公开(公告)号：US12237143B2

公开(公告)日：2025-02-25

申请号：US18392494

申请日：2023-12-21

Applicant: ASML Netherlands B.V.

Inventor： Weiming Ren ,  Xuedong Liu ,  Xuerang Hu ,  Zhongwei Chen

IPC: H01J37/147 ,  H01J37/06 ,  H01J37/10 ,  H01J37/28

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit forms plural and parallel images of one single electron source by deflecting plural beamlets of a parallel primary-electron beam therefrom, and one objective lens focuses the plural deflected beamlets onto a sample surface and forms plural probe spots thereon. A movable condenser lens is used to collimate the primary-electron beam and vary the currents of the plural probe spots, a pre-beamlet-forming means weakens the Coulomb effect of the primary-electron beam, and the source-conversion unit minimizes the sizes of the plural probe spots by minimizing and compensating the off-axis aberrations of the objective lens and condenser lens.

公开(公告)号：US20240420914A1

公开(公告)日：2024-12-19

申请号：US18819152

申请日：2024-08-29

Applicant: JIANGSU FAVORED NANOTECHNOLOGY CO., LTD.

Inventor： Jian ZONG

IPC: H01J37/06 ,  C23C16/458 ,  H01J37/32

Abstract: A coating method for coating a substrate, including the following steps: (a) introducing. (a) introducing a coating forming material into a reaction chamber of a chamber body through a plurality of monomer discharge sources and exciting the coating forming material through a plasma generation source; and (b) guiding the substrate to alternately move close to the monomer discharge source and the plasma generation source for forming a polymer coating on the substrate. The step (b) comprises a step of rotating a supporting rack to guide the substrate to move between the plurality of monomer discharge sources and the electrode means of the plasma generation source.

公开(公告)号：US12165831B2

公开(公告)日：2024-12-10

申请号：US17829230

申请日：2022-05-31

Applicant: KLA CORPORATION

Inventor： Xinrong Jiang ,  Christopher Sears ,  Youfei Jiang ,  Sameet K. Shriyan ,  Jeong Ho Lee ,  Michael Steigerwald ,  Ralph Nyffenegger

IPC: H01J37/153 ,  H01J37/06 ,  H01J37/12 ,  H01J37/244 ,  H01J37/28

Abstract: A multi-electron beam system that forms hundreds of beamlets can focus the beamlets, reduce Coulomb interaction effects, and improve resolutions of the beamlets. A Wien filter with electrostatic and magnetic deflection fields can separate the secondary electron beams from the primary electron beams and can correct the astigmatism and source energy dispersion blurs for all the beamlets simultaneously.

公开(公告)号：US20240290594A1

公开(公告)日：2024-08-29

申请号：US18176195

申请日：2023-02-28

Applicant: NuFlare Technology, Inc. ,  NuFlare Technology America, Inc.

Inventor： Victor Katsap

IPC: H01J45/00 ,  H01J37/06 ,  H01J37/22 ,  H01J37/24

CPC classification number: H01J45/00 ,  H01J37/06 ,  H01J37/22 ,  H01J37/24

Abstract: A method of assessing thermionic electron emitter quality, comprising heating a thermionic electron emitter to an emission temperature thereby causing the emitter to emit electrons, forming the electrons emitted by the emitter into an electron beam, directing the electron beam to an image detector thereby forming an image corresponding to electron emission from a surface of the emitter, and detecting a presence or absence in the image of a pair of intersecting bright band features, each band feature being formed from two parallel lines, the band features corresponding to crystal lattice planes of the emitter. The presence of one pair of intersecting bright band features indicates a single-crystal emitter. The absence of a pair of intersecting band features indicates an amorphous or contaminated emitter. The presence of more than a single pair of intersecting bright band features indicates a polycrystalline emitter. The method is particularly useful for rare-earth hexaboride emitters.

公开(公告)号：US20240167150A1

公开(公告)日：2024-05-23

申请号：US18429750

申请日：2024-02-01

Applicant: Edmund Optics, Inc.

Inventor： Joel Bagwell ,  Nathan Carlie

IPC: C23C16/02 ,  B24B13/00 ,  C23C14/02 ,  C23C14/30 ,  C23C14/58 ,  C23C16/448 ,  H01J37/06 ,  H01S3/094 ,  C23C14/34

CPC classification number: C23C16/0263 ,  B24B13/0037 ,  C23C14/02 ,  C23C14/30 ,  C23C14/5813 ,  C23C16/448 ,  H01J37/06 ,  H01S3/094076 ,  C23C14/34

Abstract: A finishing and coating apparatus combines finishing and coating optical components into one vacuum apparatus. The apparatus includes a vacuum system, a substrate holder, a finisher including a laser engine and a beam delivery apparatus, and a coating source. The finisher is configured to finish the optical components prior to coating the optical components. The finisher includes a laser engine and a laser beam delivery apparatus configured to direct a beam from the laser engine toward each of the optical components.

公开(公告)号：USRE49784E1

公开(公告)日：2024-01-02

申请号：US17005212

申请日：2020-08-27

Applicant: ASML Netherlands B.V.

Inventor： Weiming Ren ,  Xuedong Liu ,  Xuerang Hu ,  Zhong-wei Chen

IPC: H01J37/06 ,  H01J37/28 ,  H01J37/147 ,  H01J37/22 ,  G01N23/2251 ,  H01J37/145 ,  H01J37/05 ,  H01J37/244

CPC classification number: H01J37/06 ,  G01N23/2251 ,  H01J37/05 ,  H01J37/145 ,  H01J37/1474 ,  H01J37/226 ,  H01J37/244 ,  H01J37/28 ,  G01N2223/418 ,  G01N2223/6116 ,  H01J2237/057 ,  H01J2237/2448 ,  H01J2237/2817

Abstract: A new multi-beam apparatus with a total FOV variable in size, orientation and incident angle, is proposed. The new apparatus provides more flexibility to speed the sample observation and enable more samples observable. More specifically, as a yield management tool to inspect and/or review defects on wafers/masks in semiconductor manufacturing industry, the new apparatus provide more possibilities to achieve a high throughput and detect more kinds of defects.

公开(公告)号：US20230317395A1

公开(公告)日：2023-10-05

申请号：US17996520

申请日：2021-04-14

Applicant: Denka Company Limited

Inventor： Daisuke ISHIKAWA ,  Hiromitsu CHATANI

IPC: H01J9/04 ,  H01J37/06

CPC classification number: H01J9/04 ,  H01J37/06 ,  H01J2237/06308

Abstract: A method for manufacturing an electron source according to the present disclosure includes steps of: (A) preparing a first member provided with a columnar portion made of a first material having an electron emission characteristic, (B) preparing a second member which has a higher work function and a lower strength than the first material, and in which a hole is formed extending in a direction from one end surface toward the other end surface, and (C) pushing the columnar portion into the hole in the second member, wherein the first member has a cross-sectional shape that is dissimilar to the cross-sectional shape of the hole; and in the step (C), by pressing the columnar portion into the hole, a portion of a side surface of the columnar portion scrapes the inner surface of the hole and bites into the second member, thereby fixing the columnar portion to the second member.

公开(公告)号：US20230298846A1

公开(公告)日：2023-09-21

申请号：US18041408

申请日：2021-08-05

Applicant: Denka Company Limited

Inventor： Daisuke ISHIKAWA ,  Hiromitsu CHATANI

IPC: H01J37/06

CPC classification number: H01J37/06 ,  H01J2237/06308

Abstract: An emitter according to the present disclosure includes: first and second heaters generating heat by energization; an electron source comprising a first material emitting an electron by being heated by the first and second heaters; and an intermediate member interposed between the electron source, and the first and second heaters, the intermediate member comprising a second material lower in thermal conductivity than the first material.

公开(公告)号：US11562881B2

公开(公告)日：2023-01-24

申请号：US17512825

申请日：2021-10-28

Applicant: Carl Zeiss MultiSEM GmbH

Inventor： Dirk Zeidler ,  Stefan Schubert ,  Ingo Mueller ,  Joerg Jacobi ,  Mario Muetzel ,  Antonio Casares ,  Christof Riedesel

IPC: H01J37/14 ,  H01J37/05 ,  H01J37/147 ,  H01J37/21 ,  H01J37/244 ,  H01J37/28 ,  H01J37/06

Abstract: A charged particle beam system includes a charged particle source that generates a first charged particle beam and a multi beam generator that generates a plurality of charged particle beamlets from an incoming first charged particle beam. Each individual beamlet is spatially separated from other beamlets. The charged particle beam system also includes an objective lens that focuses incoming charged particle beamlets in a first plane so that a first region in which a first individual beamlet impinges in the first plane is spatially separated from a second region in which a second individual beamlet impinges in the first plane. The charged particle beam system also includes a projection system and a detector system including a plurality of individual detectors. The projection system images interaction products leaving the first region within the first plane due to impinging charged particles onto a first detector and images interaction products leaving the second region in the first plane onto a second detector.

公开(公告)号：US11458561B2

公开(公告)日：2022-10-04

申请号：US16344359

申请日：2017-01-12

Applicant: ADVANTEST CORPORATION

Inventor： Shinichi Hamaguchi ,  Shinji Sugatani ,  Masayuki Takahashi ,  Masahiro Takizawa

IPC: B23K15/00 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y50/02 ,  H01J37/06 ,  H01J37/141 ,  H01J37/147 ,  H01J37/305 ,  H01J29/56

Abstract: To provide a three-dimensional printing device that irradiates approximately the same ranges on the surface of a powder layer simultaneously with a plurality of electron beams having different beam shapes. An electron beam column 200 of the three-dimensional printing device 100 includes a plurality of electron sources 20 including electron sources having anisotropically-shaped beam generating units, and beam shape deforming elements 30 that deform the beam shapes of electron beams output from the electron sources 20 on a surface 63 of a powder layer 62. A deflector 50 included in the electron beam column 200 deflects an electron beam output from each of the plurality of electron sources 20 by a distance larger than the beam space between electron beams before passing through the deflector 50.