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2930 条记录 (耗时 0.022 秒)

    Drawing apparatus and deflector
    2.
    发明授权
    Drawing apparatus and deflector 有权

    公开(公告)号：US12009174B2

    公开(公告)日：2024-06-11

    申请号：US17651278

    申请日：2022-02-16

    申请人： NUFLARE TECHNOLOGY, INC.

    发明人： Kazuhiro Kishi ,  Munehiro Ogasawara

    IPC分类号： H01J37/04 ,  H01J37/26 ,  H01J37/317

    CPC分类号： H01J37/045 ,  H01J37/3174 ,  H01J37/26 ,  H01J2237/0435

    摘要： A blanking deflector according to an embodiment includes: a first electrode comprising a first insulator, a first material film coating all surfaces of the first insulator and having lower resistance than the first insulator, and a first low-resistance film coating part or all of surfaces of the first material film and having lower resistance than the first material film; and a second electrode comprising a second insulator, a second material film coating all surfaces of the second insulator and having lower resistance than the second insulator, and a second low-resistance film coating part or all of surfaces of the second material film and having lower resistance than the second material film, wherein the blanking deflector controls whether to irradiate a specimen with a charged particle beam by causing the charged particle beam to pass between the first electrode and the second electrode.

    Charged particle beam writing device and charged particle beam writing method
    6.
    发明授权
    Charged particle beam writing device and charged particle beam writing method 有权

    公开(公告)号：US11854764B2

    公开(公告)日：2023-12-26

    申请号：US17654834

    申请日：2022-03-15

    申请人： NuFlare Technology, Inc.

    发明人： Junpei Yasuda ,  Naoto Wakui

    IPC分类号： H01J37/147 ,  H01J37/317

    CPC分类号： H01J37/3174 ,  H01J37/147

    摘要： In one embodiment, a charged particle beam writing device writes sequentially patterns to a plurality of deflection positions on a target object by deflecting a charged particle beam by a deflector. The device includes a storage storing relation information indicating a relationship between a time elapsed since a start of deflection by the deflector and an amount of position shift in a shot position to which the charged particle beam is shot, a shot position corrector obtaining a first amount of position shift corresponding to an n-th (where n is an integer greater than or equal to 2) deflection position in sequential pattern writing and a second amount of position shift corresponding to an n−1-th deflection position by using by using a settling time and a shot time of the deflector and the relation information, obtaining an amount of position correction by adding up the first amount of position shift and the second amount of position shift, and correcting a shot position, and a writer emitting the charged particle beam to the n-th deflection position by using the shot data for which the shot position has been corrected, and writing a pattern.

    Light modulated electron source
    9.
    发明授权
    Light modulated electron source 有权

    公开(公告)号：US11715615B2

    公开(公告)日：2023-08-01

    申请号：US17858943

    申请日：2022-07-06

    申请人： KLA Corporation

    发明人： Edgardo Garcia Berrios ,  J. Joseph Armstrong ,  Yinying Xiao-Li ,  John Fielden ,  Yung-Ho Alex Chuang

    IPC分类号： H01J1/304 ,  H01J3/02 ,  H01J37/073 ,  H01J35/06 ,  H01J37/28 ,  H01J37/317

    CPC分类号： H01J1/3044 ,  H01J3/022 ,  H01J37/073 ,  H01J35/065 ,  H01J37/28 ,  H01J37/3174

    摘要： A light modulated electron source utilizes a photon-beam source to modulate the emission current of an electron beam emitted from a silicon-based field emitter. The field emitter's cathode includes a protrusion fabricated on a silicon substrate and having an emission tip covered by a coating layer. An extractor generates an electric field that attracts free electrons toward the emission tip for emission as part of the electron beam. The photon-beam source generates a photon beam including photons having an energy greater than the bandgap of silicon, and includes optics that direct the photon beam onto the emission tip, whereby each absorbed photon creates a photo-electron that combines with the free electrons to enhance the electron beam's emission current. A controller modulates the emission current by controlling the intensity of the photon beam applied to the emission tip. A monitor measures the electron beam and provides feedback to the controller.