus is described. The beam of radiation (B) comprises radiation in a soft X-ray or Extreme Ultraviolet spectral range. The optical system (OS) comprises a first stage (S1) for focusing the beam of radiation at an intermediate focus region. The optical system (OS) comprises a second stage (S2) for focusing the beam of radiation from the intermediate focus region onto the region of interest. The first and second stages each comprise a Kirkpatrick-Baez reflector combination. At least one reflector comprises an aberration-correcting reflector.
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公开(公告)号：US20180164699A1
公开(公告)日：2018-06-14
申请号：US15802701
申请日：2017-11-03
Applicant: ASML Netherlands B.V.
Inventor： Teunis Willem TUKKER , Gerbrand Van Der Zouw , Amandev Singh
IPC: G03F7/20 , G01N21/956
CPC classification number: G03F7/70633 , G01N21/95607 , G03F7/7015 , G03F7/70625 , G03F9/7046 , G03F9/7069 , G03F9/7088
Abstract: A measurement system is disclosed in which a first optical system splits an input radiation beam into a plurality of components. A modulator receives the plurality of components and applies a modulation to at least one of the components independently of at least one other of the components. A second optical system illuminates a target with the plurality of components and directs radiation scattered by the target to a detection system. The detection system distinguishes between each of one or more components, or between each of one or more groups of components, of the radiation directed to the detection system based on the modulation applied to each component or each group of components by the modulator.
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Patent Agency Ranking
公开(公告)号：US20180045657A1
公开(公告)日：2018-02-15
申请号：US15664808
申请日：2017-07-31
Applicant: ASML HOLDING N.V. , ASML NETHERLANDS B.V.
Inventor： Stanislav SMIRNOV , Johannes Matheus Marie DE WIT , Teunis Willem TUKKER , Armand Eugene Albert KOOLEN
CPC classification number: G01N21/9515 , G01N21/47 , G02B21/10 , G02B27/0075 , G03F7/70616
Abstract: An optical inspection apparatus, including: an optical metrology tool configured to measure structures, the optical metrology tool including: an electromagnetic (EM) radiation source configured to direct a beam of EM radiation along an EM radiation path; and an adaptive optical system disposed in a portion of the EM radiation path and configured to adjust a shape of a wave front of the beam of EM radiation, the adaptive optical system including: a first aspherical optical element; a second aspherical optical element adjacent the first aspherical optical element; and an actuator configured to cause relative movement between the first optical element and the second optical element in a direction different from a beam axis of the portion of the EM radiation path.
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公开(公告)号：US20240404036A1
公开(公告)日：2024-12-05
申请号：US18802614
申请日：2024-08-13
Applicant: ASML Netherlands B.V.
Inventor： Teunis Willem TUKKER , Arie Jeffrey DEN BOEF , Nitesh PANDEY , Marinus Petrus REIJNDERS , Ferry ZIJP
Abstract: Disclosed is a detection apparatus for simultaneous acquisition of multiple images of an object at a plurality of different focus levels; comprising: a modulator for obtaining multiple beam copies of an incoming beam; and a detector operable to capture said multiple beam copies, such that at two of said multiple beam copies are captured at different focus levels. Also disclosed is an inspection apparatus comprising such a detection system.
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公开(公告)号：US20220172347A1
公开(公告)日：2022-06-02
申请号：US17608015
申请日：2020-04-02
Applicant: ASML Netherlands B.V.
Inventor： Teunis Willem TUKKER , Arie Jefrey DEN BOEF , Nitesh PANDEY , Marinus Petrus REIJNDERS , Ferry ZIJP
Abstract: Disclosed is a detection apparatus for simultaneous acquisition of multiple images of an object at a plurality of different focus levels; comprising: a modulator for obtaining multiple beam copies of an incoming beam; and a detector operable to capture said multiple beam copies, such that at two of said multiple beam copies are captured at different focus levels. Also disclosed is an inspection apparatus comprising such a detection system.
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公开(公告)号：US20180107124A1
公开(公告)日：2018-04-19
申请号：US15723820
申请日：2017-10-03
Applicant: ASML Netherlands B.V.
Inventor： Teunis Willem TUKKER , Amandev Singh , Gerbrand Van Der Zouw
IPC: G03F7/20 , G01B11/27 , G01N21/956
Abstract: Metrology apparatus and methods are disclosed. In one arrangement, a substrate is inspected. A source beam of radiation emitted by a radiation source is split into a measurement beam and a reference beam. A first target is illuminated with the measurement beam, the first target being on the substrate. A second target is illuminated with the reference beam, the second target being separated from the substrate. First scattered radiation is collected from the first target and delivered to a detector. Second scattered radiation is collected from the second target and delivered to the detector. The first scattered radiation interferes with the second scattered radiation at the detector. The first target comprises a first pattern. The second target comprises a second pattern, or a pupil plane image of the second pattern. The first pattern is geometrically identical to the second pattern, the first pattern and the second pattern are periodic and a pitch of the first pattern is identical to a pitch of the second pattern, or both.
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公开(公告)号：US20180031977A1
公开(公告)日：2018-02-01
申请号：US15660498
申请日：2017-07-26
Applicant: ASML Netherlands B.V.
Inventor： Sebastianus Adrianus GOORDEN , Nitesh PANDEY , Duygu AKBULUT , Teunis Willem TUKKER , Johannes Matheus Marie DE WIT
CPC classification number: G03F7/7015 , G01N21/8806 , G01N21/9501 , G01N2021/8822 , G01N2201/0631 , G02B6/262 , G02B6/4204 , G02B6/4296 , G03F7/70075 , G03F7/70583 , G03F7/70616 , G03F7/70625 , G03F7/70633
Abstract: Devices and methods for processing a radiation beam with coherence are disclosed. In one arrangement, an optical system receives a radiation beam with coherence. The radiation beam comprises components distributed over one or more radiation beam spatial modes. A waveguide supports a plurality of waveguide spatial modes. The optical system directs a plurality of the components of the radiation beam belonging to a common radiation beam spatial mode and having different frequencies onto the waveguide in such a way that each of the plurality of components couples to a different set of the waveguide spatial modes, each set comprising one or more of the waveguide spatial modes.
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