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    Electron Gun, Electron Beam Applying Device, and Irradiation Position Shifting Method
    1.
    发明公开
    Electron Gun, Electron Beam Applying Device, and Irradiation Position Shifting Method 审中-公开

    公开(公告)号：US20240222062A1

    公开(公告)日：2024-07-04

    申请号：US18556076

    申请日：2022-03-25

    Applicant: Photo electron Soul, Inc.

    Inventor： Tomohiro NISHITANI

    IPC: H01J37/147 ,  H01J1/34 ,  H01J37/073

    CPC classification number: H01J37/1471 ,  H01J1/34 ,  H01J37/073 ,  H01J2201/3423 ,  H01J2237/0203

    Abstract: Provided are an electron gun that can extend the lifetime of a photocathode, an electron beam applicator on which the electron gun is mounted, and an irradiation position moving method. This object can be achieved by an electron gun including: a light source; a photocathode that emits an electron beam in response to receiving light from the light source; an anode; a motion device that moves excitation light irradiating the photocathode; and a control unit, the control unit controls the motion device to move an irradiation position of the excitation light from a position Rn (n is a natural number) on the photocathode to a position Rn+1 outside an excitation light irradiation-caused deteriorated range associated with the position Rn, the excitation light irradiation-caused deteriorated range is a range where the photocathode is deteriorated due to irradiation with the excitation light, and the distance between the center of a spot of the excitation light at the position Rn and the center of a spot of the excitation light at the position Rn+1 is at least three or more times a spot diameter of the excitation light on the photocathode.

    ELECTRON BEAM APPLICATION DEVICE
    2.
    发明公开
    ELECTRON BEAM APPLICATION DEVICE 审中-公开

    公开(公告)号：US20240161997A1

    公开(公告)日：2024-05-16

    申请号：US18282906

    申请日：2021-04-16

    Applicant: Hitachi High-Tech Corporation

    Inventor： Takashi OHSHIMA ,  Naohiro KOHMU ,  Hideo MORISHITA ,  Tatsuro IDE ,  Yoichi OSE ,  Junichi KATANE ,  Toshihide AGEMURA

    IPC: H01J37/073 ,  H01J37/147 ,  H01J37/26

    CPC classification number: H01J37/073 ,  H01J37/1471 ,  H01J37/265

    Abstract: A light source that emits pulse excitation light includes a laser light source, an optical splitter that splits a pulse laser beam into a plurality of pulse laser beams, phase adjusters and optical amplifiers provided for the pulse laser beams, and an optical combiner that combines the plurality of pulse laser beams whose phases are adjusted and that are amplified, and outputs combined light as the pulse excitation light. An optical phase controller controls phase delay amounts of the phase adjusters, and an optical monitor detects an inclination of the pulse excitation light relative to an optical axis of a focusing lens. The optical phase controller stores phase delay amount data indicating phase delay amounts of the plurality of phase adjusters in which the inclination is a predetermined value, and sets the phase delay amounts of the plurality of phase adjusters based on the phase delay amount data.

    Bandpass charged particle energy filtering detector for charged particle tools
    4.
    发明授权
    Bandpass charged particle energy filtering detector for charged particle tools 有权

    公开(公告)号：US11749495B2

    公开(公告)日：2023-09-05

    申请号：US17494784

    申请日：2021-10-05

    Applicant: KLA Corporation

    Inventor： Youfei Jiang ,  Michael Steigerwald

    IPC: H01J37/244 ,  H01J37/28 ,  H01J37/05 ,  H01J37/147

    CPC classification number: H01J37/244 ,  H01J37/05 ,  H01J37/1471 ,  H01J37/28 ,  H01J2237/0492 ,  H01J2237/2448 ,  H01J2237/24475

    Abstract: Methods and systems for detecting charged particles from a specimen are provided. One system includes a first repelling mesh configured to repel charged particles from a specimen having an energy lower than a first predetermined energy and a second repelling mesh configured to repel the charged particles that pass through the first repelling mesh and have an energy that is lower than a second predetermined energy. The system also includes a first attracting mesh configured to attract the charged particles that pass through the first repelling mesh, are repelled by the second repelling mesh, and have an energy that is higher than the first predetermined energy and lower than the second predetermined energy. The system further includes a first detector configured to generate output responsive to the charged particles that pass through the first attracting mesh.

    MULTIPLE CHARGED PARTICLE BEAM WRITING METHOD, AND MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS
    6.
    发明申请
    MULTIPLE CHARGED PARTICLE BEAM WRITING METHOD, AND MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS 审中-公开

    公开(公告)号：US20190198294A1

    公开(公告)日：2019-06-27

    申请号：US16228830

    申请日：2018-12-21

    Applicant: NuFlare Technology, Inc.

    Inventor： Hideo Inoue

    IPC: H01J37/317 ,  H01J37/147 ,  H01J37/04 ,  H01J37/302

    CPC classification number: H01J37/3177 ,  H01J37/045 ,  H01J37/1471 ,  H01J37/3026 ,  H01J2237/0435 ,  H01J2237/30472 ,  H01J2237/31754

    Abstract: A multiple charged particle writing method includes performing a tracking operation by shifting the main deflection position of multiple beams using charged particle beams in the direction of stage movement so that the main deflection position of the multiple beams follows the stage movement while a predetermined number of beam shots of the multiple beams are performed, and shifting the sub deflection position of the multiple beams so that each beam of the multiple beams straddles rectangular regions among plural rectangular regions obtained by dividing a writing region of a target object into meshes by the pitch size between beams of the multiple beams, and the each beam is applied to a different position in each of the rectangular regions straddled, and applying a predetermined number of shots per beam using plural beams in the multiple beams to each of the plural rectangular regions, during the tracking operation.

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