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公开(公告)号：US20240353758A1
公开(公告)日：2024-10-24
申请号：US18684894
申请日：2022-08-19
Inventor： Hrvoje Petek , Zhikang Zhou , Atreyie Ghosh , Sena Yang , Tianyi Wang , Chen-Bin Huang , Yanan Dai
IPC: G03F7/00
CPC classification number: G03F7/70091 , G03F7/70033 , G03F7/70041 , G03F7/7015
Abstract: Methods and systems for assembling electron spin and charge to possess one or more properties of a topological plasmonic spin texture array for performing lithography that is not limited by an optical system's diffraction limit are disclosed. According to one embodiment, the method includes defining a polarization of an optical field of light and a corresponding coupling-structure geometry. The method includes providing a coupling structure having the defined coupling-structure geometry in a metallic material, the coupling structure defining a region of the metallic material. The method includes directing light having the defined polarization to a center of the region, forming a lattice of plasmonic merons having a finer contrast resolution than a diffraction or reflection based resolution determined by Abbe limit based on the defined polarization of the optical field.
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公开(公告)号：US20240302756A1
公开(公告)日：2024-09-12
申请号：US18665818
申请日：2024-05-16
Applicant: Carl Zeiss SMT GmbH
Inventor： Dirk EHM , Moritz BECKER , Stefan SCHMIDT
CPC classification number: G03F7/70958 , G03F7/70033 , G03F7/7015 , G03F7/702 , G03F7/70233 , G03F7/70316 , G03F7/70925 , G03F7/70933 , G02B1/14
Abstract: A method of depositing a cover layer onto an optical element (M1) for reflection of EUV radiation. In the method, a cover layer containing phosphorus (P) is deposited onto the optical element (M1). The optical element (M1) in the course of deposition of the cover layer (35) is disposed in an interior (39) of a housing (36) of an EUV lithography system, and, for the deposition of the cover layer, phosphorus (P) is released from at least one phosphorus source (42, 43) disposed outside the interior (39) or within the interior (39). Also disclosed are an EUV lithography system and an optical element (M1) for reflecting EUV radiation.
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公开(公告)号：US12072606B2
公开(公告)日：2024-08-27
申请号：US17862133
申请日：2022-07-11
Applicant: KLA Corporation
Inventor： John Fielden , Yung-Ho Alex Chuang
CPC classification number: G02F1/3551 , G01N21/9501 , G03F7/7015 , G03F7/70591 , G01N2201/068
Abstract: An amorphous layer is used as a protective coating for hygroscopic nonlinear optical crystals. The amorphous layer consists of one or more alkali metal borates and/or alkali earth metal borates. The amorphous layer slows or prevents water and/or oxygen from diffusing into the hygroscopic nonlinear optical crystal, thus simplifying handling, storage and operating environmental requirements. One or multiple additional coating layers may be placed on top of the amorphous layer, with the additional coating layers including conventional optical materials. The thicknesses of the amorphous layer and/or additional layers may be chosen to reduce reflectance of the optical component at one or more specific wavelengths. The coated nonlinear optical crystal is used in an illumination source utilized in a semiconductor inspection system, a metrology system, or a lithography system.
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公开(公告)号：US20240170905A1
公开(公告)日：2024-05-23
申请号：US18552634
申请日：2022-03-07
Applicant: ASML Netherlands B.V.
Inventor： Herman Philip GODFRIED
CPC classification number: H01S3/0057 , G02B27/48 , G03F7/70025 , G03F7/70041 , G03F7/7015 , H01S3/225
Abstract: A laser system comprising: a laser operable to generate a laser beam; an optical system comprising a first optical element and a second optical element; and an output through which the laser beam exits the laser system; the laser, optical system and output arranged such that the laser beam travels to the first optical element, the second optical element and the output sequentially; wherein the first optical element has a first focal length, the second optical element has a second focal length equal to the first focal length, and the second optical element is spaced from the first optical element by a distance of two times the first focal length.
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公开(公告)号：US11815817B2
公开(公告)日：2023-11-14
申请号：US17553040
申请日：2021-12-16
Applicant: Carl Zeiss SMT GmbH
Inventor： Guenter Rudolph , Joram Rosseels
CPC classification number: G03F7/70075 , G02B5/09 , G02B26/0825 , G03F7/7015 , G03F7/70033 , G03F7/70141
Abstract: A field facet system for a lithography apparatus includes an optical element. The optical element includes a base section having an optically effective surface. The optical element also includes a plurality of lever sections provided at a rear side of the base section facing away from the optically effective surface. In addition, the field facet system includes two or more actuating elements configured, with the aid of the lever sections acting as levers, to apply in each case a bending moment to the base section to elastically deform the base section and thus to alter a radius of curvature of the optically effective surface. The actuating elements are arranged in series as viewed along a length direction of the optical element.
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Patent Agency Ranking
公开(公告)号：US11809084B2
公开(公告)日：2023-11-07
申请号：US17874204
申请日：2022-07-26
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Chi-Hung Liao , Yueh Lin Yang
CPC classification number: G03F7/7015 , G03F7/702 , G03F7/70025
Abstract: Embodiments described herein provide a lithographic system having two or more lithographic tools connected to a radiation source using two or more variable attenuation units. In some embodiments, the variable attenuation unit reflects a portion of the received light beam to the lithographic tool attached thereto and transmits a remaining portion of the received light beam to the lithographic tools downstream. In some embodiments, the radiation source includes two or more laser sources to provide laser beams with an enhanced power level and which can prevent operation interruption due to laser source maintenances and repair.
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公开(公告)号：US11720028B2
公开(公告)日：2023-08-08
申请号：US17511234
申请日：2021-10-26
Applicant: Carl Zeiss SMT GmbH
Inventor： Thomas Fischer , Lars Wischmeier , Michael Patra , Hubert Holderer
CPC classification number: G03F7/7015 , G03F7/70133
Abstract: A measurement illumination optical unit guides illumination light into an object field of a projection exposure apparatus for EUV lithography. The illumination optical unit has a field facet mirror with a plurality of field facets and a pupil facet mirror with a plurality of pupil facets. The latter serve for overlaid imaging in the object field of field facet images of the field facets. A field facet imaging channel of the illumination light is guided via any one field facet and any one pupil facet. A field stop specifies a field boundary of an illumination field in the object plane. The illumination field has a greater extent along one field dimension than any one of the field facet images. At least some of the field facets include tilt actuators which help guide the illumination light into the illumination field via various field facets and one and the same pupil facet.
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公开(公告)号：US11720013B2
公开(公告)日：2023-08-08
申请号：US17708593
申请日：2022-03-30
Applicant: Applied Materials, Inc.
Inventor： Wen Xiao , Vibhu Jindal , Weimin Li , Shuwei Liu
CPC classification number: G03F1/24 , G02B5/0891 , G03F7/7015 , G03F7/70316
Abstract: A multilayer stack in the form of a Bragg reflector comprising a graded interfacial layer and a method of manufacturing are disclosed. The graded interfacial layer eliminates the formation of low-reflectivity interfaces in a multilayer stack and reduces roughness of interfaces in a multilayer stack.
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公开(公告)号：US20230185201A1
公开(公告)日：2023-06-15
申请号：US17814017
申请日：2022-07-21
Applicant: CHANGXIN MEMORY TECHNOLOGIES, INC.
Inventor： Kanyu CAO
CPC classification number: G03F7/7015 , G03F7/16
Abstract: The present disclosure provides a method of forming a photoresist pattern and a projection exposure apparatus. The forming method includes: providing a photoresist layer, and disposing the photoresist layer under a projection objective, wherein a light refracting plate is located between the photoresist layer and the projection objective; and performing an exposure processing on the photoresist layer through the projection objective and the light refracting plate, and forming an exposure image in the photoresist layer, wherein the light refracting plate is configured to reduce a wavelength of optical waves entering the photoresist layer.
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公开(公告)号：US20230168588A1
公开(公告)日：2023-06-01
申请号：US18102274
申请日：2023-01-27
Applicant: NanoPath, Inc.
Inventor： Kevin Donahue
CPC classification number: G03F7/7035 , G02B6/0036 , G02B6/0051 , G03F7/16 , G03F7/2004 , G03F7/26 , G03F7/7015 , G02B6/0035 , G03F1/50 , G03F7/70283 , G02B6/0011 , G03F7/70108 , G03F7/2051 , H01L21/0274
Abstract: A device includes a light source and a light guide. The light source is configured to emit photoresist-curative electromagnetic radiation. The light guide is arranged to receive the photoresist-curative electromagnetic radiation from the light source and to guide the received radiation by total internal reflection, the light guide including a pattern of emission points on at least one surface of the light guide, the emission points emitting the photoresist-curative electromagnetic radiation out of the light guide by frustration of total internal reflection caused by the emission points.
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