Invention Application
- Patent Title: SYSTEM AND METHODS FOR THERMALLY CONDITIONING A WAFER IN A CHARGED PARTICLE BEAM APPARATUS
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Application No.: US17493837Application Date: 2021-10-04
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Publication No.: US20220102106A1Publication Date: 2022-03-31
- Inventor: Martijn Petrus Christianus VAN HEUMEN , Jeroen Gerard GOSEN
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Main IPC: H01J37/20
- IPC: H01J37/20 ; H01L21/67
Abstract:
An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including a thermal conditioning station for preconditioning a temperature of a wafer is disclosed. The charged particle beam apparatus may scan the wafer to measure one or more characteristics of the structures on the wafer and analyze the one or more characteristics. The charged particle beam apparatus may further determine a temperature characteristic of the wafer based on the analysis of the one or more characteristics of the structure and adjust the thermal conditioning station based on the temperature characteristic.
Public/Granted literature
- US11804358B2 System and methods for thermally conditioning a wafer in a charged particle beam apparatus Public/Granted day:2023-10-31
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