公开(公告)号：US09640364B2

公开(公告)日：2017-05-02

申请号：US14969352

申请日：2015-12-15

Applicant: Carl Zeiss Microscopy, LLC

Inventor： John A. Notte, IV ,  FHM-Faridur Rahman ,  Weijie Huang ,  Shawn McVey

IPC: H01J37/08 ,  H01J37/18 ,  H01J27/26

CPC classification number: H01J37/18 ,  G21K5/04 ,  H01J27/26 ,  H01J37/08 ,  H01J2237/002 ,  H01J2237/0216 ,  H01J2237/032 ,  H01J2237/0653 ,  H01J2237/0807 ,  H01J2237/1501 ,  H01J2237/1502 ,  H01J2237/1825 ,  H01J2237/188 ,  H01J2237/20207 ,  H01J2237/20214 ,  H01J2237/20221 ,  H01J2237/20235

Abstract: The present disclosure relates to a gas field ion source comprising a housing, an electrically conductive tip arranged within the housing, a gas supply for supplying one or more gases to the housing, wherein the one or more gases comprise neon or a noble gas with atoms having a mass larger than neon, and an extractor electrode having a hole to permit ions generated in the neighborhood of the tip to pass through the hole. A surface of the extractor electrode facing the tip can be made of a material having a negative secondary ion sputter rate of less than 10−5 per incident neon ion.

公开(公告)号：US09536699B2

公开(公告)日：2017-01-03

申请号：US14314317

申请日：2014-06-25

Applicant: Carl Zeiss Microscopy, LLC

Inventor： John A. Notte, IV ,  Weijie Huang ,  Raymond Hill ,  FHM-Faridur Rahman ,  Alexander Groholski ,  Shawn McVey

IPC: H01J37/00 ,  H01J37/08 ,  G21K5/04 ,  H01J27/26 ,  H01J37/18

CPC classification number: H01J37/18 ,  G21K5/04 ,  H01J27/26 ,  H01J37/08 ,  H01J2237/002 ,  H01J2237/0216 ,  H01J2237/032 ,  H01J2237/0653 ,  H01J2237/0807 ,  H01J2237/1501 ,  H01J2237/1502 ,  H01J2237/1825 ,  H01J2237/188 ,  H01J2237/20207 ,  H01J2237/20214 ,  H01J2237/20221 ,  H01J2237/20235

Abstract: The present disclosure relates to a gas field ion source having a gun housing, an electrically conductive gun can base attached to the gun housing, an inner tube mounted to the gun can base, the inner tube being made of an electrically isolating ceramic, an electrically conductive tip attached to the inner tube, an outer tube mounted to the gun can base, the outer tube being made of an electrically isolating ceramic, and an extractor electrode attached to the outer tube. The extractor electrode can have an opening for the passage of ions generated in proximity to the electrically conductive tip.

Abstract translation: 本发明涉及一种具有枪壳体的气体离子源，连接到枪壳体的导电枪壳底座，安装在枪壳底座上的内管，内管由电隔离陶瓷制成， 连接到内管的导电尖端，安装到枪罐底座的外管，外管由电绝缘陶瓷制成，以及附接到外管的提取器电极。 提取器电极可以具有用于通过在导电末端附近产生的离子的开口。

公开(公告)号：US09362084B2

公开(公告)日：2016-06-07

申请号：US13458936

申请日：2012-04-27

Applicant: Alrik van den Brom ,  Stijn Willem Herman Karel Steenbrink ,  Marco Jan-Jaco Wieland ,  Guido De Boer ,  Pieter Kappelhof

Inventor： Alrik van den Brom ,  Stijn Willem Herman Karel Steenbrink ,  Marco Jan-Jaco Wieland ,  Guido De Boer ,  Pieter Kappelhof

IPC: H01J37/20 ,  H01J37/317

CPC classification number: H01J37/20 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/708 ,  G03F7/70825 ,  G03F7/70975 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/024 ,  H01J2237/03 ,  H01J2237/0437 ,  H01J2237/1502 ,  H01J2237/153

Abstract: The invention relates to a charged particle system for processing a target surface with at least one charged particle beam. The system comprises an optical column with a beam generator module for generating a plurality of charged particle beams, a beam modulator module for switching on and off said plurality of beams and a beam projector module for projecting beams or subbeams on said target surface. The system further comprises a frame supporting each of said modules in a fixed position and alignment elements for aligning at least one of beams and/or subbeams with a downstream module element.

Abstract translation: 本发明涉及一种用至少一个带电粒子束来处理目标表面的带电粒子系统。 该系统包括具有用于产生多个带电粒子束的光束发生器模块的光学柱，用于接通和关闭所述多个光束的光束调制器模块和用于在所述目标表面上投射光束或子光束的光束投影器模块。 该系统还包括支撑固定位置的每个模块的框架和用于将梁和/或子梁中的至少一个与下游模块元件对准的对准元件。

公开(公告)号：US09218934B2

公开(公告)日：2015-12-22

申请号：US14314262

申请日：2014-06-25

Applicant: Carl Zeiss Microscopy, LLC

Inventor： John A. Notte, IV ,  Weijie Huang ,  FHM-Faridur Rahman ,  Shawn McVey

IPC: H01J27/26 ,  H01J37/08 ,  H01J37/18 ,  G21K5/04

CPC classification number: H01J37/18 ,  G21K5/04 ,  H01J27/26 ,  H01J37/08 ,  H01J2237/002 ,  H01J2237/0216 ,  H01J2237/032 ,  H01J2237/0653 ,  H01J2237/0807 ,  H01J2237/1501 ,  H01J2237/1502 ,  H01J2237/1825 ,  H01J2237/188 ,  H01J2237/20207 ,  H01J2237/20214 ,  H01J2237/20221 ,  H01J2237/20235

Abstract: The disclosure relates to a method of operating a gas field ion beam system in which the gas field ion beam system comprises an external housing, an internal housing, arranged within the external housing, an electrically conductive tip arranged within the internal housing, a gas supply for supplying one or more gases to the internal housing, the gas supply having a tube terminating within the internal housing, and an extractor electrode having a hole to permit ions generated in the neighborhood of the tip to pass through the hole into the external housing. The method comprises the step of regularly heating the external housing, the internal housing, the electrically conductive tip, the tube and the extractor electrode to a temperature of above 100° C.

Abstract translation: 本公开涉及一种操作气体场离子束系统的方法，其中气体场离子束系统包括外部壳体，布置在外部壳体内的内部壳体，布置在内部壳体内的导电尖端，气体源 用于将一个或多个气体供应到内部壳体，气体供应具有终止在内部壳体内的管，以及具有孔的提取器电极，其具有允许在尖端附近产生的离子通过孔进入外部壳体。 该方法包括将外部壳体，内部壳体，导电尖端，管子和提取器电极定期加热至高于100℃的温度。

公开(公告)号：US20150008341A1

公开(公告)日：2015-01-08

申请号：US14314219

申请日：2014-06-25

Applicant: Carl Zeiss Microscopy, LLC

Inventor： John A. Notte, IV ,  Alexander Groholski ,  Robert Conners ,  Mark D. DiManna ,  Raymond Hill

IPC: H01J37/08 ,  H01J37/18

CPC classification number: H01J37/18 ,  G21K5/04 ,  H01J27/26 ,  H01J37/08 ,  H01J2237/002 ,  H01J2237/0216 ,  H01J2237/032 ,  H01J2237/0653 ,  H01J2237/0807 ,  H01J2237/1501 ,  H01J2237/1502 ,  H01J2237/1825 ,  H01J2237/188 ,  H01J2237/20207 ,  H01J2237/20214 ,  H01J2237/20221 ,  H01J2237/20235

Abstract: The present disclosure relates to a charged particle beam system, comprising a noble gas field ion beam source, a charged particle beam column, and a housing defining a first vacuum region and a second vacuum region. A noble gas field ion beam source is arranged within the first vacuum region. A first mechanical vacuum pump is functionally attached to the first vacuum region, an ion getter pump is attached to the charged particle beam column, and a gas supply is attached to the first vacuum region configured to supply a noble gas to the noble gas field ion beam source.

Abstract translation: 本发明涉及带电粒子束系统，其包括惰性气体场离子束源，带电粒子束柱和限定第一真空区域和第二真空区域的壳体。 惰性气体场离子束源设置在第一真空区域内。 第一机械真空泵功能地附接到第一真空区域，离子吸气剂泵连接到带电粒子束柱，并且气体供应附着到构造成向惰性气体场离子供应惰性气体的第一真空区域 光束源。

公开(公告)号：US20150008334A1

公开(公告)日：2015-01-08

申请号：US14314289

申请日：2014-06-25

Applicant: Carl Zeiss Microscopy, LLC

Inventor： John A. Notte, IV ,  FHM-Faridur Rahman ,  Weijie Huang ,  Shawn McVey

IPC: H01J27/26 ,  G21K5/04

CPC classification number: H01J37/18 ,  G21K5/04 ,  H01J27/26 ,  H01J37/08 ,  H01J2237/002 ,  H01J2237/0216 ,  H01J2237/032 ,  H01J2237/0653 ,  H01J2237/0807 ,  H01J2237/1501 ,  H01J2237/1502 ,  H01J2237/1825 ,  H01J2237/188 ,  H01J2237/20207 ,  H01J2237/20214 ,  H01J2237/20221 ,  H01J2237/20235

Abstract: The present disclosure relates to a gas field ion source comprising a housing, an electrically conductive tip arranged within the housing, a gas supply for supplying one or more gases to the housing, wherein the one or more gases comprise neon or a noble gas with atoms having a mass larger than neon, and an extractor electrode having a hole to permit ions generated in the neighborhood of the tip to pass through the hole. A surface of the extractor electrode facing the tip can be made of a material having a negative secondary ion sputter rate of less than 10−5 per incident neon ion.

Abstract translation: 本公开涉及一种气体离子源，其包括壳体，布置在壳体内的导电尖端，用于向壳体供应一种或多种气体的气体源，其中所述一种或多种气体包括氖或具有原子的惰性气体 具有大于氖的质量，以及具有孔的提取器电极，其允许在尖端附近产生的离子穿过孔。 提取器电极的面向尖端的表面可以由每个入射氖离子具有小于10-5的负次级离子溅射速率的材料制成。

公开(公告)号：US08710453B2

公开(公告)日：2014-04-29

申请号：US13341487

申请日：2011-12-30

Applicant: N. William Parker

Inventor： N. William Parker

IPC: H01J31/48

CPC classification number: H01J37/26 ,  H01J37/06 ,  H01J37/08 ,  H01J37/1471 ,  H01J37/28 ,  H01J2237/0635 ,  H01J2237/0802 ,  H01J2237/083 ,  H01J2237/1501 ,  H01J2237/1502 ,  H01J2237/31749

Abstract: A charged particle source for a focused particle beam system such as a transmission electron microscope (TEM), scanning transmission electron microscope (STEM), scanning electron microscope (SEM), or focused ion beam (FIB) system is disclosed. The source employs a multiplicity of independently-addressable emitters within a small region which can be centered on the axis of the charged particle system. All of the emitters may be individually controlled to enable emission from one or more tips simultaneously. A mode with only one emitter activated corresponds to high brightness, while modes with multiple emitters simultaneously activated provides high angular intensities with lower brightness. Source lifetimes can be extended through sequential use of single emitters. A combined mechanical and electrical alignment procedure for all emitters is described.

Abstract translation: 公开了透射电子显微镜（TEM），扫描透射电子显微镜（STEM），扫描电子显微镜（SEM）或聚焦离子束（FIB）系统等聚焦粒子束系统的带电粒子源。 该源在可以在带电粒子系统的轴线上居中的小区域内采用多个可独立寻址的发射器。 所有的发射器可以被单独控制以使得能够同时从一个或多个尖端发射。 只有一个发射器激活的模式对应于高亮度，而同时激活多个发射器的模式提供了较高亮度的较高角度强度。 可以通过连续使用单个发射器来扩展源寿命。 描述了用于所有发射器的组合的机械和电气校准程序。

公开(公告)号：US20120168638A1

公开(公告)日：2012-07-05

申请号：US13341487

申请日：2011-12-30

Applicant: N. William Parker

Inventor： N. William Parker

IPC: H01J3/14

CPC classification number: H01J37/26 ,  H01J37/06 ,  H01J37/08 ,  H01J37/1471 ,  H01J37/28 ,  H01J2237/0635 ,  H01J2237/0802 ,  H01J2237/083 ,  H01J2237/1501 ,  H01J2237/1502 ,  H01J2237/31749

Abstract: A charged particle source for a focused particle beam system such as a transmission electron microscope (TEM), scanning transmission electron microscope (STEM), scanning electron microscope (SEM), or focused ion beam (FIB) system is disclosed. The source employs a multiplicity of independently-addressable emitters within a small region which can be centered on the axis of the charged particle system. All of the emitters may be individually controlled to enable emission from one or more tips simultaneously. A mode with only one emitter activated corresponds to high brightness, while modes with multiple emitters simultaneously activated provides high angular intensities with lower brightness. Source lifetimes can be extended through sequential use of single emitters. A combined mechanical and electrical alignment procedure for all emitters is described.

Abstract translation: 公开了透射电子显微镜（TEM），扫描透射电子显微镜（STEM），扫描电子显微镜（SEM）或聚焦离子束（FIB）系统等聚焦粒子束系统的带电粒子源。 该源在可以在带电粒子系统的轴线上居中的小区域内采用多个可独立寻址的发射器。 所有的发射器可以被单独控制以使得能够同时从一个或多个尖端发射。 只有一个发射器激活的模式对应于高亮度，而同时激活多个发射器的模式提供了较高亮度的较高角度强度。 可以通过连续使用单个发射器来扩展源寿命。 描述了用于所有发射器的组合的机械和电气校准程序。

公开(公告)号：US07417227B2

公开(公告)日：2008-08-26

申请号：US11294470

申请日：2005-12-06

Applicant: Takao Matsumoto ,  Masanari Koguchi

Inventor： Takao Matsumoto ,  Masanari Koguchi

IPC: G01N23/00 ,  G21K7/00

CPC classification number: H01J37/28 ,  G03H5/00 ,  H01J37/023 ,  H01J37/244 ,  H01J2237/1502 ,  H01J2237/1514 ,  H01J2237/225 ,  H01J2237/228 ,  H01J2237/2447 ,  H01J2237/24495 ,  H01J2237/24564 ,  H01J2237/2487 ,  H01J2237/2614 ,  H01J2237/2802 ,  H01J2237/2803

Abstract: The conventional detection technique has the following problems in detecting interference fringes: (1) Setting and adjustment are complex and difficult to conduct; (2) A phase image and an amplitude image cannot be displayed simultaneously; and (3) Detection efficiency of electron beams is low. The invention provides a scanning interference electron microscope which is improved in detection efficiency of electron beam interference fringes, and enables the user to observe electric and magnetic information easily in a micro domain of a specimen as a scan image of a high S/N ratio under optimum conditions.

Abstract translation: 常规检测技术在检测干涉条纹方面存在以下问题：（1）设置和调整复杂，难以进行; （2）相位图像和振幅图像不能同时显示; （3）电子束的检测效率低。 本发明提供了扫描干涉电子显微镜，其提高了电子束干涉条纹的检测效率，并且使得用户能够在样本的微区域中容易地观察电磁信息作为高S / N比的扫描图像 最佳条件。

公开(公告)号：US20050253089A1

公开(公告)日：2005-11-17

申请号：US10845209

申请日：2004-05-14

Applicant: Syuichi Maeno ,  Masao Naito ,  Yasunori Ando ,  Hilton Glavish

Inventor： Syuichi Maeno ,  Masao Naito ,  Yasunori Ando ,  Hilton Glavish

IPC: H01J37/317 ,  G01N21/00 ,  H01L21/265

CPC classification number: H01J37/3171 ,  H01J2237/0455 ,  H01J2237/057 ,  H01J2237/1502 ,  H01J2237/20228 ,  H01J2237/24528 ,  H01J2237/24542 ,  H01L21/26513 ,  H01L21/2658

Abstract: The ion implanting apparatus according to this invention includes: an ion source for producing the ion beam 20 including desired ion species and being shaped in a sheet with a width longer than a narrow width of a substrate 82, a mass separating magnet 36 for selectively deriving the desired ion species by bending the ion beam in a direction perpendicular to a sheet face thereof, a separating slit 72 for selectively making the desired ion species pass through by cooperating with the mass separating magnet 36, and a substrate drive device 86 for reciprocatedly driving the substrate 82 in a direction substantially perpendicular to the sheet face 20s of the ion beam 20 within an irradiating area of the ion beam 20 which has passed through a separating slit 72.

Abstract translation: 根据本发明的离子注入装置包括：用于产生包括所需离子种类的离子束20的离子源，并且成形为具有比衬底82的窄宽度更长的宽度的片材;质量分离磁体36，用于选择性地导出 通过在与其表面垂直的方向上弯曲离子束来形成期望的离子种类，通过与质量分离磁体36配合选择性地使期望的离子种类通过的分离狭缝72和用于往复驱动的衬底驱动装置86 基板82在离开光束20的已经通过分离狭缝72的照射区域内与离子束20的片表面20s基本垂直的方向。