公开(公告)号：US20240274396A1

公开(公告)日：2024-08-15

申请号：US18110284

申请日：2023-02-15

申请人： ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH

发明人： John Breuer ,  Dominik Patrick Ehberger ,  Kathrin Mohler ,  Ivo Liska

IPC分类号： H01J37/147 ,  H01J37/09 ,  H01J37/153 ,  H01J37/28

CPC分类号： H01J37/1472 ,  H01J37/09 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/022 ,  H01J2237/1516 ,  H01J2237/1534 ,  H01J2237/24514

摘要： A method of forming a multipole device (100) for influencing an electron beam (11) is provided. The method is carried out in an electron beam apparatus (200) that comprises an aperture body (110) having at least one aperture opening (112). The method comprises directing the electron beam (11) onto two or more surface portions of the aperture body (110) on two or more sides of the at least one aperture opening (112) to generate an electron beam-induced deposition pattern (120) configured to act as a multipole in a charged state, particularly configured to act as a quadrupole, a hexapole and/or an octupole. The electron beam-induced deposition pattern (120) can be an electron beam-induced carbon or carbonaceous pattern. Further provided are methods of influencing an electron beam in an electron beam apparatus, particularly with a multipole device as described herein. Further provided is a multipole device for influencing an electron beam in an electron beam apparatus in a predetermined manner.

公开(公告)号：US20240242922A1

公开(公告)日：2024-07-18

申请号：US18493961

申请日：2023-10-25

申请人： NuFlare Technology, Inc.

发明人： Hirofumi MORITA ,  Haruyuki NOMURA

IPC分类号： H01J37/153 ,  H01J37/04 ,  H01J37/09 ,  H01J37/145 ,  H01J37/317

CPC分类号： H01J37/153 ,  H01J37/045 ,  H01J37/09 ,  H01J37/145 ,  H01J37/3174 ,  H01J2237/04735 ,  H01J2237/31754 ,  H01J2237/31774

摘要： In one embodiment, a multi charged particle beam writing apparatus includes two or more-stage objective lenses each comprised of a magnetic lens, and configured to focus the multi charged particle beam on a substrate, which has passed through the limiting aperture member, three or more correction lenses correcting an imaging state of the multi charged particle beam on the substrate, and an electric field control electrode to which a positive constant voltage with respect to the substrate is applied, the electric field control electrode generating an electric field between the substrate and the electric field control electrode. The two or more-stage objective lenses include a first objective lens, and a second objective lens placed most downstream in a travel direction of the multi charged particle beam. The three or more correction lenses are placed upstream of a lens magnetic field of the second objective lens in the travel direction of the multi charged particle beam.

公开(公告)号：USRE49952E1

公开(公告)日：2024-04-30

申请号：US16838976

申请日：2020-04-02

申请人： ASML Netherlands B.V.

发明人： Vincent Sylvester Kuiper ,  Erwin Slot

IPC分类号： H01J37/317 ,  H01J37/09 ,  H01J37/30

CPC分类号： H01J37/3177 ,  H01J37/09 ,  H01J37/3007 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/3175 ,  H01J2237/31774

摘要： A sub-beam aperture array for forming a plurality of sub-beams from one or more charged particle beams. The sub-beam aperture array comprises one or more beam areas, each beam area comprising a plurality of sub-beam apertures arranged in a non-regular hexagonal pattern, the sub-beam apertures arranged so that, when projected in a first direction onto a line parallel to a second direction, the sub-beam apertures are uniformly spaced along the line, and wherein the first direction is different from the second direction. The system further comprises a beamlet aperture array with a plurality of beamlet apertures arranged in one or more groups. The beamlet aperture array is arranged to receive the sub-beams and form a plurality of beamlets at the locations of the beamlet apertures of the beamlet array.

公开(公告)号：US20240085171A1

公开(公告)日：2024-03-14

申请号：US18367208

申请日：2023-09-12

申请人： Carl Zeiss SMT GmbH

发明人： David Laemmle ,  Michael Budach ,  Jan Guentner ,  Frans-Felix Schotsch

IPC分类号： G01B11/06 ,  H01J37/09

CPC分类号： G01B11/0608 ,  H01J37/09 ,  H01J2237/24592

摘要： The present application relates to a method for characterizing a shielding element of a particle beam device for shielding an electric field between a sample position and a particle beam source. The method comprises positioning a means for characterizing the shielding element on a side of the shielding element which is facing the sample position.

公开(公告)号：US11894213B2

公开(公告)日：2024-02-06

申请号：US17252997

申请日：2018-06-22

申请人： Hitachi High-Tech Corporation

发明人： Asako Kaneko ,  Hisayuki Takasu

IPC分类号： H01J37/20 ,  H01J37/08 ,  H01J37/09 ,  H01J37/147 ,  H01J37/305

CPC分类号： H01J37/20 ,  H01J37/08 ,  H01J37/09 ,  H01J37/1478 ,  H01J37/3053 ,  H01J2237/002 ,  H01J2237/1502 ,  H01J2237/20214

摘要： An ion milling device capable of high-speed milling is realized even for a specimen containing a material having an imide bond. Therefore, the ion milling device includes: a vacuum chamber 6 configured to hold a specimen 3 in a vacuum atmosphere; an ion gun 1 configured to irradiate the specimen with a non-focused ion beam 2; a vaporization container 17 configured to store a mixed solution 13 of a water-soluble ionic liquid and water; and nozzles 11, 12 configured to supply water vapor obtained by vaporizing the mixed solution to a vicinity of a surface of the specimen processed by the ion beam.

公开(公告)号：US20230324318A1

公开(公告)日：2023-10-12

申请号：US18327847

申请日：2023-06-01

申请人： ASML Netherlands B.V.

发明人： Yan REN ,  Erwin SLOT ,  Albertus Victor, Gerardus MANGNUS ,  Marijke SCOTUZZI ,  Erwin Paul SMAKMAN

IPC分类号： G01N23/2251 ,  H01J37/244 ,  H01J37/09 ,  H01J37/12 ,  H01J37/147

CPC分类号： G01N23/2251 ,  H01J37/244 ,  H01J37/09 ,  H01J37/12 ,  H01J37/1472 ,  G01N2223/303 ,  H01J2237/2448 ,  H01J2237/0453 ,  H01J37/20

摘要： A charged-particle tool configured to generate a plurality of sub-beams from a beam of charged particles and direct the sub-beams downbeam toward a sample position, the tool charged-particle tool comprising at least three charged-particle-optical components; a detector module; and a controller. Thea detector module is configured to generate a detection signal in response to charged particles that propagate upbeam from the direction of the sample position. The controller is configured to operate the tool in a calibration mode. The charged-particle-optical components include: a charged-particle source configured to emit a beam of charged particles and a beam generator configured to generate the sub-beams. The detection signal contains information about alignment of at least two of the charged-particle-optical components. The charged-particle optical components comprise two or more charged-particle optical elements comprising an array of apertures for which the charged particles may be monitored.

公开(公告)号：US20230245849A1

公开(公告)日：2023-08-03

申请号：US18123210

申请日：2023-03-17

申请人： ASML Netherlands B.V.

发明人： Marco Jan-Jaco WIELAND

IPC分类号： H01J37/12 ,  G01N23/2251 ,  H01J37/09 ,  H01J37/147

CPC分类号： H01J37/12 ,  G01N23/2251 ,  H01J37/09 ,  H01J37/1474 ,  G01N2223/3301 ,  H01J2237/0453 ,  H01J2237/04924 ,  H01J2237/12

摘要： Arrangements involving objective lens array assemblies for charged-particle assessment tools are disclosed. In one arrangement, the assembly comprises an objective lens array and a control lens array. Each objective lens projects a respective sub-beam of a multi-beam onto a sample. The control lens array is associated with the objective lens array and positioned up-beam of the objective lens array. The control lenses pre-focus the sub-beams.

公开(公告)号：US20180286633A1

公开(公告)日：2018-10-04

申请号：US15760994

申请日：2015-09-25

申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION

发明人： Kengo ASAI ,  Toru IWAYA ,  Hisayuki TAKASU ,  Hiroyasu SHICHI

IPC分类号： H01J37/31 ,  H01J37/28 ,  H01J37/20 ,  H01J37/09 ,  H01J37/08

CPC分类号： H01J37/31 ,  H01J37/08 ,  H01J37/09 ,  H01J37/20 ,  H01J37/28 ,  H01J37/3056 ,  H01J2237/0262 ,  H01J2237/0264 ,  H01J2237/04732 ,  H01J2237/082 ,  H01J2237/31745

摘要： To provide an ion milling system that can suppress an orbital shift of an observation electron beam emitted from an electron microscope column, the ion milling system includes: a Penning discharge type ion gun 100 that includes a permanent magnet 114 and that generates ions for processing a sample; and a scanning electron microscope for observing the sample, in which a magnetic shield 172 for reducing a leakage magnetic field from the permanent magnet 114 to the electron microscope column is provided.

公开(公告)号：US20180269034A1

公开(公告)日：2018-09-20

申请号：US15888118

申请日：2018-02-05

申请人： NuFlare Technology, Inc.

发明人： Haruyuki NOMURA

IPC分类号： H01J37/317 ,  H01J37/04 ,  H01J37/10 ,  H01J37/09 ,  H01J37/24

CPC分类号： H01J37/3175 ,  H01J37/045 ,  H01J37/09 ,  H01J37/10 ,  H01J37/243 ,  H01J37/3174 ,  H01J2237/043 ,  H01J2237/30433 ,  H01J2237/31776

摘要： In one embodiment, a charged particle beam writing apparatus includes a current limiting aperture, a blanking deflector switching between beam ON and beam OFF so as to control an irradiation time by deflecting the charged particle beam having passed through the current limiting aperture, a blanking aperture blocking the charged particle beam deflected by the blanking deflector in such a manner that the beam OFF state is entered, and an electron lens disposed between the current limiting aperture and the blanking aperture. A lens value set for the electron lens is substituted into a given function to calculate an offset time. The offset time is added to an irradiation time for writing a pattern to correct the irradiation time. The blanking deflector switches between the beam ON and the beam OFF based on the corrected irradiation time.

公开(公告)号：US10037864B2

公开(公告)日：2018-07-31

申请号：US15594712

申请日：2017-05-15

申请人： MAPPER LITHOGRAPHY IP B.V.

发明人： Alexander Hendrik Vincent Van Veen ,  Willem Henk Urbanus

IPC分类号： G03B27/52 ,  H01J37/09 ,  H01J37/30 ,  H01J37/317 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/147 ,  H01J37/302

CPC分类号： H01J37/09 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/147 ,  H01J37/3007 ,  H01J37/302 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/002 ,  H01J2237/026 ,  H01J2237/0262 ,  H01J2237/0264 ,  H01J2237/16 ,  H01J2237/182 ,  H01J2237/188

摘要： The invention relates to a charged particle beam generator. The generator may comprise a high voltage shielding arrangement (201) for shielding components outside the shielding arrangement from high voltages within the shielding arrangement, and a vacuum pump (220) located outside the shielding arrangement for regulating a pressure of a space within the shielding arrangement. The generator may comprise a collimator system with a cooling arrangement (405a/407a-407b/405b) comprising cooling channels inside electrodes of the collimator system.