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公开(公告)号：USRE49241E1
公开(公告)日：2022-10-11
申请号：US16568164
申请日：2019-09-11
发明人： Niels Vergeer
IPC分类号： G03B27/58 , B82Y40/00 , B82Y10/00 , H01J37/317 , G03F9/00 , H01J37/304
摘要： A method for operating a target processing system for processing a target (23) on a chuck (13), the method comprising providing at least a first chuck position mark (27) and a second chuck position mark (28) on the chuck (13); providing an alignment sensing system (17) arranged for detecting the first and second chuck position marks (27, 28), the alignment sensing system (17) comprising at least a first alignment sensor (61) and a second alignment sensor (62); moving the chuck (13) to a first position based on at least one measurement of the alignment sensing system (17); and measuring at least one value related to the first position of the chuck.
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公开(公告)号：US11237489B2
公开(公告)日：2022-02-01
申请号：US16457765
申请日：2019-06-28
摘要： The invention relates to a substrate exposure system comprising a frame, a substrate support module for carrying a substrate, an exposure apparatus for exposing said substrate, and adjustment assembly for adjusting the position of the exposure apparatus with respect to the substrate support module. The adjustment assembly comprises a hydraulic actuator, a hydraulic generator and a conduit, wherein the conduit interconnects said hydraulic actuator and said hydraulic generator for forming a hydraulic system. The exposure apparatus, the frame, the adjustment assembly and the substrate support module are arranged as parts of a series of mechanically linked components. A first part of said series of mechanically linked components comprises the exposure apparatus, and a second part comprises the substrate support module. Said hydraulic actuator is arranged between said first part and said second part. Preferably the hydraulic actuator comprises a first bellows and the hydraulic generator comprises a second bellows.
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公开(公告)号：US11086234B2
公开(公告)日：2021-08-10
申请号：US16758917
申请日：2018-10-11
摘要： A substrate holder, a method of manufacturing of the substrate holder and a lithographic apparatus having the substrate holder. In one arrangement, a substrate holder is for use in a lithographic apparatus. The substrate holder is configured to support a lower surface of a substrate. The substrate holder has a main body, a plurality of burls and a coating. The main body has a substrate-facing face. The plurality of burls protrudes from the substrate-facing face. Each burl has a distal end configured to engage with the substrate. The distal ends are configured for supporting the substrate. The coating is on the substrate-facing face between the burls. Between the burls the substrate-facing face has an arrangement of areas. Adjacent areas are separated by a step-change in distance below the support plane. Each step-change is greater than a thickness of the coating.
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公开(公告)号：US11048176B2
公开(公告)日：2021-06-29
申请号：US16812717
申请日：2020-03-09
IPC分类号： G03B27/58 , G03F7/20 , G05B19/042 , H01L21/027 , H01L21/68 , H01L21/687
摘要： The present invention provides a substrate processing apparatus that processes a substrate, the apparatus including a stage configured to hold and move the substrate, a conveying unit configured to hold and convey the substrate between conveying unit and the stage, an accumulation unit configured to accumulate control information concerning the stage and the conveying unit which is generated by processing the substrate, and a determination unit configured to determine a conveying procedure when conveying the substrate between the stage and the conveying unit by selecting one of a plurality of conveying procedures which can be set for the stage and the conveying unit based on control information accumulated in the accumulation unit.
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公开(公告)号：US10551751B2
公开(公告)日：2020-02-04
申请号：US14395436
申请日：2013-03-18
摘要： A lithography apparatus and device manufacturing methods are disclosed. A lithography apparatus includes a support stage, and a measurement system including a sensor part and a reference part, the measurement system being configured to determine the position and/or orientation of the support stage, or of a component mounted on the support stage, relative to a reference frame by using the sensor part to interact with the reference part, wherein: the reference frame comprises N sub-frames coupled together so as to behave predominantly as a single rigid body with respect to vibrations below a first reference frequency and predominantly as an N-body system with respect to vibrations above a second reference frequency, where N is an integer greater than 1.
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公开(公告)号：US10514618B2
公开(公告)日：2019-12-24
申请号：US16026195
申请日：2018-07-03
摘要： A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.
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公开(公告)号：US10459350B2
公开(公告)日：2019-10-29
申请号：US15788745
申请日：2017-10-19
申请人： NIKON CORPORATION
摘要： A linear motor with high heat recovery efficiency that inhibits the rise in surface temperature is offered. The linear motor is disposed in a surrounding member (142) and facing a flow passage (142a) of a liquid for regulating temperature, and is provided with a coil unit (141) having at least a part thereof in contact with the liquid. The coil unit (141) is provided with a coil body (144), a mold layer (143) that covers the coil body and holds it in specific form, and a liquid protection layer (150) that covers the mold layer (143) and has liquid protection properties.
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公开(公告)号：US10437160B2
公开(公告)日：2019-10-08
申请号：US15749226
申请日：2016-07-28
摘要： A Lorentz actuator includes: a magnet arrangement; a coil arrangement; and a current controller for supplying a current to the coil arrangement; wherein the magnet and coil arrangement are moveable relative to each other in a main direction, wherein the coil arrangement has a first and second coil portion that are separately operable by the current controller, such that when the same current is supplied to the first coil portion as is supplied to the second coil portion, Lorentz forces generated in the main direction by the first and second coil portions are also the same, and wherein the current controller is configured to supply a current to the first and second coil portions with a phase difference in order to compensate for parasitic reluctance and/or Lorentz forces in an auxiliary direction perpendicular to the main direction.
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9.发明授权公开(公告)号：US10401744B2
公开(公告)日：2019-09-03
申请号：US14324806
申请日：2014-07-07
摘要： The present invention provides a method for calibrating an encoder which includes a scale and a light receiving unit configured to receive light reflected by the scale, and detects a change in relative position between the scale and the light receiving unit, the method comprising a measurement step of measuring a deformation amount of a surface shape of the scale, a specifying step of specifying, based on a measurement result in the measurement step, a range which includes a portion of a surface of the scale, where the deformation amount exceeds a threshold, and within which a detection value of the encoder is corrected, and a determination step of determining a correction value for correcting the detection value of the encoder within the range specified in the specifying step.
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公开(公告)号：US10353301B2
公开(公告)日：2019-07-16
申请号：US16114498
申请日：2018-08-28
申请人： NIKON CORPORATION
发明人： Yuichi Shibazaki
摘要： In an exposure operation, as a second stage is moved in a direction parallel to a predetermined plane, another head different from a plurality of heads faces a grating section instead of one head of the plurality of heads, and positional information of the second stage is measured by multiple heads including remaining heads and the another head, the remaining heads excluding the one head of the plurality of heads, and correction information is acquired for the positional information obtained from the another head, based on the positional information obtained from the plurality of heads including the one head.
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