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公开(公告)号：US10719019B2
公开(公告)日：2020-07-21
申请号：US16315125
申请日：2017-07-06
发明人： Thomas Poiesz , Satish Achanta , Mehmet Ali Akbas , Pavlo Antonov , Jeroen Bouwknegt , Joost Wilhelmus Maria Frenken , Evelyn Wallis Pacitti , Nicolaas Ten Kate , Bruce Tirri , Jan Verhoeven
IPC分类号： G03F7/20 , H01L21/687
摘要： There is disclosed a substrate holder, a method of manufacturing a substrate holder, a lithographic apparatus comprising the substrate holder, and a method of manufacturing devices using the lithographic apparatus. In one arrangement, there is provided a substrate holder for use in a lithographic apparatus. The substrate holder supports a substrate. The substrate holder comprises a main body. The main body has a main body surface. A plurality of burls are provided projecting from the main body surface. Each burl has a burl side surface and a distal end surface. The distal end surface of each burl engages with the substrate. The distal end surfaces of the burls substantially conform to a support plane and support the substrate. A layer of carbon based material is provided in a plurality of separated regions of carbon based material. The layer of carbon based material provides a surface with a lower coefficient of friction than a part of the main body surface outside the plurality of separated regions of carbon based material. The layer of carbon based material covers only part of the distal end surface of at least one of the burls. Alternatively, the layer of carbon based material covers the distal end surface and at least a portion of the burl side surface of at least one of the burls.
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公开(公告)号：US11448976B2
公开(公告)日：2022-09-20
申请号：US16770464
申请日：2018-11-22
发明人： Thomas Poiesz , Coen Hubertus Matheus Baltis , Abraham Alexander Soethoudt , Mehmet Ali Akbas , Dennis Van Den Berg , Wouter Vanesch , Marcel Maria Cornelius Franciscus Teunissen
IPC分类号： G03F7/20 , H01L21/687
摘要： A substrate holder, for a lithographic apparatus, having a main body, a plurality of support elements to support a substrate and a seal unit. The seal unit may include a first seal positioned outward of and surrounding the plurality of support elements. A position of a substrate contact region of an upper surface of the first seal may be arranged at a distance from the plurality of support elements sufficient enough such that during the loading/unloading of the substrate, a force applied to the first seal by the substrate is greater than a force applied to the plurality of support elements by the substrate. A profile of the contact region, in a cross section through the seal, may have a shape which is configured such that during the loading/unloading of the substrate, the substrate contacts the seal via at least two different points of the profile.
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公开(公告)号：US10656536B2
公开(公告)日：2020-05-19
申请号：US15308598
申请日：2015-04-23
发明人： Martinus Hendrikus Antonius Leenders , Niek Elout De Kruijf , Mircea Dusa , Martijn Houben , Johannes Gerardus Maria Mulder , Thomas Poiesz , Marco Adrianus Peter Van Den Heuvel , Paul Van Dongen , Justin Johannes Hermanus Gerritzen , Antonie Hendrik Verweij , Abraham Alexander Soethoudt
IPC分类号： B25B11/00 , G03F7/20 , H01L21/683
摘要： A substrate support, includes: a substrate support location configured to support a substrate, and a vacuum clamping device configured to clamp the substrate on the substrate support location, wherein the vacuum clamping device includes at least one reduced pressure source to create a reduced pressure, at least one vacuum section connected to the at least one reduced pressure source, wherein the at least one vacuum section is configured to attract the substrate towards the substrate support location, and a control device configured to control a spatial pressure profile along the at least one vacuum section with which the substrate is attracted by the vacuum clamping device, wherein the control device includes a substrate shape data input to receive substrate shape data representing shape data of the substrate to be clamped, and wherein the control device is configured to adapt the spatial pressure profile in dependency of the substrate shape data.
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公开(公告)号：US10514615B2
公开(公告)日：2019-12-24
申请号：US15580806
申请日：2016-06-21
发明人： Andre Bernardus Jeunink , Robbert De Jong , Martinus Hendrikus Antonius Leenders , Evelyn Wallis Pacitti , Thomas Poiesz , Frank Pieter Albert Van Den Berkmortel
摘要： A support apparatus configured to support an object, the support apparatus includes a support body including an object holder to hold an object; an opening in the support body adjacent to an edge of the object holder; a channel in fluid communication with the opening via each of a plurality of passageways in the support body; and a passageway liner mounted in at least one of the plurality of passageways, the passageway liner being thermally insulating to substantially thermally decouple the support body from fluid in the at least one of the plurality of passageways.
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公开(公告)号：US10353303B2
公开(公告)日：2019-07-16
申请号：US15569135
申请日：2016-05-23
IPC分类号： G03B27/58 , G03F7/20 , B01D53/34 , B01D53/56 , B01D53/79 , B05B13/02 , B05B13/04 , F23J15/00 , B05B15/656 , B05B15/68 , B05B13/06
摘要： A lithographic apparatus includes a support table and a gas extraction system. The gas extraction system is configured to extract gas from a gap between a base surface of the support table and a substrate through at least one gas extraction opening when the substrate is being lowered onto the support table. The lithographic apparatus is configured such that gas is extracted from the gap at a first loading flow rate when the distance between the substrate and the support plane is greater than a threshold distance and gas is extracted from the gap at a second loading flow rate when the distance between the substrate and the support plane is less than the threshold distance, wherein the second loading flow rate is lower than the first loading flow rate.
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6.发明授权公开(公告)号：US09798253B2
公开(公告)日：2017-10-24
申请号：US15306676
申请日：2015-03-25
IPC分类号： G03F7/20 , H01L21/67 , H01L21/687
CPC分类号： G03F7/70875 , G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70866 , H01L21/67028 , H01L21/67051 , H01L21/6875
摘要： A support table having: a base surface configured to be substantially parallel to a lower surface of a substrate, a plurality of burls each having a respective distal end and a first height above the base surface, the burls arranged to support the substrate by the respective distal ends, and a plurality of elongate raised protrusions protruding above the base surface, each elongate raised protrusion having a second height above the base surface that is less than the first height. The base surface has a plurality of regions within each of which some of the elongate raised protrusions are located. All of the elongate raised protrusions located within each region have substantially the same direction of elongation such that they are substantially parallel to each other so as to form between the elongate raised protrusions at least one gas flow path substantially parallel to the elongate raised protrusions.
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公开(公告)号：US11269259B2
公开(公告)日：2022-03-08
申请号：US16952371
申请日：2020-11-19
发明人： Thomas Poiesz , Bert Dirk Scholten , Dirk Willem Harberts , Lucas Henricus Johannes Stevens , Laura Maria Fernandez Diaz , Johannes Adrianus Cornelis Maria Pijnenburg , Abraham Alexander Soethoudt , Wilhelmus Jacobus Johannes Welters , Jimmy Matheus Wilhelmus Van De Winkel
IPC分类号： G03F7/20
摘要： A substrate table for an immersion system having a projection system arranged to project an image onto a substrate and a liquid confinement system configured to confine an immersion liquid to a space between the projection system and the substrate, the substrate table including: a substrate holder configured to hold a substrate; and a current control device arranged to reduce an electric current flowing between the substrate and the substrate holder while the immersion liquid is confined to the space.
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公开(公告)号：US10453734B2
公开(公告)日：2019-10-22
申请号：US15580601
申请日：2016-06-01
IPC分类号： G03B27/52 , H01L21/687 , G03F7/20 , B23H7/26 , H01L21/027 , H01L21/683
摘要： A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder including: a main body having a main body surface; and a plurality of burls projecting from the main body surface; wherein each burl has a distal end configured to engage with the substrate; the distal ends of the burls substantially conform to a support plane whereby a substrate can be supported in a substantially flat state on the burls; a frictional force between the distal end of each burl and a substrate engaged therewith arises in a direction parallel to the support plane in the event of a relative movement of the substrate and substrate holder in the direction; and distal end surfaces of the burls are provided with a release structure configured so that the frictional force is less than would arise in the absence of the release structure.
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公开(公告)号：US10310393B2
公开(公告)日：2019-06-04
申请号：US15737399
申请日：2016-04-28
发明人： Thomas Poiesz
IPC分类号： G03F7/20
摘要： The present invention relates to a substrate support (1), comprising: a support body (2) forming a support surface configured to support a substrate, wherein said support surface comprises a support surface part configured to support a substrate area of the substrate, at least one actuator (6) arranged on the support body at a location aligned with the support surface part and configured to contract or extend in a direction substantially parallel to a main plane of the support surface.
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10.发明授权公开(公告)号：US11187998B2
公开(公告)日：2021-11-30
申请号：US16761608
申请日：2018-10-24
IPC分类号： G03F7/20 , H01L21/683
摘要： A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder including a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member; and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.
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