公开(公告)号：US20240203682A1

公开(公告)日：2024-06-20

申请号：US18287316

申请日：2021-09-13

Applicant: HITACHI HIGH-TECH CORPORATION

Inventor： Shinichi MATSUBARA ,  Noriaki ARAI

IPC: H01J37/08 ,  H01J37/12 ,  H01J37/32

CPC classification number: H01J37/08 ,  H01J37/12 ,  H01J37/32449 ,  H01J2237/0807

Abstract: An object of the invention is to provide an ion beam device capable of sharpening an emitter tip end to an atomic level with high reproducibility while reducing a device downtime. The ion beam device according to the invention measures a current of a helium ion beam, and switches, according to a measurement result, between a first operation of adjusting a flow rate of a nitrogen gas or an oxygen gas and a second operation of adjusting an extraction voltage.

公开(公告)号：US09761407B2

公开(公告)日：2017-09-12

申请号：US15021350

申请日：2014-10-08

Applicant: Hitachi High-Technologies Corporation

Inventor： Hiroyuki Muto ,  Yoshimi Kawanami ,  Hiroyasu Shichi ,  Shinichi Matsubara

IPC: H01J37/26 ,  H01J1/304 ,  H01J37/08 ,  B23K9/00 ,  H01J27/26 ,  H01J37/147 ,  H01J37/18 ,  H01J37/285 ,  H01J37/30

CPC classification number: H01J37/08 ,  H01J27/26 ,  H01J37/1474 ,  H01J37/18 ,  H01J37/285 ,  H01J37/3005 ,  H01J2237/002 ,  H01J2237/006 ,  H01J2237/0807 ,  H01J2237/28

Abstract: The objective of the present invention is to provide an ion beam device capable of forming a nanopyramid stably having one atom at the front end of an emitter tip even when the cooling temperature is lowered in order to observe a sample with a high signal-to-noise ratio. In the present invention, the ion beam device, wherein an ion beam generated from an electric field-ionized gas ion source is irradiated onto the sample to observe or process the sample, holds the temperature of the emitter tip at a second temperature higher than a first temperature for generating the ion beam and lower than room temperature, sets the extraction voltage to a second voltage higher than the first voltage used when generating the ion beam, and causes field evaporation of atoms at the front end of the emitter tip, when forming the nanopyramid having one atom at the front end of the emitter tip.

公开(公告)号：US20160111243A1

公开(公告)日：2016-04-21

申请号：US14969306

申请日：2015-12-15

Applicant: Carl Zeiss Microscopy, LLC

Inventor： John A. Notte, IV ,  Weijie Huang ,  FHM-Faridur Rahman ,  Shawn McVey

IPC: H01J37/08 ,  H01J37/18

CPC classification number: H01J37/18 ,  G21K5/04 ,  H01J27/26 ,  H01J37/08 ,  H01J2237/002 ,  H01J2237/0216 ,  H01J2237/032 ,  H01J2237/0653 ,  H01J2237/0807 ,  H01J2237/1501 ,  H01J2237/1502 ,  H01J2237/1825 ,  H01J2237/188 ,  H01J2237/20207 ,  H01J2237/20214 ,  H01J2237/20221 ,  H01J2237/20235

Abstract: The disclosure relates to a method of operating a gas field ion beam system in which the gas field ion beam system comprises an external housing, an internal housing, arranged within the external housing, an electrically conductive tip arranged within the internal housing, a gas supply for supplying one or more gases to the internal housing, the gas supply having a tube terminating within the internal housing, and an extractor electrode having a hole to permit ions generated in the neighborhood of the tip to pass through the hole into the external housing. The method comprises the step of regularly heating the external housing, the internal housing, the electrically conductive tip, the tube and the extractor electrode to a temperature of above 100° C.

公开(公告)号：US20160104598A1

公开(公告)日：2016-04-14

申请号：US14969352

申请日：2015-12-15

Applicant: Carl Zeiss Microscopy, LLC

Inventor： John A. Notte, IV ,  FHM-Faridur Rahman ,  Weijie Huang ,  Shawn McVey

IPC: H01J37/08 ,  H01J27/26

CPC classification number: H01J37/18 ,  G21K5/04 ,  H01J27/26 ,  H01J37/08 ,  H01J2237/002 ,  H01J2237/0216 ,  H01J2237/032 ,  H01J2237/0653 ,  H01J2237/0807 ,  H01J2237/1501 ,  H01J2237/1502 ,  H01J2237/1825 ,  H01J2237/188 ,  H01J2237/20207 ,  H01J2237/20214 ,  H01J2237/20221 ,  H01J2237/20235

Abstract: The present disclosure relates to a gas field ion source comprising a housing, an electrically conductive tip arranged within the housing, a gas supply for supplying one or more gases to the housing, wherein the one or more gases comprise neon or a noble gas with atoms having a mass larger than neon, and an extractor electrode having a hole to permit ions generated in the neighborhood of the tip to pass through the hole. A surface of the extractor electrode facing the tip can be made of a material having a negative secondary ion sputter rate of less than 10−5 per incident neon ion.

Abstract translation: 本公开涉及一种气体离子源，其包括壳体，布置在壳体内的导电尖端，用于向壳体供应一种或多种气体的气体源，其中所述一种或多种气体包括氖或具有原子的惰性气体 具有大于氖的质量，以及具有孔的提取器电极，其允许在尖端附近产生的离子穿过孔。 提取器电极的面向尖端的表面可以由每个入射氖离子具有小于10-5的负次级离子溅射速率的材料制成。

公开(公告)号：US09218935B2

公开(公告)日：2015-12-22

申请号：US14314289

申请日：2014-06-25

Applicant: Carl Zeiss Microscopy, LLC

Inventor： John A. Notte, IV ,  FHM-Faridur Rahman ,  Weijie Huang ,  Shawn McVey

IPC: H01J27/26 ,  H01J37/08 ,  H01J37/18 ,  G21K5/04

CPC classification number: H01J37/18 ,  G21K5/04 ,  H01J27/26 ,  H01J37/08 ,  H01J2237/002 ,  H01J2237/0216 ,  H01J2237/032 ,  H01J2237/0653 ,  H01J2237/0807 ,  H01J2237/1501 ,  H01J2237/1502 ,  H01J2237/1825 ,  H01J2237/188 ,  H01J2237/20207 ,  H01J2237/20214 ,  H01J2237/20221 ,  H01J2237/20235

Abstract: The present disclosure relates to a gas field ion source comprising a housing, an electrically conductive tip arranged within the housing, a gas supply for supplying one or more gases to the housing, wherein the one or more gases comprise neon or a noble gas with atoms having a mass larger than neon, and an extractor electrode having a hole to permit ions generated in the neighborhood of the tip to pass through the hole. A surface of the extractor electrode facing the tip can be made of a material having a negative secondary ion sputter rate of less than 10−5 per incident neon ion.

Abstract translation: 本公开涉及一种气体离子源，其包括壳体，布置在壳体内的导电尖端，用于向壳体供应一种或多种气体的气体源，其中所述一种或多种气体包括氖或具有原子的惰性气体 具有大于氖的质量，以及具有孔的提取器电极，其允许在尖端附近产生的离子穿过孔。 提取器电极的面向尖端的表面可以由每个入射氖离子具有小于10-5的负次级离子溅射速率的材料制成。

公开(公告)号：US09058959B2

公开(公告)日：2015-06-16

申请号：US14363252

申请日：2012-11-08

Applicant: Hitachi High-Technologies Corporation

Inventor： Yoshimi Kawanami ,  Yoichi Ose

IPC: H01J37/26 ,  H01J37/28 ,  H01J37/244 ,  H01J37/22 ,  H01J37/20

CPC classification number: H01J37/28 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/265 ,  H01J37/317 ,  H01J2237/0473 ,  H01J2237/0807 ,  H01J2237/2806 ,  H01J2237/2807

Abstract: The present invention is provided to enable a detailed inspection of a specimen and preventing a distortion of an observation image even when a specimen containing an insulating material is partially charged. For a scanning ion microscope utilizing a gas field ionization ion source, a thin film is disposed between an ion optical system and a specimen, and an ion beam is applied to and transmitted through this thin film in order to focus a neutralized beam on the specimen. Furthermore, an electrode for regulating secondary electrons discharged from this thin film is provided in order to eliminate mixing of noises into an observation image.

Abstract translation: 提供本发明，以便即使当含有绝缘材料的样本被部分充电时，也能够对样本进行详细检查并防止观察图像的变形。 对于使用气体电离离子源的扫描离子显微镜，在离子光学系统和样品之间设置薄膜，并且将离子束施加并透过该薄膜，以将中和的光束聚焦在样品上 。 此外，设置用于调节从该薄膜排出的二次电子的电极，以消除噪声对观察图像的混合。

公开(公告)号：US08963100B2

公开(公告)日：2015-02-24

申请号：US13654509

申请日：2012-10-18

Applicant: Anto Yasaka ,  Fumio Aramaki ,  Yasuhiko Sugiyama ,  Tomokazu Kozakai ,  Osamu Matsuda

Inventor： Anto Yasaka ,  Fumio Aramaki ,  Yasuhiko Sugiyama ,  Tomokazu Kozakai ,  Osamu Matsuda

IPC: H01J37/08 ,  G21K5/04 ,  H01J37/305

CPC classification number: H01J27/024 ,  H01J27/26 ,  H01J37/08 ,  H01J37/3056 ,  H01J2237/0807 ,  H01J2237/182

Abstract: A focused ion beam apparatus has an ion source chamber in which is disposed an emitter for emitting ions. A gas supply unit supplies nitrogen gas to the ion source chamber so that the nitrogen gas adsorbs on the surface of the emitter, and the gas supply unit maintains the pressure in the ion source chamber in the range 1.0×10−6 Pa to 1.0×10−2 Pa. An extracting electrode is spaced from the emitter, and a voltage is applied to the extracting electrode to ionize the adsorbed nitrogen gas and extract nitrogen ions in the form of an ion beam. A temperature control unit controls the temperature of the emitter.

Abstract translation: 聚焦离子束装置具有离子源室，其中设置有用于发射离子的发射极。 气体供给单元向离子源室供给氮气，使得氮气吸附在发射体的表面，气体供给单元将离子源室内的压力维持在1.0×10 -6 Pa〜1.0× 10-2Pa。提取电极与发射极间隔开，电压施加到提取电极，使吸附的氮气离子化，并以离子束的形式提取氮离子。 温度控制单元控制发射器的温度。

公开(公告)号：US20150048247A1

公开(公告)日：2015-02-19

申请号：US14363252

申请日：2012-11-08

Applicant: Hitachi High-Technologies Corporation

Inventor： Yoshimi Kawanami ,  Yoichi Ose

IPC: H01J37/28 ,  H01J37/20 ,  H01J37/22 ,  H01J37/26 ,  H01J37/244

CPC classification number: H01J37/28 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/265 ,  H01J37/317 ,  H01J2237/0473 ,  H01J2237/0807 ,  H01J2237/2806 ,  H01J2237/2807

Abstract: The present invention is provided to enable a detailed inspection of a specimen and preventing a distortion of an observation image even when a specimen containing an insulating material is partially charged. For a scanning ion microscope utilizing a gas field ionization ion source, a thin film is disposed between an ion optical system and a specimen, and an ion beam is applied to and transmitted through this thin film in order to focus a neutralized beam on the specimen. Furthermore, an electrode for regulating secondary electrons discharged from this thin film is provided in order to eliminate mixing of noises into an observation image.

Abstract translation: 提供本发明，以便即使当含有绝缘材料的样本被部分充电时，也能够对样本进行详细检查并防止观察图像的变形。 对于使用气体电离离子源的扫描离子显微镜，在离子光学系统和样品之间设置薄膜，并且将离子束施加并透过该薄膜，以将中和的光束聚焦在样品上 。 此外，设置用于调节从该薄膜排出的二次电子的电极，以消除噪声对观察图像的混合。

公开(公告)号：US08927942B2

公开(公告)日：2015-01-06

申请号：US14124408

申请日：2012-06-05

Applicant: Jacques Gierak ,  Nicolas Allemandou ,  Klaus Hasselbach ,  Jean-Paul Leggeri ,  Guillaume Donnier-Valentin ,  Stephen Purcell ,  Pauline Gavand

Inventor： Jacques Gierak ,  Nicolas Allemandou ,  Klaus Hasselbach ,  Jean-Paul Leggeri ,  Guillaume Donnier-Valentin ,  Stephen Purcell ,  Pauline Gavand

IPC: H01J27/00 ,  H01J37/08 ,  H01J27/02 ,  H01J27/22 ,  H01J3/18 ,  H01J3/26 ,  H01J37/05 ,  H01J37/317

CPC classification number: H01J37/08 ,  H01J3/18 ,  H01J3/26 ,  H01J27/022 ,  H01J27/024 ,  H01J27/22 ,  H01J37/05 ,  H01J37/317 ,  H01J37/3174 ,  H01J2237/0807 ,  H01J2237/0815 ,  H01J2237/0827

Abstract: A ion source comprises: a chamber, an injection to inject matter into the chamber, wherein said matter comprises at least a first species, a tip with an apex located in the chamber, wherein the apex has a surface made of a metallic second species, a generator to generate ions of said species, and a regulation system adapted to set operative conditions of the chamber to alternatively generate ions from the gaseous first species, and ions from the non-gaseous metallic second species.

Abstract translation: 离子源包括：腔室，用于将物质注入到腔室中的注射器，其中所述物质包括至少第一物质，具有位于所述腔室中的顶点的尖端，其中所述顶点具有由金属第二物质制成的表面， 用于产生所述物质的离子的发生器，以及调节系统，其适于设置所述腔室的操作条件以交替地从所述气态第一物质产生离子，以及从所述非气态金属第二物质产生离子。

公开(公告)号：US20140319370A1

公开(公告)日：2014-10-30

申请号：US14328754

申请日：2014-07-11

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Hiroyasu SHICHI ,  Shinichi MATSUBARA ,  Norihide SAHO ,  Masahiro YAMAOKA ,  Noriaki ARAI

IPC: H01J27/02 ,  H01J37/26

CPC classification number: H01J27/26 ,  H01J27/022 ,  H01J37/023 ,  H01J37/067 ,  H01J37/08 ,  H01J37/26 ,  H01J37/28 ,  H01J2237/002 ,  H01J2237/006 ,  H01J2237/061 ,  H01J2237/0807 ,  H01J2237/2803

Abstract: An ion beam device according to the present invention includes a gas field ion source (1) including an emitter tip (21) supported by an emitter base mount (64), a ionization chamber (15) including an extraction electrode (24) and being configured to surround the emitter tip (21), and a gas supply tube (25). A center axis line of the extraction electrode (24) overlaps or is parallel to a center axis line (14A) of the ion irradiation light system, and a center axis line (66) passing the emitter tip (21) and the emitter base mount (64) is inclinable with respect to a center axis line of the ionization chamber (15). Accordingly, an ion beam device including a gas field ion source capable of adjusting the direction of the emitter tip is provided.

Abstract translation: 根据本发明的离子束装置包括气体离子源（1），其包括由发射极基座（64）支撑的发射极尖端（21），包括引出电极（24）的电离室（15） 构造成围绕发射器尖端（21），以及气体供应管（25）。 引出电极（24）的中心轴线与离​​子照射光系统的中心轴线（14A）重叠或平行，通过发射极尖端（21）和发射极基座 （64）相对于所述电离室（15）的中心轴线是可倾斜的。 因此，提供了包括能够调节发射极尖端的方向的气体场离子源的离子束装置。