公开(公告)号：US12049883B2

公开(公告)日：2024-07-30

申请号：US18466294

申请日：2023-09-13

Applicant: SHINE TECHNOLOGIES, LLC

Inventor： Arne V. Kobernik ,  Brandon A. Jackson ,  Thomas C. Bonde ,  Tye Gribb ,  Ross F. Radel

IPC: H01J37/147 ,  F04B37/16

CPC classification number: F04B37/16 ,  H01J37/147 ,  H01J2237/15

Abstract: Provided herein are articles of manufacture, systems, and methods employing a gas-deflector plate in low to ultra-high vacuum systems that use differential pumping (e.g., gas-target particle accelerators, mass spectrometers, and windowless delivery ports). In certain embodiments, the gas-deflector plate is configured to be positioned between higher and lower pressure regions in a pressurized system, wherein the gas-deflector plate has a channel therethrough shaped and/or angled such that jetting gas moving through the channel enters the lower pressure region at an angle offset from the vertical axis of the gas-deflector plate and/or the channel. In other embodiments, a jet-deflector component is employed such that the jetting gas strikes such jet-deflector component and is re-directed in another direction.

公开(公告)号：US20240186102A1

公开(公告)日：2024-06-06

申请号：US18410075

申请日：2024-01-11

Applicant: TECHNION RESEARCH & DEVELOPMENT FOUNDATION LIMITED

Inventor： Raphael DAHAN ,  Ido KAMINER ,  Michael YANNAI ,  Tal FISHMAN

IPC: H01J37/147 ,  H01J37/28

CPC classification number: H01J37/147 ,  H01J37/28

Abstract: A charged particles beam column for inspecting a sample in a sample plane is presented. The charged particles beam column comprises: a charged particles source generating a charged particles beam propagating along a general propagation path towards the sample plane; and at least one charged particles beam shaping unit. The charged particles shaping unit comprises at least one high-frequency electromagnetic radiation generator located in a vicinity of said general propagation path of the charged particles beam and controllably operated to perform synchronized generation of said high-frequency electromagnetic radiation towards at least one interaction region in said general propagation path, to cause interaction between said radiation and the charged particles, thereby directly affecting energy properties of the charged particles passing through said at least one interaction region in the general propagation path and directly affecting spectral resolution of the charged particles beam at said sample plane.

公开(公告)号：US20240153731A1

公开(公告)日：2024-05-09

申请号：US18039177

申请日：2021-11-24

Applicant: KYOCERA Corporation

Inventor： Takeshi MUNEISHI

IPC: H01J37/147

CPC classification number: H01J37/147 ,  H01J2237/151

Abstract: The manufacturing method for an electrostatic deflector includes: obtaining a plurality of first compacts having a sheet-like shape by molding a raw material containing a ceramic into each desired shape; obtaining a second compact by layering the plurality of first compacts; obtaining a tubular body by firing the second compact; and forming an internal electrode and an external electrode on an inner wall surface of the tubular body and on a surface other than the inner wall surface. In the obtaining the plurality of first compacts, a wiring layer serving as a connection conductor that electrically connects the internal electrode and the external electrode is formed on a surface of the first compact that is predetermined.

公开(公告)号：US20230417233A1

公开(公告)日：2023-12-28

申请号：US18466294

申请日：2023-09-13

Applicant: SHINE TECHNOLOGIES, LLC

Inventor： Arne V. Kobernik ,  Brandon A. Jackson ,  Thomas C. Bonde ,  Tye Gribb ,  Ross F. Radel

IPC: F04B37/16 ,  H01J37/147

CPC classification number: F04B37/16 ,  H01J37/147 ,  H01J2237/15

Abstract: Provided herein are articles of manufacture, systems, and methods employing a gas-deflector plate in low to ultra-high vacuum systems that use differential pumping (e.g., gas-target particle accelerators, mass spectrometers, and windowless delivery ports). In certain embodiments, the gas-deflector plate is configured to be positioned between higher and lower pressure regions in a pressurized system, wherein the gas-deflector plate has a channel therethrough shaped and/or angled such that jetting gas moving through the channel enters the lower pressure region at an angle offset from the vertical axis of the gas-deflector plate and/or the channel. In other embodiments, a jet-deflector component is employed such that the jetting gas strikes such jet-deflector component and is re-directed in another direction.

公开(公告)号：US20230411112A1

公开(公告)日：2023-12-21

申请号：US18201536

申请日：2023-05-24

Applicant: Integrated Dynamic Electron Solutions, Inc.

Inventor： Ruth Shewmon BLOOM ,  Bryan Walter REED ,  Daniel Joseph MASIEL ,  Sang Tae PARK

IPC: H01J37/24 ,  H01J37/29 ,  H01J37/28 ,  H01J37/147

CPC classification number: H01J37/243 ,  H01J37/292 ,  H01J37/28 ,  H01J37/147

Abstract: A device may include an electron source, a detector, and a deflector. The electron source may be directed toward a sample area. The detector may receive an electron signal or an electron-induced signal. A deflector may be positioned between the electron source and the sample. The deflector may modulate an intensity of the electron source directed to the sample area according to an electron dose waveform having a continuously variable temporal profile.

公开(公告)号：US11804361B2

公开(公告)日：2023-10-31

申请号：US17661188

申请日：2022-04-28

Applicant: NuFlare Technology, Inc.

Inventor： Haruyuki Nomura ,  Noriaki Nakayamada ,  Munehiro Ogasawara

IPC: H01J37/317 ,  H01J37/147 ,  H01J37/302 ,  H01J37/304

CPC classification number: H01J37/3174 ,  H01J37/147 ,  H01J37/3026 ,  H01J37/3045

Abstract: In a charged particle beam writing method according to one embodiment, a deflector is caused to deflect a charged particle beam and a pattern is written by irradiating a substrate with the charged particle beam. The charged particle beam writing method includes calculating a charge amount distribution based on a charge amount of a beam irradiation region on the substrate immediately after irradiation with the charged particle beam and a diffusion coefficient for electric charge of the substrate, calculating a position shift distribution of the charged particle beam on the substrate based on the charge amount distribution, and correcting an irradiation position of the charged particle beam based on the position shift distribution.

公开(公告)号：US20230282440A1

公开(公告)日：2023-09-07

申请号：US18134020

申请日：2023-04-12

Applicant: ASML Netherlands B.V.

Inventor： Marco Jan-Jaco WIELAND

IPC: H01J37/147 ,  H01J37/12

CPC classification number: H01J37/147 ,  H01J37/12 ,  H01J2237/2817

Abstract: Disclosed herein is an aperture array configured to define sub-beams that are scanned in a scanning direction in a charged particle apparatus, the aperture array comprising a plurality of apertures arranged in an aperture pattern that comprises: a plurality of parallel aperture rows, wherein apertures are arranged along the aperture rows and the aperture rows are inclined relative to the scanning direction; an edge aperture row defining an edge of the aperture pattern; and an adjacent aperture row adjacent the edge row; wherein the edge aperture row and the adjacent aperture row each comprise fewer apertures than another aperture row of the aperture pattern.

公开(公告)号：US11742176B2

公开(公告)日：2023-08-29

申请号：US17536288

申请日：2021-11-29

Applicant: JEOL Ltd.

Inventor： Kazuki Yagi ,  Yoshiki Oyama

IPC: H01J37/28 ,  H01J37/10 ,  H01J37/26 ,  H01J37/147

CPC classification number: H01J37/28 ,  H01J37/10 ,  H01J37/147 ,  H01J37/265 ,  H01J2237/2802

Abstract: A transmission electron microscope includes a control unit that: determines an excitation amount of a second illumination system lens based on an excitation amount of first illumination system lens such that the second illumination system lens satisfies a first optical condition; and determines a control amount of a first deflector and a control amount of a second deflector based on the excitation amount of the second illumination system lens such that the first deflector and the second deflector satisfy a second optical condition. The first optical condition is for a convergence angle of the electron beam to be constant even if the excitation amount of the first illumination system lens has changed, and the second optical condition is for an illuminating position of the electron beam and an illuminating angle of the electron beam to be constant even if the excitation amount of the first illumination system lens has changed.

公开(公告)号：US11728128B2

公开(公告)日：2023-08-15

申请号：US17825261

申请日：2022-05-26

Applicant: Integrated Dynamic Electron Solutions, Inc.

Inventor： Ruth Shewmon Bloom ,  Bryan Walter Reed ,  Daniel Joseph Masiel ,  Sang Tae Park

IPC: H01J37/24 ,  H01J37/29 ,  H01J37/28 ,  H01J37/147

CPC classification number: H01J37/243 ,  H01J37/147 ,  H01J37/28 ,  H01J37/292

Abstract: A device may include an electron source, a detector, and a deflector. The electron source may be directed toward a sample area. The detector may receive an electron signal or an electron-induced signal. A deflector may be positioned between the electron source and the sample. The deflector may modulate an intensity of the electron source directed to the sample area according to an electron dose waveform having a continuously variable temporal profile.

公开(公告)号：US20230154639A1

公开(公告)日：2023-05-18

申请号：US17917669

申请日：2021-02-11

Applicant: University of Pittsburgh - Of the Commonwealth System of Higher Education

Inventor： Jeremy Levy

IPC: G21K5/04 ,  H01J37/317 ,  H01J37/28 ,  H01J37/147 ,  H10N52/01 ,  H10N60/30 ,  H10N60/01 ,  H10N70/20 ,  H10N70/00

CPC classification number: G21K5/04 ,  H01J37/3174 ,  H01J37/28 ,  H01J37/147 ,  H10N52/01 ,  H10N60/30 ,  H10N60/01 ,  H10N70/257 ,  H10N70/041 ,  H01J2237/004

Abstract: Described is a method comprising directing an ultra-low voltage electron beam to a surface of a first insulating layer. The first insulating layer is disposed on a second insulating layer. The method includes modifying, by the application of the ultra-low voltage electron beam, the surface of the first insulating layer to selectively switch an interface between a first state having a first electronic property and a second state having a second electronic property.