公开(公告)号：US20230213868A1

公开(公告)日：2023-07-06

申请号：US18012308

申请日：2021-06-04

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Mohamed SWILLAM ,  Marinus Petrus REIJNDERS

IPC: G03F7/20

CPC classification number: G03F7/70258 ,  G03F7/7085 ,  G03F7/70275

Abstract: A system includes an illumination system, an optical element, a switching element and a detector. The illumination system includes a broadband light source that generates a beam of radiation. The dispersive optical element receives the beam of radiation and generates a plurality of light beams having a narrower bandwidth than the broadband light source. The optical switch receives the plurality of light 5 beams and transmits each one of the plurality of light beams to a respective one of a plurality of alignment sensor of a sensor array. The detector receives radiation returning from the sensor array and to generate a measurement signal based on the received radiation.

公开(公告)号：US20220291595A1

公开(公告)日：2022-09-15

申请号：US17626852

申请日：2020-07-07

Applicant: ASML Netherlands B.V.

Inventor： Marinus Petrus REIJNDERS ,  Hendrik SABERT ,  Patrick Sebastian UEBEL

IPC: G03F7/20

Abstract: Provided are light sources and methods of controlling them, and devices and methods for use in measurement applications, particularly in metrology, for example in a lithographic apparatus. The methods and devices provide mechanisms for detection and/or correction of variations in the light source, in particular stochastic variations. Feedback or feedforward approaches can be used for the correction of the source and/or the metrology outputs. An exemplary method of controlling the spectral output of a light source which emits a time-varying spectrum of light includes the steps of: determining at least one characteristic of the spectrum of light emitted from the light source; and using said determined characteristic to control the spectral output.

公开(公告)号：US20240231243A1

公开(公告)日：2024-07-11

申请号：US18612659

申请日：2024-03-21

Applicant: ASML Netherlands B.V.

Inventor： Marinus Petrus REIJNDERS ,  Hendrik SABERT ,  Patrick Sebastian UEBEL

IPC: G03F7/00

CPC classification number: G03F7/70616

Abstract: Provided are light sources and methods of controlling them, and devices and methods for use in measurement applications, particularly in metrology, for example in a lithographic apparatus. The methods and devices provide mechanisms for detection and/or correction of variations in the light source, in particular stochastic variations. Feedback or feedforward approaches can be used for the correction of the source and/or the metrology outputs. An exemplary method of controlling the spectral output of a light source which emits a time-varying spectrum of light includes the steps of: determining at least one characteristic of the spectrum of light emitted from the light source; and using said determined characteristic to control the spectral output.

公开(公告)号：US20220121127A1

公开(公告)日：2022-04-21

申请号：US17562446

申请日：2021-12-27

Applicant: ASML Netherlands B.V.

Inventor： Nitesh PANDEY ,  Arie Jeffrey DEN BOEF ,  Duygu AKBULUT ,  Marimus Johannes Maria VAN DAM ,  Hans BUTLER ,  Hugo Augustinus Joseph CRAMER ,  Engelbertus Antonius Franciscus VAN DER PASCH ,  Ferry ZIJP ,  Jeroen Arnoldus Leonardus Johannes RAAYMAKERS ,  Marinus Petrus REIJNDERS

IPC: G03F7/20 ,  G01N21/956

Abstract: A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.

公开(公告)号：US20210072652A1

公开(公告)日：2021-03-11

申请号：US17044674

申请日：2019-03-13

Applicant: ASML Netherlands B.V.

Inventor： Simon Reinald HUISMAN ,  Marinus Petrus REIJNDERS

IPC: G03F9/00 ,  G03F7/20

Abstract: The invention provides a level sensor to measure a position of a surface of a substrate, comprising a projection unit arranged to direct a beam of radiation to the surface of the substrate and a detection unit. The detection unit comprises a detection grating arranged to receive the beam of radiation reflected on the surface of the substrate, one or more detectors, one or more optical elements to direct the beam of radiation from the detection grating to the one or more detectors, and a processing unit to determine the position of the surface of the substrate on the basis of the beam of radiation received by the one or more detectors. The detection grating and the one or more optical elements are integrated in a single integrated optical element.

公开(公告)号：US20240404036A1

公开(公告)日：2024-12-05

申请号：US18802614

申请日：2024-08-13

Applicant: ASML Netherlands B.V.

Inventor： Teunis Willem TUKKER ,  Arie Jeffrey DEN BOEF ,  Nitesh PANDEY ,  Marinus Petrus REIJNDERS ,  Ferry ZIJP

IPC: G06T7/00 ,  G01N21/47 ,  G02B5/30 ,  G02B27/28 ,  G02B27/42 ,  G03F7/00

Abstract: Disclosed is a detection apparatus for simultaneous acquisition of multiple images of an object at a plurality of different focus levels; comprising: a modulator for obtaining multiple beam copies of an incoming beam; and a detector operable to capture said multiple beam copies, such that at two of said multiple beam copies are captured at different focus levels. Also disclosed is an inspection apparatus comprising such a detection system.

公开(公告)号：US20240168392A1

公开(公告)日：2024-05-23

申请号：US18277188

申请日：2022-01-12

Applicant: ASML Netherlands B.V.

Inventor： Petrus Wilhelmus SMORENBURG ,  Johan REININK ,  Marinus Petrus REIJNDERS ,  Han-Kwang NIENHUYS ,  David O'DWYER ,  Sander Bas ROOBOL ,  Christina Lynn PORTER ,  Stephen EDWARD

IPC: G03F7/00 ,  G21K1/10

CPC classification number: G03F7/706849 ,  G03F7/70233 ,  G03F7/70308 ,  G03F7/70316 ,  G21K1/10

Abstract: An assembly and method for separating first radiation and second radiation in the far field, wherein the first radiation and the second radiation have non-overlapping wavelengths, The assembly comprises a capillary structure, wherein the first radiation and the second radiation propagate coaxially along at least a portion of the capillary structure, and an optical structure configured to control the spatial distribution of the first radiation outside of the capillary structure, through interference, such that the intensity of the first radiation in the far field is reduced along an optical axis of the second radiation.

公开(公告)号：US20220172347A1

公开(公告)日：2022-06-02

申请号：US17608015

申请日：2020-04-02

Applicant: ASML Netherlands B.V.

Inventor： Teunis Willem TUKKER ,  Arie Jefrey DEN BOEF ,  Nitesh PANDEY ,  Marinus Petrus REIJNDERS ,  Ferry ZIJP

IPC: G06T7/00 ,  G02B5/30 ,  G02B27/42 ,  G02B27/28 ,  H04N5/225 ,  H04N5/232

Abstract: Disclosed is a detection apparatus for simultaneous acquisition of multiple images of an object at a plurality of different focus levels; comprising: a modulator for obtaining multiple beam copies of an incoming beam; and a detector operable to capture said multiple beam copies, such that at two of said multiple beam copies are captured at different focus levels. Also disclosed is an inspection apparatus comprising such a detection system.

公开(公告)号：US20240184218A1

公开(公告)日：2024-06-06

申请号：US18441772

申请日：2024-02-14

Applicant: ASML Netherlands B.V.

Inventor： Nitesh PANDEY ,  Arie Jeffrey DEN BOEF ,  Duygu AKBULUT ,  Marinus Johannes Maria VAN DAM ,  Hans BUTLER ,  Hugo Augustinus Joseph CRAMER ,  Engelbertus Antonius Fransiscus VAN DER PASCH ,  Ferry ZIJP ,  Jeroen Arnoldus Leonardus Johannes RAAYMAKERS ,  Marinus Petrus REIJNDERS

IPC: G03F7/00 ,  G01N21/956

CPC classification number: G03F7/70625 ,  G01N21/956 ,  G03F7/7015 ,  G03F7/70633

Abstract: A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.

公开(公告)号：US20230058714A1

公开(公告)日：2023-02-23

申请号：US17790344

申请日：2020-12-08

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Marinus Petrus REIJNDERS ,  Mohamed SWILLAM

IPC: G03F7/20

Abstract: A system includes an illumination system, an optical element, and a detector. The optical system is implemented on a substrate. The illumination system includes first and second sources and first and second generators. The illumination system generates a beam of radiation. The first and second sources generate respective first and second different wavelength bands. The first and second resonators are optically coupled to respective ones of the first and second sources and narrow respective ones of the first and second wavelength bands. The optical element directs the beam toward a target structure. The detector receives radiation from the target structure and to generate a measurement signal based on the received radiation.