-
公开(公告)号：US20170068175A1
公开(公告)日：2017-03-09
申请号：US15354821
申请日：2016-11-17
发明人： Jan Steven Christiaan WESTERLAKEN , Ruud Hendrikus Martinus Johannes BLOKS , Peter A. DELMASTRO , Thibault Simon Mathieu LAURENT , Martinus Hendrikus Antonius LEENDERS , Mark Josef SCHUSTER , Christopher Charles WARD , Frank Johannes Jacobus VAN BOXTEL , Justin Matthew VERDIRAME , Samir A. NAYFEH
IPC分类号： G03F7/20
摘要： A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.
摘要翻译： 光刻设备具有构造成支撑图案形成装置的支撑结构，所述图案形成装置用于根据期望的图案对辐射束进行图案化，并具有辐射束通过的平面主表面; 出口开口，其构造成将气体流引导到图案形成装置上; 以及入口开口，被配置为提取已经离开出口的气体，其中出口开口和入口开口面向面向图案形成装置的平面主表面的面对表面。
-
公开(公告)号：US20190121247A1
公开(公告)日：2019-04-25
申请号：US16226731
申请日：2018-12-20
发明人： Martinus Hendrikus Antonius LEENDERS , Sjoerd Nicolaas Lambertus DONDERS , Harry SEWELL , Louis John MARKOYA , Marcus Martinus Petrus Adrianus VERMEULEN , Diane Elaine MARIKOYA
IPC分类号： G03F7/20
摘要： A new way of drying and/or wetting a surface, such as a top surface of a substrate, is disclosed which is useful in immersion lithography. The surface is placed under a single phase extractor and a priming liquid is delivered between the single phase extractor and the surface. The single phase extractor is only activated after the priming liquid has been provided between the single phase extractor and the surface. Priming liquid is delivered to the single phase extractor during the whole of the drying and/or wetting process.
-
公开(公告)号：US20170192359A1
公开(公告)日：2017-07-06
申请号：US15308598
申请日：2015-04-23
发明人： Martinus Hendrikus Antonius LEENDERS , Niek Elout DE KRUIJF , Mircea DUSA , Martijn HOUBEN , Johannes Gerardus Maria MULDER , Thomas POIESZ , Marco Adrianus Peter VAN DEN HEUVEL , Paul VAN DONGEN , Justin Johannes Hermanus GERRITZEN , Antonie Hendrik VER WEIJ , Abraham Alexander SOETHOUDT
IPC分类号： G03F7/20 , H01L21/683
CPC分类号： G03F7/707 , G03F7/70716 , G03F7/70783 , H01L21/6835 , H01L21/6838
摘要： A substrate support, includes: a substrate support location configured to support a substrate, and a vacuum clamping device configured to clamp the substrate on the substrate support location, wherein the vacuum clamping device includes at least one reduced pressure source to create a reduced pressure, at least one vacuum section connected to the at least one reduced pressure source, wherein the at least one vacuum section is configured to attract the substrate towards the substrate support location, and a control device configured to control a spatial pressure profile along the at least one vacuum section with which the substrate is attracted by the vacuum clamping device, wherein the control device includes a substrate shape data input to receive substrate shape data representing shape data of the substrate to be clamped, and wherein the control device is configured to adapt the spatial pressure profile in dependency of the substrate shape data.
-
公开(公告)号：US20170227856A1
公开(公告)日：2017-08-10
申请号：US15495548
申请日：2017-04-24
发明人： Martinus Hendrikus Antonius LEENDERS , Sjoerd Nicolaas Lambertus DONDERS , Harry SEWELL , Louis John MARKOYA , Marcus Martinus Petrus Adrianus VERMEULEN , Diane Czop McCAFFERTY
IPC分类号： G03F7/20
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/70875
摘要： A new way of drying and/or wetting a surface, such as a top surface of a substrate, is disclosed which is useful in immersion lithography. The surface is placed under a single phase extractor and a priming liquid is delivered between the single phase extractor and the surface. The single phase extractor is only activated after the priming liquid has been provided between the single phase extractor and the surface. Priming liquid is delivered to the single phase extractor during the whole of the drying and/or wetting process.
-
公开(公告)号：US20170045831A1
公开(公告)日：2017-02-16
申请号：US15333044
申请日：2016-10-24
发明人： Nicolaas Rudolf KEMPER , Henrikus Herman Marie COX , Sjoerd Nicolaas Lambertus DONDERS , Roelof Frederik DE GRAAF , Christiaan Alexander HOOGENDAM , Nicolaas TEN KATE , Martinus Hendrikus Antonius LEENDERS , Jeroen Johannes Sophia Maria MERTENS , Frits VAN DER MEULEN , Joost Jeroen OTTENS , Franciscus Johannes Herman Maria TEUNISSEN , Jan-Gerard Cornelis VAN DER TOORN , Martinus Cornelis Maria VERHAGEN , Marco POLIZZI , Edwin Augustinus Matheus VAN GOMPEL , Johannes Petrus Maria SMEULERS , Stefan Philip Christiaan BELFROID , Herman VOGEL
IPC分类号： G03F7/20
CPC分类号： G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
摘要： A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
-
公开(公告)号：US20150323876A1
公开(公告)日：2015-11-12
申请号：US14806395
申请日：2015-07-22
发明人： Nicolaas Rudolf KEMPER , Henrikus Herman Marie COX , Sjoerd Nicolaas Lambertus DONDERS , Roelof Frederik DE GRAAF , Christiaan Alexander HOOGENDAM , Nicolaas TEN KATE , Martinus Hendrikus Antonius LEENDERS , Jeroen Johannes Sophia Maria MERTENS , Frits VAN DER MEULEN , Joost Jeroen OTTENS , Franciscus Johannes Herman Maria TEUNISSEN , Jan-Gerard Cornelis VAN DER TOORN , Martinus Cornelis Maria VERHAGEN , Marco POLIZZI , Edwin Augustinus Matheus VAN GOMPEL , Johannes Petrus Maria SMEULERS , Stefan Philip Christiaan BELFROID , Herman VOGEL
IPC分类号： G03F7/20
CPC分类号： G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
摘要： A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
-
公开(公告)号：US20200057394A1
公开(公告)日：2020-02-20
申请号：US16587483
申请日：2019-09-30
发明人： Matthias KRUIZINGA , Maarten Mathijs Marinus JANSEN , Jorge Manuel AZEREDO LIMA , Erik Willem BOGAART , Derk Servatius Gertruda BROUNS , Marc BRUIJN , Richard Joseph BRULS , Jeroen DEKKERS , Paul JANSSEN , Mohammad Reza KAMALI , Ronald Harm Gunther KRAMER , Robert Gabriël Maria LANSBERGEN , Martinus Hendrikus Antonius LEENDERS , Matthew LIPSON , Erik Roelof LOOPSTRA , Joseph H. LYONS , Stephen ROUX , Gerrit VAN DEN BOSCH , Sander VAN DEN HEIJKANT , Sandra VAN DER GRAAF , Frits VAN DER MEULEN , Jérôme François SylvainVirgile VAN LOO , Beatrijs Louis Marie-Joseph Katrien VERBRUGGE
摘要： A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
-
公开(公告)号：US20180231897A1
公开(公告)日：2018-08-16
申请号：US15580806
申请日：2016-06-21
发明人： Andre Bernardus JEUNINK , Robert DE JONG , Martinus Hendrikus Antonius LEENDERS , Evelyn Wallis PACITTI , Thomas POIESZ , Frank Pieter Albert VAN DEN BERKMOTEL
IPC分类号： G03F7/20
摘要： A support apparatus configured to support an object, the support apparatus includes a support body including an object holder to hold an object; an opening in the support body adjacent to an edge of the object holder; a channel in fluid communication with the opening via each of a plurality of passageways in the support body; and a passageway liner mounted in at least one of the plurality of passageways, the passageway liner being thermally insulating to substantially thermally decouple the support body from fluid in the at least one of the plurality of passageways.
-
公开(公告)号：US20160033875A1
公开(公告)日：2016-02-04
申请号：US14879852
申请日：2015-10-09
发明人： Anthonius Martinus Cornelis Petrus DE JONG , Hans JANSEN , Martinus Hendrikus Antonius LEENDERS , Antonius Johannus VAN DER NET , Peter Franciscus WANTEN , Jacques Cor Johan VAN DER DONCK , Robert Douglas WATSO , Teunis Cornelis VAN DEN DOOL , Nadja SCHUH , Jan Willem CROMWIJK
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/70925
摘要： An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).
摘要翻译： 或（c）过氧化氢和臭氧的混合物，或（b）浓度高达5％的过氧化氢，或（c） 浓度高达50ppm的臭氧，或（d）浓度高达10ppm的氧，或（e）选自（a） - （d）的任何组合。
-
公开(公告)号：US20150234294A1
公开(公告)日：2015-08-20
申请号：US14704384
申请日：2015-05-05
发明人： Clemens Johannes Gerardus VAN DEN DUNGEN , Nicolaas Franciscus KOPPELAARS , Martinus Hendrikus Antonius LEENDERS , Paulus Martinus Maria LIEBREGTS , Johannes Catharinus Hubertus MULKENS , Erik Henricus Egidius Catharina EUMMELEN , Marcel BECKERS , Richard MOERMAN , Cédric Désiré GROUWSTRA , Danny Maria Hubertus PHILIPS , Remko Jan Peter VERHEES , Pieter MULDER , Evert VAN VLIET
IPC分类号： G03F7/20
CPC分类号： G03F7/70866 , G03F7/70341
摘要： An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.
-
-
-
-
-
-
-
-
-
搜索结果
24 条记录 (耗时 0.064 秒)
