公开(公告)号：US20190243257A1

公开(公告)日：2019-08-08

申请号：US16343425

申请日：2017-09-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Tiannan GUAN ,  Jingshi LI ,  Miao YU

IPC: G03F7/20

CPC classification number: G03F7/70783 ,  G03F7/70708 ,  G03F7/70716 ,  G03F7/708 ,  G03F7/70825 ,  G03F7/7085 ,  G03F7/70875

Abstract: A method of measuring wear of a substrate holder that is configured to hold a production substrate, the method includes: clamping a measurement substrate to the substrate holder; and measuring strain in the measurement substrate to generate a measurement result. The measurement substrate may have a body having dimensions similar to that of the production substrate; and a strain sensor in the body configured to measure strain in a peripheral portion of the measurement substrate.

公开(公告)号：US20180308740A1

公开(公告)日：2018-10-25

申请号：US15766740

申请日：2016-09-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Satish ACHANTA ,  Tiannan GUAN ,  Raymond Wilhelmus Louis LAFARRE ,  Ilya MALAKHOVSKY ,  Bas Johannes Petrus ROSET ,  Siegfried Alexander TROMP ,  Johannes Petrus Martinus Bernardus VERMEULEN

IPC: H01L21/687 ,  G03F7/20 ,  G03F7/00

CPC classification number: H01L21/68742 ,  G03F7/0002 ,  G03F7/707 ,  G03F7/70708 ,  G03F7/70716 ,  G03F7/70725 ,  G03F7/70733 ,  G03F7/70783 ,  H01L21/683 ,  H01L21/6831 ,  H01L21/687 ,  H01L21/6875

Abstract: A substrate table to support a substrate, the substrate table including a main body, burls extending from the main body and having first upper ends that define a support surface to support the substrate, and support pins having second upper ends. The support pins are movable between a retracted position and an extended position. The support pins are arranged to support the substrate in the extended position. The support pins are arranged to be switched to a first stiffness mode and a second stiffness mode. In the first stiffness mode, the support pins have a first stiffness in a direction parallel to the support surface. In the second stiffness mode, the support pins have a second stiffness in the direction parallel to the support surface. The first stiffness is different from the second stiffness.

公开(公告)号：US20250021022A1

公开(公告)日：2025-01-16

申请号：US18682883

申请日：2021-07-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Tiannan GUAN ,  Zhuangxiong HUANG ,  Johannes Bernardus Charles ENGELEN ,  Günes NAKIBOGLU ,  Matthias KRUIZINGA ,  Petrus Jacobus Maria VAN GILS ,  Aldo TRALLI ,  Sjoerd Frans DE VRIES ,  Marcel Maria Cornelius Franciscus TEUNISSEN ,  Richard Joseph BRULS ,  Frits VAN DER MEULEN

IPC: G03F7/00

Abstract: The invention relates to an electrostatic holder comprising: a body, and a clamping element attached to the body, said clamping element comprising an electrode for applying an attractive force between the clamping element and a first to be clamped object, wherein an outer edge of the body is configured to provide a gap between the outer edge of the body and the first to be clamped object, which gap is configured for outputting a fluid for reducing dust particles reaching the first to be clamped object or a second to be clamped object on an opposite side of the holder.

公开(公告)号：US20210263418A1

公开(公告)日：2021-08-26

申请号：US17260649

申请日：2019-06-27

Applicant: ASML NETHERLANDS B.V.

Inventor： Bert Dirk SCHOLTEN ,  Peter Andreas Maria BILLEKENS ,  Tiannan GUAN ,  Tjarco LINDEIJER ,  Harold Anton MEHAGNOUL ,  Jimmy Matheus Wilhelmus VAN DE WINKEL ,  Cas Johannes Petrus Maria VAN NUENEN ,  Hendrikus Theodorus Jacobus Franciscus VAN VERSEVELD ,  Marcus Martinus Petrus Adrianus VERMEULEN

IPC: G03F7/20 ,  B24B37/14 ,  B24B37/16

Abstract: A tool for modifying substrate support elements of a substrate holder, the substrate support elements having support surfaces for supporting a substrate, the tool includes a main body having a main body surface, and multiple protrusions from the main body surface, the multiple protrusions having distal ends configured to contact the support surfaces to modify the substrate support elements. Furthermore, a lithographic apparatus and a method comprising such a tool are provided.

公开(公告)号：US20190086202A1

公开(公告)日：2019-03-21

申请号：US15769999

申请日：2016-10-25

Applicant: ASML NETHERLANDS B.V.

Inventor： Tiannan GUAN ,  Joseph Eid, Estafanous ZEKRY

IPC: G01B13/12 ,  G01L11/02 ,  G03F9/00

CPC classification number: G01B13/12 ,  G01L11/02 ,  G01L11/025 ,  G03F9/7057

Abstract: A gas gauge proximity sensor comprising a measurement gas flow channel having an optical pressure sensor for comparing a pressure of the first gas flow and a reference pressure; the optical pressure sensor comprising a first optical cavity fluidly connected to the measurement channel and a second optical cavity fluidly connected to the reference pressure, with the optical cavities being configured to receive electromagnetic radiation and output reflected electromagnetic radiation, the optical pressure sensor further being configured to combine the reflected electromagnetic radiation from the first optical cavity with the reflected electromagnetic radiation from the second optical cavity and determine, based on the combined electromagnetic radiation, a pressure difference between the pressure of the first gas flow and the reference pressure and determine, based on the pressure difference, a distance between the measurement outlet and the measurement object.