公开(公告)号：US12158704B2

公开(公告)日：2024-12-03

申请号：US17533947

申请日：2021-11-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Abraham Alexander Soethoudt ,  Thomas Poiesz

IPC: G03F7/00 ,  H01L21/683

Abstract: A method including: generating a first force to attract a substrate holder to a support surface, the holder including a body having opposing first and second body surfaces, first burls at the first body surface, wherein each first burl has a distal end to support a substrate, and second burls at the second body surface to support the substrate holder on the support surface through contact with distal ends of the second burls; generating a second force to attract the substrate to the substrate holder; and controlling the first force and/or second force in a release step to deform the body between the second burls such as to create a gap between the distal ends of a first subset of the plurality of first burls and the substrate and such that the substrate is supported on distal ends of a second subset of the plurality of first burls.

公开(公告)号：US10353303B2

公开(公告)日：2019-07-16

申请号：US15569135

申请日：2016-05-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Abraham Alexander Soethoudt ,  Thomas Poiesz

IPC: G03B27/58 ,  G03F7/20 ,  B01D53/34 ,  B01D53/56 ,  B01D53/79 ,  B05B13/02 ,  B05B13/04 ,  F23J15/00 ,  B05B15/656 ,  B05B15/68 ,  B05B13/06

Abstract: A lithographic apparatus includes a support table and a gas extraction system. The gas extraction system is configured to extract gas from a gap between a base surface of the support table and a substrate through at least one gas extraction opening when the substrate is being lowered onto the support table. The lithographic apparatus is configured such that gas is extracted from the gap at a first loading flow rate when the distance between the substrate and the support plane is greater than a threshold distance and gas is extracted from the gap at a second loading flow rate when the distance between the substrate and the support plane is less than the threshold distance, wherein the second loading flow rate is lower than the first loading flow rate.

公开(公告)号：US11269259B2

公开(公告)日：2022-03-08

申请号：US16952371

申请日：2020-11-19

Applicant: ASML NETHERLANDS B.V.

Inventor： Thomas Poiesz ,  Bert Dirk Scholten ,  Dirk Willem Harberts ,  Lucas Henricus Johannes Stevens ,  Laura Maria Fernandez Diaz ,  Johannes Adrianus Cornelis Maria Pijnenburg ,  Abraham Alexander Soethoudt ,  Wilhelmus Jacobus Johannes Welters ,  Jimmy Matheus Wilhelmus Van De Winkel

IPC: G03F7/20

Abstract: A substrate table for an immersion system having a projection system arranged to project an image onto a substrate and a liquid confinement system configured to confine an immersion liquid to a space between the projection system and the substrate, the substrate table including: a substrate holder configured to hold a substrate; and a current control device arranged to reduce an electric current flowing between the substrate and the substrate holder while the immersion liquid is confined to the space.

公开(公告)号：US10453734B2

公开(公告)日：2019-10-22

申请号：US15580601

申请日：2016-06-01

Applicant: ASML Netherlands B.V.

Inventor： Thomas Poiesz ,  Martijn Houben ,  Abraham Alexander Soethoudt

IPC: G03B27/52 ,  H01L21/687 ,  G03F7/20 ,  B23H7/26 ,  H01L21/027 ,  H01L21/683

Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder including: a main body having a main body surface; and a plurality of burls projecting from the main body surface; wherein each burl has a distal end configured to engage with the substrate; the distal ends of the burls substantially conform to a support plane whereby a substrate can be supported in a substantially flat state on the burls; a frictional force between the distal end of each burl and a substrate engaged therewith arises in a direction parallel to the support plane in the event of a relative movement of the substrate and substrate holder in the direction; and distal end surfaces of the burls are provided with a release structure configured so that the frictional force is less than would arise in the absence of the release structure.

公开(公告)号：US11953837B2

公开(公告)日：2024-04-09

申请号：US17423818

申请日：2019-11-05

Applicant: ASML Netherlands B.V.

Inventor： Thomas Poiesz ,  Michel Ben Isel Habets ,  Abraham Alexander Soethoudt ,  Herman Marquart

IPC: G03F7/00

CPC classification number: G03F7/70783 ,  G03F7/70033

Abstract: The present invention provides a testing substrate (W) for estimating stress in production substrates due to a substrate support, said testing substrate having a support surface (SS) divided into predefined portions, wherein the predefined portions comprise at least one first portion (1) having a first coefficient of friction being substantially uniform across the at least one first portion, and at least one second portion (2) having a second coefficient of friction being substantially uniform across the at least one second portion, wherein the second coefficient of friction is different to the first coefficient of friction. The present invention also provides a method for estimating stress in a substrate due to a substrate support and a system for making such an estimation.

公开(公告)号：US11664264B2

公开(公告)日：2023-05-30

申请号：US16075754

申请日：2016-12-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Andre Bernardus Jeunink ,  Robby Franciscus Josephus Martens ,  Youssef Karel Maria De Vos ,  Ringo Petrus Cornelis Van Dorst ,  Gerhard Albert Ten Brinke ,  Dirk Jerome Andre Senden ,  Coen Hubertus Matheus Baltis ,  Justin Johannes Hermanus Gerritzen ,  Jelmer Mattheüs Kamminga ,  Evelyn Wallis Pacitti ,  Thomas Poiesz ,  Arie Cornelis Scheiberlich ,  Bert Dirk Scholten ,  André Schreuder ,  Abraham Alexander Soethoudt ,  Siegfried Alexander Tromp ,  Yuri Johannes Gabriël Van De Vijver

IPC: H01L21/683 ,  H01L21/687 ,  G03F7/20 ,  B25B11/00

CPC classification number: H01L21/6838 ,  B25B11/005 ,  G03F7/707 ,  G03F7/70733 ,  H01L21/68742

Abstract: A method for unloading a substrate from a support table configured to support the substrate, the method including: supplying gas to a gap between a base surface of the support table and the substrate via a plurality of gas flow openings in the support table, wherein during an initial phase of unloading the gas is supplied through at least one gas flow opening in an outer region of the support table and not through any gas flow opening in a central region of the support table radially inward of the outer region, and during a subsequent phase of unloading the gas is supplied through at least one gas flow opening in the outer region and at least one gas flow opening in the central region.

公开(公告)号：US11448976B2

公开(公告)日：2022-09-20

申请号：US16770464

申请日：2018-11-22

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Thomas Poiesz ,  Coen Hubertus Matheus Baltis ,  Abraham Alexander Soethoudt ,  Mehmet Ali Akbas ,  Dennis Van Den Berg ,  Wouter Vanesch ,  Marcel Maria Cornelius Franciscus Teunissen

IPC: G03F7/20 ,  H01L21/687

Abstract: A substrate holder, for a lithographic apparatus, having a main body, a plurality of support elements to support a substrate and a seal unit. The seal unit may include a first seal positioned outward of and surrounding the plurality of support elements. A position of a substrate contact region of an upper surface of the first seal may be arranged at a distance from the plurality of support elements sufficient enough such that during the loading/unloading of the substrate, a force applied to the first seal by the substrate is greater than a force applied to the plurality of support elements by the substrate. A profile of the contact region, in a cross section through the seal, may have a shape which is configured such that during the loading/unloading of the substrate, the substrate contacts the seal via at least two different points of the profile.

公开(公告)号：US11086234B2

公开(公告)日：2021-08-10

申请号：US16758917

申请日：2018-10-11

Applicant: ASML NETHERLANDS B.V.

Inventor： Thomas Poiesz ,  Satish Achanta ,  Jeroen Bouwknegt ,  Abraham Alexander Soethoudt

IPC: G03B27/58 ,  G03F7/20

Abstract: A substrate holder, a method of manufacturing of the substrate holder and a lithographic apparatus having the substrate holder. In one arrangement, a substrate holder is for use in a lithographic apparatus. The substrate holder is configured to support a lower surface of a substrate. The substrate holder has a main body, a plurality of burls and a coating. The main body has a substrate-facing face. The plurality of burls protrudes from the substrate-facing face. Each burl has a distal end configured to engage with the substrate. The distal ends are configured for supporting the substrate. The coating is on the substrate-facing face between the burls. Between the burls the substrate-facing face has an arrangement of areas. Adjacent areas are separated by a step-change in distance below the support plane. Each step-change is greater than a thickness of the coating.

公开(公告)号：US10656536B2

公开(公告)日：2020-05-19

申请号：US15308598

申请日：2015-04-23

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Martinus Hendrikus Antonius Leenders ,  Niek Elout De Kruijf ,  Mircea Dusa ,  Martijn Houben ,  Johannes Gerardus Maria Mulder ,  Thomas Poiesz ,  Marco Adrianus Peter Van Den Heuvel ,  Paul Van Dongen ,  Justin Johannes Hermanus Gerritzen ,  Antonie Hendrik Verweij ,  Abraham Alexander Soethoudt

IPC: B25B11/00 ,  G03F7/20 ,  H01L21/683

Abstract: A substrate support, includes: a substrate support location configured to support a substrate, and a vacuum clamping device configured to clamp the substrate on the substrate support location, wherein the vacuum clamping device includes at least one reduced pressure source to create a reduced pressure, at least one vacuum section connected to the at least one reduced pressure source, wherein the at least one vacuum section is configured to attract the substrate towards the substrate support location, and a control device configured to control a spatial pressure profile along the at least one vacuum section with which the substrate is attracted by the vacuum clamping device, wherein the control device includes a substrate shape data input to receive substrate shape data representing shape data of the substrate to be clamped, and wherein the control device is configured to adapt the spatial pressure profile in dependency of the substrate shape data.

公开(公告)号：US11898601B2

公开(公告)日：2024-02-13

申请号：US17407778

申请日：2021-08-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Siegfried Alexander Tromp ,  Antonie Hendrik Verweij ,  Abraham Alexander Soethoudt ,  Jan Pieter Van De Poel ,  Mark Constant Johannes Baggen

IPC: F16C32/06 ,  H01L21/683 ,  F16C29/02 ,  G03F7/00 ,  G03F7/20

CPC classification number: F16C32/0611 ,  F16C29/025 ,  F16C32/0607 ,  G03F7/20 ,  G03F7/707 ,  G03F7/708 ,  H01L21/6831 ,  H01L21/6833

Abstract: A support table for a lithographic apparatus, a method of loading a substrate, a lithographic apparatus and a method for manufacturing a device using a lithographic apparatus. In one arrangement, a support table is configured to support a substrate. The support table has a base surface. The base surface faces a surface of the substrate when the substrate is supported by the support table. One or more gas cushion members are provided above the base surface. Each of the gas cushion members includes a recess. The recess is shaped and configured such that a lowering of the substrate into a position on the support table at which the substrate is supported by the support table causes a localised build-up of pressure within the recess. The localized build-up of pressure provides a localised gas cushioning effect during the lowering of the substrate.