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公开(公告)号：US10078269B2
公开(公告)日：2018-09-18
申请号：US15283669
申请日：2016-10-03
申请人： NIKON CORPORATION
CPC分类号： G03F7/70141 , G01J1/0414 , G01J1/0448 , G01J1/0477 , G01J1/08 , G01J1/4209 , G01N21/4788 , G01N21/4795 , G03F7/70775 , G03F9/7088
摘要： System and method for accurately measuring alignment of every exposure field on a pre-patterned wafer without reducing wafer-exposure throughput. Diffraction grating disposed in scribe-lines of such wafer, used as alignment marks, and array of encoder-heads (each of which is configured to define positional phase(s) of at least one such alignment mark) are used. Determination of trajectory of a wafer-stage scanning during the wafer-exposure in the exposure tool employs determining in-plane coordinates of such spatially-periodic alignment marks by simultaneously measuring position-dependent phases of signals produced by these marks as a result of recombination of light corresponding to different diffraction orders produced by these marks. Measurements may be performed simultaneously at all areas corresponding to at least most of the exposure fields of the wafer, and/or with use of a homodyne light source, and/or in a wavelength-independent fashion, and/or with a pre-registration process allowing for accommodation of wafers with differently-dimensioned exposure fields.
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公开(公告)号：US20170280545A1
公开(公告)日：2017-09-28
申请号：US15622139
申请日：2017-06-14
CPC分类号： H05G2/008 , G01J1/0448 , G01J1/4257 , G01J1/429 , G01J3/4412 , G03F7/70033 , G03F7/70575
摘要： An extreme ultraviolet light generating system may include: a chamber; a target feeding unit configured to feed a target into the chamber; a drive laser unit configured to irradiate the target with a drive pulsed laser light beam to generate a plasma to thereby generate extreme ultraviolet light; a probe laser unit configured to irradiate the plasma with a probe pulsed laser light beam to thereby generate Thomson scattered light; a spectrometer configured to measure a spectrum waveform of an ionic term in the Thomson scattered light; and a wavelength filter disposed upstream of the spectrometer, and configured to suppress light with a predetermined wavelength from entering the spectrometer. The light with the predetermined wavelength may be part of light containing the Thomson scattered light, and the predetermined wavelength may be substantially same as a wavelength of the probe pulsed laser light beam.
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公开(公告)号：US09759603B2
公开(公告)日：2017-09-12
申请号：US14843310
申请日：2015-09-02
申请人： Sekonic Corporation
CPC分类号： G01J3/0272 , G01J1/0233 , G01J1/0403 , G01J1/0411 , G01J1/0418 , G01J1/0422 , G01J1/0448 , G01J1/0474 , G01J3/0202 , G01J3/0205 , G01J3/0208 , G01J3/0213 , G01J3/0216 , G01J3/0237 , G01J3/46
摘要： This is to provide a photometric apparatus improved in measurement precision by improving the state of light incident to a sensor, which photometric apparatus 1 comprises a photometric sensor 30 into which light which is an object to be measured is incident, a signal processing means for processing a sensor output by the photometric sensor, and optical systems 50, 100, 92, 93 and 150 which introduces external light into the photometric sensor, wherein a columnar fiber rod 100 in which a center axis is provided along a direction perpendicular to a light receiving surface of the photometric sensor is provided at a part of the optical system.
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公开(公告)号：US20170097574A1
公开(公告)日：2017-04-06
申请号：US15283669
申请日：2016-10-03
申请人： NIKON CORPORATION
CPC分类号： G03F7/70141 , G01J1/0414 , G01J1/0448 , G01J1/0477 , G01J1/08 , G01J1/4209 , G01N21/4788 , G01N21/4795 , G03F7/70775 , G03F9/7088
摘要： System and method for accurately measuring alignment of every exposure field on a pre-patterned wafer without reducing wafer-exposure throughput. Diffraction grating disposed in scribe-lines of such wafer, used as alignment marks, and array of encoder-heads (each of which is configured to define positional phase(s) of at least one such alignment mark) are used. Determination of trajectory of a wafer-stage scanning during the wafer-exposure in the exposure tool employs determining in-plane coordinates of such spatially-periodic alignment marks by simultaneously measuring position-dependent phases of signals produced by these marks as a result of recombination of light corresponding to different diffraction orders produced by these marks. Measurements may be performed simultaneously at all areas corresponding to at least most of the exposure fields of the wafer, and/or with use of a homodyne light source, and/or in a wavelength-independent fashion, and/or with a pre-registration process allowing for accommodation of wafers with differently-dimensioned exposure fields.
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公开(公告)号：US09568356B2
公开(公告)日：2017-02-14
申请号：US14540357
申请日：2014-11-13
CPC分类号： G01J1/0271 , G01J1/02 , G01J1/0448 , G01J1/4204 , G01J1/44
摘要： A sensor adapted to be mounted to a surface has a rotatable enclosure that may be used, for example, to direct a lens of the sensor towards a window. The daylight sensor includes a photosensitive circuit for measuring a light intensity in the space, a cover portion, and a base portion adapted to be mounted to the surface. The cover portion is rotatable with respect to the base portion, for example, to direct the lens towards the window after the base portion is mounted to the surface. The base portion may also include a cylindrical wall having a channel adapted to capture a snap of the cover portion, such that the snap may move angularly through the channel to allow for rotation of the cover portion with respect to the base portion to a plurality of discrete positions.
摘要翻译： 适于安装到表面的传感器具有可旋转的外壳，其可以用于例如将传感器的透镜朝向窗口引导。 日光传感器包括用于测量空间中的光强度的光敏电路，盖部分和适于安装到表面的基部。 盖部分可相对于基部旋转，例如，在将基部安装到表面之后，将透镜朝向窗口引导。 基部还可以包括圆柱形壁，其具有适于捕获盖部分的卡扣的通道，使得卡扣可以成角度地移动通过通道，以允许盖部分相对于基部旋转到多个 离散位置。
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公开(公告)号：US09518864B2
公开(公告)日：2016-12-13
申请号：US14364727
申请日：2012-12-13
申请人： Oculus VR, LLC
发明人： Nadav Grossinger , Nitay Romano , Arnon Gratch
IPC分类号： G01N21/55 , G01J1/04 , G01S17/46 , G01B11/25 , G01S7/481 , G02B3/10 , G02B5/18 , G02B27/42 , G02B27/58 , G01S17/89
CPC分类号： G01J1/0411 , G01B11/25 , G01J1/044 , G01J1/0448 , G01N21/55 , G01S7/4814 , G01S17/46 , G01S17/89 , G02B3/10 , G02B5/1876 , G02B27/4205 , G02B27/58
摘要： An optical sensing device for using light to locate objects or features in a field of view comprises a light source; a controllable lens having two states and being controllable between them, for example a multifocal lens having two or more foci for focusing light from the light source; and a sensor able to sense light reflected from an object, to determine information of the object. The use of two or more foci adds dynamic range to optical sensing to allow for reliable detection over a wide range of distances.
摘要翻译： 一种用于使用光在视场中定位物体或特征的光学感测装置包括光源; 具有两个状态并且在它们之间可控的可控透镜，例如具有用于聚焦来自光源的光的两个或多个焦点的多焦点透镜; 以及能够感测从物体反射的光的传感器，以确定物体的信息。 使用两个或更多个焦点将动态范围增加到光学感测，以允许在宽范围的距离上的可靠检测。
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公开(公告)号：US20160334285A1
公开(公告)日：2016-11-17
申请号：US15113839
申请日：2014-01-24
发明人： Oguz CELIKEL , Ferhat SAMETOGLU
CPC分类号： G01K17/003 , G01J1/0407 , G01J1/0418 , G01J1/0425 , G01J1/0448 , G01J1/1626 , G01J1/22 , G01J1/4257 , G01J2001/0481 , G01J2001/4238 , G01J2001/444
摘要： The averaged pulse energy (J) of a Pulsed Type Laser Source can be measured by several types of commercial laser energy meters, such as pyroelectric detector or thermopile sensor, the spectral responsivity and the time/frequency related response properties of which are compatible with those of the Pulsed Type Laser Source. These Commercial Laser Energy Meters, regardless of sensor/detector type, should be calibrated against the working standards calibrated in a national (or an international) traceability chain relying on primary standards on the highest level having the lowest uncertainty in realizations of the fundamental SI units. FCIS based-LEMCS designed in this invention accomplishes both of the above proficiencies of measuring the averaged pulse energy of the Pulsed Type Laser Source and calibrating the Commercial Laser Energy Meters, which are traceably to primary level standards. FCIS based-LEMCS contains an integrating sphere having a novel port and an interior design and a series of mechanical choppers having separate Duty Cycles, each of which is rotated by an electrical motor in FCIS based-LEMCS, used for generating a chopped type laser, called as Chopped Type Laser Source, in order to provide the reference and averaged pulse energy for traceable calibration of Commercial Laser Energy Meters. With this invention, in addition to generating the reference and averaged pulse energy to be used during the calibration of Commercial Laser Energy Meters to be performed by means of FCIS based-LEMCS, the peak pulse energies of the Pulsed Type Laser Source and the Chopped Type Laser Source, which is a strict part of FCIS based-LEMS and which is used for producing the reference averaged pulse energy in the calibration of Commercial Laser Energy Meters, are also measured by FCIS based-LEMCS, traceable to Electrical Substitution Cryogenic Radiometer (ESCR) in primary optical watt scale (W), to 133Cs (or 87Rb) Atomic Frequency Standard in time scale t (s), and to direct current unit (A) realized with Quantum Hall—primary resistance standard (ohm) and DC Josephson primary voltage standard (V). With this configuration presented as a preferred embodiment, the averaged pulse energy measurements are performed and achieved for a range extending from 16.5 p J to 100 mJ.
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公开(公告)号：US20160097887A1
公开(公告)日：2016-04-07
申请号：US14787141
申请日：2014-02-13
发明人： Seung Min JIN , Il Seung YANG , Yung Doug SUH , Sang Hwan NAM , Yu Jin JUNG , Hae Mi LEE , Yun Mi BAE , So Jeong PARK , Yu Sic KIM
IPC分类号： G02B5/20
CPC分类号： G02B5/20 , G01J1/0414 , G01J1/0448 , G01J3/12 , G01J2003/1243 , G01J2003/1247
摘要： Provided is a monochromatization device for easily selecting light having a specific wavelength, comprising: a first broadband filter arranged to have a first rotational angle with respect to an incident direction of light to enable a first wavelength band to pass therethrough with respect to the incident light; a second broadband filter arranged to have a second rotational angle with respect to an incident direction of light to enable a second wavelength band to pass therethrough with respect to the light passing through the first broadband filter; and a path compensation unit for adjusting a light path so that the light path passing through the second broadband filter is the same as a path of the light incident to the first broadband filter. Accordingly, the output light efficiency for the incident light is increased and the required specific wavelength can be more easily selected.
摘要翻译： 提供一种用于容易地选择具有特定波长的光的单色化装置，包括：第一宽带滤光器，被布置成相对于光的入射方向具有第一旋转角度，以使得第一波长带相对于入射光能够通过 ; 第二宽带滤波器，被布置成相对于光的入射方向具有第二旋转角度，以使第二波长带相对于穿过所述第一宽带滤光器的光线通过; 以及路径补偿单元，用于调整光路，使得穿过第二宽带滤波器的光路与入射到第一宽带滤波器的光的路径相同。 因此，入射光的输出光效率增加，并且可以更容易地选择所需的特定波长。
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9.发明授权Apparatus configured to generate terahertz wave and apparatus configured to detect terahertz wave 有权被配置为产生太赫兹波的装置和被配置为检测太赫兹波的装置公开(公告)号：US09261401B2
公开(公告)日：2016-02-16
申请号：US14300069
申请日：2014-06-09
发明人： Takeaki Itsuji
IPC分类号： G01J1/00 , G01J1/04 , G01J3/42 , G01J3/02 , G01N21/3581 , G01N21/3586
CPC分类号： G01J1/0448 , G01J3/0208 , G01J3/42 , G01N21/3581 , G01N21/3586
摘要： An apparatus including: an element configured to generate or detect a terahertz wave; a semi-spherical lens configured to guide the terahertz wave outgoing from the element or entering the element; and a holder configured to hold the semi-spherical lens and the element in a state in which a flat surface of the semi-spherical lens and the element are in contact with each other or in a state in which the flat surface of the semi-spherical lens and the element clamp a substance which allows the terahertz wave to pass therethrough and the flat surface of the semi-spherical lens and the element are in contact with the substance, wherein the holder includes: a resiliently deformable portion; and a position adjusting unit configured to adjust a relative position between the semi-spherical lens and the element in a direction parallel to the flat surface of the semi-spherical lens by resiliently deforming the resiliently deformable portion.
摘要翻译： 一种装置，包括：被配置为产生或检测太赫兹波的元件; 半球形透镜，被配置为引导从元件出射或进入元件的太赫兹波; 以及保持器，其被配置为将所述半球形透镜和所述元件保持在所述半球形透镜和所述元件的平坦表面彼此接触的状态下或者在所述半球形透镜和所述元件的平坦表面的状态下， 球形透镜和元件夹紧允许太赫兹波通过的物质，半球形透镜和元件的平坦表面与物质接触，其中保持器包括：可弹性变形的部分; 以及位置调整单元，其被配置为通过使所述弹性变形部弹性变形来调节所述半球形透镜和所述元件之间的平行于所述半球形透镜的平坦表面的方向上的相对位置。
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公开(公告)号：US08796610B2
公开(公告)日：2014-08-05
申请号：US13873464
申请日：2013-04-30
申请人： Hubbell Incorporated
CPC分类号： H05B37/0209 , G01J1/04 , G01J1/0403 , G01J1/0448 , G01J1/4204 , G01J5/0022 , G01J5/0025 , G01J5/08 , G01J5/084 , G01J5/0896 , H05B33/0854 , H05B37/0218 , H05B37/0227 , Y02B20/46
摘要： An occupancy sensor with a separable override unit can selectively override the operation of the occupancy sensor at designated times and for selected time intervals. The occupancy sensor includes a light sensor to actuate the occupancy sensor and a light assembly when the ambient light is below a predetermined level and to deactivate the occupancy sensor when the ambient light is above a threshold level. The override unit is provided with a light source, such as an LED, to emit light to actuate the light sensor of the occupancy sensor, thereby controlling the occupancy sensor, such as by preventing the occupancy sensor from being actuated. The occupancy sensor includes a cavity for receiving the override unit with the LED aligned with the light sensor: A control unit is operatively connected to one or more override units for selectively controlling the normal operation of the occupancy sensor.
摘要翻译： 具有可分离超控单元的占用传感器可以在指定的时间和选定的时间间隔选择性地覆盖占用传感器的操作。 所述占用传感器包括光传感器，用于当环境光低于预定水平时致动占用传感器和灯组件，并且当环境光高于阈值水平时停用占用传感器。 超控单元设置有诸如LED的光源，以发射光来致动占用传感器的光传感器，从而例如通过防止占用传感器被致动来控制占用传感器。 占用传感器包括用于接收超声单元的空腔，其中LED与光传感器对准。控制单元可操作地连接到一个或多个超控单元，以选择性地控制占用传感器的正常操作。
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