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公开(公告)号：US20180203362A1
公开(公告)日：2018-07-19
申请号：US15743273
申请日：2016-06-03
Applicant: ASML NETHERLANDS B.V.
Inventor： Wilhelmus Patrick Elisabeth Maria OP 'T ROOT , Herman Philip GODFRIED , Hubertus Petrus Leonardus Henrica VAN BUSSEL , Arij Jonathan RIJKE , Marc Wilhelmus Maria VAN DER WIJST , Mathijs Leonardus Johan VERHEES
IPC: G03F7/20
CPC classification number: G03F7/70041 , G03F7/70133 , G03F7/70358 , G03F7/70558 , G03F7/709
Abstract: A technique involving projecting a pulsed radiation beam using an illumination system onto a region of a plane in a reference frame; using a scanning mechanism to move a calibration sensor relative to the reference frame such that the calibration sensor moves through the beam of radiation in the plane along a scan trajectory; determining a quantity indicative of a velocity of the illumination system relative to the reference frame; and determining information related to a spatial intensity distribution of the radiation beam in the plane in dependence on: (a) an output of the calibration sensor; (b) the scan trajectory of the calibration sensor; and (c) the quantity indicative of a velocity of the illumination system relative to the reference frame.
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2.发明申请公开(公告)号：US20160070179A1
公开(公告)日：2016-03-10
申请号：US14787738
申请日：2014-04-16
Applicant: ASML NETHERLANDS B.V.
Inventor： Wilhelmus Patrick Elisabeth Maria OP 'T ROOT , Adrianus Leonardus Gertrudus BOMMER , Robert DE JONG , Frank EVERTS , Herman Philip GODFRIED , Roland Pieter STOLK , Paul VAN DER VEEN
IPC: G03F7/20
CPC classification number: G03F7/70558 , G03F7/70025 , G03F7/70516 , H01S3/0975 , H01S3/104 , H01S3/225
Abstract: A method of selecting a periodic modulation to be applied to a variable of a radiation source, wherein the source delivers radiation for projection onto a substrate and wherein there is relative motion between the substrate and the radiation at a scan speed, the method including: for a set of system parameters and for a position on the substrate, calculating a quantity, the quantity being a measure of the contribution to an energy dose delivered to the position that arises from the modulation being applied to the variable of the source, wherein the contribution to the energy dose is calculated as a convolution of: a profile of radiation, and a contribution to an irradiance of radiation delivered by the source; and selecting a modulation frequency at which the quantity for the set of system parameters and the position on the substrate satisfies a certain criteria.
Abstract translation: 选择要施加到辐射源的变量的周期性调制的方法，其中所述源传送用于投影到衬底上的辐射，并且其中以扫描速度存在所述衬底和所述辐射之间的相对运动，所述方法包括： 一组系统参数和用于基板上的位置的计算量，所述数量是对从应用于源的变量的调制产生的递送到位置的能量剂量的贡献的度量的量，其中贡献 能量剂量被计算为卷积：辐射曲线和对源发射的辐射的辐照度的贡献; 并且选择用于所述一组系统参数的量和所述基板上的位置的所述调制频率满足一定的标准。
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公开(公告)号：US20170307977A1
公开(公告)日：2017-10-26
申请号：US15507237
申请日：2015-08-21
Applicant: ASML NETHERLANDS B.V.
Inventor： Herman Philip GODFRIED , Hubertus Petrus Leonardus Henrica VAN BUSSEL , Arij Jonathan RIJKE , Wilhelmus Patrick Elisabeth Maria OP 'T ROOT
IPC: G03F7/20
CPC classification number: G03F7/70558 , G03F7/20 , G03F7/70008 , G03F7/70058 , G03F7/70358 , G03F7/709
Abstract: A lithographic apparatus including: a radiation system; a frame; a substrate table for holding a substrate; and a scanning mechanism. The radiation system is operable to produce a radiation beam. The substrate table is moveably mounted to the frame and arranged such that a target portion of the substrate is arranged to receive the radiation beam. The scanning mechanism is operable to move the substrate table relative to the frame so that different portions of the substrate may receive the radiation beam. A mechanism is operable to determine a quantity indicative of a velocity of the radiation system relative to the frame. An adjustment mechanism is operable to control a power or irradiance of the radiation beam so as to reduce a variation in a dose of radiation received by the substrate as a result of relative motion of the radiation system and the frame.
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公开(公告)号：US20210344157A1
公开(公告)日：2021-11-04
申请号：US17268778
申请日：2019-08-05
Applicant: ASML Netherlands B.V.
Abstract: An apparatus (10) for increasing a pulse length of a pulsed radiation beam, the apparatus comprising: a beam splitter (16) configured to split an input radiation beam (18) into a first beam (24) and a second beam (22); an optical arrangement (12,14), wherein the beam splitter and the optical arrangement are configured such that at least a portion of the first beam is recombined with the second beam into a modified beam after an optical delay of the first beam caused by the optical arrangement; and at least one optical element (30) in an optical path of the first beam, the at least one optical element configured such that the phase of different parts of a wavefront of the first beam is varied to reduce coherence between the first beam and the second beam.
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Patent Agency Ranking
公开(公告)号：US20170293229A1
公开(公告)日：2017-10-12
申请号：US15511570
申请日：2015-08-26
Applicant: ASML NETHERLANDS B.V.
Inventor： Herman Philip GODFRIED , Hubertus Petrus Leonardus Henrica VAN BUSSEL , Wilhelmus Patrick Elisabeth Maria OP 'T ROOT
IPC: G03F7/20 , G02F1/1335
CPC classification number: G03F7/70116 , G02B26/0833 , G02F1/133526 , G03F7/70133 , G03F7/70291 , G03F7/7085
Abstract: An illumination system for a lithographic apparatus includes an array of lenses configured to receive a radiation beam and focus the beam into a plurality of sub-beams, an array of reflective elements configured to receive the sub-beams and reflect the sub-beams so as to form an illumination beam, a beam splitting device configured to split the illumination beam into a first portion and a second portion wherein the first portion is directed to be incident on a lithographic patterning device, a focusing unit configured to focus the second portion of the illumination beam onto a detection plane such that an image is formed at the detection plane and wherein the image is an image of the sub-beams in which the sub-beams do not overlap with each other and an array of detector elements configured to measure the intensity of radiation which is incident on the detection plane.
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公开(公告)号：US20160301180A1
公开(公告)日：2016-10-13
申请号：US15035674
申请日：2014-11-27
Applicant: ASML NETHERLANDS B.V.
Inventor： Andrey Alexandrovich NIKIPELOV , Vadim Yevgenyevich BANINE , Pieter Willem Herman DE JAGER , Gosse Charles DE VRIES , Olav Waldemar Vladimir FRIJNS , Leonardus Adrianus Gerardus GRIMMINCK , Andelko KATALENIC , Johannes Antonius Gerardus AKKERMANS , Erik LOOPSTRA , Wouter Joep ENGELEN , Petrus Rutgerus BARTRAIJ , Teis Johan COENEN , Wilhelmus Patrick Elisabeth Maria OP 'T ROOT
CPC classification number: H01S3/0903 , H01J1/34 , H05H7/08 , H05H2007/084
Abstract: An injector arrangement for providing an electron beam. The injector arrangement comprises a first injector for providing electron bunches, and a second injector for providing electrons bunches. The injector arrangement is operable in a first mode in which the electron beam comprises electron bunches provided by the first injector only and a second mode in which the electron beam comprises electron bunches provided by the second injector only.
Abstract translation: 一种用于提供电子束的喷射装置。 喷射器装置包括用于提供电子束的第一喷射器和用于提供电子束的第二喷射器。 喷射器装置可以在第一模式中操作，其中电子束包括仅由第一注射器提供的电子束和第二模式，其中电子束包括仅由第二注射器提供的电子束。
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7.发明申请公开(公告)号：US20250060661A1
公开(公告)日：2025-02-20
申请号：US18720941
申请日：2022-11-28
Applicant: ASML Netherlands B.V.
Inventor： Hugo Augustinus Joseph CRAMER , Karel Hendrik Wouter VAN DEN BOS , Miguel GARCIA GRANDA , Maurits VAN DER SCHAAR , Wilhelmus Patrick Elisabeth Maria OP 'T ROOT
Abstract: Disclosed is a method of measuring a focus parameter from a focus target. and associated substrate and associated patterning device. The focus target comprises at least a first sub-target and a second sub-target, each having at least a periodic main feature, wherein a respective pitch and/or dimensional parameter of at least some sub-elements of the main feature are configured such that said first sub-target and second sub-target have a respective different best focus value; and wherein each said main feature is formed with a focus dependent center-of-mass and/or pitch. The method comprises obtaining a first measurement signal from said first sub-target and a second measurement signal from said second sub-target; determining a difference signal of said first measurement signal and second measurement signal; and determining said focus parameter from said difference signal.
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公开(公告)号：US20240410827A1
公开(公告)日：2024-12-12
申请号：US18704156
申请日：2022-10-10
Applicant: ASML Netherlands B.V.
Inventor： Diederik Jan MAAS , Wilhelmus Patrick Elisabeth Maria OP 'T ROOT , Marinus JOCHEMSEN , Hugo Augustinus Joseph CRAMER
Abstract: Disclosed is metrology apparatus for measurement of a diffractive structure on a substrate. comprising: a radiation source operable to provide first radiation for excitation of the diffractive structure, said first radiation having a first wavelength; a detection arrangement operable to detect at least diffracted second radiation comprising a second harmonic of said first radiation, said diffracted second radiation being generated from said diffractive structure and/or substrate and diffracted by said diffractive structure; and a processing arrangement operable to determine a parameter of interest relating to said diffractive structure from at least said diffracted second radiation.
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公开(公告)号：US20180253014A1
公开(公告)日：2018-09-06
申请号：US15759358
申请日：2016-08-23
Applicant: ASML Netherlands B.V. , Cymer, LLC
Inventor： Frank EVERTS , Wilhelmus Patrick Elisabeth Maria OP 'T ROOT , Herman Philip GODFRIED , Joshua Jon THORNES , Kevin Michael O"BRIEN , Leon Pieter Paul SAANEN , Tanuj AGGARWAL
IPC: G03F7/20
CPC classification number: G03F7/70558 , G03F7/70008 , G03F7/70066 , G03F7/70525 , G03F7/70716
Abstract: A method of controlling output of a radiation source, the method including: periodically monitoring an output energy of the radiation source; determining a difference between a reference energy signal and the monitored output energy; determining a feedback value; determining a desired output energy of the radiation source for a subsequent time period; and controlling an input parameter of the radiation source in dependence on the determined desired output energy during the subsequent time period. If the magnitude of the determined difference between the monitored output energy of the radiation source and the reference energy signal exceeds a threshold value: the determined difference does not contribute to the feedback value; and the determined difference is spread over the subsequent time period according to a reference energy signal adjustment profile and the reference energy signal adjustment profile is added to the reference energy signal for the subsequent time period.
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