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公开(公告)号：US20240219846A1
公开(公告)日：2024-07-04
申请号：US18606012
申请日：2024-03-15
申请人： Gigaphoton Inc.
发明人： Koichi FUJII
CPC分类号： G03F7/70633 , G03F7/70358 , H01S3/08009 , H01S3/225
摘要： An electronic device manufacturing method includes performing scanning exposure in which plural scan fields of a first photosensitive substrate are exposed to pulse laser light having a reference wavelength, measuring overlay errors at plural positions in each of the plural scan fields, calculating the average of the overlay errors at each of the plural positions in scan fields scanned in the same scan direction out of the plural scan fields, calculating the amount of wavelength adjustment with respect to the reference wavelength in such a way that a first overlay error parameter calculated from the averages and distortions produced when the wavelength of the pulse laser light is changed from the reference wavelength is smaller than a second overlay error parameter calculated from the averages, causing a laser apparatus to generate the pulse laser light having a wavelength controlled by using the amount of wavelength adjustment, outputting the pulse laser light to an exposure apparatus, and exposing a second photosensitive substrate to the pulse laser light in the exposure apparatus to manufacture electronic devices.
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公开(公告)号：US20240170905A1
公开(公告)日：2024-05-23
申请号：US18552634
申请日：2022-03-07
CPC分类号： H01S3/0057 , G02B27/48 , G03F7/70025 , G03F7/70041 , G03F7/7015 , H01S3/225
摘要： A laser system comprising: a laser operable to generate a laser beam; an optical system comprising a first optical element and a second optical element; and an output through which the laser beam exits the laser system; the laser, optical system and output arranged such that the laser beam travels to the first optical element, the second optical element and the output sequentially; wherein the first optical element has a first focal length, the second optical element has a second focal length equal to the first focal length, and the second optical element is spaced from the first optical element by a distance of two times the first focal length.
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公开(公告)号：US20240128701A1
公开(公告)日：2024-04-18
申请号：US18531771
申请日：2023-12-07
申请人： Gigaphoton Inc.
发明人： Atsushi FUCHIMUKAI
CPC分类号： H01S3/0064 , G02F1/0136 , G02F1/09 , G03F7/2006 , G03F7/70025 , G03F7/70566 , H01S3/0014 , H01S3/225 , H01S3/2308 , H01S2302/00
摘要： An ultraviolet laser device includes an oscillation stage laser outputting linearly polarized pulse laser light having an ultraviolet wavelength, an optical isolator arranged on an optical path between the oscillation stage laser and an amplifier, and a processor. The optical isolator includes a first polarizer, a first Faraday rotator rotating a polarization direction of the pulse laser light transmitted through the first polarizer in a first rotation direction, a second polarizer arranged so that the pulse laser light output from the first Faraday rotator is transmitted therethrough, a first actuator relatively moving the first magnet and the first Faraday material in an optical axis direction, and a first sensor measuring a power of pulse laser light reflected by the second polarizer among the pulse laser light output from the oscillation stage laser. The processor controls the first actuator based on a measurement result of the first sensor.
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公开(公告)号：US20240079844A1
公开(公告)日：2024-03-07
申请号：US18504532
申请日：2023-11-08
申请人： Gigaphoton Inc.
发明人： Takashi SHIGA
CPC分类号： H01S3/1301 , G03F7/70025 , H01S3/10069 , H01S3/225 , H01S3/2316
摘要： A laser device includes a master oscillator outputting pulse laser light at a first discharge timing synchronized with a repetition frequency; an amplifier amplifying the pulse laser light by exciting, at a second discharge timing, a laser medium through which the pulse laser light passes; and a processor setting the second discharge timing by adding a delay time to the first discharge timing, holding a first value as a command value of the delay time corresponding to a first repetition frequency, holding a second value as the command value of the delay time corresponding to a second repetition frequency, and outputting the command value of the second value after outputting the command value of a third value between the first value and the second value when the repetition frequency is changed from the first repetition frequency to the second repetition frequency after outputting the command value of the first value.
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公开(公告)号：US20230378713A1
公开(公告)日：2023-11-23
申请号：US18363602
申请日：2023-08-01
申请人： Gigaphoton Inc. , Inter-University Research Institute Corporation, National Institutes of Natural Sciences
发明人： Yuki TAMARU , Taisuke MIURA , Ryo YASUHARA
CPC分类号： H01S3/10061 , H01S3/0064 , H01S3/2251 , H01S3/2256 , H01S3/0071 , H01S3/0014 , H01S3/2325 , G03F7/70025 , G03F7/70191
摘要： An ultraviolet laser apparatus includes an oscillation-stage laser, an amplifier that amplifies the pulse laser light, and an optical isolator. The optical isolator includes a first Faraday rotator that rotates the polarization direction of the pulse laser light output from the oscillation-stage laser by a first angle in a first rotation direction, a first polarizer so disposed to transmit the pulse laser light that exits out of the first Faraday rotator at normalized transmittance greater than or equal to 0.9, a second Faraday rotator that rotates the polarization direction of the pulse laser light passing through the first polarizer by a second angle in the opposite direction to the first rotation direction, and a second polarizer so disposed to transmit the pulse laser light that exits out of the second Faraday rotator at the normalized transmittance greater than or equal to 0.9.
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6.发明公开公开(公告)号：US20230375847A1
公开(公告)日：2023-11-23
申请号：US18363651
申请日：2023-08-01
申请人： Gigaphoton Inc. , Inter-University Research Institute Corporation, National Institutes of Natural Sciences
发明人： Yuki TAMARU , Taisuke MIURA , Ryo YASUHARA
CPC分类号： G02B27/28 , H01S3/0401 , H01S3/2251 , H01S3/2256 , H01S3/23
摘要： An optical isolator includes a first polarizer arranged such that a transmission axis thereof is set to cause a normalized transmittance with respect to incident light having a wavelength of ultraviolet and linear polarization to be 0.9 or more, a Faraday rotator using a Faraday material configured to rotate a polarization direction of light having transmitted through the first polarizer in a first rotation direction by a first rotation amount by a magnetic field and rotate the polarization direction in a second rotation direction opposite to the first rotation direction by a second rotation amount by optical activity or birefringence, and a second polarizer arranged such that a transmission axis thereof is set to cause a normalized transmittance with respect to the incident light having transmitted through the Faraday rotator to be 0.9 or more.
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7.发明公开公开(公告)号：US20230375846A1
公开(公告)日：2023-11-23
申请号：US18363279
申请日：2023-08-01
申请人： Gigaphoton Inc. , Inter-University Research Institute Corporation, National Institutes of Natural Sciences
发明人： Yuki TAMARU , Taisuke MIURA , Ryo YASUHARA
CPC分类号： G02B27/28 , H01S3/0401 , H01S3/2256 , H01S3/2251 , H01S3/23
摘要： An optical isolator according to an aspect of the present disclosure includes a first polarizer through which incident light transmits, a Faraday rotator configured to rotate the polarization direction of the light, and a second polarizer through which the light transmits. The Faraday rotator includes a calcium fluoride crystal. When a, b, and c axes are the [001], [100], and [010] crystallographic axes, respectively, and x, y, and z axes are obtained by rotating the three axes by a first angle of 40° to 50° about the c axis and by a second angle of 45° to 75° about the b axis rotated by the first angle, the z axis is parallel to the propagation direction of the light, and the calcium fluoride crystal is disposed such that the transmission axis of the first polarizer and the x axis have an angle difference of 0° to 45°.
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公开(公告)号：US11804697B2
公开(公告)日：2023-10-31
申请号：US17192205
申请日：2021-03-04
申请人： Gigaphoton Inc.
发明人： Taisuke Miura , Osamu Wakabayashi
CPC分类号： H01S5/4012 , H01S5/06821 , H01S5/06837 , H01S5/50
摘要： A laser system according to one aspect of the present disclosure includes a first solid-state laser device, a wavelength conversion system, an excimer amplifier, and a control unit. The first solid-state laser device includes a first multiple semiconductor laser system, a first semiconductor optical amplifier, and a first fiber amplifier. The first multiple semiconductor laser system includes a plurality of first semiconductor lasers configured to perform continuous wave oscillation in a single longitudinal mode with different wavelengths, a first spectrum monitor, and a first beam combiner. The control unit controls an oscillation wavelength and light intensity of each line of a first multiline spectrum generated by the first semiconductor lasers to obtain an excimer laser beam having at least a target center wavelength or a target spectral line width instructed by an external device.
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公开(公告)号：US11686951B2
公开(公告)日：2023-06-27
申请号：US17240050
申请日：2021-04-26
申请人： Cymer, LLC , ASML Netherlands B.V.
发明人： Wilhelmus Patrick Elisabeth Maria op 't Root , Thomas Patrick Duffey , Herman Philip Godfried , Frank Everts , Joshua Jon Thornes , Brian Edward King
IPC分类号： G02B27/48 , G01J3/26 , G01J9/02 , G01J3/02 , G03F7/00 , H01S3/225 , H01S3/00 , G01J11/00 , G02F1/01 , H01S4/00 , G02B19/00
CPC分类号： G02B27/48 , G01J3/027 , G01J3/26 , G01J9/02 , G01J11/00 , G02F1/0121 , G03F7/70008 , G03F7/70041 , G03F7/7055 , H01S3/0085 , H01S3/225 , H01S4/00 , G01J2009/0211 , G02B19/0095 , G02F2203/18 , G03F7/70025 , G03F7/70583 , H01S3/0057
摘要： A method includes: producing a light beam made up of pulses having a wavelength in the deep ultraviolet range, each pulse having a first temporal coherence defined by a first temporal coherence length and each pulse being defined by a pulse duration; for one or more pulses, modulating the optical phase over the pulse duration of the pulse to produce a modified pulse having a second temporal coherence defined by a second temporal coherence length that is less than the first temporal coherence length of the pulse; forming a light beam of pulses at least from the modified pulses; and directing the formed light beam of pulses toward a substrate within a lithography exposure apparatus.
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公开(公告)号：US20230098685A1
公开(公告)日：2023-03-30
申请号：US18061857
申请日：2022-12-05
申请人： Gigaphoton Inc.
发明人： Koichi FUJII , Osamu WAKABAYASHI
摘要： An exposure method includes reading data indicating a relation between parameters and a wavelength difference between a first pulse laser beam and a second pulse laser beam, the parameters being related to exposure conditions under which a semiconductor wafer is exposed to a plurality of pulse laser beams including the first and second pulse laser beams, determining a target value of the wavelength difference based on the data and command values of the parameters; determining a first wavelength of the first pulse laser beam and a second wavelength of the second pulse laser beam based on the target value; outputting a wavelength setting signal to a laser apparatus to cause emission of the pulse laser beams including the first pulse laser beam having the first wavelength and the second pulse laser beam having the second wavelength; and exposing the semiconductor wafer to the pulse laser beams.
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