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公开(公告)号：US11226536B2
公开(公告)日：2022-01-18
申请号：US16987972
申请日：2020-08-07
发明人： Chen Qu , Yohei Kobayashi , Zhigang Zhao , Hironori Igarashi
摘要： A wavelength conversion system including: A. a first nonlinear optical crystal to which first pulsed laser light having a first polarization state and a first wavelength and second pulsed laser light having a second polarization state and a second wavelength are inputted and which is configured to output in response to the input the second pulsed laser light and first sum frequency light having the second polarization state and a third wavelength produced by sum frequency mixing of the first wavelength with the second wavelength; and B. a second nonlinear optical crystal to which the first sum frequency light and the second pulsed laser light outputted from the first nonlinear optical crystal are inputted and which is configured to output in response to the input third pulsed laser light having a fourth wavelength.
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公开(公告)号：US11022892B2
公开(公告)日：2021-06-01
申请号：US16669317
申请日：2019-10-30
发明人： Patrick Warnaar , Simon Philip Spencer Hastings , Alberto Da Costa Assafrao , Lukasz Jerzy Macht
摘要： An inspection apparatus (140) measures asymmetry or other property of target structures (T) formed by a lithographic process on a substrate. For a given set of illumination conditions, accuracy of said measurement is influenced strongly by process variations across the substrate and/or between substrates. The apparatus is arranged to collect radiation scattered by a plurality of structures under two or more variants of said illumination conditions (p1−, p1, p1+; λ1−, λ1, λ1+). A processing system (PU) is arranged to derive the measurement of said property using radiation collected under a different selection or combination of said variants for different ones of said structures. The variants may be for example in wavelength, or in angular distribution, or in any characteristic of the illumination conditions. Selection and/or combination of variants is made with reference to a signal quality (302, Q, A) observed in the different variants.
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公开(公告)号：US10802405B2
公开(公告)日：2020-10-13
申请号：US16124357
申请日：2018-09-07
发明人： Chieh Hsieh , Shang-Chieh Chien , Li-Jui Chen , Po-Chung Cheng
摘要： A method for generating EUV radiation is provided. The method includes generating a target droplet with a target droplet generator. The method further includes recording an image of the target droplet on a first image plane to detect a first position of the target droplet. The method also includes recording an image of the target droplet on a second image plane to detect a second position of the target droplet. In addition, the method includes projecting a laser pulse onto the target droplet when the target droplet is located on a focus plane. The method further includes adjusting at least one parameter of the target droplet generator according to the first position and the second position.
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公开(公告)号：US10795267B2
公开(公告)日：2020-10-06
申请号：US16462569
申请日：2017-11-17
发明人： Steven George Hansen
摘要： A method including: obtaining a resist process dose sensitivity value for a patterning process; applying the resist process dose sensitivity value to a stochastic model providing values of a stochastic variable as a function of resist process dose sensitivity to obtain a value of the stochastic variable; and designing or modifying a parameter of the patterning process based on the stochastic variable value.
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公开(公告)号：US10747119B2
公开(公告)日：2020-08-18
申请号：US16568044
申请日：2019-09-11
发明人： Yu-Chih Huang , Chi Yang , Che-Chang Hsu , Li-Jui Chen , Po-Chung Cheng
摘要： A method of controlling a feedback system with a data matching module of an extreme ultraviolet (EUV) radiation source is disclosed. The method includes obtaining a slit integrated energy (SLIE) sensor data and diffractive optical elements (DOE) data. The method performs a data match, by the data matching module, of a time difference of the SLIE sensor data and the DOE data to identify a mismatched set of the SLIE sensor data and the DOE data. The method also determines whether the time difference of the SLIE sensor data and the DOE data of the mismatched set is within an acceptable range. Based on the determination, the method automatically validates a configurable data of the mismatched set such that the SLIE sensor data of the mismatched set is valid for a reflectivity calculation.
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公开(公告)号：US10728413B2
公开(公告)日：2020-07-28
申请号：US16421200
申请日：2019-05-23
发明人： Yasuhiro Suto , Mitsuharu Yoshimoto , Tomohiko Okada , Hisashi Yamanaka , Shohichi Fukutome , Kenji Nakanishi
摘要： An illuminating device capable of stably illuminating an irradiated object such as a document while suppressing light loss with a simply structure is provided. An LED array and a reflective plate are disposed sandwiching a slit (St) through which light reflected by a document MS passes and a light-guiding member is disposed on the side of the LED array. The light-guiding member includes a direct emission unit disposed between an illumination range y centered on a document reading position and the LED array and an indirect emission unit disposed between the reflective plate and the LED array, a light incidence face of the direct emission unit and a light incidence face of the indirect emission unit are disposed at mutually different position around the LED array, and the LED array is disposed on a side of an interior angle formed by the light incidence faces.
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公开(公告)号：US10674030B2
公开(公告)日：2020-06-02
申请号：US16475445
申请日：2018-02-21
发明人： Taku Matsuzawa , Toru Shiraki , Hideki Kunishio , Daisuke Ohama
摘要： An illumination device includes a light source and a rod-like light guide extending in a longitudinal direction for guiding incident light to an object to be illuminated. The light source is disposed at an end of the light guide extending in a longitudinal direction. The light guide includes an incident surface at the longitudinal end to receive light emitted from the light source, a flat emission surface to emit light incident on the light guide toward the object to be illuminated, a parabolic reflective surface to reflect, toward the emission surface, light from a focus of the paraboloid shape of the refractive surface or light passing through the focus from a predetermined area, and a light-scattering portion, having a predetermined area, to scatter light entering through the incident surface and reflect the light toward the reflective surface. The light-scattering portion is placed at the focus of the paraboloid shape or at a position where light reflected by the scattering area on the light-scattering portion passes through the focus.
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公开(公告)号：US10598921B2
公开(公告)日：2020-03-24
申请号：US15837932
申请日：2017-12-11
申请人： Carl Zeiss SMT GmbH
摘要： A mirror element, in particular for a microlithographic projection exposure apparatus. According to one aspect, the mirror element includes a substrate (111, 112, 113, 114, 115, 211, 212, 213, 311a-311m, 411, 412, 413) and a layer stack (121, 122, 123, 124, 125, 221, 222, 223, 321a-321m, 421, 422, 423) on the substrate. The layer stack has at least one reflection layer system, wherein a curvature of the mirror element is generated on the basis of a setpoint curvature for a predetermined operating temperature by a non-vanishing bending force exerted by the layer stack, wherein the generated curvature varies by no more than 10% over a temperature interval (ΔT) of at least 10 K.
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公开(公告)号：US10578979B2
公开(公告)日：2020-03-03
申请号：US16279001
申请日：2019-02-19
摘要： A method involving a radiation intensity distribution for a target measured using an optical component at a gap from the target, the method including: determining a value of a parameter of interest using the measured radiation intensity distribution and a mathematical model describing the target, the model including an effective medium approximation for roughness of a surface of the optical component or a part thereof.
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公开(公告)号：US10520827B2
公开(公告)日：2019-12-31
申请号：US16241462
申请日：2019-01-07
申请人： Carl Zeiss SMT GmbH
摘要： An optical system, in particular for a microlithographic projection exposure apparatus, with at least one mirror (200) which has an optically effective surface and, for electromagnetic radiation of a predefined operating wavelength impinging on the optically effective surface at an angle of incidence of at least 65° relative to the respective surface normal, has a reflectivity of at least 0.5. The mirror has a reflection layer (210) and a compensation layer (220) which is arranged above this reflection layer (210) in the direction of the optically effective surface. The compensation layer (220), for an intensity distribution generated in a pupil plane or a field plane of the optical system during operation thereof, reduces the difference between the maximum and the minimum intensity value by at least 20% compared to an analogous structure without the compensation layer.
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