公开(公告)号：US20160349631A1

公开(公告)日：2016-12-01

申请号：US15116794

申请日：2015-01-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Günes NAKIBOGLU ,  Martijn VAN BAREN ,  Frank Johannes Jacobs VAN BOXTEL ,  Koen CUYPERS ,  Jeroen Gerard GOSEN ,  Laurentius Johannes Adrianus VAN BOKHOVEN

IPC: G03F7/20

CPC classification number: G03F7/70858 ,  G03F7/70358 ,  G03F7/70716 ,  G03F7/70908

Abstract: A lithographic apparatus including a barrier system and a device manufacturing method using such a lithographic apparatus. The barrier system is used to maintain a protected volume of gas within a barrier. The protected volume may be maintained when different components of the lithographic apparatus move relative to each other. The barrier system may be used in different locations within the lithographic apparatus. The geometry of the barrier affects how efficiently the protected volume is maintained, especially at high speeds. The geometry reduces the amount of ambient gas entering the protected volume from outside the barrier.

Abstract translation: 包括屏障系统的光刻设备和使用这种光刻设备的设备制造方法。 屏障系统用于将受保护的气体体积维持在屏障内。 当光刻设备的不同部件相对于彼此移动时，可以保持受保护的体积。 屏障系统可用于光刻设备内的不同位置。 屏障的几何形状会影响保护体积的保持程度，尤其是在高速度下。 几何形状减少了从屏障外部进入受保护体积的环境气体的量。

公开(公告)号：US20170052463A1

公开(公告)日：2017-02-23

申请号：US15306982

申请日：2015-03-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Gerardus Arnoldus Hendricus Franciscus JANSSEN ,  Martijn VAN BAREN

IPC: G03F7/20 ,  H01L21/67 ,  H01L21/677

CPC classification number: G03F7/70875 ,  G03F7/7075 ,  G03F7/708 ,  G03F7/70808 ,  G03F7/70841 ,  G03F7/70858 ,  G03F7/70866 ,  H01L21/67 ,  H01L21/6719 ,  H01L21/67196 ,  H01L21/67265 ,  H01L21/67742

Abstract: A substrate handling system includes: a thermal shield for thermally insulating a space through which a substrate passes, from a thermal load originating outside the space, the thermal shield including: a first wall and a second wall with a gap therebetween, the first wall positioned between the space and the second wall; an inlet opening configured to allow a flow of gas from a gas source to enter the gap from outside the space; and an outlet opening configured to allow the flow of gas to exit the gap to outside of the space, wherein the system is configured to direct the flow of gas to enter the gap through the inlet opening, to flow through the gap and out of the gap to outside the space through the outlet opening thereby to reduce thermal fluctuations in the space due to the thermal load originating outside the space.

Abstract translation: 一种基板处理系统，包括：热屏蔽件，用于将基板通过的空间从发生在该空间外部的热负载热绝缘，所述热屏蔽包括：第一壁和第二壁，其间具有间隙，所述第一壁定位 在空间和第二个墙之间; 入口开口，其构造成允许来自气体源的气体流从所述空间外部进入所述间隙; 以及出口开口，其构造成允许气体流动离开所述间隙到所述空间的外部，其中所述系统被配置为引导气体流通过所述入口开口进入所述间隙，以流过所述间隙并离开所述间隙 通过出口开口到空间外部的间隙，由此由于源自空间外的热负荷而减小空间中的热波动。