公开(公告)号：US20240096586A1

公开(公告)日：2024-03-21

申请号：US17829230

申请日：2022-05-31

Applicant: KLA CORPORATION

Inventor： Xinrong JIANG ,  Christopher SEARS ,  Youfei JIANG ,  Sameet K. SHRIYAN ,  Jeong Ho LEE ,  Michael STEIGERWALD ,  Ralph NYFFENEGGER

IPC: H01J37/153 ,  H01J37/06 ,  H01J37/12 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/153 ,  H01J37/06 ,  H01J37/12 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/0451 ,  H01J2237/04735 ,  H01J2237/103 ,  H01J2237/151 ,  H01J2237/152 ,  H01J2237/1532 ,  H01J2237/1536 ,  H01J2237/2448

Abstract: A multi-electron beam system that forms hundreds of beamlets can focus the beamlets, reduce Coulomb interaction effects, and improve resolutions of the beamlets. A Wien filter with electrostatic and magnetic deflection fields can separate the secondary electron beams from the 5 primary electron beams and can correct the astigmatism and source energy dispersion blurs for all the beamlets simultaneously.

公开(公告)号：US11887807B2

公开(公告)日：2024-01-30

申请号：US18158444

申请日：2023-01-23

Applicant: ASML Netherlands B.V.

Inventor： Weiming Ren ,  Xuedong Liu ,  Xuerang Hu ,  Zhongwei Chen

IPC: H01J37/147 ,  H01J37/06 ,  H01J37/10 ,  H01J37/28

CPC classification number: H01J37/1474 ,  H01J37/06 ,  H01J37/10 ,  H01J37/1477 ,  H01J37/1478 ,  H01J37/28 ,  H01J2237/024 ,  H01J2237/0453 ,  H01J2237/0492 ,  H01J2237/103 ,  H01J2237/1205 ,  H01J2237/1516 ,  H01J2237/1534 ,  H01J2237/1536

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit forms plural and parallel images of one single electron source by deflecting plural beamlets of a parallel primary-electron beam therefrom, and one objective lens focuses the plural deflected beamlets onto a sample surface and forms plural probe spots thereon. A movable condenser lens is used to collimate the primary-electron beam and vary the currents of the plural probe spots, a pre-beamlet-forming means weakens the Coulomb effect of the primary-electron beam, and the source-conversion unit minimizes the sizes of the plural probe spots by minimizing and compensating the off-axis aberrations of the objective lens and condenser lens.

公开(公告)号：US11715628B2

公开(公告)日：2023-08-01

申请号：US17184962

申请日：2021-02-25

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jeongil Mun ,  Kyeonghun Kim ,  Taekyoon Park ,  Jongwoo Sun ,  Seeyub Yang ,  Yongseok Lee ,  Hyungjoo Lee ,  Eunhee Jeang

IPC: H01J37/32 ,  H01J9/24

CPC classification number: H01J37/32467 ,  H01J9/245 ,  H01J37/32119 ,  H01J37/32238 ,  H01J37/32972 ,  H01J2237/103

Abstract: A method of forming a plasma processing apparatus comprises providing a chamber, the chamber including a wall defining an interior, and a viewport extending through the wall. An analysis apparatus connected to the viewport may be formed. The analysis apparatus includes an analyzer adjacent to the chamber, a probe connected to the analyzer and aligned with the viewport, and a first window aligned with the probe, the first window having a first surface, and a second surface at an opposite side relative to the first surface, the second surface being exposed to the interior of the chamber, and the second surface of the first window has a scattering surface.

公开(公告)号：US09922796B1

公开(公告)日：2018-03-20

申请号：US15366455

申请日：2016-12-01

Applicant: APPLIED MATERIALS ISRAEL LTD. ,  Technische Universiteit Delft

Inventor： Jürgen Frosien ,  Pieter Kruit

IPC: H01J37/28 ,  H01J37/147 ,  H01J37/145 ,  H01J37/09 ,  H01J37/22

CPC classification number: H01J37/145 ,  H01J37/09 ,  H01J37/1474 ,  H01J37/153 ,  H01J37/226 ,  H01J37/28 ,  H01J2237/0453 ,  H01J2237/0492 ,  H01J2237/103 ,  H01J2237/1534 ,  H01J2237/1536 ,  H01J2237/2817

Abstract: A method for inspecting a specimen with an array of primary charged particle beamlets in a charged particle beam device having an optical axis. The method includes generating a primary charged particle beam; illuminating a multi-aperture lens plate with the primary charged particle beam to generate the array of primary charged particle beamlets; and correcting a field curvature of the charged particle beam device with a first and a second field curvature correction electrode. The method further includes applying a voltage to the first and to the second field curvature correction electrode. At least one of the field strength provided by the first and the second field curvature correction electrode varies in a plane perpendicular to the optical axis of the charged particle beam device. The method further includes focusing the primary charged particle beamlets on separate locations on the specimen with an objective lens.

公开(公告)号：US20170069456A1

公开(公告)日：2017-03-09

申请号：US15256967

申请日：2016-09-06

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Yasuhiko SUGIYAMA ,  Hiroshi OBA

IPC: H01J37/08 ,  H01J37/10

CPC classification number: H01J37/08 ,  H01J37/10 ,  H01J37/12 ,  H01J37/18 ,  H01J2237/0805 ,  H01J2237/083 ,  H01J2237/103

Abstract: A focused ion beam apparatus includes an ion source that emits an ion beam, an extraction electrode that extracts ions from a tip end of an emitter of the ion source, and a first lens electrode that configures a condenser lens by a potential difference with the extraction electrode, the condenser lens focusing the ions extracted by the extraction electrode, in which a strong lens action is generated between the extraction electrode and the first lens electrode so as to focus all ions extracted from the ion source to pass through a hole of the condenser lens including the first lens electrode.

Abstract translation: 聚焦离子束装置包括发射离子束的离子源，从离子源的发射极的前端提取离子的提取电极和通过提取电位差构成聚光透镜的第一透镜电极 电极，所述聚光透镜聚焦由所述提取电极提取的离子，其中在所述提取电极和所述第一透镜电极之间产生强透镜作用，以便将从所述离子源提取的所有离子聚焦通过所述冷凝器的孔 透镜包括第一透镜电极。

公开(公告)号：US20160233049A1

公开(公告)日：2016-08-11

申请号：US15022662

申请日：2014-05-02

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Yuko SASAKI ,  Hiroyuki ITO

IPC: H01J37/153 ,  H01J37/12

CPC classification number: H01J37/153 ,  H01J37/12 ,  H01J37/141 ,  H01J37/147 ,  H01J2237/103 ,  H01J2237/1532 ,  H01J2237/1534

Abstract: Provided is a multifunctional charged particle beam device capable of inclining a beam with little aberration. The aberration is corrected by forming a local divergent field with a multipole, parallel current lines, or the like, matching the beam axis with the local divergent field via a conventional rotationally symmetric lens, deflector or astigmatism corrector, and counteracting an aberration occurring from another rotationally symmetric convex lens field.

Abstract translation: 提供了一种能够使几乎没有像差的光束倾斜的多功能带电粒子束装置。 通过用多极，平行电流线等形成局部发散场，通过常规旋转对称透镜，偏转器或像散校正器将光束轴与局部发散场匹配并抵消从另一个发生的像差来校正像差 旋转对称凸透镜场。

公开(公告)号：US20150179394A1

公开(公告)日：2015-06-25

申请号：US14404115

申请日：2013-04-22

Applicant: Hitachi High-Technologies Corporation

Inventor： Tsutomu Saito ,  Kenji Aoki

IPC: H01J37/10 ,  H01J37/26

CPC classification number: H01J37/10 ,  H01J37/09 ,  H01J37/18 ,  H01J37/26 ,  H01J2237/103

Abstract: A preferred aim of the present invention is to provide a charged particle beam device having a high differential exhaust performance while maintaining a large dynamic range of an irradiation current by effectively arranging an aperture for differential pumping (111) and an objective final aperture (110). The present invention has features that a lens barrel including therein an optical system of the charged particle beam device (100) includes a first space (106) having a first degree of vacuum and a second space (105) having a degree of vacuum higher than the first degree of vacuum, and that the objective final aperture (110) is arranged in the second space (105).

Abstract translation: 本发明的优选目的是提供一种具有高差分排气性能的带电粒子束装置，同时通过有效地布置差分泵浦（111）和目标最终孔径（110）的孔径来保持辐射电流的大动态范围， 。 本发明的特征在于，其中包括带电粒子束装置（100）的光学系统的镜筒包括具有第一真空度的第一空间（106）和具有高于 第一真空度，并且目标最终孔（110）布置在第二空间（105）中。

公开(公告)号：US08124946B2

公开(公告)日：2012-02-28

申请号：US12477631

申请日：2009-06-03

Applicant: Geoffrey Ryding ,  Theodore Smick ,  Marvin Farley ,  Takao Sakase ,  Bo Vanderberg

Inventor： Geoffrey Ryding ,  Theodore Smick ,  Marvin Farley ,  Takao Sakase ,  Bo Vanderberg

IPC: H01J37/317 ,  H01J49/30 ,  H01J49/42

CPC classification number: H01J37/3171 ,  H01J37/05 ,  H01J2237/0492 ,  H01J2237/103 ,  H01J2237/1405 ,  H01J2237/1501 ,  H01J2237/1523 ,  H01J2237/153 ,  H01J2237/21 ,  H01J2237/24528 ,  H01J2237/31705

Abstract: A system and method for magnetically filtering an ion beam during an ion implantation into a workpiece is provided, wherein ions are emitted from an ion source and accelerated the ions away from the ion source to form an ion beam. The ion beam is mass analyzed by a mass analyzer, wherein ions are selected. The ion beam is then decelerated via a decelerator once the ion beam is mass-analyzed, and the ion beam is further magnetically filtered the ion beam downstream of the deceleration. The magnetic filtering is provided by a quadrapole magnetic energy filter, wherein a magnetic field is formed for intercepting the ions in the ion beam exiting the decelerator to selectively filter undesirable ions and fast neutrals.

Abstract translation: 提供了一种用于在离子注入工件期间对离子束进行磁过滤的系统和方法，其中离子从离子源发射并且将离子加速离开离子源以形成离子束。 离子束通过质量分析器进行质量分析，其中选择离子。 一旦离子束被质量分析，离子束然后通过减速器减速，并且离子束进一步对减速度下游的离子束进行磁过滤。 磁滤波由四极磁能滤波器提供，其中形成磁场以截取离开减速器的离子束中的离子，以选择性地过滤不需要的离子和快速中性粒子。

公开(公告)号：US20230170181A1

公开(公告)日：2023-06-01

申请号：US18159852

申请日：2023-01-26

Applicant: Carl Zeiss MultiSEM GmbH

Inventor： Stefan Schubert

IPC: H01J37/26 ,  H01J37/22 ,  H01J37/147 ,  H01J37/28 ,  H01J37/244

CPC classification number: H01J37/265 ,  H01J37/22 ,  H01J37/28 ,  H01J37/244 ,  H01J37/1472 ,  H01J37/14 ,  H01J2237/103 ,  H01J2237/1532

Abstract: A multiple particle beam system with a mirror mode of operation, a method for operating a multiple particle beam system with a mirror mode of operation and an associated computer program product are disclosed. The multiple particle beam system can be operated in different mirror modes of operation which allow the multiple particle beam system to be inspected and recalibrated thoroughly. A detection system configured to operate in a first detection mode and/or in a second detection mode is used for the analysis.

公开(公告)号：US20230154723A1

公开(公告)日：2023-05-18

申请号：US17359365

申请日：2019-12-06

Applicant: ASML Netherlands B.V.

Inventor： Yan REN ,  Albertus Victor Gerardus MANGNUS

IPC: H01J37/147 ,  H01J37/145 ,  H01J37/28 ,  H01J37/20 ,  H01J37/09 ,  G01N23/2251

CPC classification number: H01J37/1478 ,  H01J37/1474 ,  H01J37/145 ,  H01J37/28 ,  H01J37/20 ,  H01J37/09 ,  G01N23/2251 ,  H01J2237/0455 ,  H01J2237/2611 ,  H01J2237/151 ,  H01J2237/226 ,  H01J2237/04926 ,  H01J2237/103 ,  G01N2223/07 ,  G01N2223/418 ,  G01N2223/507

Abstract: Embodiments consistent with the disclosure herein include methods and a multi-beam apparatus configured to emit charged-particle beams for imaging a top and side of a structure of a sample, including: a deflector array including a first deflector and configured to receive a first charged-particle beam and a second charged-particle beam; a blocking plate configured to block one of the first charged-particle beam and the second charged-particle beam; and a controller having circuitry and configured to change the configuration of the apparatus to transition between a first mode and a second mode. In the first mode, the deflector array directs the second charged-particle beam to the top of the structure, and the blocking plate blocks the first charged-particle beam. And in the second mode, the first deflector deflects the first charged-particle beam to the side of the structure, and the blocking plate blocks the second charged-particle beam.