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1.发明申请METHOD FOR MONITORING USAGE OF A PHYSICAL VAPOR DEPOSITION (PVD) TARGET WITH AN ULTRASONIC TRANSDUCER 有权用超声波传感器监测物理气相沉积（PVD）目标的使用方法公开(公告)号：US20160376695A1
公开(公告)日：2016-12-29
申请号：US14750148
申请日：2015-06-25
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Tsung-Jen Yang , Cheng-Chieh Chen , Hong-Hsing Chou
CPC classification number: G01N29/07 , C23C14/3407 , C23C14/54 , C23C16/52 , G01B17/02 , G01N29/032 , G01N29/11 , G01N2291/011 , G01N2291/015 , G01N2291/0237 , G01N2291/02854 , G01N2291/103 , G01N2291/2697 , H01J37/32935 , H01J37/345 , H01J37/3479
Abstract: A system for semiconductor manufacturing that uses ultrasonic waves for estimating and monitoring a remaining service lifetime of a consumable element is provided. A consumable element comprises a front side arranged inside a process chamber and a back side, opposite the front side, arranged outside the process chamber. An ultrasonic transducer is arranged on the back side of the consumable element, and directed towards the front side of the consumable element. A monitoring unit is configured to estimate and monitor a remaining service lifetime of the consumable element using the ultrasonic transducer. A method for estimating and monitoring the remaining service lifetime of the consumable element using ultrasonic waves is also provided.
Abstract translation: 提供了一种使用超声波估计和监测可消耗元件的剩余使用寿命的半导体制造系统。 消耗元件包括布置在处理室内的前侧和设置在处理室外部的与前侧相对的后侧。 超声波换能器设置在可消耗元件的背面，朝向可消耗元件的前侧。 监视单元被配置为使用超声波换能器来估计和监视可消耗元件的剩余使用寿命。 还提供了一种使用超声波估计和监测消耗元件的剩余使用寿命的方法。
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公开(公告)号：US11768439B2
公开(公告)日：2023-09-26
申请号：US17403540
申请日：2021-08-16
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Wolf Hung , Chung-Nan Chen , Hong-Hsing Chou , Chao-Li Shih , Yeh-Chieh Wang
CPC classification number: G03F7/70191 , G02B5/283 , G02B5/285 , G03F7/70575
Abstract: The present disclosure provides an interference filter, a lithography system incorporating an interference filter, and a method of fabricating an interference filter. The interference filter includes a transparent substrate having a front surface and a back surface, a plurality of alternating material layers formed over the front surface of the transparent substrate that form a bandpass filter, and an anti-reflective structure formed over the back surface of the transparent substrate. The alternating material layers alternate between a relatively high refractive index material and a relatively low refractive index material.
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公开(公告)号：US09791415B2
公开(公告)日：2017-10-17
申请号：US14750148
申请日：2015-06-25
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Tsung-Jen Yang , Cheng-Chieh Chen , Hong-Hsing Chou
IPC: C23C14/00 , G01N29/07 , C23C14/54 , G01B17/02 , G01N29/032 , G01N29/11 , C23C14/34 , C23C16/52 , H01J37/32 , H01J37/34
CPC classification number: G01N29/07 , C23C14/3407 , C23C14/54 , C23C16/52 , G01B17/02 , G01N29/032 , G01N29/11 , G01N2291/011 , G01N2291/015 , G01N2291/0237 , G01N2291/02854 , G01N2291/103 , G01N2291/2697 , H01J37/32935 , H01J37/345 , H01J37/3479
Abstract: A system for semiconductor manufacturing that uses ultrasonic waves for estimating and monitoring a remaining service lifetime of a consumable element is provided. A consumable element comprises a front side arranged inside a process chamber and a back side, opposite the front side, arranged outside the process chamber. An ultrasonic transducer is arranged on the back side of the consumable element, and directed towards the front side of the consumable element. A monitoring unit is configured to estimate and monitor a remaining service lifetime of the consumable element using the ultrasonic transducer. A method for estimating and monitoring the remaining service lifetime of the consumable element using ultrasonic waves is also provided.
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公开(公告)号：US20140210057A1
公开(公告)日：2014-07-31
申请号：US13752954
申请日：2013-01-29
Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Inventor： Yen-Chen Lin , Ching-Hsin Chang , Chia-Hung Chu , Hu-Wei Lin , Chih-Hsien Hsu , Hong-Hsing Chou
CPC classification number: G03F7/0387 , G03F7/039 , G03F7/162
Abstract: A method comprises dispensing a first solvent on a semiconductor substrate; dispensing a first layer of a high-viscosity polymer on the first solvent; dispensing a second solvent on the first layer of high-viscosity polymer; and spinning the semiconductor substrate after dispensing the second solvent, so as to spread the high-viscosity polymer to a periphery of the semiconductor substrate.
Abstract translation: 一种方法包括在半导体衬底上分配第一溶剂; 在第一溶剂上分配第一层高粘度聚合物; 在第一层高粘度聚合物上分配第二溶剂; 并且在分配第二溶剂之后旋转半导体衬底，以将高粘度聚合物扩散到半导体衬底的周围。
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公开(公告)号：US10163609B2
公开(公告)日：2018-12-25
申请号：US15475196
申请日：2017-03-31
Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Inventor： Tsung-Min Lin , Ming-Hsing Li , Fang-Chi Chien , Chao-Li Shih , Hong-Hsing Chou
IPC: H01J37/00 , H01J37/32 , H01L21/265
Abstract: An ion implanter comprises a dissociation chamber in the ion implanter. The dissociation chamber has an input port for receiving a gas and an output port for outputting ions. A vacuum chamber surrounds the dissociation chamber. A plurality of rods or plates of magnetic material are located adjacent to the dissociation chamber on at least two sides of the dissociation chamber. A magnet is magnetically coupled to the plurality of rods or plates of magnetic material. A microwave source is provided for supplying microwaves to the dissociation chamber, so as to cause electron cyclotron resonance in the dissociation chamber to ionize the gas.
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Patent Agency Ranking
6.发明授权Ultraviolet light emitting diode array light source for photolithography and method 有权紫外发光二极管阵列光源用于光刻和方法公开(公告)号：US09128387B2
公开(公告)日：2015-09-08
申请号：US13893368
申请日：2013-05-14
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Jaw-Lih Shih , Hong-Hsing Chou , Yeh-Chieh Wang , Hsin-Kuo Chang , Chung-Nan Chen , Kuang Hsiung Cheng
CPC classification number: G03F7/70191 , G02B26/06 , G03F7/7005 , G03F7/70583 , G03F7/70891
Abstract: A light source includes a plurality of ultraviolet (UV) light emitting diodes (LEDs) and an LED phase shift controller coupled to the plurality of UV LEDs adapted to control the phase shift of each UV LED in the plurality of UV LEDs. The plurality of UV LEDs forms a UV LED array. An ultraviolet lithography system can include a light source as described above. The system can further include a mirror assembly in a light path of the light source, the mirror assembly having a polarization mirror with an interference coating. A method provides a light source for an ultraviolet lithography system including the element of providing an plurality of UV LEDs that emit UV light and the element of controlling a phase shift of the plurality of UV LEDs with an LED phase shift controller coupled to each UV LED or arrays of the UV LEDs in the plurality of UV LEDs.
Abstract translation: 光源包括耦合到多个UV LED的多个紫外（UV）发光二极管（LED）和LED相移控制器，其适于控制多个UV LED中的每个UV LED的相移。 多个UV LED形成UV LED阵列。 紫外光刻系统可以包括如上所述的光源。 该系统还可以包括在光源的光路中的反射镜组件，反射镜组件具有带有干涉涂层的偏振镜。 一种方法提供一种用于紫外光刻系统的光源，其包括提供发射紫外光的多个UV LED的元件，以及耦合到每个UV LED的LED相移控制器控制多个UV LED的相移的元件 或多个UV LED中的UV LED的阵列。
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公开(公告)号：US20210373442A1
公开(公告)日：2021-12-02
申请号：US17403540
申请日：2021-08-16
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Wolf Hung , Chung-Nan Chen , Hong-Hsing Chou , Chao-Li Shih , Yeh-Chieh Wang
Abstract: The present disclosure provides an interference filter, a lithography system incorporating an interference filter, and a method of fabricating an interference filter. The interference filter includes a transparent substrate having a front surface and a back surface, a plurality of alternating material layers formed over the front surface of the transparent substrate that form a bandpass filter, and an anti-reflective structure formed over the back surface of the transparent substrate. The alternating material layers alternate between a relatively high refractive index material and a relatively low refractive index material.
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公开(公告)号：US09970105B2
公开(公告)日：2018-05-15
申请号：US14138495
申请日：2013-12-23
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Chun-Ta Chen , Cheng-Chieh Chen , Hong-Hsing Chou , Yeh-Chieh Wang , Jeng-Yann Tsay , Shyue-Shin Tsai , Tsung-Yang Liu
CPC classification number: C23C16/4409 , H01J37/32513 , H01L21/67126
Abstract: Embodiments of method for cooling a wafer are provided. A method for cooling a wafer includes placing the wafer in a processing module via a passage of a seat member. The method also includes moving a closure member toward the seat member in a diagonal manner. The method further includes engaging the seat member and the closure member and placing a portion of the closure member inside the passage. In addition, the method includes performing a process on the wafer in the processing module.
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公开(公告)号：US20180101101A1
公开(公告)日：2018-04-12
申请号：US15830746
申请日：2017-12-04
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Wolf Hung , Chung-Nan Chen , Hong-Hsing Chou , Chao-Li Shih , Yeh-Chieh Wang
CPC classification number: G03F7/70191 , G02B5/283 , G02B5/285 , G03F7/70575
Abstract: The present disclosure provides an interference filter, a lithography system incorporating an interference filter, and a method of fabricating an interference filter. The interference filter includes a transparent substrate having a front surface and a back surface, a plurality of alternating material layers formed over the front surface of the transparent substrate that form a bandpass filter, and an anti-reflective structure formed over the back surface of the transparent substrate. The alternating material layers alternate between a relatively high refractive index material and a relatively low refractive index material.
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公开(公告)号：US09097972B2
公开(公告)日：2015-08-04
申请号：US13752954
申请日：2013-01-29
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Yen-Chen Lin , Ching-Hsin Chang , Chia-Hung Chu , Hu-Wei Lin , Chih-Hsien Hsu , Hong-Hsing Chou
CPC classification number: G03F7/0387 , G03F7/039 , G03F7/162
Abstract: A method comprises dispensing a first solvent on a semiconductor substrate; dispensing a first layer of a high-viscosity polymer on the first solvent; dispensing a second solvent on the first layer of high-viscosity polymer; and spinning the semiconductor substrate after dispensing the second solvent, so as to spread the high-viscosity polymer to a periphery of the semiconductor substrate.
Abstract translation: 一种方法包括在半导体衬底上分配第一溶剂; 在第一溶剂上分配第一层高粘度聚合物; 在第一层高粘度聚合物上分配第二溶剂; 并且在分配第二溶剂之后旋转半导体衬底，以将高粘度聚合物扩散到半导体衬底的周围。
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