公开(公告)号：US20230314959A1

公开(公告)日：2023-10-05

申请号：US18186396

申请日：2023-03-20

Applicant: Carl Zeiss SMT GmbH

Inventor： Conrad Wolke ,  Barbara Moser

IPC: G03F7/00

CPC classification number: G03F7/70583 ,  G03F7/70025 ,  G03F7/70041

Abstract: An optical system, in particular for microlithography, comprises a laser light source for generating a multiplicity of light pulses, and a control unit configured to control the laser light source in such a way that, for a light pulse sequence generated by the laser light source, the time period between respectively successive light pulses varies across the light pulse sequence. A method comprises operating the optical system.

公开(公告)号：US11686951B2

公开(公告)日：2023-06-27

申请号：US17240050

申请日：2021-04-26

Applicant: Cymer, LLC ,  ASML Netherlands B.V.

Inventor： Wilhelmus Patrick Elisabeth Maria op 't Root ,  Thomas Patrick Duffey ,  Herman Philip Godfried ,  Frank Everts ,  Joshua Jon Thornes ,  Brian Edward King

IPC: G02B27/48 ,  G01J3/26 ,  G01J9/02 ,  G01J3/02 ,  G03F7/00 ,  H01S3/225 ,  H01S3/00 ,  G01J11/00 ,  G02F1/01 ,  H01S4/00 ,  G02B19/00

CPC classification number: G02B27/48 ,  G01J3/027 ,  G01J3/26 ,  G01J9/02 ,  G01J11/00 ,  G02F1/0121 ,  G03F7/70008 ,  G03F7/70041 ,  G03F7/7055 ,  H01S3/0085 ,  H01S3/225 ,  H01S4/00 ,  G01J2009/0211 ,  G02B19/0095 ,  G02F2203/18 ,  G03F7/70025 ,  G03F7/70583 ,  H01S3/0057

Abstract: A method includes: producing a light beam made up of pulses having a wavelength in the deep ultraviolet range, each pulse having a first temporal coherence defined by a first temporal coherence length and each pulse being defined by a pulse duration; for one or more pulses, modulating the optical phase over the pulse duration of the pulse to produce a modified pulse having a second temporal coherence defined by a second temporal coherence length that is less than the first temporal coherence length of the pulse; forming a light beam of pulses at least from the modified pulses; and directing the formed light beam of pulses toward a substrate within a lithography exposure apparatus.

公开(公告)号：US20180299794A1

公开(公告)日：2018-10-18

申请号：US15942423

申请日：2018-03-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Nitesh PANDEY ,  Jin LIAN ,  SAMEE UR-REHMAN ,  Martin Jacobus Johan JAK

IPC: G03F7/20 ,  G01B11/02

CPC classification number: G03F7/70633 ,  G01B11/02 ,  G03F7/70566 ,  G03F7/70575 ,  G03F7/70583 ,  G03F7/70616

Abstract: Methods and apparatuses for measuring a plurality of structures formed on a substrate are disclosed. In one arrangement, a method includes obtaining data from a first measurement process. The first measurement process including individually measuring each of the plurality of structures to measure a first property of the structure. A second measurement process is used to measure a second property of each of the plurality of structures. The second measurement process includes illuminating each structure with radiation having a radiation property that is individually selected for that structure using the measured first property for the structure.

公开(公告)号：US20180180487A1

公开(公告)日：2018-06-28

申请号：US15905658

申请日：2018-02-26

Applicant: Cymer, LLC

Inventor： Thomas Frederick Allen Bibby ,  Joshua Jon Thornes ,  Rostislav Rokitski ,  Thomas Patrick Duffey

IPC: G01J9/00 ,  G03F7/20 ,  G02B26/08 ,  G01J1/42 ,  G02B5/00 ,  G02B27/09

CPC classification number: G01J9/00 ,  G01J1/4257 ,  G01J2009/006 ,  G02B5/005 ,  G02B26/0825 ,  G02B27/0988 ,  G03F7/70058 ,  G03F7/70583

Abstract: Techniques for controlling an optical system include accessing a measured value of a property of a particular pulse of a pulsed light beam emitted from the optical system, the property being related to an amount of coherence of the light beam; comparing the measured value of the property of the light beam to a target value of the property; determining whether to generate a control signal based on the comparison; and if a control signal is generated based on the comparison, adjusting the amount of coherence in the light beam by modifying an aspect of the optical system based on the control signal to reduce an amount of coherence of a pulse that is subsequent to the particular pulse.

公开(公告)号：US09945730B2

公开(公告)日：2018-04-17

申请号：US15256196

申请日：2016-09-02

Applicant: Cymer, LLC

Inventor： Thomas Frederick Allen Bibby ,  Joshua Jon Thornes ,  Rostislav Rokitski ,  Thomas Patrick Duffey

IPC: G01J9/00 ,  G02B26/08 ,  G01J1/42 ,  G03F7/20 ,  G02B5/00 ,  G02B27/09

CPC classification number: G01J9/00 ,  G01J1/4257 ,  G01J2009/006 ,  G02B5/005 ,  G02B26/0825 ,  G02B27/0988 ,  G03F7/70058 ,  G03F7/70583

Abstract: Techniques for controlling an optical system include accessing a measured value of a property of a particular pulse of a pulsed light beam emitted from the optical system, the property being related to an amount of coherence of the light beam; comparing the measured value of the property of the light beam to a target value of the property; determining whether to generate a control signal based on the comparison; and if a control signal is generated based on the comparison, adjusting the amount of coherence in the light beam by modifying an aspect of the optical system based on the control signal to reduce an amount of coherence of a pulse that is subsequent to the particular pulse.

公开(公告)号：US20180031977A1

公开(公告)日：2018-02-01

申请号：US15660498

申请日：2017-07-26

Applicant: ASML Netherlands B.V.

Inventor： Sebastianus Adrianus GOORDEN ,  Nitesh PANDEY ,  Duygu AKBULUT ,  Teunis Willem TUKKER ,  Johannes Matheus Marie DE WIT

IPC: G03F7/20 ,  G01N21/95 ,  G01N21/88

CPC classification number: G03F7/7015 ,  G01N21/8806 ,  G01N21/9501 ,  G01N2021/8822 ,  G01N2201/0631 ,  G02B6/262 ,  G02B6/4204 ,  G02B6/4296 ,  G03F7/70075 ,  G03F7/70583 ,  G03F7/70616 ,  G03F7/70625 ,  G03F7/70633

Abstract: Devices and methods for processing a radiation beam with coherence are disclosed. In one arrangement, an optical system receives a radiation beam with coherence. The radiation beam comprises components distributed over one or more radiation beam spatial modes. A waveguide supports a plurality of waveguide spatial modes. The optical system directs a plurality of the components of the radiation beam belonging to a common radiation beam spatial mode and having different frequencies onto the waveguide in such a way that each of the plurality of components couples to a different set of the waveguide spatial modes, each set comprising one or more of the waveguide spatial modes.

公开(公告)号：US09128387B2

公开(公告)日：2015-09-08

申请号：US13893368

申请日：2013-05-14

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Jaw-Lih Shih ,  Hong-Hsing Chou ,  Yeh-Chieh Wang ,  Hsin-Kuo Chang ,  Chung-Nan Chen ,  Kuang Hsiung Cheng

IPC: G03F7/20 ,  G02B26/06

CPC classification number: G03F7/70191 ,  G02B26/06 ,  G03F7/7005 ,  G03F7/70583 ,  G03F7/70891

Abstract: A light source includes a plurality of ultraviolet (UV) light emitting diodes (LEDs) and an LED phase shift controller coupled to the plurality of UV LEDs adapted to control the phase shift of each UV LED in the plurality of UV LEDs. The plurality of UV LEDs forms a UV LED array. An ultraviolet lithography system can include a light source as described above. The system can further include a mirror assembly in a light path of the light source, the mirror assembly having a polarization mirror with an interference coating. A method provides a light source for an ultraviolet lithography system including the element of providing an plurality of UV LEDs that emit UV light and the element of controlling a phase shift of the plurality of UV LEDs with an LED phase shift controller coupled to each UV LED or arrays of the UV LEDs in the plurality of UV LEDs.

Abstract translation: 光源包括耦合到多个UV LED的多个紫外（UV）发光二极管（LED）和LED相移控制器，其适于控制多个UV LED中的每个UV LED的相移。 多个UV LED形成UV LED阵列。 紫外光刻系统可以包括如上所述的光源。 该系统还可以包括在光源的光路中的反射镜组件，反射镜组件具有带有干涉涂层的偏振镜。 一种方法提供一种用于紫外光刻系统的光源，其包括提供发射紫外光的多个UV LED的元件，以及耦合到每个UV LED的LED相移控制器控制多个UV LED的相移的元件 或多个UV LED中的UV LED的阵列。

公开(公告)号：US08891057B2

公开(公告)日：2014-11-18

申请号：US12818501

申请日：2010-06-18

Applicant: Michael Layh ,  Markus Deguenther ,  Michael Patra ,  Johannes Wangler ,  Manfred Maul ,  Damian Fiolka ,  Gundula Weiss

Inventor： Michael Layh ,  Markus Deguenther ,  Michael Patra ,  Johannes Wangler ,  Manfred Maul ,  Damian Fiolka ,  Gundula Weiss

IPC: G03B27/42 ,  G03F7/20

CPC classification number: G03F7/702 ,  G02B5/09 ,  G02B26/105 ,  G03F7/70116 ,  G03F7/7055 ,  G03F7/70583

Abstract: A projection exposure apparatus for microlithography comprises illumination optics for illuminating object field points of an object field in an object plane is disclosed. The illumination optics have, for each object field point of the object field, an exit pupil associated with the object point, where sin(γ) is a greatest marginal angle value of the exit pupil. The illumination optics include a multi-mirror array that includes a plurality of mirrors to adjust an intensity distribution in exit pupils associated to the object field points. The illumination optics further contain at least one optical system to temporally stabilize the illumination of the multi-mirror array so that, for each object field point, the intensity distribution in the associated exit pupil deviates from a desired intensity distribution in the associated exit pupil in the case of a centroid angle value sin(β) by less than 2% expressed in terms of the greatest marginal angle value sin(γ) of the associated exit pupil and/or, in the case of ellipticity by less than 2%, and/or in the case of a pole balance by less than 2%.

Abstract translation: 公开了一种用于微光刻的投影曝光装置，包括用于照射物平面中的物场的对象场点的照明光学装置。 对于物场的每个物场点，照明光学器件具有与对象点相关联的出射光瞳，其中sin（γ）是出射光瞳的最大边缘角度值。 照明光学器件包括多镜阵列，其包括多个反射镜以调整与对象场点相关联的出射光瞳中的强度分布。 照明光学器件还包含至少一个光学系统，用于暂时稳定多镜阵列的照明，使得对于每个物体场点，相关出射光瞳中的强度分布偏离相关联的出射光瞳中的期望强度分布 以关联出射光瞳的最大边缘角度值sin（γ）表示的质心角值sin（＆bgr）小于2％的情况和/或在椭圆度小于2％的情况下， 和/或在极平衡小于2％的情况下。

公开(公告)号：US20130021593A1

公开(公告)日：2013-01-24

申请号：US13582725

申请日：2011-03-14

Applicant: Johannes Onvlee ,  Robert-Han Munnig Schmidt

Inventor： Johannes Onvlee ,  Robert-Han Munnig Schmidt

IPC: G03B27/58 ,  B65G54/00 ,  B65G49/06

CPC classification number: G03F7/70258 ,  B65H23/245 ,  B65H2406/311 ,  G03F7/70275 ,  G03F7/70283 ,  G03F7/70391 ,  G03F7/70525 ,  G03F7/70583 ,  G03F7/707 ,  G03F7/70775 ,  G03F7/70816

Abstract: A substrate handling apparatus for handling a substrate is disclosed. The substrate handling apparatus includes a substrate feeding device to feed the substrate towards an exposure area, a substrate receiving device to receive the substrate from the exposure area, and a substrate stabilization device to maintain, at least in the exposure area, the substrate substantially flat at an exposure height and/or tilt, the substrate stabilization device configured for contactless stabilization of the flexible substrate.

Abstract translation: 公开了一种用于处理基板的基板处理装置。 基板处理装置包括：基板馈送装置，用于将基板馈送到曝光区域;基板接收装置，用于从曝光区域接收基板;以及基板稳定装置，至少在曝光区域中基板保持基本平坦 在曝光高度和/或倾斜下，所述基板稳定装置被配置用于柔性基板的非接触式稳定。

公开(公告)号：US08159651B2

公开(公告)日：2012-04-17

申请号：US12328204

申请日：2008-12-04

Applicant: Huibert Visser ,  Jacob Fredrik Friso Klinkhamer ,  Lev Ryzhikov ,  Scott D. Coston ,  Adel Joobeur ,  Rob Vink ,  Yevgeniy Shmarev

Inventor： Huibert Visser ,  Jacob Fredrik Friso Klinkhamer ,  Lev Ryzhikov ,  Scott D. Coston ,  Adel Joobeur ,  Rob Vink ,  Yevgeniy Shmarev

IPC: G03B27/72

CPC classification number: G03F7/70583 ,  G02B27/0905 ,  G03F7/70075

Abstract: A coherence remover includes a first partially reflective surface and a second partially reflective surface. The coherence remover is configured to receive an input beam. Each of the first and second reflective surfaces is configured to reflect a respective portion of the input beam to produce respective one or more intermediate beams. The intermediate beams collectively form an output beam that has a reduced coherence compared to the input beam.

Abstract translation: 相干去除器包括第一部分反射表面和第二部分反射表面。 相干去除器被配置为接收输入光束。 第一和第二反射表面中的每一个被配置为反射输入光束的相应部分以产生相应的一个或多个中间光束。 与输入光束相比，中间光束共同形成具有减小的相干性的输出光束。