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    Processing Facility for Manufacturing Integrated Circuits from Semiconductor Wafers as well as Perforated Panel for a Processing Facility
    5.
    发明申请
    Processing Facility for Manufacturing Integrated Circuits from Semiconductor Wafers as well as Perforated Panel for a Processing Facility 审中-公开
    用于制造半导体晶片的集成电路的处理设备以及用于处理设备的穿孔面板

    公开(公告)号：US20170073978A1

    公开(公告)日：2017-03-16

    申请号：US15264655

    申请日：2016-09-14

    申请人： M+W Group GmbH

    发明人： Hartmut Schneider ,  Freyja Eberle ,  Steffen Köhler ,  Peter Csatary ,  Herbert Blaschitz

    IPC分类号： E04F15/02 ,  E04H5/02

    CPC分类号： E04F15/02177 ,  E04B5/43 ,  E04B5/48 ,  E04F2290/02 ,  E04H5/02 ,  G03F7/702 ,  G03F7/708 ,  G03F7/70991 ,  H01L21/67225

    摘要： A processing facility for manufacturing integrated circuits on semiconductor wafers is provided with at least one radiation generator that generates an EUV (extreme ultraviolet) radiation that is supplied to at least one lithography machine, housed in a factory building, for exposure of the semiconductor wafers. The radiation generator is housed in a building or a building section separate from the factory building. At least one beam guide extends from the building or the building section to the factory building, wherein the EUV radiation is supplied from the building or the building section through the at least one beam guide to the factory building. At least one supply line branches off at an obtuse angle from the at least one beam guide inside the factory building, wherein at least a portion of the EUV radiation is supplied through the at least one supply line to the lithography machine.

    摘要翻译： 一种用于在半导体晶片上制造集成电路的处理设备设置有至少一个辐射发生器，该辐射发生器产生供给至少一个光刻机的EUV（极紫外）辐射，该光刻机容纳在工厂建筑物中，用于暴露半导体晶片。 辐射发生器安装在与工厂大楼分开的建筑物或建筑物中。 至少一个梁导向件从建筑物或建筑部分延伸到工厂建筑物，其中EUV辐射从建筑物或建筑部分通过至少一个梁导向器供应到工厂建筑物。 至少一个供应线与工厂建筑物内的至少一个梁导向件以钝角分支，其中EUV辐射的至少一部分通过至少一个供应管线供应到光刻机。

    Apparatus for protecting extreme ultra violet mask and extreme ultra violet exposure apparatus including the same
    6.
    发明授权
    Apparatus for protecting extreme ultra violet mask and extreme ultra violet exposure apparatus including the same 有权
    用于保护极紫外线掩膜和包括其的极紫外曝光设备的装置

    公开(公告)号：US09575421B2

    公开(公告)日：2017-02-21

    申请号：US14692919

    申请日：2015-04-22

    申请人： SAMSUNG ELECTRONICS CO., LTD.

    发明人： Myung-soo Hwang ,  Joo-on Park ,  Chang-min Park

    IPC分类号： G03F7/20 ,  G03F1/00 ,  G03F1/62 ,  G03F1/66

    CPC分类号： G03F7/70983 ,  G03F1/14 ,  G03F1/142 ,  G03F1/62 ,  G03F1/66 ,  G03F7/70733 ,  G03F7/708 ,  G03F7/70808 ,  G03F7/70908

    摘要： An apparatus for protecting an extreme ultra violet (EUV) mask includes an EUV pellicle that allows EUV light to be radiated through the EUV pellicle onto the EUV mask, the EUV pellicle having a size corresponding to a size of a slit limiting the EUV light to a predetermined portion of the EUV mask, a flexible blocking film at opposite sides of the EUV pellicle in a first direction, the first direction being a scan direction of an exposure apparatus, and a roller unit including a first roller and a second roller, a first portion of the flexible blocking film being wound around the first roller at a first side of the EUV pellicle, and a second portion of the flexible blocking film being wound around the second roller at a second side of the EUV pellicle.

    摘要翻译： 用于保护极端紫外线（EUV）掩模的装置包括EUV防护薄膜，其允许EUV光通过EUV防护薄膜辐射到EUV掩模上，EUV防护薄膜的尺寸对应于限制EUV光的狭缝的尺寸 EUV掩模的预定部分，在第一方向上的EUV防护薄膜的相对侧处的柔性阻挡膜，第一方向是曝光装置的扫描方向，以及包括第一辊和第二辊的辊单元， 所述柔性阻挡膜的第一部分在所述EUV防护薄膜组件的第一侧围绕所述第一辊缠绕，并且所述柔性阻挡膜的第二部分围绕所述第二辊缠绕在所述EUV防护薄膜的第二侧。

    OPERATING METHOD FOR INSPECTING EQUIPMENT
    8.
    发明申请
    OPERATING METHOD FOR INSPECTING EQUIPMENT 审中-公开
    检查设备的操作方法

    公开(公告)号：US20160210028A1

    公开(公告)日：2016-07-21

    申请号：US14996282

    申请日：2016-01-15

    申请人： MPI Corporation

    发明人： Stojan Kanev ,  Yung-Chin Liu ,  Andrej Rumiantsev ,  YAO-CHUAN CHIANG

    IPC分类号： G06F3/0484 ,  G06F3/0488 ,  G06F3/041

    CPC分类号： G06F3/04845 ,  G01N21/9501 ,  G01R31/2808 ,  G03F7/7065 ,  G03F7/708 ,  G06F3/0412 ,  G06F3/04847 ,  G06F3/04883 ,  G06F2203/04806

    摘要： The instant disclosure provides an operating method of inspecting equipment, with the method applicable to semiconductor inspecting equipment having a movable element. The method includes: displaying a wafer graphic by a touch display; detecting a touch signal generated by the touch display; detecting the magnification of the wafer graphic when the touch signal is generated; and determining the moving speed of the movable element based on the magnification of the wafer graphic when the touch signal is generated. In addition, the moving direction of the movable element can be determined according to the touch signal. Through the instant disclosure, the operator can more intuitively operate each movable element of semiconductor inspecting equipment.

    摘要翻译： 本公开提供了一种可用于具有可移动元件的半导体检查设备的方法来检查设备的操作方法。 该方法包括：通过触摸显示器显示晶片图形; 检测由所述触摸显示器产生的触摸信号; 当生成触摸信号时检测晶片图形的放大率; 以及当产生所述触摸信号时，基于所述晶片图形的放大率来确定所述可移动元件的移动速度。 此外，可以根据触摸信号来确定可移动元件的移动方向。 通过本公开，操作者可以更直观地操作半导体检查设备的每个可移动元件。

    Exposure apparatus, exposure method, and method for producing device
    9.
    发明授权
    Exposure apparatus, exposure method, and method for producing device 有权
    曝光装置，曝光方法和制造装置的方法

    公开(公告)号：US09348239B2

    公开(公告)日：2016-05-24

    申请号：US14286332

    申请日：2014-05-23

    申请人： NIKON CORPORATION

    发明人： Hiroyuki Nagasaka

    IPC分类号： G03B27/52 ,  G03B27/42 ,  G03F7/20

    CPC分类号： G03F7/70733 ,  G03F7/70341 ,  G03F7/708 ,  G03F7/7095

    摘要： An exposure apparatus includes a projection system having a final element that projects exposure light to an upper surface of a substrate through liquid between the final element and the substrate. A liquid confinement member has a recovery outlet, via which the liquid is removed along with gas, arranged such that the upper surface of the substrate faces the recovery outlet, and the recovery outlet surrounds a path of the exposure light. The liquid confinement member confines the liquid to an area smaller than an area of the upper surface of the substrate by removing the liquid via the recovery outlet from a gap between the liquid confinement member and the upper surface of the substrate. A first support member supports the projection system, and a second support member supports the liquid confinement member, wherein the projection system is isolated from vibrations of the liquid confinement member.

    摘要翻译： 曝光装置包括具有最终元件的投影系统，该最终元件通过最终元件和基板之间的液体将曝光光投射到基板的上表面。 液体限制构件具有回收出口，液体与气体一起被除去，排列成使得衬底的上表面面向回收出口，并且回收出口围绕曝光光的路径。 液体限制构件通过从液体限制构件和衬底的上表面之间的间隙经由回收口排出液体，将液体限制在小于衬底上表面区域的区域。 第一支撑构件支撑投影系统，第二支撑构件支撑液体限制构件，其中投影系统与液体限制构件的振动隔离。

    Target processing unit
    10.
    发明授权
    Target processing unit 有权
    目标处理单元

    公开(公告)号：US09263234B2

    公开(公告)日：2016-02-16

    申请号：US14479648

    申请日：2014-09-08

    申请人： Mapper Lithography IP B.V.

    发明人： Johan Joost Koning ,  David Johannes van den Bergen

    IPC分类号： H01J37/10 ,  H01J37/30 ,  G03F7/20 ,  H01J37/20 ,  H01J37/317 ,  B01J19/12

    CPC分类号： H01J37/023 ,  B01J19/12 ,  G03F7/708 ,  G03F7/70825 ,  G03F7/70833 ,  G03F7/70891 ,  G03F7/709 ,  G03F7/70975 ,  H01J37/10 ,  H01J37/20 ,  H01J37/3007 ,  H01J37/3177

    摘要： The invention relates to a projection lens assembly for directing a beam toward a target. This assembly includes a lens support body (52) that spans a plane (P), and has a connection region (58) and a lateral edge (56). The lens support body is arranged for insertion into a frame (42) of a processing unit along an insertion direction (X) parallel with the plane (P). The projection lens assembly includes conduits (60-64) emanating from the connection region, and a conduit guiding body (70-81) for accommodating the conduits. The guiding body includes a first guiding portion (72) for guiding the conduits from the connection region, along the plane to a lateral region (B) beyond the lateral edge. The guiding body also includes a second guiding portion (78) for guiding the conduits from the lateral region (B) toward a tilted edge (79) of the conduit guiding body.

    摘要翻译： 本发明涉及一种用于将光束导向目标的投影透镜组件。 该组件包括跨越平面（P）的透镜支撑体（52），并且具有连接区域（58）和侧边缘（56）。 透镜支撑体被布置成沿着与平面（P）平行的插入方向（X）插入到处理单元的框架（42）中。 投影透镜组件包括从连接区域发出的导管（60-64）和用于容纳导管的导管引导体（70-81）。 引导体包括用于将管道从连接区域沿着该平面引导到超过侧边缘的横向区域（B）的第一引导部分（72）。 引导体还包括用于将导管从侧向区域（B）引导到导管引导体的倾斜边缘（79）的第二引导部分（78）。