公开(公告)号：US20250069843A1

公开(公告)日：2025-02-27

申请号：US18943131

申请日：2024-11-11

Applicant: Fractilia, LLC

Inventor： Chris Mack ,  Jonathan Yannuzzi

IPC: H01J37/22 ,  G01Q30/02 ,  G01Q30/06 ,  G06T5/70 ,  G06T7/13 ,  G06T7/40 ,  G06T7/42 ,  G06T7/49 ,  H01J37/28

Abstract: Methods, systems, and computer-readable mediums for configuring a lithography tool to manufacture a semiconductor device. The method includes selecting a first variable, selecting a second variable, selecting at least one response variable that is a function of the first variable and second variable, determining a measurement uncertainty for each response variable, determining, based on a measurement of the response variable, and the measurement uncertainty for the response variable, a plurality of probabilities representing a plurality of indications of whether a plurality of points associated with a lithography process meet a specification requirement for each response variable, wherein the plurality of probabilities represent a process window, and configuring, based on the process window, a lithography tool to manufacture a semiconductor device.

公开(公告)号：US12230469B2

公开(公告)日：2025-02-18

申请号：US17566518

申请日：2021-12-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Albertus Victor Gerardus Mangnus ,  Maikel Robert Goosen

IPC: H01J37/153 ,  H01J37/28

Abstract: Disclosed among other aspects is a charged particle inspection system including a phaseplate configured and arranged to modify the local phase of charged particles in a beam to reduce the effects of lens aberrations. The phaseplate is made up of an array of apertures with the voltage and/or a degree of obscuration of the apertures being controlled individually or in groups.

公开(公告)号：US12217927B2

公开(公告)日：2025-02-04

申请号：US17633556

申请日：2020-08-04

Applicant: ASML NETHERLANDS B.V.

Inventor： Jian Zhang ,  Ning Ye ,  Zhiwen Kang ,  Yixiang Wang

IPC: H01J37/26 ,  G02B27/09 ,  H01J37/02 ,  H01J37/28

Abstract: A system and a method for manipulating a beam of an Advanced Charge Controller module in different planes in an e-beam system are provided. Some embodiments of the system include a lens system configured to manipulate a beam in the tangential plane and the sagittal plane such that the beam spot is projected onto the wafer with high luminous energy. Some embodiments of the system include a lens system comprising at least two cylindrical lens.

公开(公告)号：US20250037966A1

公开(公告)日：2025-01-30

申请号：US18910626

申请日：2024-10-09

Applicant: ASML Netherlands B.V.

Inventor： Jinmei YANG ,  Jian ZHANG ,  Zhiwen KANG ,  Yixiang WANG

IPC: H01J37/28 ,  G01N23/2251 ,  H01J37/26

Abstract: A sensor may be used to measure a degree of tilt of a sample. The sensor may include an apparatus having a light source, first, second, and third optical elements, a lens, and an aperture. The first optical element may supply light from the light source toward the sample, and may supply light input into the first optical element from the sample toward the second optical element. The second optical element may supply light toward first and second sensing elements. An aperture may be arranged on a focal plane of the lens. A light beam incident on the first sensing element may be a reference beam.

公开(公告)号：US12196692B2

公开(公告)日：2025-01-14

申请号：US17769690

申请日：2020-09-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Weiming Ren ,  Xuedong Liu ,  Zhong-wei Chen ,  Xiaoyu Ji ,  Xiaoxue Chen ,  Weimin Zhou ,  Frank Nan Zhang

IPC: G01N23/2202 ,  G01N1/44 ,  G01N23/2251 ,  H01J37/02 ,  H01J37/244 ,  H01J37/28

Abstract: Systems and methods of providing a probe spot in multiple modes of operation of a charged-particle beam apparatus are disclosed. The method may comprise activating a charged-particle source to generate a primary charged-particle beam and selecting between a first mode and a second mode of operation of the charged-particle beam apparatus. In the flooding mode, the condenser lens may focus at least a first portion of the primary charged-particle beam passing through an aperture of the aperture plate to form a second portion of the primary charged-particle beam, and substantially all of the second portion is used to flood a surface of a sample. In the inspection mode, the condenser lens may focus a first portion of the primary charged-particle beam such that the aperture of the aperture plate blocks off peripheral charged-particles to form the second portion of the primary charged-particle beam used to inspect the sample surface.

公开(公告)号：US20250014859A1

公开(公告)日：2025-01-09

申请号：US18687252

申请日：2021-09-01

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Ayana MURAKI ,  Tatsuya ASAHATA ,  Satoshi TOMIMATSU ,  Makoto SATO

IPC: H01J37/302 ,  H01J37/28

Abstract: The present invention provides a computer, a program, and a charged particle beam processing system, with which it is possible to reduce adjustment and setting work of conditions for observation or machining by an operator in an FIB-SEM composite device. This computer comprises: an information acquisition unit that acquires information related to a recipe to be executed by a charged particle beam device provided with a charged particle irradiation optical system; and an information management unit that generates recipe management information based on the information acquired by the information acquisition unit and stores the recipe management information in a storage unit.

公开(公告)号：US12176179B2

公开(公告)日：2024-12-24

申请号：US18474982

申请日：2023-09-26

Applicant: FEI Company

Inventor： Maarten Bischoff ,  Peter Christiaan Tiemeijer ,  Tjerk Gerrit Spanjer ,  Stan Johan Pieter Konings

IPC: H01J37/153 ,  H01J37/147 ,  H01J37/20 ,  H01J37/22 ,  H01J37/28

Abstract: A method for reducing throughput time in a sample image acquisition session in transmission electron microscopy comprises: providing an electron microscope comprising a sample component, a beam generator, an adjusting component, and a filtering component; securing a sample by using the sample component; generating an electron beam by using the beam generator; generating an image beam by directing the beam to the sample component; adjusting at least one of the beam and the image beam by using the adjusting component to obtain at least one modified image beam, wherein the adjusting is performed in such a way, that off-axial aberration of the modified image beam is minimized; and filtering the modified image beam via the filtering component to reduce resolution-deteriorating effect of chromatic aberration on the modified image beam resulting from the adjusting of the at least one of the beam and the image beam.

公开(公告)号：US12175648B2

公开(公告)日：2024-12-24

申请号：US18524603

申请日：2023-11-30

Applicant: FEI Company

Inventor： Remco Schoenmakers ,  Maurice Peemen ,  Pavel Potoček

IPC: G06T7/00 ,  G06V20/69 ,  H01J37/28

Abstract: The invention relates to a method implemented by a data processing apparatus, comprising the steps of receiving an image; providing a set-point for a desired image quality parameter of said image; and processing said image using an image analysis technique for determining a current image quality parameter of said image. In the method, the current image quality parameter is compared with said desired set-point. Based on said comparison, a modified image is generated by using an image modification technique. The generating comprises a step of deteriorating said image in terms of said image quality parameter in case said current image quality parameter exceeds said set-point. The modified image is then output and may be further analysed.

公开(公告)号：US20240404784A1

公开(公告)日：2024-12-05

申请号：US18203034

申请日：2023-05-29

Applicant: Applied Materials Israel Ltd.

Inventor： Itamar Shani ,  Konstantin Chirko ,  Lior Yaron ,  Guy Eytan ,  Guy Shwartz

IPC: H01J37/28 ,  G06T11/00 ,  G06T11/20

Abstract: Disclosed herein is a system for non-destructive tomography of specimens. The system includes a scanning electron microscope (SEM) and a processor(s). The SEM is configured to obtain a sinogram of a tested specimen, parameterized by a vector {right arrow over (s)}, by projecting e-beams on the tested specimen, at each of a plurality of projection directions and offsets, and. for each e-beam, measuring a respective intensity of electrons returned from the tested specimen, The processor(s) is configured to obtain a tomographic map, pertaining to the tested specimen, by determining values indicative of components of a vector {right arrow over (t)} defined by an equation W{right arrow over (t)}={right arrow over (s)}. W is a matrix with components wij specifying a contribution of a j-th voxel in a nominal specimen to an i-th element of a nominal sinogram of the nominal specimen. The matrix W accounts for e-beam expansion and attenuation with depth within the nominal specimen.

公开(公告)号：US12158372B2

公开(公告)日：2024-12-03

申请号：US17833670

申请日：2022-06-06

Applicant: FEI Company

Inventor： Joseph Christian ,  Jorge Filevich

IPC: G01J3/44 ,  G01J3/02 ,  G01N21/65 ,  G01N21/94 ,  H01J37/28

Abstract: Methods and apparatus are disclosed for concurrent cleaning and cleanliness monitoring of a sample such as a substrate for electron point projection microscopy. A graphene sample is illuminated by a laser. Raman scattering from contaminants generates secondary light which is analyzed by spectrometer. Based on Raman scattering analysis, sample cleanliness is determined. Cleaning can be dynamically terminated based on achieving a target cleanliness level or based on prediction thereof. Variations and additional applications are disclosed.