摘要:
System and method for accurately measuring alignment of every exposure field on a pre-patterned wafer without reducing wafer-exposure throughput. Diffraction grating disposed in scribe-lines of such wafer, used as alignment marks, and array of encoder-heads (each of which is configured to define positional phase(s) of at least one such alignment mark) are used. Determination of trajectory of a wafer-stage scanning during the wafer-exposure in the exposure tool employs determining in-plane coordinates of such spatially-periodic alignment marks by simultaneously measuring position-dependent phases of signals produced by these marks as a result of recombination of light corresponding to different diffraction orders produced by these marks. Measurements may be performed simultaneously at all areas corresponding to at least most of the exposure fields of the wafer, and/or with use of a homodyne light source, and/or in a wavelength-independent fashion, and/or with a pre-registration process allowing for accommodation of wafers with differently-dimensioned exposure fields.
摘要:
An extreme ultraviolet light generating system may include: a chamber; a target feeding unit configured to feed a target into the chamber; a drive laser unit configured to irradiate the target with a drive pulsed laser light beam to generate a plasma to thereby generate extreme ultraviolet light; a probe laser unit configured to irradiate the plasma with a probe pulsed laser light beam to thereby generate Thomson scattered light; a spectrometer configured to measure a spectrum waveform of an ionic term in the Thomson scattered light; and a wavelength filter disposed upstream of the spectrometer, and configured to suppress light with a predetermined wavelength from entering the spectrometer. The light with the predetermined wavelength may be part of light containing the Thomson scattered light, and the predetermined wavelength may be substantially same as a wavelength of the probe pulsed laser light beam.
摘要:
This is to provide a photometric apparatus improved in measurement precision by improving the state of light incident to a sensor, which photometric apparatus 1 comprises a photometric sensor 30 into which light which is an object to be measured is incident, a signal processing means for processing a sensor output by the photometric sensor, and optical systems 50, 100, 92, 93 and 150 which introduces external light into the photometric sensor, wherein a columnar fiber rod 100 in which a center axis is provided along a direction perpendicular to a light receiving surface of the photometric sensor is provided at a part of the optical system.
摘要:
System and method for accurately measuring alignment of every exposure field on a pre-patterned wafer without reducing wafer-exposure throughput. Diffraction grating disposed in scribe-lines of such wafer, used as alignment marks, and array of encoder-heads (each of which is configured to define positional phase(s) of at least one such alignment mark) are used. Determination of trajectory of a wafer-stage scanning during the wafer-exposure in the exposure tool employs determining in-plane coordinates of such spatially-periodic alignment marks by simultaneously measuring position-dependent phases of signals produced by these marks as a result of recombination of light corresponding to different diffraction orders produced by these marks. Measurements may be performed simultaneously at all areas corresponding to at least most of the exposure fields of the wafer, and/or with use of a homodyne light source, and/or in a wavelength-independent fashion, and/or with a pre-registration process allowing for accommodation of wafers with differently-dimensioned exposure fields.
摘要:
A sensor adapted to be mounted to a surface has a rotatable enclosure that may be used, for example, to direct a lens of the sensor towards a window. The daylight sensor includes a photosensitive circuit for measuring a light intensity in the space, a cover portion, and a base portion adapted to be mounted to the surface. The cover portion is rotatable with respect to the base portion, for example, to direct the lens towards the window after the base portion is mounted to the surface. The base portion may also include a cylindrical wall having a channel adapted to capture a snap of the cover portion, such that the snap may move angularly through the channel to allow for rotation of the cover portion with respect to the base portion to a plurality of discrete positions.
摘要:
An optical sensing device for using light to locate objects or features in a field of view comprises a light source; a controllable lens having two states and being controllable between them, for example a multifocal lens having two or more foci for focusing light from the light source; and a sensor able to sense light reflected from an object, to determine information of the object. The use of two or more foci adds dynamic range to optical sensing to allow for reliable detection over a wide range of distances.
摘要:
The averaged pulse energy (J) of a Pulsed Type Laser Source can be measured by several types of commercial laser energy meters, such as pyroelectric detector or thermopile sensor, the spectral responsivity and the time/frequency related response properties of which are compatible with those of the Pulsed Type Laser Source. These Commercial Laser Energy Meters, regardless of sensor/detector type, should be calibrated against the working standards calibrated in a national (or an international) traceability chain relying on primary standards on the highest level having the lowest uncertainty in realizations of the fundamental SI units. FCIS based-LEMCS designed in this invention accomplishes both of the above proficiencies of measuring the averaged pulse energy of the Pulsed Type Laser Source and calibrating the Commercial Laser Energy Meters, which are traceably to primary level standards. FCIS based-LEMCS contains an integrating sphere having a novel port and an interior design and a series of mechanical choppers having separate Duty Cycles, each of which is rotated by an electrical motor in FCIS based-LEMCS, used for generating a chopped type laser, called as Chopped Type Laser Source, in order to provide the reference and averaged pulse energy for traceable calibration of Commercial Laser Energy Meters. With this invention, in addition to generating the reference and averaged pulse energy to be used during the calibration of Commercial Laser Energy Meters to be performed by means of FCIS based-LEMCS, the peak pulse energies of the Pulsed Type Laser Source and the Chopped Type Laser Source, which is a strict part of FCIS based-LEMS and which is used for producing the reference averaged pulse energy in the calibration of Commercial Laser Energy Meters, are also measured by FCIS based-LEMCS, traceable to Electrical Substitution Cryogenic Radiometer (ESCR) in primary optical watt scale (W), to 133Cs (or 87Rb) Atomic Frequency Standard in time scale t (s), and to direct current unit (A) realized with Quantum Hall—primary resistance standard (ohm) and DC Josephson primary voltage standard (V). With this configuration presented as a preferred embodiment, the averaged pulse energy measurements are performed and achieved for a range extending from 16.5 p J to 100 mJ.
摘要:
Provided is a monochromatization device for easily selecting light having a specific wavelength, comprising: a first broadband filter arranged to have a first rotational angle with respect to an incident direction of light to enable a first wavelength band to pass therethrough with respect to the incident light; a second broadband filter arranged to have a second rotational angle with respect to an incident direction of light to enable a second wavelength band to pass therethrough with respect to the light passing through the first broadband filter; and a path compensation unit for adjusting a light path so that the light path passing through the second broadband filter is the same as a path of the light incident to the first broadband filter. Accordingly, the output light efficiency for the incident light is increased and the required specific wavelength can be more easily selected.
摘要:
An apparatus including: an element configured to generate or detect a terahertz wave; a semi-spherical lens configured to guide the terahertz wave outgoing from the element or entering the element; and a holder configured to hold the semi-spherical lens and the element in a state in which a flat surface of the semi-spherical lens and the element are in contact with each other or in a state in which the flat surface of the semi-spherical lens and the element clamp a substance which allows the terahertz wave to pass therethrough and the flat surface of the semi-spherical lens and the element are in contact with the substance, wherein the holder includes: a resiliently deformable portion; and a position adjusting unit configured to adjust a relative position between the semi-spherical lens and the element in a direction parallel to the flat surface of the semi-spherical lens by resiliently deforming the resiliently deformable portion.
摘要:
An occupancy sensor with a separable override unit can selectively override the operation of the occupancy sensor at designated times and for selected time intervals. The occupancy sensor includes a light sensor to actuate the occupancy sensor and a light assembly when the ambient light is below a predetermined level and to deactivate the occupancy sensor when the ambient light is above a threshold level. The override unit is provided with a light source, such as an LED, to emit light to actuate the light sensor of the occupancy sensor, thereby controlling the occupancy sensor, such as by preventing the occupancy sensor from being actuated. The occupancy sensor includes a cavity for receiving the override unit with the LED aligned with the light sensor: A control unit is operatively connected to one or more override units for selectively controlling the normal operation of the occupancy sensor.