专利检索 ap:("NUFLARE TECHNOLOGY, INC.") AND inv:"Shunji Shinkawa" 第 1 页

1.

发明授权
Electron beam writing apparatus and cathode life span prediction method 有权

公开(公告)号：US11749491B2

公开(公告)日：2023-09-05

申请号：US17577630

申请日：2022-01-18

申请人： NUFLARE TECHNOLOGY, INC.

发明人： Satoshi Nakahashi , Nobuo Miyamoto , Takahito Nakayama , Shunji Shinkawa

IPC分类号： H01J37/073 , H01J37/317

CPC分类号： H01J37/073 , H01J37/3174 , H01J2237/06333

摘要： An electron beam writing apparatus comprising, a cathode configured to emit an electron beam, a condition controller configured to change a condition under which the electron beam is emitted from the cathode in a plurality of ways, and a prediction unit configured to predict a life span of the cathode based on a temporal change in an amount of fluctuation of a beam characteristic of the electron beam to a change in the condition when the condition is changed.