公开(公告)号：US20180181004A1

公开(公告)日：2018-06-28

申请号：US15738701

申请日：2016-06-16

Applicant: ASML Netherlands B.V.

Inventor： Seerwan SAEED ,  Petrus Martinus Gerardus Johannes ARTS ,  Harold Sebastiaan BUDDENBERG ,  Erik Henricus Egidius Catharina EUMMELEN ,  Giovanni Luca GATTOBIGIO ,  Floor Lodewijk KEUKENS ,  Ferdy MIGCHELBRINK ,  Jeroen Arnoldus Leonardus Johanne RAAYMAKERS ,  Arnoldus Johannes Martinus Jozeph RAS ,  Gheorghe TANASA ,  Jimmy Matheus Wilhelmus VAN DE WINKEL ,  Daan Daniel Johannes Antonius VAN SOMMEREN ,  Marijn WOUTERS ,  Miao YU

IPC: G03F7/20 ,  G01N21/95

CPC classification number: G03F7/7085 ,  G01N21/9515 ,  G03F7/70341 ,  G03F7/7065 ,  G03F7/70916 ,  H01L22/12 ,  H01L27/14627 ,  H01L27/14678 ,  H01L27/14862

Abstract: An inspection substrate for inspecting a component, e.g. a liquid confinement system, of an apparatus for processing production substrates, e.g. a lithographic apparatus, the inspection substrate comprising: a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus; an illumination device, e.g. light emitting diodes, embedded in the body; a sensor, e.g. an imaging device or a pressure sensor, for generating inspection information relating to a parameter of a component of the apparatus proximate to the inspection substrate, the sensor embedded in the body; and a storage device embedded in the body, the storage device configured to store the inspection information, e.g. image data.

公开(公告)号：US20240192607A1

公开(公告)日：2024-06-13

申请号：US17641206

申请日：2020-08-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Theodorus Wilhelmus POLET ,  Koen STEFFENS ,  Ronald VAN DER HAM ,  Gerben PIETERSE ,  Erik Henricus Egidius Catharina EUMMELEN ,  Francis FAHRNI

IPC: G03F7/00 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/2041 ,  G03F7/70733 ,  G03F7/70991

Abstract: A fluid handling system for wetting a substrate irradiated by radiation. The fluid handling system include a first device to confine a first liquid to a first space between the first device and the substrate. The first device includes a first liquid supply member to provide the first liquid to the first space and an extraction member to remove liquid. The fluid handling system further includes a second device including a second liquid supply member to provide a second liquid to a second space between the second device and the substrate, wherein there is a gap on the surface of the substrate between the first and second liquids. The fluid handling system is configured to provide the second liquid to the second space without removing any liquid from the second space to form a liquid layer, and is configured to provide the first and second liquids on the substrate simultaneously.

公开(公告)号：US20210181641A1

公开(公告)日：2021-06-17

申请号：US17186117

申请日：2021-02-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Erik Henricus Egidius Catharina EUMMELEN ,  Giovanni Luca GATTOBIGIO ,  Johannes Cornelis Paulus MELMAN ,  Han Henricus Aldegonda LEMPENS ,  Miao YU ,  Cornelius Maria ROPS ,  Ruud OLIESLAGERS ,  Artunç ULUCAN ,  Theodorus Wilhelmus POLET ,  Patrick Johannes Wilhelmus SPRUYTENBURG

IPC: G03F7/20 ,  H01L21/027

Abstract: An immersion lithographic apparatus having a fluid handling structure, the fluid handling structure configured to confine immersion fluid to a region and including: a meniscus controlling feature having an extractor exit on a surface of the fluid handling structure; and a gas knife system outwards of the extractor exit and including passages each having an exit, the passages having a plurality of first passages having a plurality of corresponding first exits on the surface, and a plurality of second passages having a plurality of corresponding second exits outwards of the first exits on the surface, wherein the surface faces and is substantially parallel to a top surface of a substrate during exposure, and the first exits and the second exits are arranged at a greater distance from the substrate than the extractor exit.

公开(公告)号：US20170219933A1

公开(公告)日：2017-08-03

申请号：US15500866

申请日：2015-06-30

Applicant: ASML Netherlands B.V.

Inventor： Norbertus Josephus Martinus VAN DEN NIEUWELAAR ,  Victor Manuel BLANCO CARBALLO ,  Casper Roderik DE GROOT ,  Rolf Hendrikus Jacobus CUSTERS ,  David Merritt PHILLIPS ,  Frederik Antonius VAN DER ZANDEN ,  Pieter Lein Joseph GUNTER ,  Erik Henricus Egidius Catharina EUMMELEN ,  Yuri Johannes Gabriël VAN DE VIJVER ,  Bert Dirk SCHOLTEN ,  Marijn WOUTERS ,  Ronald Frank KOX ,  Jorge Alberto VIEYRA SALAS

IPC: G03F7/20 ,  G02B27/00

CPC classification number: G03F7/70341 ,  G02B27/0043 ,  G03F7/2043 ,  G03F7/70358 ,  G03F7/70725 ,  G03F7/70858 ,  G03F7/70925

Abstract: An immersion lithography apparatus has a controller configured to control a substrate table to move along an exposure route including in order: an entry motion in which the substrate moves from an off-substrate position at which the immersion space does not overlap the substrate to an on-substrate position at which the immersion space at least partially overlaps the substrate, a transfer motion in which the substrate table changes speed and/or direction and moves for at least a transfer time after the substrate moves to the on-substrate position, and an expose motion in which the substrate is scanned and the patterned beam is projected onto the substrate, wherein throughout the transfer motion at least a part of the immersion space overlaps the substrate and wherein the patterned beam is not projected onto the substrate during the entry motion and the transfer motion.

公开(公告)号：US20150234294A1

公开(公告)日：2015-08-20

申请号：US14704384

申请日：2015-05-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Clemens Johannes Gerardus VAN DEN DUNGEN ,  Nicolaas Franciscus KOPPELAARS ,  Martinus Hendrikus Antonius LEENDERS ,  Paulus Martinus Maria LIEBREGTS ,  Johannes Catharinus Hubertus MULKENS ,  Erik Henricus Egidius Catharina EUMMELEN ,  Marcel BECKERS ,  Richard MOERMAN ,  Cédric Désiré GROUWSTRA ,  Danny Maria Hubertus PHILIPS ,  Remko Jan Peter VERHEES ,  Pieter MULDER ,  Evert VAN VLIET

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341

Abstract: An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.

公开(公告)号：US20240036477A1

公开(公告)日：2024-02-01

申请号：US18463667

申请日：2023-09-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Erik Henricus Egidius Catharina EUMMELEN ,  Frank Debougnoux ,  Koen Cuypers ,  Han Henricus Aldegonda Lempens ,  Theodorus Wilhelmus Polet ,  Jorge Alberto Vieyra Salas ,  John Maria Bombeeck ,  Johannes Cornelis Paulus Melman ,  Giovanni Luca Gattobigio

IPC: G03F7/00

CPC classification number: G03F7/70341 ,  G03F7/70725

Abstract: An immersion lithography apparatus controller configured to control a positioner to move a support table to follow an exposure route and to control a liquid confinement structure, the controller configured to: predict whether liquid will be lost from an immersion space during at least one motion of the route in which an edge of the object passes under an edge of the immersion space, and if liquid loss from the immersion space is predicted, modify the fluid flow such that a first fluid flow rate into or out of an opening at a leading edge of the liquid confinement structure is different to a second fluid flow rate into or out of an opening at a trailing edge of the liquid confinement structure during the motion of predicted liquid loss or a motion of the route subsequent to the motion of predicted liquid loss.

公开(公告)号：US20220308459A1

公开(公告)日：2022-09-29

申请号：US17838946

申请日：2022-06-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Erik Henricus Egidius Catharina EUMMELEN ,  Frank Debougnoux ,  Koen Cuypers ,  Han Henricus Aldegonda Lempens ,  Theodorus Wilhelmus Polet ,  Jorge Alberto Vieyra Salas ,  John Maria Bombeeck ,  Johannes Cornelis Paulus Melman ,  Giovanni Luca Gattobigio

IPC: G03F7/20

Abstract: An immersion lithography apparatus controller configured to control a positioner to move a support table to follow an exposure route and to control a liquid confinement structure, the controller configured to: predict whether liquid will be lost from an immersion space during at least one motion of the route in which an edge of the object passes under an edge of the immersion space, and if liquid loss from the immersion space is predicted, modify the fluid flow such that a first fluid flow rate into or out of an opening at a leading edge of the liquid confinement structure is different to a second fluid flow rate into or out of an opening at a trailing edge of the liquid confinement structure during the motion of predicted liquid loss or a motion of the route subsequent to the motion of predicted liquid loss.

公开(公告)号：US20220075264A1

公开(公告)日：2022-03-10

申请号：US17524816

申请日：2021-11-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Stef Marten Johan JANSSENS ,  Koen CUYPERS ,  Rogier Hendrikus Magdalena CORTIE ,  Sudhir SRIVASTAVA ,  Theodorus Johannes Antonius RENCKENS ,  Jeroen Gerard GOSEN ,  Erik Henricus Egidius Catharina EUMMELEN ,  Hendrikus Johannes SCHELLENS ,  Adrianus Marinus Wouter HEEREN ,  Bo LENSSEN

IPC: G03F7/00 ,  F16K31/00 ,  F16K37/00 ,  H01L21/67

Abstract: A pressure control valve has: a passageway having a flow opening; an member displaceable relative to the opening for obstructing the opening by differing amounts; a piezo actuator; and a linkage mechanism adapted to amplify a dimensional change in the piezo actuator and to use the amplified dimensional change to displace the member relative to the opening, wherein the linkage mechanism comprises a frame attached to a wall and fixed at a first end in relation to the passageway, a portion of the frame moveable in a first direction while being substantially restrained in a second direction orthogonal to the first direction, the piezo actuator extending between the wall and the movable portion such that an expansion of the piezo actuator results in movement of the movable portion in the first direction by an amount greater than the expansion of the piezo actuator, the moveable portion connected to the member.

公开(公告)号：US20200004162A1

公开(公告)日：2020-01-02

申请号：US16570382

申请日：2019-09-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Erik Henricus Egidius Catharina EUMMELEN ,  Giovanni Luca GATTOBIGIO ,  Johannes Cornelis Paulus MELMAN ,  Han Henricus Aldegonda LEMPENS ,  Miao YU ,  Cornelius Maria ROPS ,  Ruud OLIESLAGERS ,  Arturnç ULUCAN ,  Theodorus Wilhelmus POLET ,  Patrick Johannes Wilhelmus SPRUYTENBURG

IPC: G03F7/20 ,  H01L21/027

Abstract: An immersion lithographic apparatus having a fluid handling structure, the fluid handling structure configured to confine immersion fluid to a region and including: a meniscus controlling feature having an extractor exit on a surface of the fluid handling structure; and a gas knife system outwards of the extractor exit and including passages each having an exit, the passages having a plurality of first passages having a plurality of corresponding first exits on the surface, and a plurality of second passages having a plurality of corresponding second exits outwards of the first exits on the surface, wherein the surface faces and is substantially parallel to a top surface of a substrate during exposure, and the first exits and the second exits are arranged at a greater distance from the substrate than the extractor exit.

公开(公告)号：US20230333480A1

公开(公告)日：2023-10-19

申请号：US18028982

申请日：2021-11-25

Applicant: ASML NETHERLANDS B.V.

Inventor： Christianus Wilhelmus Johannes BERENDSEN ,  Theodorus Wilhelmus POLET ,  Erik Henricus Egidius Catharina EUMMELEN ,  Giovanni Luca GATTOBIGIO ,  Koen CUYPERS

IPC: G03F7/00

CPC classification number: G03F7/70341 ,  G03F7/70858

Abstract: A fluid handling system for a lithographic apparatus, wherein the fluid handling system is configured to confine immersion liquid to a liquid confinement space between a part of a projection system and a surface of a substrate in the lithographic apparatus so that a radiation beam projected from the projection system can irradiate the surface of the substrate by passing through the immersion liquid, the fluid handling system including a replaceable plate with an outer surface that includes a plurality of fluid openings configured for supply and/or extraction of immersion liquid and/or gas in a channel between the fluid handling system and the substrate, wherein the outer surface is coated.