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1.发明申请公开(公告)号：US20200041895A1
公开(公告)日：2020-02-06
申请号：US16339402
申请日：2017-09-18
Applicant: ASML NETHERLANDS B.V.
Inventor： Stef Marten Johan JANSSENS , Koen CUYPERS , Rogier Hendrikus Magdalena CORTIE , Sudhir SRIVASTAVA , Theodorus Johannes Antonius RENCKENS , Jeroen Gerard GOSEN , Erik Henricus Egidius Catharina EUMMELEN , Hendrikus Johannes SCHELLENS , Adrianus Marinus Wouter HEEREN , Bo LENSSEN
Abstract: A pressure control valve has: a passageway having a flow opening; an member displaceable relative to the opening for obstructing the opening by differing amounts; a piezo actuator; and a linkage mechanism adapted to amplify a dimensional change in the piezo actuator and to use the amplified dimensional change to displace the member relative to the opening, wherein the linkage mechanism comprises a frame attached to a wall and fixed at a first end in relation to the passageway, a portion of the frame moveable in a first direction while being substantially restrained in a second direction orthogonal to the first direction, the piezo actuator extending between the wall and the movable portion such that an expansion of the piezo actuator results in movement of the movable portion in the first direction by an amount greater than the expansion of the piezo actuator, the moveable portion connected to the member.
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公开(公告)号：US20220415678A1
公开(公告)日：2022-12-29
申请号：US17811047
申请日：2022-07-06
Applicant: ASML Netherlands B.V.
Inventor： Jeroen Gerard GOSEN , Te-Yu CHEN , Dennis Herman, Caspar VAN BANNING , Edwin Cornelis KADIJK , Martijn Petrus, Christianus VAN HEUMEN , Erheng WANG , Johannes Andreas, Henricus, Maria JACOBS
Abstract: An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including an improved load lock unit is disclosed. An improved load lock system may comprise a plurality of supporting structures configured to support a wafer and a conditioning plate including a heat transfer element configured to adjust a temperature of the wafer. The load lock system may further comprise a gas vent configured to provide a gas between the conditioning plate and the wafer and a controller configured to assist with the control of the heat transfer element.
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公开(公告)号：US20210132513A1
公开(公告)日：2021-05-06
申请号：US17054194
申请日：2019-05-22
Applicant: ASML NETHERLANDS B.V.
Inventor： Dennis Herman Caspar VAN BANNING , Jeroen Gerard GOSEN
IPC: G03F7/20 , H01J37/20 , H01J37/317
Abstract: An apparatus having: a vacuum chamber for enclosing an article support, the article support configured to support an article such that a volume is defined between the article support and the article, the article support including a plurality of supporting protrusions configured to provide a plane of support for the article; a conduit for providing a fluid to the volume such that the fluid provides heat transfer between the article and the article support; and a controller for controlling the fluid supply to the volume, wherein the controller is configured to control a fluid supply unit to start removing the fluid substantially at a time the article reaches a stable temperature.
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公开(公告)号：US20220075264A1
公开(公告)日：2022-03-10
申请号：US17524816
申请日：2021-11-12
Applicant: ASML NETHERLANDS B.V.
Inventor： Stef Marten Johan JANSSENS , Koen CUYPERS , Rogier Hendrikus Magdalena CORTIE , Sudhir SRIVASTAVA , Theodorus Johannes Antonius RENCKENS , Jeroen Gerard GOSEN , Erik Henricus Egidius Catharina EUMMELEN , Hendrikus Johannes SCHELLENS , Adrianus Marinus Wouter HEEREN , Bo LENSSEN
Abstract: A pressure control valve has: a passageway having a flow opening; an member displaceable relative to the opening for obstructing the opening by differing amounts; a piezo actuator; and a linkage mechanism adapted to amplify a dimensional change in the piezo actuator and to use the amplified dimensional change to displace the member relative to the opening, wherein the linkage mechanism comprises a frame attached to a wall and fixed at a first end in relation to the passageway, a portion of the frame moveable in a first direction while being substantially restrained in a second direction orthogonal to the first direction, the piezo actuator extending between the wall and the movable portion such that an expansion of the piezo actuator results in movement of the movable portion in the first direction by an amount greater than the expansion of the piezo actuator, the moveable portion connected to the member.
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公开(公告)号：US20230205101A1
公开(公告)日：2023-06-29
申请号：US17927348
申请日：2021-05-27
Applicant: ASML NETHERLANDS B.V.
Inventor： Luuc KEULEN , Jeroen Gerard GOSEN , Dennis Herman Caspar VAN BANNING , Sampann ARORA , Michaél Johannes Christiaan RONDE , Lucas KUINDERSMA , Youssef Karel Maria DE VOS , Henricus Martinus Johannes VAN DE GROES , Allard Eelco KOOIKER , Wouter Onno PRIL , Johan VAN GEND
IPC: G03F7/20
CPC classification number: G03F7/70933 , G03F7/70775 , G03F7/7085 , G03F7/70883 , G03F7/70725
Abstract: An apparatus for use in a metrology process or a lithographic process, the apparatus including: an object support module adapted to hold an object; and a first gas shower arranged on a first side of the object support module and adapted to emit a gas with a first velocity in a first gas direction which is a horizontal direction to cause a net gas flow in the apparatus to be a substantially horizontal gas flow in the first gas direction at least above the object support module.
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Patent Agency Ranking
6.发明申请公开(公告)号：US20220102106A1
公开(公告)日：2022-03-31
申请号：US17493837
申请日：2021-10-04
Applicant: ASML Netherlands B.V.
Abstract: An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including a thermal conditioning station for preconditioning a temperature of a wafer is disclosed. The charged particle beam apparatus may scan the wafer to measure one or more characteristics of the structures on the wafer and analyze the one or more characteristics. The charged particle beam apparatus may further determine a temperature characteristic of the wafer based on the analysis of the one or more characteristics of the structure and adjust the thermal conditioning station based on the temperature characteristic.
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公开(公告)号：US20200027763A1
公开(公告)日：2020-01-23
申请号：US16514843
申请日：2019-07-17
Applicant: ASML Netherlands B.V.
Inventor： Jeroen Gerard GOSEN , Te-Yu CHEN , Dennis Herman, Caspar VAN BANNING , Edwin Cornelis KADIJK , Martijn Petrus, Christianus VAN HEUMEN , Erheng WANG , Johannes Andreas, Henricus, Maria JACOBS
Abstract: An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including an improved load lock unit is disclosed. An improved load lock system may comprise a plurality of supporting structures configured to support a wafer and a conditioning plate including a heat transfer element configured to adjust a temperature of the wafer. The load lock system may further comprise a gas vent configured to provide a gas between the conditioning plate and the wafer and a controller configured to assist with the control of the heat transfer element.
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公开(公告)号：US20240258138A1
公开(公告)日：2024-08-01
申请号：US18423199
申请日：2024-01-25
Applicant: ASML Netherlands B.V.
Inventor： Jeroen Gerard GOSEN , Te-Yu CHEN , Dennis Herman, Caspar VAN BANNING , Edwin Cornelis KADIJK , Martijn Petrus, Christianus VAN HEUMEN , Erheng WANG , Johannes Andreas, Henricus, Maria JACOBS
CPC classification number: H01L21/67201 , G03F7/70841 , G03F7/70858 , H01L21/67098
Abstract: An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including an improved load lock unit is disclosed. An improved load lock system may comprise a plurality of supporting structures configured to support a wafer and a conditioning plate including a heat transfer element configured to adjust a temperature of the wafer. The load lock system may further comprise a gas vent configured to provide a gas between the conditioning plate and the wafer and a controller configured to assist with the control of the heat transfer element.
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9.发明公开公开(公告)号：US20240079202A1
公开(公告)日：2024-03-07
申请号：US18467642
申请日：2023-09-14
Applicant: ASML Netherlands B.V.
CPC classification number: H01J37/20 , H01L21/67288 , H01J2237/2001 , H01J2237/2814
Abstract: An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including a thermal conditioning station for preconditioning a temperature of a wafer is disclosed. The charged particle beam apparatus may scan the wafer to measure one or more characteristics of the structures on the wafer and analyze the one or more characteristics. The charged particle beam apparatus may further determine a temperature characteristic of the wafer based on the analysis of the one or more characteristics of the structure and adjust the thermal conditioning station based on the temperature characteristic.
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公开(公告)号：US20160349631A1
公开(公告)日：2016-12-01
申请号：US15116794
申请日：2015-01-20
Applicant: ASML NETHERLANDS B.V.
Inventor： Günes NAKIBOGLU , Martijn VAN BAREN , Frank Johannes Jacobs VAN BOXTEL , Koen CUYPERS , Jeroen Gerard GOSEN , Laurentius Johannes Adrianus VAN BOKHOVEN
IPC: G03F7/20
CPC classification number: G03F7/70858 , G03F7/70358 , G03F7/70716 , G03F7/70908
Abstract: A lithographic apparatus including a barrier system and a device manufacturing method using such a lithographic apparatus. The barrier system is used to maintain a protected volume of gas within a barrier. The protected volume may be maintained when different components of the lithographic apparatus move relative to each other. The barrier system may be used in different locations within the lithographic apparatus. The geometry of the barrier affects how efficiently the protected volume is maintained, especially at high speeds. The geometry reduces the amount of ambient gas entering the protected volume from outside the barrier.
Abstract translation: 包括屏障系统的光刻设备和使用这种光刻设备的设备制造方法。 屏障系统用于将受保护的气体体积维持在屏障内。 当光刻设备的不同部件相对于彼此移动时，可以保持受保护的体积。 屏障系统可用于光刻设备内的不同位置。 屏障的几何形状会影响保护体积的保持程度，尤其是在高速度下。 几何形状减少了从屏障外部进入受保护体积的环境气体的量。
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