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公开(公告)号：US11774857B2
公开(公告)日：2023-10-03
申请号：US17838946
申请日：2022-06-13
Applicant: ASML NETHERLANDS B.V.
Inventor： Erik Henricus Egidius Catharina Eummelen , Frank Debougnoux , Koen Cuypers , Han Henricus Aldegonda Lempens , Theodorus Wilhelmus Polet , Jorge Alberto Vieyra Salas , John Maria Bombeeck , Johannes Cornelis Paulus Melman , Giovanni Luca Gattobigio
CPC classification number: G03F7/70341 , G03F7/70725
Abstract: An immersion lithography apparatus controller configured to control a positioner to move a support table to follow an exposure route and to control a liquid confinement structure, the controller configured to: predict whether liquid will be lost from an immersion space during at least one motion of the route in which an edge of the object passes under an edge of the immersion space, and if liquid loss from the immersion space is predicted, modify the fluid flow such that a first fluid flow rate into or out of an opening at a leading edge of the liquid confinement structure is different to a second fluid flow rate into or out of an opening at a trailing edge of the liquid confinement structure during the motion of predicted liquid loss or a motion of the route subsequent to the motion of predicted liquid loss.
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公开(公告)号：US11199771B2
公开(公告)日：2021-12-14
申请号：US16339402
申请日：2017-09-18
Applicant: ASML NETHERLANDS B.V.
Inventor： Stef Marten Johan Janssens , Koen Cuypers , Rogier Hendrikus Magdalena Cortie , Sudhir Srivastava , Theodorus Johannes Antonius Renckens , Jeroen Gerard Gosen , Erik Henricus Egidius Catharina Eummelen , Hendrikus Johannes Schellens , Adrianus Marinus Wouter Heeren , Bo Lenssen
Abstract: A pressure control valve has: a passageway having a flow opening; an member displaceable relative to the opening for obstructing the opening by differing amounts; a piezo actuator; and a linkage mechanism adapted to amplify a dimensional change in the piezo actuator and to use the amplified dimensional change to displace the member relative to the opening, wherein the linkage mechanism comprises a frame attached to a wall and fixed at a first end in relation to the passageway, a portion of the frame moveable in a first direction while being substantially restrained in a second direction orthogonal to the first direction, the piezo actuator extending between the wall and the movable portion such that an expansion of the piezo actuator results in movement of the movable portion in the first direction by an amount greater than the expansion of the piezo actuator, the moveable portion connected to the member.
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公开(公告)号：US20240036477A1
公开(公告)日：2024-02-01
申请号：US18463667
申请日：2023-09-08
Applicant: ASML NETHERLANDS B.V.
Inventor： Erik Henricus Egidius Catharina EUMMELEN , Frank Debougnoux , Koen Cuypers , Han Henricus Aldegonda Lempens , Theodorus Wilhelmus Polet , Jorge Alberto Vieyra Salas , John Maria Bombeeck , Johannes Cornelis Paulus Melman , Giovanni Luca Gattobigio
IPC: G03F7/00
CPC classification number: G03F7/70341 , G03F7/70725
Abstract: An immersion lithography apparatus controller configured to control a positioner to move a support table to follow an exposure route and to control a liquid confinement structure, the controller configured to: predict whether liquid will be lost from an immersion space during at least one motion of the route in which an edge of the object passes under an edge of the immersion space, and if liquid loss from the immersion space is predicted, modify the fluid flow such that a first fluid flow rate into or out of an opening at a leading edge of the liquid confinement structure is different to a second fluid flow rate into or out of an opening at a trailing edge of the liquid confinement structure during the motion of predicted liquid loss or a motion of the route subsequent to the motion of predicted liquid loss.
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公开(公告)号：US20220308459A1
公开(公告)日：2022-09-29
申请号：US17838946
申请日：2022-06-13
Applicant: ASML NETHERLANDS B.V.
Inventor： Erik Henricus Egidius Catharina EUMMELEN , Frank Debougnoux , Koen Cuypers , Han Henricus Aldegonda Lempens , Theodorus Wilhelmus Polet , Jorge Alberto Vieyra Salas , John Maria Bombeeck , Johannes Cornelis Paulus Melman , Giovanni Luca Gattobigio
IPC: G03F7/20
Abstract: An immersion lithography apparatus controller configured to control a positioner to move a support table to follow an exposure route and to control a liquid confinement structure, the controller configured to: predict whether liquid will be lost from an immersion space during at least one motion of the route in which an edge of the object passes under an edge of the immersion space, and if liquid loss from the immersion space is predicted, modify the fluid flow such that a first fluid flow rate into or out of an opening at a leading edge of the liquid confinement structure is different to a second fluid flow rate into or out of an opening at a trailing edge of the liquid confinement structure during the motion of predicted liquid loss or a motion of the route subsequent to the motion of predicted liquid loss.
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公开(公告)号：US10031428B2
公开(公告)日：2018-07-24
申请号：US14762450
申请日：2014-02-20
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Koen Cuypers , Marcelo Henrique De Andrade Oliveira , Marinus Jan Remie , Chattarbir Singh , Laurentius Johannes Adrianus Van Bokhoven , Henricus Anita Jozef Wilhemus Van De Ven , José Nilton Fonseca Junior , Frank Johannes Jacobus Van Boxtel , Daniel Nathan Burbank , Erik Roelof Loopstra , Johannes Onvlee , Mark Josef Schuster , Robertus Nicodemus Jacobus Van Ballegoij , Christopher Charles Ward , Jan Steven Christiaan Westerlaken
Abstract: A system is disclosed for reducing overlay errors by controlling gas flow around a patterning device of a lithographic apparatus. The lithographic apparatus includes an illumination system configured to condition a radiation beam. The lithographic apparatus further includes a movable stage comprising a support structure that may be configured to support a patterning device. The patterning device may be configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam. In addition, the lithographic apparatus comprises a plate (410) positioned between the movable stage (401) and the projection system (208). The plate includes an opening (411) that comprises a first sidewall (411a) and a second sidewall (411b). The plate may be configured to provide a gas flow pattern (424) in a region between the movable stage and the projection system that is substantially perpendicular to an optical axis of the illumination system.
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Patent Agency Ranking
公开(公告)号：US11860546B2
公开(公告)日：2024-01-02
申请号：US17952119
申请日：2022-09-23
Applicant: ASML NETHERLANDS B.V.
Inventor： Pepijn Van Den Eijnden , Cornelius Maria Rops , Theodorus Wilhelmus Polet , Floor Lodewijk Keukens , Gheorghe Tanasa , Rogier Hendrikus Magdalena Cortie , Koen Cuypers , Harold Sebastiaan Buddenberg , Giovanni Luca Gattobigio , Evert Van Vliet , Nicolaas Ten Kate , Mark Johannes Hermanus Frencken , Jantien Laura Van Erve , Marcel Maria Cornelius Franciscus Teunissen
IPC: G03F7/00
CPC classification number: G03F7/70341 , G03F7/70525
Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.
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公开(公告)号：US11454892B2
公开(公告)日：2022-09-27
申请号：US17315650
申请日：2021-05-10
Applicant: ASML NETHERLANDS B.V.
Inventor： Pepijn Van Den Eijnden , Cornelius Maria Rops , Theodorus Wilhelmus Polet , Floor Lodewijk Keukens , Gheorghe Tanasa , Rogier Hendrikus Magdalena Cortie , Koen Cuypers , Harold Sebastiaan Buddenberg , Giovanni Luca Gattobigio , Evert Van Vliet , Nicolaas Ten Kate , Mark Johannes Hermanus Frencken , Jantien Laura Van Erve , Marcel Maria Cornelius Franciscus Teunissen
IPC: G03F7/20
Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.
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公开(公告)号：US11372336B2
公开(公告)日：2022-06-28
申请号：US16464361
申请日：2017-11-01
Applicant: ASML NETHERLANDS B.V.
Inventor： Erik Henricus Egidius Catharina Eummelen , Frank Debougnoux , Koen Cuypers , Han Henricus Aldegonda Lempens , Theodorus Wilhelmus Polet , Jorge Alberto Vieyra Salas , John Maria Bombeeck , Johannes Cornelis Paulus Melman , Giovanni Luca Gattobigio
IPC: G03F7/20
Abstract: An immersion lithography apparatus controller configured to control a positioner to move a support table to follow an exposure route and to control a liquid confinement structure, the controller configured to: predict whether liquid will be lost from an immersion space during at least one motion of the route in which an edge of the object passes under an edge of the immersion space, and if liquid loss from the immersion space is predicted, modify the fluid flow such that a first fluid flow rate into or out of an opening at a leading edge of the liquid confinement structure is different to a second fluid flow rate into or out of an opening at a trailing edge of the liquid confinement structure during the motion of predicted liquid loss or a motion of the route subsequent to the motion of predicted liquid loss.
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公开(公告)号：US11029607B2
公开(公告)日：2021-06-08
申请号：US16330544
申请日：2017-08-28
Applicant: ASML NETHERLANDS B.V.
Inventor： Pepijn Van Den Eijnden , Cornelius Maria Rops , Theodorus Wilhelmus Polet , Floor Lodewijk Keukens , Gheorghe Tanasa , Rogier Hendrikus Magdalena Cortie , Koen Cuypers , Harold Sebastiaan Buddenberg , Giovanni Luca Gattobigio , Evert Van Vliet , Nicolaas Ten Kate , Mark Johannes Hermanus Frencken , Jantien Laura Van Erve , Marcel Maria Cornelius Franciscus Teunissen
IPC: G03F7/20
Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.
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公开(公告)号：US09939740B2
公开(公告)日：2018-04-10
申请号：US15116794
申请日：2015-01-20
Applicant: ASML Netherlands B.V.
Inventor： Günes Nakiboglu , Martijn Van Baren , Frank Johannes Jacobus Van Boxtel , Koen Cuypers , Jeroen Gerard Gosen , Laurentius Johannes Adrianus Van Bokhoven
CPC classification number: G03F7/70858 , G03F7/70358 , G03F7/70716 , G03F7/70908
Abstract: A lithographic apparatus including a barrier system and a device manufacturing method using such a lithographic apparatus. The barrier system is used to maintain a protected volume of gas within a barrier. The protected volume may be maintained when different components of the lithographic apparatus move relative to each other. The barrier system may be used in different locations within the lithographic apparatus. The geometry of the barrier affects how efficiently the protected volume is maintained, especially at high speeds. The geometry reduces the amount of ambient gas entering the protected volume from outside the barrier.
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