SYSTEM AND METHOD FOR RESOLUTION IMPROVEMENT OF CHARGED PARTICLES MICROSCOPY

    公开(公告)号:US20240186102A1

    公开(公告)日:2024-06-06

    申请号:US18410075

    申请日:2024-01-11

    CPC classification number: H01J37/147 H01J37/28

    Abstract: A charged particles beam column for inspecting a sample in a sample plane is presented. The charged particles beam column comprises: a charged particles source generating a charged particles beam propagating along a general propagation path towards the sample plane; and at least one charged particles beam shaping unit. The charged particles shaping unit comprises at least one high-frequency electromagnetic radiation generator located in a vicinity of said general propagation path of the charged particles beam and controllably operated to perform synchronized generation of said high-frequency electromagnetic radiation towards at least one interaction region in said general propagation path, to cause interaction between said radiation and the charged particles, thereby directly affecting energy properties of the charged particles passing through said at least one interaction region in the general propagation path and directly affecting spectral resolution of the charged particles beam at said sample plane.

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