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    Charged particle source
    2.
    发明授权
    Charged particle source 有权

    公开(公告)号：US11075053B2

    公开(公告)日：2021-07-27

    申请号：US16667590

    申请日：2019-10-29

    Applicant: ASML Netherlands B.V.

    Inventor： Shuai Li

    IPC: H01J37/143 ,  H01J37/28 ,  H01J3/20 ,  H01J37/063 ,  H01J37/065 ,  H01J37/14 ,  H01J37/09

    Abstract: This invention provides a charged particle source, which comprises an emitter and means for generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero.

    Apparatus of plural charged-particle beams
    3.
    发明授权
    Apparatus of plural charged-particle beams 有权

    公开(公告)号：US11107657B2

    公开(公告)日：2021-08-31

    申请号：US16866482

    申请日：2020-05-04

    Applicant: ASML Netherlands B.V.

    Inventor： Weiming Ren ,  Shuai Li ,  Xuedong Liu ,  Zhongwei Chen

    IPC: H01J37/28 ,  H01J37/147 ,  H01J37/05 ,  H01J37/063 ,  H01J37/304 ,  H01J29/51 ,  H01J37/12

    Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.

    Apparatus of plural charged-particle beams
    4.
    发明授权
    Apparatus of plural charged-particle beams 有权

    公开(公告)号：US11062877B2

    公开(公告)日：2021-07-13

    申请号：US16734219

    申请日：2020-01-03

    Applicant: ASML Netherlands B.V.

    Inventor： Shuai Li ,  Weiming Ren ,  Xuedong Liu ,  Juying Dou ,  Xuerang Hu ,  Zhongwei Chen

    IPC: H01J37/28 ,  H01J37/10 ,  H01J37/20 ,  H01J37/244

    Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput and in flexibly varying observing conditions is proposed. The apparatus uses a movable collimating lens to flexibly vary the currents of the plural probe spots without influencing the intervals thereof, a new source-conversion unit to form the plural images of the single electron source and compensate off-axis aberrations of the plural probe spots with respect to observing conditions, and a pre-beamlet-forming means to reduce the strong Coulomb effect due to the primary-electron beam.

    Apparatus of plural charged-particle beams
    6.
    发明授权
    Apparatus of plural charged-particle beams 有权

    公开(公告)号：US11043354B2

    公开(公告)日：2021-06-22

    申请号：US16799773

    申请日：2020-02-24

    Applicant: ASML Netherlands B.V.

    Inventor： Xuedong Liu ,  Weiming Ren ,  Shuai Li ,  Zhongwei Chen

    IPC: H01J37/147 ,  H01J37/28 ,  H01J37/04 ,  H01J37/153

    Abstract: One modified source-conversion unit and one method to reduce the Coulomb Effect in a multi-beam apparatus are proposed. In the modified source-conversion unit, the aberration-compensation function is carried out after the image-forming function has changed each beamlet to be on-axis locally, and therefore avoids undesired aberrations due to the beamlet tilting/shifting. A Coulomb-effect-reduction means with plural Coulomb-effect-reduction openings is placed close to the single electron source of the apparatus and therefore the electrons not in use can be cut off as early as possible.

    Objective lens system for fast scanning large FOV
    7.
    发明授权
    Objective lens system for fast scanning large FOV 有权

    公开(公告)号：US12300458B2

    公开(公告)日：2025-05-13

    申请号：US18498984

    申请日：2023-10-31

    Applicant: ASML Netherlands B.V.

    Inventor： Shuai Li ,  Zhongwei Chen

    IPC: H01J37/145 ,  H01J37/141 ,  H01J37/147

    Abstract: The device includes a beam source for generating an electron beam, a beam guiding tube passed through an objective lens, an objective lens for generating a magnetic field in the vicinity of the specimen to focus the particles of the particle beam on the specimen, a control electrode having a potential for providing a retarding field to the particle beam near the specimen to reduce the energy of the particle beam when the beam collides with the specimen, a deflection system including a plurality of deflection units situated along the optical axis for deflecting the particle beam to allow scanning on the specimen with large area, at least one of the deflection units located in the retarding field of the beam, the remainder of the deflection units located within the central bore of the objective lens, and a detection unit to capture secondary electron (SE) and backscattered electrons (BSE).

    Apparatus of plural charged-particle beams
    9.
    发明授权
    Apparatus of plural charged-particle beams 有权

    公开(公告)号：US11217423B2

    公开(公告)日：2022-01-04

    申请号：US16357309

    申请日：2019-03-18

    Applicant: ASML Netherlands B.V.

    Inventor： Weiming Ren ,  Shuai Li ,  Xuedong Liu ,  Zhongwei Chen ,  Jack Jau

    IPC: H01J37/28

    Abstract: A multi-beam apparatus for observing a sample with oblique illumination is proposed. In the apparatus, a new source-conversion unit changes a single electron source into a slant virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample with oblique illumination, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means not only forms the slant virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots. The apparatus can provide dark-field images and/or bright-field images of the sample.

    APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
    10.
    发明申请
    APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS 审中-公开

    公开(公告)号：US20200152421A1

    公开(公告)日：2020-05-14

    申请号：US16734219

    申请日：2020-01-03

    Applicant: ASML Netherlands B.V.

    Inventor： Shuai Li ,  Weiming Ren ,  Xuedong Liu ,  Juying Dou ,  Xuerang Hu ,  Zhongwei Chen

    IPC: H01J37/28 ,  H01J37/10

    Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput and in flexibly varying observing conditions is proposed. The apparatus uses a movable collimating lens to flexibly vary the currents of the plural probe spots without influencing the intervals thereof, a new source-conversion unit to form the plural images of the single electron source and compensate off-axis aberrations of the plural probe spots with respect to observing conditions, and a pre-beamlet-forming means to reduce the strong Coulomb effect due to the primary-electron beam.

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