公开(公告)号：US07078714B2

公开(公告)日：2006-07-18

申请号：US10845209

申请日：2004-05-14

Applicant: Syuichi Maeno ,  Masao Naito ,  Yasunori Ando ,  Hilton F. Glavish

Inventor： Syuichi Maeno ,  Masao Naito ,  Yasunori Ando ,  Hilton F. Glavish

IPC: H01J37/00

CPC classification number: H01J37/3171 ,  H01J2237/0455 ,  H01J2237/057 ,  H01J2237/1502 ,  H01J2237/20228 ,  H01J2237/24528 ,  H01J2237/24542 ,  H01L21/26513 ,  H01L21/2658

Abstract: The ion implanting apparatus according to this invention includes: an ion source for producing the ion beam 20 including desired ion species and being shaped in a sheet with a width longer than a narrow width of a substrate 82, a mass separating magnet 36 for selectively deriving the desired ion species by bending the ion beam in a direction perpendicular to a sheet face thereof, a separating slit 72 for selectively making the desired ion species pass through by cooperating with the mass separating magnet 36, and a substrate drive device 86 for reciprocatedly driving the substrate 82 in a direction substantially perpendicular to the sheet face 20s of the ion beam 20 within an irradiating area of the ion beam 20 which has passed through a separating slit 72.

Abstract translation: 根据本发明的离子注入装置包括：用于产生包括所需离子种类的离子束20的离子源，并且成形为具有比衬底82的窄宽度更长的宽度的片材;质量分离磁体36，用于选择性地导出 通过在与其表面垂直的方向上弯曲离子束来形成期望的离子种类，通过与质量分离磁体36配合选择性地使期望的离子种类通过的分离狭缝72和用于往复驱动的衬底驱动装置86 基板82在离开光束20的已经通过分离狭缝72的照射区域内与离子束20的片表面20s基本垂直的方向。

公开(公告)号：US20050253089A1

公开(公告)日：2005-11-17

申请号：US10845209

申请日：2004-05-14

Applicant: Syuichi Maeno ,  Masao Naito ,  Yasunori Ando ,  Hilton Glavish

Inventor： Syuichi Maeno ,  Masao Naito ,  Yasunori Ando ,  Hilton Glavish

IPC: H01J37/317 ,  G01N21/00 ,  H01L21/265

CPC classification number: H01J37/3171 ,  H01J2237/0455 ,  H01J2237/057 ,  H01J2237/1502 ,  H01J2237/20228 ,  H01J2237/24528 ,  H01J2237/24542 ,  H01L21/26513 ,  H01L21/2658

Abstract: The ion implanting apparatus according to this invention includes: an ion source for producing the ion beam 20 including desired ion species and being shaped in a sheet with a width longer than a narrow width of a substrate 82, a mass separating magnet 36 for selectively deriving the desired ion species by bending the ion beam in a direction perpendicular to a sheet face thereof, a separating slit 72 for selectively making the desired ion species pass through by cooperating with the mass separating magnet 36, and a substrate drive device 86 for reciprocatedly driving the substrate 82 in a direction substantially perpendicular to the sheet face 20s of the ion beam 20 within an irradiating area of the ion beam 20 which has passed through a separating slit 72.

Abstract translation: 根据本发明的离子注入装置包括：用于产生包括所需离子种类的离子束20的离子源，并且成形为具有比衬底82的窄宽度更长的宽度的片材;质量分离磁体36，用于选择性地导出 通过在与其表面垂直的方向上弯曲离子束来形成期望的离子种类，通过与质量分离磁体36配合选择性地使期望的离子种类通过的分离狭缝72和用于往复驱动的衬底驱动装置86 基板82在离开光束20的已经通过分离狭缝72的照射区域内与离子束20的片表面20s基本垂直的方向。