知搜-全球专利检索

  1. Login
  2. Sign Up

Search Results

52 records (took 0.016 seconds)

    System and method for alignment of secondary beams in multi-beam inspection apparatus
    1.
    发明授权
    System and method for alignment of secondary beams in multi-beam inspection apparatus 有权

    公开(公告)号：US12278081B2

    公开(公告)日：2025-04-15

    申请号：US17598841

    申请日：2020-03-06

    Applicant: ASML Netherlands B.V.

    Inventor： Qingpo Xi ,  Xuerang Hu ,  Xuedong Liu ,  Weiming Ren ,  Zhong-Wei Chen

    IPC: H01J37/05 ,  H01J37/147

    Abstract: A multi-beam inspection apparatus including an adjustable beam separator is disclosed. The adjustable beam separator is configured to change a path of a secondary particle beam. The adjustable beam separator comprises a first Wien filter and a second Wien filter. Both Wien filters are aligned with a primary optical axis. The first Wien filter and the second Wien filter are independently controllable via a first excitation input and a second excitation input, respectively. The adjustable beam separator is configured move the effective bending point of the adjustable beam separator along the primary optical axis based on the first excitation input and the second excitation input.

    Apparatus using multiple charged particle beams
    2.
    发明授权
    Apparatus using multiple charged particle beams 有权

    公开(公告)号：US12243709B2

    公开(公告)日：2025-03-04

    申请号：US17373766

    申请日：2021-07-12

    Applicant: ASML Netherlands B.V.

    Inventor： Weiming Ren ,  Xuedong Liu ,  Xuerang Hu ,  Zhong-Wei Chen

    IPC: H01J37/145

    Abstract: The present disclosure proposes an anti-rotation lens and using it as an anti-rotation condenser lens in a multi-beam apparatus with a pre-beamlet-forming mechanism. The anti-rotation condenser lens keeps rotation angles of beamlets unchanged when changing currents thereof, and thereby enabling the pre-beamlet-forming mechanism to cut off electrons not in use as much as possible. In this way, the multi-beam apparatus can observe a sample with high resolution and high throughput, and is competent as a yield management tool to inspect and/or review defects on wafers/masks in semiconductor manufacturing industry.

    Systems and methods for voltage contrast defect detection
    3.
    发明授权
    Systems and methods for voltage contrast defect detection 有权

    公开(公告)号：US12196692B2

    公开(公告)日：2025-01-14

    申请号：US17769690

    申请日：2020-09-30

    Applicant: ASML NETHERLANDS B.V.

    Inventor： Weiming Ren ,  Xuedong Liu ,  Zhong-wei Chen ,  Xiaoyu Ji ,  Xiaoxue Chen ,  Weimin Zhou ,  Frank Nan Zhang

    IPC: G01N23/2202 ,  G01N1/44 ,  G01N23/2251 ,  H01J37/02 ,  H01J37/244 ,  H01J37/28

    Abstract: Systems and methods of providing a probe spot in multiple modes of operation of a charged-particle beam apparatus are disclosed. The method may comprise activating a charged-particle source to generate a primary charged-particle beam and selecting between a first mode and a second mode of operation of the charged-particle beam apparatus. In the flooding mode, the condenser lens may focus at least a first portion of the primary charged-particle beam passing through an aperture of the aperture plate to form a second portion of the primary charged-particle beam, and substantially all of the second portion is used to flood a surface of a sample. In the inspection mode, the condenser lens may focus a first portion of the primary charged-particle beam such that the aperture of the aperture plate blocks off peripheral charged-particles to form the second portion of the primary charged-particle beam used to inspect the sample surface.

    Multiple charged-particle beam apparatus with low crosstalk
    8.
    发明授权
    Multiple charged-particle beam apparatus with low crosstalk 有权

    公开(公告)号：US12211669B2

    公开(公告)日：2025-01-28

    申请号：US17127956

    申请日：2020-12-18

    Applicant: ASML Netherlands B.V.

    Inventor： Weiming Ren ,  Zizhou Gong ,  Xuerang Hu ,  Xuedong Liu ,  Zhong-wei Chen

    IPC: H01J37/317 ,  H01J37/141 ,  H01J37/147 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28

    Abstract: Systems and methods of forming images of a sample using a multi-beam apparatus are disclosed. The method may include generating a plurality of secondary electron beams from a plurality of probe spots on the sample upon interaction with a plurality of primary electron beams. The method may further include adjusting an orientation of the plurality of primary electron beams interacting with the sample, directing the plurality of secondary electron beams away from the plurality of primary electron beams, compensating astigmatism aberrations of the plurality of directed secondary electron beams, focusing the plurality of directed secondary electron beams onto a focus plane, detecting the plurality of focused secondary electron beams by a charged-particle detector, and positioning a detection plane of the charged-particle detector at or close to the focus plane.

    Multiple charged-particle beam apparatus and methods
    9.
    发明授权
    Multiple charged-particle beam apparatus and methods 有权

    公开(公告)号：US11854765B2

    公开(公告)日：2023-12-26

    申请号：US16885872

    申请日：2020-05-28

    Applicant: ASML Netherlands B.V.

    Inventor： Weiming Ren ,  Xuedong Liu ,  Xuerang Hu ,  Zhong-wei Chen ,  Martinus Gerardus Johannes Maria Maassen

    IPC: H01J37/317 ,  H01J37/145 ,  H01J37/28

    CPC classification number: H01J37/3177 ,  H01J37/145 ,  H01J37/28 ,  H01J2237/0453

    Abstract: Systems and methods of mitigating Coulomb effect in a multi-beam apparatus are disclosed. The multi-beam apparatus may include a charged-particle source configured to generate a primary charged-particle beam along a primary optical axis, a first aperture array comprising a first plurality of apertures having shapes and configured to generate a plurality of primary beamlets derived from the primary charged-particle beam, a condenser lens comprising a plane adjustable along the primary optical axis, and a second aperture array comprising a second plurality of apertures configured to generate probing beamlets corresponding to the plurality of beamlets, wherein each of the plurality of probing beamlets comprises a portion of charged particles of a corresponding primary beamlet based on at least a position of the plane of the condenser lens and a characteristic of the second aperture array.

Patent Agency Ranking