-
公开(公告)号：US20160126055A1
公开(公告)日：2016-05-05
申请号：US14992049
申请日：2016-01-11
CPC分类号： H01J37/023 , B01J19/12 , G03F7/708 , G03F7/70825 , G03F7/70833 , G03F7/70891 , G03F7/709 , G03F7/70975 , H01J37/10 , H01J37/20 , H01J37/3007 , H01J37/3177
摘要： The invention relates to a target processing unit (10) comprising a vacuum chamber (30) for accommodating a target to be processed, a projection column (46) within the vacuum chamber for generating a beam and projecting the beam towards the target, and a first conduit arrangement (26,36,37,60) for connecting the projection column to external equipment (22). The vacuum chamber can comprise a positioning system (114) for supporting the target, and a second conduit arrangement (110) distinct from the first conduit arrangement for connecting the positioning system to external equipment, wherein the positioning system is moveably arranged with respect to the projection column, and wherein the positioning system and the projection column occupy spatially distinct portions of the vacuum chamber. The first conduit arrangement extends through an upper side of the vacuum chamber, and the second conduit arrangement extends through a lower side of the vacuum chamber.
摘要翻译： 本发明涉及一种目标处理单元（10），其包括用于容纳待处理目标物的真空室（30），真空室内的用于产生光束并将光束朝向目标物投影的突出柱（46），以及 用于将投影柱连接到外部设备（22）的第一导管装置（26,36,37,60）。 真空室可以包括用于支撑靶的定位系统（114）和与第一导管装置不同的第二导管装置（110），用于将定位系统连接到外部设备，其中定位系统可相对于 投影柱，并且其中定位系统和投影柱占据真空室的空间上不同的部分。 第一导管装置延伸穿过真空室的上侧，第二导管装置延伸穿过真空室的下侧。
-
公开(公告)号：US20150069259A1
公开(公告)日：2015-03-12
申请号：US14477769
申请日：2014-09-04
CPC分类号： G21K1/093 , G21K1/087 , H01F2007/068 , H01J37/1475 , H01J37/3177 , H01J2237/1526 , H01J2237/31774
摘要： The invention relates to a charged particle optical device for manipulating a trajectory of multiple beamlets of charged particles. Said charged particle optical device comprising an electromagnetic deflector comprising a planar substrate having an upper side and a lower side of said substrate, and an even thickness. The substrate comprises: a through opening for passing said beamlets there through, wherein said through opening debouches in the upper and lower side of said substrate; a first and a second coil, wherein each of said coils preferably is a substantially helical coil and comprises conducting upper leads arranged at the upper side, conducting lower leads arranged at the lower side, and vias extending through said substrate and which conductively connect one of said upper leads with one of said lower leads for forming said coil; wherein said first and second coils are arranged on either side of the through opening.
摘要翻译： 本发明涉及一种用于操纵带电粒子的多个子束的轨迹的带电粒子光学装置。 所述带电粒子光学器件包括电磁偏转器，该电磁偏转器包括具有所述基底的上侧和下侧的平面基底和均匀的厚度。 基板包括：用于使所述子束通过的通孔，其中所述通孔在所述基板的上侧和下侧消失; 第一和第二线圈，其中每个所述线圈优选地是基本上螺旋形的线圈，并且包括导通布置在上侧的上引线，导电布置在下侧的下引线，以及延伸穿过所述基板的通孔，并且导电地连接 所述上引线与所述下导线之一形成所述线圈; 其中所述第一和第二线圈布置在所述通孔的任一侧上。
-
公开(公告)号：US09263234B2
公开(公告)日：2016-02-16
申请号：US14479648
申请日：2014-09-08
CPC分类号： H01J37/023 , B01J19/12 , G03F7/708 , G03F7/70825 , G03F7/70833 , G03F7/70891 , G03F7/709 , G03F7/70975 , H01J37/10 , H01J37/20 , H01J37/3007 , H01J37/3177
摘要： The invention relates to a projection lens assembly for directing a beam toward a target. This assembly includes a lens support body (52) that spans a plane (P), and has a connection region (58) and a lateral edge (56). The lens support body is arranged for insertion into a frame (42) of a processing unit along an insertion direction (X) parallel with the plane (P). The projection lens assembly includes conduits (60-64) emanating from the connection region, and a conduit guiding body (70-81) for accommodating the conduits. The guiding body includes a first guiding portion (72) for guiding the conduits from the connection region, along the plane to a lateral region (B) beyond the lateral edge. The guiding body also includes a second guiding portion (78) for guiding the conduits from the lateral region (B) toward a tilted edge (79) of the conduit guiding body.
摘要翻译： 本发明涉及一种用于将光束导向目标的投影透镜组件。 该组件包括跨越平面（P）的透镜支撑体（52），并且具有连接区域（58）和侧边缘（56）。 透镜支撑体被布置成沿着与平面（P）平行的插入方向（X）插入到处理单元的框架（42）中。 投影透镜组件包括从连接区域发出的导管（60-64）和用于容纳导管的导管引导体（70-81）。 引导体包括用于将管道从连接区域沿着该平面引导到超过侧边缘的横向区域（B）的第一引导部分（72）。 引导体还包括用于将导管从侧向区域（B）引导到导管引导体的倾斜边缘（79）的第二引导部分（78）。
-
4.发明申请公开(公告)号：US20170304878A1
公开(公告)日：2017-10-26
申请号：US15135138
申请日：2016-04-21
发明人： Marc Smits , Johan Joost Koning , Chris Franciscus Jessica Lodewijk , Hindrik Willem Mook , Ludovic Lattard
IPC分类号： B08B7/04 , B08B17/02 , H01J37/147 , H01J37/18
CPC分类号： B08B7/04 , B08B17/02 , H01J37/02 , H01J37/1472 , H01J37/18 , H01J37/3177 , H01J2237/006 , H01J2237/022 , H01J2237/0435 , H01J2237/0453 , H01J2237/0492
摘要： A charged particle beam system is disclosed, comprising: a charged particle beam generator for generating a beam of charged particles; a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; a source for providing a cleaning agent; a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element; wherein the charged particle optical element comprises: a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element, wherein the vent hole has a cross section which is larger than a cross section of the charged particle transmitting aperture.Further, a method for preventing or removing contamination in the charged particle transmitting apertures is disclosed, comprising the step of introducing the cleaning agent while the beam generator is active.
-
公开(公告)号：US20150090895A1
公开(公告)日：2015-04-02
申请号：US14479648
申请日：2014-09-08
CPC分类号： H01J37/023 , B01J19/12 , G03F7/708 , G03F7/70825 , G03F7/70833 , G03F7/70891 , G03F7/709 , G03F7/70975 , H01J37/10 , H01J37/20 , H01J37/3007 , H01J37/3177
摘要： The invention relates to a projection lens assembly for directing a beam toward a target. This assembly includes a lens support body (52) that spans a plane (P), and has a connection region (58) and a lateral edge (56). The lens support body is arranged for insertion into a frame (42) of a processing unit along an insertion direction (X) parallel with the plane (P). The projection lens assembly includes conduits (60-64) emanating from the connection region, and a conduit guiding body (70-81) for accommodating the conduits. The guiding body includes a first guiding portion (72) for guiding the conduits from the connection region, along the plane to a lateral region (B) beyond the lateral edge. The guiding body also includes a second guiding portion (78) for guiding the conduits from the lateral region (B) toward a tilted edge (79) of the conduit guiding body.
摘要翻译： 本发明涉及一种用于将光束导向目标的投影透镜组件。 该组件包括跨越平面（P）的透镜支撑体（52），并具有连接区域（58）和侧边缘（56）。 透镜支撑体被布置成沿着与平面（P）平行的插入方向（X）插入到处理单元的框架（42）中。 投影透镜组件包括从连接区域发出的导管（60-64）和用于容纳导管的导管引导体（70-81）。 引导体包括用于将导管从连接区域沿着该平面引导到超过侧边缘的横向区域（B）的第一引导部分（72）。 引导体还包括用于将管道从侧向区域（B）引导到导管引导体的倾斜边缘（79）的第二引导部分（78）。
-
6.发明授权公开(公告)号：US09981293B2
公开(公告)日：2018-05-29
申请号：US15135138
申请日：2016-04-21
发明人： Marc Smits , Johan Joost Koning , Chris Franciscus Jessica Lodewijk , Hindrik Willem Mook , Ludovic Lattard
IPC分类号： G01F23/00 , B08B7/04 , H01J37/18 , H01J37/147 , B08B17/02
CPC分类号： B08B7/04 , B08B17/02 , H01J37/02 , H01J37/1472 , H01J37/18 , H01J37/3177 , H01J2237/006 , H01J2237/022 , H01J2237/0435 , H01J2237/0453 , H01J2237/0492
摘要： A charged particle beam system is disclosed, comprising: a charged particle beam generator for generating a beam of charged particles; a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; a source for providing a cleaning agent; a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element; wherein the charged particle optical element comprises: a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element, wherein the vent hole has a cross section which is larger than a cross section of the charged particle transmitting aperture. Further, a method for preventing or removing contamination in the charged particle transmitting apertures is disclosed, comprising the step of introducing the cleaning agent while the beam generator is active.
-
公开(公告)号：USRE46452E1
公开(公告)日：2017-06-27
申请号：US14302522
申请日：2014-06-12
CPC分类号： H01J37/12 , B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J37/3177 , H01J2237/004 , H01J2237/0203 , H01J2237/03 , H01J2237/04924 , Y10T29/49
摘要： An electrostatic lens comprising a first conductive plate with a first aperture, a second conductive plate with a second aperture, the second aperture being substantially aligned with the first aperture, a voltage supply for supplying a first voltage to the first conductive plate and a second voltage to the second conductive plate, the first voltage being lower than the second voltage, and an insulating structure for separating the first conductive plate from the second conductive plate. The insulating structure comprises a first portion in contact with the first conductive plate and a second portion in contact with the second conductive plate, the first portion having an overhanging portion and the second portion having an indented portion at an edge of the insulating structure, so that a gap is formed between the overhanging portion and the second conductive plate.
-
公开(公告)号：US09111657B2
公开(公告)日：2015-08-18
申请号：US14477769
申请日：2014-09-04
IPC分类号： G21K1/08 , H01J37/147 , G21K1/093 , G21K1/087 , H01J37/317 , H01F7/06
CPC分类号： G21K1/093 , G21K1/087 , H01F2007/068 , H01J37/1475 , H01J37/3177 , H01J2237/1526 , H01J2237/31774
摘要： The invention relates to a charged particle optical device for manipulating a trajectory of multiple beamlets of charged particles. Said charged particle optical device comprising an electromagnetic deflector comprising a planar substrate having an upper side and a lower side of said substrate, and an even thickness. The substrate comprises: a through opening for passing said beamlets there through, wherein said through opening debouches in the upper and lower side of said substrate; a first and a second coil, wherein each of said coils preferably is a substantially helical coil and comprises conducting upper leads arranged at the upper side, conducting lower leads arranged at the lower side, and vias extending through said substrate and which conductively connect one of said upper leads with one of said lower leads for forming said coil; wherein said first and second coils are arranged on either side of the through opening.
摘要翻译： 本发明涉及一种用于操纵带电粒子的多个子束的轨迹的带电粒子光学装置。 所述带电粒子光学器件包括电磁偏转器，该电磁偏转器包括具有所述基底的上侧和下侧的平面基底和均匀的厚度。 基板包括：用于使所述子束通过的通孔，其中所述通孔在所述基板的上侧和下侧消失; 第一和第二线圈，其中每个所述线圈优选地是基本上螺旋形的线圈，并且包括导通布置在上侧的上引线，导电布置在下侧的下引线和穿过所述基板的通孔，并且导电地连接 所述上引线与所述下导线之一形成所述线圈; 其中所述第一和第二线圈布置在所述通孔的任一侧上。
-
公开(公告)号：US09941093B2
公开(公告)日：2018-04-10
申请号：US14992049
申请日：2016-01-11
CPC分类号： H01J37/023 , B01J19/12 , G03F7/708 , G03F7/70825 , G03F7/70833 , G03F7/70891 , G03F7/709 , G03F7/70975 , H01J37/10 , H01J37/20 , H01J37/3007 , H01J37/3177
摘要： The invention relates to a target processing unit (10) comprising a vacuum chamber (30) for accommodating a target to be processed, a projection column (46) within the vacuum chamber for generating a beam and projecting the beam towards the target, and a first conduit arrangement (26,36,37,60) for connecting the projection column to external equipment (22). The vacuum chamber can comprise a positioning system (114) for supporting the target, and a second conduit arrangement (110) distinct from the first conduit arrangement for connecting the positioning system to external equipment, wherein the positioning system is moveably arranged with respect to the projection column, and wherein the positioning system and the projection column occupy spatially distinct portions of the vacuum chamber. The first conduit arrangement extends through an upper side of the vacuum chamber, and the second conduit arrangement extends through a lower side of the vacuum chamber.
-
公开(公告)号：US08987679B2
公开(公告)日：2015-03-24
申请号：US13722873
申请日：2012-12-20
CPC分类号： H01J3/18 , H01J37/12 , H01J37/3007 , H01J37/3177 , H01J2237/1205 , H01J2237/15
摘要： The present invention relates to a projection lens assembly module for directing a multitude of charged particle beamlets onto an image plane located in a downstream direction, and a method for assembling such a projection lens assembly. In particular the present invention discloses a modular projection lens assembly with enhanced structural integrity and/or increased placement precision of its most downstream electrode.
摘要翻译： 本发明涉及一种用于将多个带电粒子子束引导到位于下游方向的图像平面上的投影透镜组合模块，以及用于组装这种投影透镜组件的方法。 特别地，本发明公开了一种具有增强的结构完整性和/或其最下游电极的放置精度提高的模块化投影透镜组件。
-
-
-
-
-
-
-
-
-
搜索结果
10 条记录 (耗时 0.018 秒)
