公开(公告)号：US20190196345A1

公开(公告)日：2019-06-27

申请号：US16289875

申请日：2019-03-01

申请人： ASML NETHERLANDS B.V.

发明人： Laurentius Johannes Adrianus VAN BOKHOVEN ,  Ruud Hendrikus Martinus Johannes BLOKS ,  Günes NAKIBOGLU ,  Marinus Jan REMIE ,  Johan Gertrudis Cornelis KUNNEN

IPC分类号： G03F7/20

CPC分类号： G03F7/70875 ,  G03F7/70716 ,  G03F7/70783 ,  G03F7/70858 ,  G03F7/70933

摘要： An apparatus and method for controlling temperature of a patterning device in a lithographic apparatus, by flowing gas across the patterning device. A patterning apparatus includes: a patterning device support structure configured to support a patterning device; a patterning device conditioning system including a first gas outlet configured to provide a gas flow over a surface of the patterning device and a second gas outlet configured to provide a gas flow over a part of a surface of the patterning device support structure not supporting the patterning device; and a control system configured to separately control the temperature of the gas exiting the first and second gas outlets such that the gas exiting the second gas outlet is at a higher temperature than the gas exiting the first gas outlet and/or to separately control the temperature and gas flow rate of the gas exiting the first and second gas outlets.

公开(公告)号：US20190033733A1

公开(公告)日：2019-01-31

申请号：US16072218

申请日：2017-02-09

申请人： ASML NETHERLANDS B.V.

发明人： Michael Johannes VERVOORDELDONK ,  Joeri LOF

IPC分类号： G03F7/20 ,  B65G47/24

CPC分类号： G03F9/7011 ,  B65G47/24 ,  B65G2203/042 ,  G03F7/70258 ,  G03F7/70733 ,  G03F7/70741 ,  G03F7/7075 ,  G03F7/70875

摘要： A substrate handling system for handling a substrate, the substrate handling system including a holder for holding the substrate, a rotation device for rotating the holder around an axis perpendicular to a plane, and a mover for moving the holder along a path in the plane relative to the axis. Further, there is provided a lithographic apparatus including the substrate handling system. The substrate handling system may include a coupling device arranged to couple the holder to the mover or the rotation device in a first situation. The coupling device may be arranged to decouple the holder from the mover or rotation device in a second situation.

公开(公告)号：US20180173116A1

公开(公告)日：2018-06-21

申请号：US15568122

申请日：2016-04-04

申请人： ASML Netherlands B.V.

发明人： Adrianus Hendrik KOEVOETS ,  Erik Johan ARLEMARK ,  Sander Catharina Reinier DERKS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Wilfred Edward ENDENDIJK ,  Franciscus Johannes Joseph JANSSEN ,  Raymond Wilhelmus Louis LAFARRE ,  Leon Martin LEVASIER ,  Jim Vincent OVERKAMP ,  Nicolaas TEN KATE ,  Jacobus Cornelis Gerardus VAN DER SANDEN

IPC分类号： G03F7/20 ,  H01L21/67

CPC分类号： G03F7/70875 ,  G03F7/2041 ,  G03F7/70258 ,  G03F7/70783 ,  H01L21/67098 ,  H01L21/683

摘要： A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus (40) for cooling the substrate, wherein the cooling apparatus comprises a cooling element (42, 44) located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.

公开(公告)号：US20180149986A1

公开(公告)日：2018-05-31

申请号：US15316526

申请日：2015-05-21

申请人： ASML NETHERLAND B.V.

发明人： Paul Corné Henri DE WIT ,  Stijn Willem BOERE ,  Youssef Karel Maria DE VOS ,  Peter Paul HEMPENIUS ,  Nicolaas Rudolf KEMPER ,  Robertus Mathijs Gerardus RIJS ,  Frits VAN DER MEULEN

IPC分类号： G03F9/00 ,  G03F7/20

CPC分类号： G03F9/7073 ,  G03F7/20 ,  G03F7/70725 ,  G03F7/70875 ,  G03F7/70891 ,  G03F7/709

摘要： A temperature conditioning system for a lithographic apparatus. Temperature variations in an object cause object deformation which prevents the object being accurately positioned. Temperature condition systems use conduit systems, provided with fluid, in or on the object to control the temperature of the object to reduce object deformation. In this way, parts of the object can be more accurately positioned. However, acceleration of the object and the temperature conditioning system induces variation in pressure within the fluid inside the conduit system on or in the object, which may also cause object deformation. To provide an improved conduit system, the lithographic apparatus further includes a control system which is used to control the movement of the object based on measurements indicating pressure variation in the conduit.

公开(公告)号：US20180074417A1

公开(公告)日：2018-03-15

申请号：US15698503

申请日：2017-09-07

申请人： NIKON CORPORATION

发明人： Michael B. Binnard ,  Paul Derek Coon

IPC分类号： G03F7/20

CPC分类号： G03F7/70875 ,  G03F7/707

摘要： An exposure apparatus (10) for transferring one or more features to a workpiece (22) includes an illumination source (44A); (ii) a chuck (40) that retains the workpiece (22); (iii) a chamber housing (28A) that encircles the chuck and the workpiece; and (iv) a temperature controller (32) (34) that adjusts the temperature of at least one of the chuck (40) and the workpiece (22) so that a predetermined temperature differential (309) exists between the chuck (40) and the workpiece (22) before transferring the features to the workpiece (22).

公开(公告)号：US09915877B2

公开(公告)日：2018-03-13

申请号：US15629399

申请日：2017-06-21

申请人： ASML Netherlands B.V.

发明人： Thibault Simon Mathieu Laurent ,  Johannes Henricus Wilhelmus Jacobs ,  Wilhelmus Franciscus Johannes Simons ,  Martijn Houben ,  Raymond Wilhelmus Louis Lafarre ,  Koen Steffens ,  Han Henricus Aldegonda Lempens ,  Rogier Hendrikus Magdalena Cortie ,  Ruud Hendrikus Martinus Johannes Bloks ,  Gerben Pieterse ,  Siegfried Alexander Tromp ,  Theodorus Wilhelmus Polet ,  Jim Vincent Overkamp ,  Van Vuong Vy

IPC分类号： G03B27/52 ,  G03B27/58 ,  H02K41/02 ,  G03F7/20 ,  H01L21/68

CPC分类号： G03F7/70341 ,  G03F7/70716 ,  G03F7/70875 ,  G03F7/7095 ,  H01L21/682

摘要： An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.

公开(公告)号：US09885964B2

公开(公告)日：2018-02-06

申请号：US13659729

申请日：2012-10-24

申请人： Jan Steven Christiaan Westerlaken ,  Rob Jansen ,  Erik Vervoort

发明人： Jan Steven Christiaan Westerlaken ,  Rob Jansen ,  Erik Vervoort

IPC分类号： G03B27/52 ,  G03B27/58 ,  G03F7/20

CPC分类号： G03F7/7075 ,  G03F7/70875

摘要： A lithographic apparatus includes a substrate table constructed to hold a substrate; a compartment configured to receive the substrate table; a thermal conditioning unit arranged to receive a substrate to be exposed and thermally condition the substrate; and a transfer system for transferring a thermally conditioned substrate to the substrate table, wherein the substrate table and the thermal conditioning unit are arranged inside the compartment of the lithographic apparatus, at least during a transfer of the thermally conditioned substrate from the thermal conditioning unit to the substrate table.

公开(公告)号：US20180024446A1

公开(公告)日：2018-01-25

申请号：US15528187

申请日：2015-11-24

申请人： ASML NETHERLANDS B.V.

发明人： Theodorus Petrus Maria CADEE ,  Benjamin Joseph DE SMET ,  Sjoerd Nicolaas Lambertus DONDERS ,  Adrianus Marianus VERDONCK

IPC分类号： G03F7/20

CPC分类号： G03F7/70875 ,  F25B39/02 ,  F25B2339/023 ,  G02B7/028 ,  G02B7/1815 ,  G03F7/708 ,  G03F7/70808 ,  G03F7/70858 ,  G03F7/70891

摘要： A method of thermally conditioning a physical object, includes guiding a two-phase cooling medium through a cooling duct of the physical object, wherein the guiding includes: guiding the two-phase cooling medium in a liquid phase via a pre-heating duct of the physical object from a supply side of the physical object at least partly towards a discharging side of the physical object, the two-phase cooling medium being pre-heated in the pre-heating duct; guiding the two-phase cooling medium from the pre-heating duct to a phase transitioning duct of the physical object, the two-phase cooling medium at least partly transitioning from the liquid phase towards a gas phase in the phase transitioning duct; guiding the two-phase cooling medium from the phase transitioning duct to a discharging duct of the physical object; and discharging at the discharging side the two-phase cooling medium from the discharging duct.

公开(公告)号：US20180017880A1

公开(公告)日：2018-01-18

申请号：US15718396

申请日：2017-09-28

申请人： Taiwan Semiconductor Manufacturing Company, Ltd.

发明人： Chue San Yoo ,  Ching-Yueh Chen ,  Wen-Hao Cheng

IPC分类号： G03F7/20

CPC分类号： G03F7/70916 ,  G03F7/707 ,  G03F7/70875 ,  H01L21/67115 ,  H01L21/67253

摘要： An apparatus for generating at least one particle shield in photolithography includes a first component and a second component. The first component and the second component are operable to form a first particle shield of the at least one particle shield for blocking particles from contacting a proximate surface of an object. The first component includes a first gas injector, and the second component includes a first gas extractor corresponding to the first gas injector. The first gas injector is configured to blow out a gas, thereby forming the first particle shield. The first gas extractor is configured to work with the first gas injector for providing gas pressure gradient for the first particle shield.

公开(公告)号：US09851644B2

公开(公告)日：2017-12-26

申请号：US15237394

申请日：2016-08-15

申请人： ASML NETHERLANDS B.V.

发明人： Koen Jacobus Johannes Maria Zaal ,  Joost Jeroen Ottens

IPC分类号： G03B27/52 ,  G03B27/58 ,  G03F7/20

CPC分类号： G03F7/70716 ,  G03F7/70341 ,  G03F7/70725 ,  G03F7/70775 ,  G03F7/70783 ,  G03F7/7085 ,  G03F7/70858 ,  G03F7/70875

摘要： A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.