公开(公告)号：US20240272516A1

公开(公告)日：2024-08-15

申请号：US18570289

申请日：2022-05-20

申请人： ASML NETHERLANDS B.V.

发明人： Sjoerd Nicolaas Lambertus DONDERS ,  Petrus Wilhelmus SMORENBURG

IPC分类号： G02F1/383

CPC分类号： G02F1/383

摘要： An assembly for receiving a pump radiation to interact with a gas medium at an interaction space to generate an emitted radiation. The assembly comprising: an object with a hollow core, wherein the hollow core has an elongated volume through the object, wherein the interaction space is located inside the hollow core, and a heat conductive structure that connects at multiple locations of an outside wall of the object for transferring heat generated at the interaction space away from the object.

公开(公告)号：US20190250518A1

公开(公告)日：2019-08-15

申请号：US16245400

申请日：2019-01-11

申请人： ASML NETHERLANDS B.V.

发明人： Joeri LOF ,  Hans BUTLER ,  Sjoerd Nicolaas Lambertus DONDERS ,  Aleksey Yurievich KOLESNYCHENKO ,  Erik Roelof LOOPSTRA ,  Hendricus Johannes Maria MEIJER ,  Johannes Catherinus Hubertus MULKENS ,  Roelof Aeilko Siebrand RITSEMA ,  Frank VAN SCHAIK ,  Timotheus Franciscus SENGERS ,  Klaus SIMON ,  Joannes Theodoor DE SMIT ,  Alexander STRAAIJER ,  Bob STREEFKERK ,  Erik Theodorus Maria BIJLAART ,  Christiaan Alexander HOOGENDAM ,  Helmar VAN SANTEN ,  Marcus Adrianus VAN DE KERKHOF ,  Mark KROON ,  Arie Jeffrey DEN BOEF ,  Joost Jeroen OTTENS ,  Jeroen Johannes Sophia Maria MERTENS

IPC分类号： G03F7/20

摘要： A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.

公开(公告)号：US20190179232A1

公开(公告)日：2019-06-13

申请号：US16276861

申请日：2019-02-15

申请人： ASML NETHERLANDS B.V.

发明人： Marcel BECKERS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Christiaan Alexander HOOGENDAM ,  Johannes Henricus Wilhelmus JACOBS ,  Nicolaas TEN KATE ,  Nicolaas Rudolf KEMPER ,  Ferdy MIGCHELBRINK ,  Elmar EVERS

IPC分类号： G03F7/20

摘要： A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.

公开(公告)号：US20190121247A1

公开(公告)日：2019-04-25

申请号：US16226731

申请日：2018-12-20

申请人： ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

发明人： Martinus Hendrikus Antonius LEENDERS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Harry SEWELL ,  Louis John MARKOYA ,  Marcus Martinus Petrus Adrianus VERMEULEN ,  Diane Elaine MARIKOYA

IPC分类号： G03F7/20

摘要： A new way of drying and/or wetting a surface, such as a top surface of a substrate, is disclosed which is useful in immersion lithography. The surface is placed under a single phase extractor and a priming liquid is delivered between the single phase extractor and the surface. The single phase extractor is only activated after the priming liquid has been provided between the single phase extractor and the surface. Priming liquid is delivered to the single phase extractor during the whole of the drying and/or wetting process.

公开(公告)号：US20180239252A1

公开(公告)日：2018-08-23

申请号：US15525626

申请日：2015-11-04

申请人： ASML Netherlands B.V.

发明人： Han-Kwang NIENHUYS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Gosse Charles DE VRIES ,  Michael Josef Mathijs RENKENS ,  Erik Roelof LOOPSTRA

IPC分类号： G03F7/20

CPC分类号： G03F7/70891 ,  G02B5/1838 ,  G02B5/1861 ,  G02B7/1815 ,  G03F7/2008 ,  G03F7/70266 ,  G03F7/7095

摘要： A reflector (2) comprising a plate (4) supported by a substrate (8), wherein the plate has a reflective surface (5) and is secured to the substrate by adhesive free bonding, and wherein a cooling channel array (10) is provided in the reflector. The channels (16) of the cooling channel array may be formed from open channels in a surface of the substrate, the open channels being closed by the plate to create the channels.

公开(公告)号：US20180046095A1

公开(公告)日：2018-02-15

申请号：US15795227

申请日：2017-10-26

申请人： ASML NETHERLANDS B.V.

发明人： Timotheus Franciscus SENGERS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Hans JANSEN ,  Arjen BOOGAARD

IPC分类号： G03F7/20

CPC分类号： G03F7/70866 ,  G03F7/70341 ,  G03F7/70591 ,  G03F7/7085 ,  G03F7/7095

摘要： In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained.

公开(公告)号：US20160026085A1

公开(公告)日：2016-01-28

申请号：US14871795

申请日：2015-09-30

申请人： ASML NETHERLANDS B.V.

发明人： Bob STREEFKERK ,  Sjoerd Nicolaas Lambertus DONDERS ,  Roelof Frederik DE GRAAF ,  Christiaan Alexander HOOGENDAM ,  Hans JANSEN ,  Martinus Hendikus Antonius LEENDERS ,  Paulus Martinus Maria LIEBREGTS ,  Jeroen Johannes Sophia Maria MERTENS ,  Jan-Gerard Cornelis VAN DER TOORN ,  Michel RIEPEN

IPC分类号： G03F7/20

CPC分类号： G03F7/2041 ,  G03F7/3085 ,  G03F7/70058 ,  G03F7/70341 ,  G03F7/70825 ,  G03F7/70875 ,  G03F7/70916 ,  G03F2007/2067 ,  H01L21/0274 ,  H01L21/67098

摘要： An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.

公开(公告)号：US20150205214A1

公开(公告)日：2015-07-23

申请号：US14676025

申请日：2015-04-01

申请人： ASML NETHERLANDS B.V.

发明人： Marcel Mathijs Theodore Marie DIERICHS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Johannes Henricus Wilhelmus JACOBS ,  Hans JANSEN ,  Erik Roelof LOOPSTRA ,  Jeroen Johannes Sophia Maria MERTENS ,  Marco Koert STAVENGA ,  Bob STREEFKERK ,  Martinus Cornelis Maria VERHAGEN ,  Lejla SEUNTIENS-GRUDA

IPC分类号： G03F7/20

CPC分类号： G03F7/70866 ,  B01D19/0031 ,  B01D61/025 ,  B01D61/24 ,  C02F1/04 ,  C02F1/20 ,  C02F1/28 ,  C02F1/283 ,  C02F1/32 ,  C02F1/42 ,  C02F1/441 ,  C02F2103/40 ,  G03F7/2041 ,  G03F7/70341

摘要： In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiation source, and/or a filter configured to purify the liquid. A gas content reduction device may be provided to reduce a gas content of the liquid. A chemical may be added to the liquid using an adding device to inhibit lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms may be reduced.

摘要翻译： 在光刻投影装置中，液体供应系统将液体保持在投影系统和基板之间的空间中。 液体供应系统还可以包括去矿化单元，蒸馏单元，去烃化单元，UV辐射源和/或构造成净化液体的过滤器。 可以提供气体减少装置以减少液体的气体含量。 可以使用添加装置将化学物质添加到液体中以抑制生命形态生长，并且液体供应系统的组分可以由对可见光不透明的材料制成，使得寿命的增长可能降低。

公开(公告)号：US20150116675A1

公开(公告)日：2015-04-30

申请号：US14584826

申请日：2014-12-29

申请人： ASML NETHERLANDS B.V.

发明人： Hans JANSEN ,  Johannes Jacobus Matheus BASELMANS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Christiaan Alexander HOOGENDAM ,  Jeroen Johannes Sophia Maria MERTENS ,  Johannes Catharinus Hubertus MULKENS ,  Marco Koert STAVENGA ,  Bob STREEFKERK ,  Jan Cornelis VAN DER HOEVEN ,  Cedric Desire GROUWSTRA

IPC分类号： G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/70925

摘要： A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.

摘要翻译： 公开了一种清洗浸没式光刻设备内部的方法和装置。 特别地，可以使用光刻设备的液体供应系统将清洁流体引入到投影系统和光刻设备的基板台之间的空间中。 另外或替代地，可以在衬底台上设置清洁装置，并且可以设置超声发射器以产生超声波清洗液体。

公开(公告)号：US20140375973A1

公开(公告)日：2014-12-25

申请号：US14484076

申请日：2014-09-11

申请人： ASML NETHERLANDS B.V.

发明人： Bob STREEFKERK ,  Sjoerd Nicolaas Lambertus DONDERS ,  Roelof Frederik DE GRAAF ,  Christiaan Alexander HOOGENDAM ,  Hans JANSEN ,  Martinus Hendrikus Antonius LEENDERS ,  Paulus Martinus Maria LIEBREGTS ,  Jeroen Johannes Sophia Maria MERTENS ,  Jan-Gerard Cornelis VAN DER TOORN ,  Michel RIEPEN

IPC分类号： G03F7/20

CPC分类号： G03F7/2041 ,  G03F7/3085 ,  G03F7/70058 ,  G03F7/70341 ,  G03F7/70825 ,  G03F7/70875 ,  G03F7/70916 ,  G03F2007/2067 ,  H01L21/0274 ,  H01L21/67098

摘要： An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.

摘要翻译： 浸没式光刻设备设置有液体限制结构，其限定至少部分地被配置为在投影系统和衬底之间容纳液体的空间。 为了减少正在成像的衬底的边缘（其可能导致在浸没液体中包含气泡）的交叉，使得平行于衬底的平面中的空间的横截面积小至 可能。 最小的理论尺寸是由投影系统成像的目标部分的尺寸。 在一个实施例中，投影系统的最终元件的形状也被改变为在平行于基底的截面与目标部分的横截面上具有相似的尺寸和/或形状。