公开(公告)号：US12068129B2

公开(公告)日：2024-08-20

申请号：US17981141

申请日：2022-11-04

Applicant: KLA Corporation

Inventor： Xinrong Jiang ,  Youfei Jiang ,  Ralph Nyffenegger ,  Michael Steigerwald

IPC: H01J37/28 ,  H01J37/26

CPC classification number: H01J37/28 ,  H01J37/261

Abstract: A system and method of a tilt-column electron beam imaging system is disclosed. The system may include an imaging sub-system. The imaging sub-system may include a plurality of electron beam sources configured to generate a plurality of beamlets. The imaging sub-system may further include a plurality of tilt-illumination columns, where a respective tilt-illumination column is configured to receive a respective beamlet from a respective electron beam source. For the system and method, a first tilt axis of a first tilt-illumination column may be orientated along a first angle and at least one additional tilt axis of at least one additional tilt-illumination column may be orientated along at least one additional angle different from the first angle, where each of the plurality of beamlets pass through a first common crossover volume.

公开(公告)号：US20230395349A1

公开(公告)日：2023-12-07

申请号：US17830244

申请日：2022-06-01

Applicant: KLA Corporation

Inventor： Xinrong Jiang ,  Youfei Jiang ,  Michael Steigerwald ,  Ralph Nyffenegger

IPC: H01J37/073 ,  H01J37/28 ,  H01J37/147 ,  H01J37/22 ,  H01J37/12 ,  H01J37/14

CPC classification number: H01J37/073 ,  H01J37/28 ,  H01J37/1472 ,  H01J37/22 ,  H01J37/12 ,  H01J37/14 ,  H01J2237/103 ,  H01J2237/2448 ,  H01J2237/0492 ,  H01J2237/06333

Abstract: An electron-beam device includes a laser and a photocathode film. The photocathode film has a front side and a back side and emits a plurality of electron beamlets when illuminated from the back side using the laser. The electron-beam device also includes electrodes to extract the plurality of electron beamlets from the front side of the photocathode film and to control shapes of the plurality of electron beamlets.

公开(公告)号：US12283453B2

公开(公告)日：2025-04-22

申请号：US17830244

申请日：2022-06-01

Applicant: KLA Corporation

Inventor： Xinrong Jiang ,  Youfei Jiang ,  Michael Steigerwald ,  Ralph Nyffenegger

IPC: H01J37/073 ,  H01J37/12 ,  H01J37/14 ,  H01J37/147 ,  H01J37/22 ,  H01J37/28

Abstract: An electron-beam device includes a laser and a photocathode film. The photocathode film has a front side and a back side and emits a plurality of electron beamlets when illuminated from the back side using the laser. The electron-beam device also includes electrodes to extract the plurality of electron beamlets from the front side of the photocathode film and to control shapes of the plurality of electron beamlets.

公开(公告)号：US12165831B2

公开(公告)日：2024-12-10

申请号：US17829230

申请日：2022-05-31

Applicant: KLA CORPORATION

Inventor： Xinrong Jiang ,  Christopher Sears ,  Youfei Jiang ,  Sameet K. Shriyan ,  Jeong Ho Lee ,  Michael Steigerwald ,  Ralph Nyffenegger

IPC: H01J37/153 ,  H01J37/06 ,  H01J37/12 ,  H01J37/244 ,  H01J37/28

Abstract: A multi-electron beam system that forms hundreds of beamlets can focus the beamlets, reduce Coulomb interaction effects, and improve resolutions of the beamlets. A Wien filter with electrostatic and magnetic deflection fields can separate the secondary electron beams from the primary electron beams and can correct the astigmatism and source energy dispersion blurs for all the beamlets simultaneously.

公开(公告)号：US20240153737A1

公开(公告)日：2024-05-09

申请号：US17981141

申请日：2022-11-04

Applicant: KLA Corporation

Inventor： Xinrong Jiang ,  Youfei Jiang ,  Ralph Nyffenegger ,  Michael Steigerwald

IPC: H01J37/28 ,  H01J37/26

CPC classification number: H01J37/28 ,  H01J37/261

Abstract: A system and method of a tilt-column electron beam imaging system is disclosed. The system may include an imaging sub-system. The imaging sub-system may include a plurality of electron beam sources configured to generate a plurality of beamlets. The imaging sub-system may further include a plurality of tilt-illumination columns, where a respective tilt-illumination column is configured to receive a respective beamlet from a respective electron beam source. For the system and method, a first tilt axis of a first tilt-illumination column may be orientated along a first angle and at least one additional tilt axis of at least one additional tilt-illumination column may be orientated along at least one additional angle different from the first angle, where each of the plurality of beam lets pass through a first common crossover volume.