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公开(公告)号：US20240266140A1
公开(公告)日：2024-08-08
申请号：US18619397
申请日：2024-03-28
发明人： Sho KAWATSU , Masateru SATO
IPC分类号： H01J37/08 , H01J37/09 , H01J37/317
CPC分类号： H01J37/08 , H01J37/09 , H01J37/3171 , H01J2237/061
摘要： An ion generation device includes an arc chamber including an internal space and including a front slit for extracting an ion beam from plasma generated in the internal space, a magnetic field generator that generates a magnetic field applied in an axial direction in the internal space, and a first cathode configured to supply a thermoelectron into the internal space. The first cathode includes a first cathode cap, a first heat source, and a first thermal shield including a first extension portion. A first tip portion, and a first tip opening, and a first opening width of the first tip opening in the radial direction is smaller than a maximum width of the first cathode cap in the radial direction.
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公开(公告)号：US20240258065A1
公开(公告)日：2024-08-01
申请号：US18424034
申请日：2024-01-26
发明人： Dirk Preikszas , Kai Wicker , Bjoern Gamm , Yauheni Novikau , Ralf Wolleschensky
IPC分类号： H01J37/21 , G06T7/00 , H01J37/09 , H01J37/145 , H01J37/147 , H01J37/153 , H01J37/22 , H01J37/28
CPC分类号： H01J37/21 , G06T7/0002 , H01J37/09 , H01J37/145 , H01J37/1472 , H01J37/153 , H01J37/222 , H01J37/28 , G06T2207/10148 , G06T2207/20221 , H01J2237/0451 , H01J2237/0458 , H01J2237/1534 , H01J2237/24578
摘要： Particle beam systems, for example electron beam microscopes, exhibit improved resolution in a first direction by manipulating a beam of charged particles so that the beam has a non-circular beam profile in a focal plane of an objective lens. Multiple images of a sample can be recorded at different orientations of the beam profile relative to the sample, and the recorded images can be synthesized using non-uniform spatial-frequency weights to obtain an image of the sample having improved resolution in any direction. The orientation of the beam profile can be adjusted to a target orientation depending on a structure on a sample prior to recording an image of the sample, thereby making it possible to achieve highest resolution in a selected direction of interest.
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公开(公告)号：US12046443B2
公开(公告)日：2024-07-23
申请号：US17532358
申请日：2021-11-22
发明人： Klaus Becker , Luigi G. Amato , Elvis Gomez , David Burgdorf , Victor Theriault , Thomas Stewart
IPC分类号： H01J37/08 , H01J37/09 , H01J37/317
CPC分类号： H01J37/08 , H01J37/09 , H01J37/3171
摘要： A Bernas ion source having a shield is disclosed. The shield is disposed between the distal portion of the filament and the first end of the chamber and serves to confine the plasma to the region between the shield and the second end of the chamber. The shield may be electrically connected to the negative leg of the filament so as to be the most negatively biased component in the chamber. In other embodiments, the shield may be electrically floating. In this embodiment, the shield may self-bias. The shield is typically made of a refractory metal. The use of the shield may reduce back heating of the filament by the plasma and reduce the possibility for thermal runaway. This may allow denser plasmas to be generated within the chamber.
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公开(公告)号：US20240242927A1
公开(公告)日：2024-07-18
申请号：US18562345
申请日：2022-05-24
发明人： Toshihiko OGURA
摘要： A sample holder for an impedance microscope according to an aspect includes: a first insulating film having a front surface and a back surface; a second insulating film having a front surface facing the back surface of the first insulating film and a back surface; a conductive film disposed on the front surface of the first insulating film; an electrode disposed to face the back surface of the second insulating film; and a conductive member fixed at a ground potential or a constant potential, in which the conductive member has an opening located between the first insulating film and the electrode.
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公开(公告)号：US20240208762A1
公开(公告)日：2024-06-27
申请号：US18536792
申请日：2023-12-12
申请人： JEOL Ltd.
发明人： Tsutomu Negishi , Munehiro Kozuka
CPC分类号： B65H35/002 , B65H59/06 , H01J37/09 , H01J37/3053
摘要： There is provided a shield plate fabrication apparatus capable of fabricating a shield plate easily. The shield plate is included in a sample milling apparatus which mills a sample by shielding a part of the sample with the shield plate and irradiating the sample with a charged particle beam. The fabrication apparatus includes: a base plate holding shaft for rotatably holding a base plate and winding tape around the base plate; and a tension mechanism for applying tension to the tape while it is being wound around the base plate.
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6.发明授权公开(公告)号：US12020894B2
公开(公告)日：2024-06-25
申请号：US17324301
申请日：2021-05-19
申请人： JEOL Ltd.
发明人： Shio En , Takashi Sato
IPC分类号： H01J37/147 , B22F10/80 , B22F12/41 , B23K15/00 , B23K15/02 , B33Y30/00 , B33Y50/00 , H01J37/09
CPC分类号： H01J37/1474 , B22F10/80 , B22F12/41 , B23K15/002 , B23K15/0086 , B23K15/02 , B33Y30/00 , B33Y50/00 , H01J37/09
摘要： A beam adjustment method includes: installing, on an irradiation surface to which an electron beam is radiated, a detection part having a Faraday cup catching electrical charges of the electron beam, and installing, on a side of an electron gun further than the detection part, a shielding plate having opening holes through which the electron beam is passable. The method includes causing, upon performing beam diameter measurement processing, the electron beam to pass through the opening holes, and radiating the electron beam to the Faraday cup. In addition, the method includes radiating, upon performing normal processing, the electron beam to the shielding plate.
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7.发明公开公开(公告)号：US20240136148A1
公开(公告)日：2024-04-25
申请号：US18461180
申请日：2023-09-04
IPC分类号： H01J37/244 , H01J37/09 , H01J37/317
CPC分类号： H01J37/244 , H01J37/09 , H01J37/3174 , H01J2237/0451 , H01J2237/1501 , H01J2237/24564
摘要： In one embodiment, a beam detector includes a first aperture plate including a first passage hole, a second aperture plate including a second passage hole that allows a single detection target beam passing through the first passage hole to pass therethrough, and a sensor detecting a beam current of the detection target beam passing through the second passage hole. The second aperture plate includes an electrically conductive material, a plurality of third passage holes are formed around the second passage hole, and the plurality of third passage holes allow light to pass therethrough.
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公开(公告)号：US20230411109A1
公开(公告)日：2023-12-21
申请号：US17807362
申请日：2022-06-16
申请人： FEI Company
IPC分类号： H01J37/09 , H01J37/244 , H01J37/22
CPC分类号： H01J37/09 , H01J37/244 , H01J37/226 , H01J2237/2443 , H01J2237/2445 , H01J2237/0458
摘要： Variations in charged-particle-beam (CPB) source location are determined by scanning an alignment aperture that is fixed with respect to a beam defining aperture in a CPB, particularly at edges of a defocused CPB illumination disk. The alignment aperture is operable to transmit a CPB portion to a secondary emission surface that produces secondary emission directed to a scintillator element. Scintillation light produced in response is directed out of a vacuum enclosure associated with the CPB via a light guide to an external photodetection system.
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公开(公告)号：US11804360B2
公开(公告)日：2023-10-31
申请号：US17778758
申请日：2020-11-04
发明人： Tsubasa Nanao , Hirofumi Morita , Takanao Touya
IPC分类号： H01J37/304 , H01J37/12 , H01J37/14 , H01J37/317 , H01J37/04 , G03F7/00 , H01J37/09
CPC分类号： H01J37/304 , G03F7/7005 , G03F7/7055 , G03F7/70383 , H01J37/12 , H01J37/14 , H01J37/3177 , H01J37/045 , H01J37/09 , H01J2237/0435
摘要： The present invention quickly calculates values of optimal excitation parameters which are set in lenses in multiple stages. A multi charged particle beam adjustment method includes forming a multi charged particle beam, calculating, for each of lenses in two or more stages disposed corresponding to object lenses in two or more stages, a first rate of change and a second rate of change in response to change in at least an excitation parameter, the first rate of change being a rate of change in a demagnification level of a beam image of the multi charged particle beam, the second rate of change being a rate of change in a rotation level of the beam image, and calculating a first amount of correction to the excitation parameter of each of the lenses based on an amount of correction to the demagnification level and the rotation level of the beam image, the first rate of change, and the second rate of change.
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公开(公告)号：US11749493B2
公开(公告)日：2023-09-05
申请号：US17027291
申请日：2020-09-21
CPC分类号： H01J37/08 , H01J37/09 , H01J2237/0805 , H01J2237/31749
摘要： A liquid metal ion source (50) includes: a reservoir (10) configured to hold an ion material (M) forming a liquid metal; a needle electrode (20); an extraction electrode (22) configured to cause an ion of the ion material to be emitted from a distal end of the needle electrode; a beam diaphragm (24), which is arranged on a downstream side of the extraction electrode, and is configured to limit a beam diameter of the ion; and a vacuum chamber (30) configured to accommodate and hold the reservoir, the needle electrode, the extraction electrode, and the beam diaphragm in vacuum, wherein the liquid metal ion source further includes an oxidizing gas introducing portion (40), and wherein the oxidizing gas introducing portion communicates to the vacuum chamber, and is configured to introduce an oxidizing gas into a periphery of the needle electrode.
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