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    METHOD OF CONTROLLING A RADIATION SOURCE AND LITHOGRAPHIC APPARATUS COMPRISING THE RADIATION SOURCE
    4.
    发明申请
    METHOD OF CONTROLLING A RADIATION SOURCE AND LITHOGRAPHIC APPARATUS COMPRISING THE RADIATION SOURCE 有权
    控制辐射源的方法和包含辐射源的光刻设备

    公开(公告)号：US20160070179A1

    公开(公告)日：2016-03-10

    申请号：US14787738

    申请日：2014-04-16

    申请人： ASML NETHERLANDS B.V.

    发明人： Wilhelmus Patrick Elisabeth Maria OP 'T ROOT ,  Adrianus Leonardus Gertrudus BOMMER ,  Robert DE JONG ,  Frank EVERTS ,  Herman Philip GODFRIED ,  Roland Pieter STOLK ,  Paul VAN DER VEEN

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70558 ,  G03F7/70025 ,  G03F7/70516 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/225

    摘要： A method of selecting a periodic modulation to be applied to a variable of a radiation source, wherein the source delivers radiation for projection onto a substrate and wherein there is relative motion between the substrate and the radiation at a scan speed, the method including: for a set of system parameters and for a position on the substrate, calculating a quantity, the quantity being a measure of the contribution to an energy dose delivered to the position that arises from the modulation being applied to the variable of the source, wherein the contribution to the energy dose is calculated as a convolution of: a profile of radiation, and a contribution to an irradiance of radiation delivered by the source; and selecting a modulation frequency at which the quantity for the set of system parameters and the position on the substrate satisfies a certain criteria.

    摘要翻译： 选择要施加到辐射源的变量的周期性调制的方法，其中所述源传送用于投影到衬底上的辐射，并且其中以扫描速度存在所述衬底和所述辐射之间的相对运动，所述方法包括： 一组系统参数和用于基板上的位置的计算量，所述数量是对从应用于源的变量的调制产生的递送到位置的能量剂量的贡献的度量的量，其中贡献 能量剂量被计算为卷积：辐射曲线和对源发射的辐射的辐照度的贡献; 并且选择用于所述一组系统参数的量和所述基板上的位置的所述调制频率满足一定的标准。

    LASER SYSTEM
    5.
    发明公开
    LASER SYSTEM 审中-公开

    公开(公告)号：US20240170905A1

    公开(公告)日：2024-05-23

    申请号：US18552634

    申请日：2022-03-07

    申请人： ASML Netherlands B.V.

    发明人： Herman Philip GODFRIED

    IPC分类号： H01S3/00 ,  G02B27/48 ,  G03F7/00 ,  H01S3/225

    CPC分类号： H01S3/0057 ,  G02B27/48 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/7015 ,  H01S3/225

    摘要： A laser system comprising: a laser operable to generate a laser beam; an optical system comprising a first optical element and a second optical element; and an output through which the laser beam exits the laser system; the laser, optical system and output arranged such that the laser beam travels to the first optical element, the second optical element and the output sequentially; wherein the first optical element has a first focal length, the second optical element has a second focal length equal to the first focal length, and the second optical element is spaced from the first optical element by a distance of two times the first focal length.

    RADIATION MEASUREMENT SYSTEM
    7.
    发明申请
    RADIATION MEASUREMENT SYSTEM 有权

    公开(公告)号：US20220146944A1

    公开(公告)日：2022-05-12

    申请号：US17433494

    申请日：2020-01-27

    申请人： ASML Netherlands B.V.

    发明人： Herman Philip GODFRIED ,  Wilhelmus Patrick Elisabeth M OP 'T ROOT

    IPC分类号： G03F7/20 ,  G01J3/45

    摘要： A radiation measurement system (200) comprising an optical apparatus (205) configured to receive a radiation beam (210) and change an intensity distribution of the radiation beam to output a conditioned radiation beam (215), and a spectrometer (220) operable to receive the conditioned radiation beam and determine spectral content of the conditioned radiation beam. The radiation measurement system may form part of a lithographic apparatus.

    Pulse Stretcher and Method
    8.
    发明申请
    Pulse Stretcher and Method 有权

    公开(公告)号：US20210344157A1

    公开(公告)日：2021-11-04

    申请号：US17268778

    申请日：2019-08-05

    申请人： ASML Netherlands B.V.

    发明人： Herman Philip GODFRIED ,  Wilhelmus Patrick Elisabeth Maria OP 'T ROOT

    IPC分类号： H01S3/00 ,  G02B27/14 ,  G02F1/01 ,  G03F7/20

    摘要： An apparatus (10) for increasing a pulse length of a pulsed radiation beam, the apparatus comprising: a beam splitter (16) configured to split an input radiation beam (18) into a first beam (24) and a second beam (22); an optical arrangement (12,14), wherein the beam splitter and the optical arrangement are configured such that at least a portion of the first beam is recombined with the second beam into a modified beam after an optical delay of the first beam caused by the optical arrangement; and at least one optical element (30) in an optical path of the first beam, the at least one optical element configured such that the phase of different parts of a wavefront of the first beam is varied to reduce coherence between the first beam and the second beam.

    ILLUMINATION SYSTEM
    9.
    发明申请
    ILLUMINATION SYSTEM 审中-公开

    公开(公告)号：US20170293229A1

    公开(公告)日：2017-10-12

    申请号：US15511570

    申请日：2015-08-26

    申请人： ASML NETHERLANDS B.V.

    发明人： Herman Philip GODFRIED ,  Hubertus Petrus Leonardus Henrica VAN BUSSEL ,  Wilhelmus Patrick Elisabeth Maria OP 'T ROOT

    IPC分类号： G03F7/20 ,  G02F1/1335

    CPC分类号： G03F7/70116 ,  G02B26/0833 ,  G02F1/133526 ,  G03F7/70133 ,  G03F7/70291 ,  G03F7/7085

    摘要： An illumination system for a lithographic apparatus includes an array of lenses configured to receive a radiation beam and focus the beam into a plurality of sub-beams, an array of reflective elements configured to receive the sub-beams and reflect the sub-beams so as to form an illumination beam, a beam splitting device configured to split the illumination beam into a first portion and a second portion wherein the first portion is directed to be incident on a lithographic patterning device, a focusing unit configured to focus the second portion of the illumination beam onto a detection plane such that an image is formed at the detection plane and wherein the image is an image of the sub-beams in which the sub-beams do not overlap with each other and an array of detector elements configured to measure the intensity of radiation which is incident on the detection plane.