公开(公告)号：US20250046563A1

公开(公告)日：2025-02-06

申请号：US18362429

申请日：2023-07-31

Applicant: Axcelis Technologies, Inc.

Inventor： Wilhelm Peter Platow ,  Edward C. Eisner ,  Shu Satoh

IPC: H01J37/141 ,  H01J37/21 ,  H01J37/244 ,  H01J37/317

Abstract: A magnetic focusing apparatus for focusing an ion beam has a first magnet pair, a first core having a first yoke and a pair of first pole members defining a pair of first poles. A second core has a second yoke and a pair of second pole members defining a pair of second poles. A first gap separates the pairs of first and second poles. First and second coils are respectively wound around the first and second cores. The pairs of first and second poles control a focus of the ion beam along a first plane based on a current, and the pairs of first and second poles define an exit trajectory of the ion beam along a second plane downstream of the first magnet pair. The exit trajectory does not angularly deviate along the second plane from an entrance trajectory upstream of the first magnet pair.

公开(公告)号：US20250006453A1

公开(公告)日：2025-01-02

申请号：US18342643

申请日：2023-06-27

Applicant: FEI Company

Inventor： Jan Stopka ,  Tomáš Radlicka ,  Martin Oral

IPC: H01J37/14 ,  H01J37/20 ,  H01J37/21 ,  H01J37/28

Abstract: Magnetic lenses, charged particle microscope systems including the same, and associated methods. In an example, a magnetic lens is configured to direct a charged particle beam to a sample location and comprises a plurality of pole pieces and at least two independent coils. The magnetic lens operates as an objective lens with variable main objective plane without immersing a sample in a magnetic field. The variable main objective plane permits selective adjustment of a magnification of the charged particle beam at the focal plane without immersing the sample location in the magnetic fields produced by coils of the magnetic lens. In an example, a charged particle microscope system comprises a charged particle source, a sample holder, and a magnetic objective lens. In an example, a method comprises positioning a sample relative to a magnetic lens and operating the magnetic lens to focus a charged particle beam to a focus location.

公开(公告)号：US20240379326A1

公开(公告)日：2024-11-14

申请号：US18658499

申请日：2024-05-08

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Bjoern Gamm

IPC: H01J37/26 ,  H01J37/14 ,  H01J37/21

Abstract: A method for operating an electron beam system comprises setting a first potential supplied to an electron emitter to a first value, a second potential supplied to a beam tube to a second value and a third potential supplied to an object to a third value such that the third potential is greater than the first potential and the second potential is greater than the third potential. The method also comprises focusing a beam of the electron beam system on the object by modifying at least one current supplied to at least one focusing magnetic lens.

公开(公告)号：US20240177962A1

公开(公告)日：2024-05-30

申请号：US18072451

申请日：2022-11-30

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Ofer Dudovitch ,  Ido Ben Noon ,  Efi Zertser

IPC: H01J37/20 ,  G01N23/2251 ,  H01J37/18 ,  H01J37/21 ,  H01J37/28

CPC classification number: H01J37/20 ,  G01N23/2251 ,  H01J37/18 ,  H01J37/21 ,  H01J37/28 ,  H01J2237/24578

Abstract: A system for processing a sample comprising: a vacuum chamber having a window formed along one of its walls; a sample support configured to hold a sample within the vacuum chamber during a sample processing operation and move the substrate within the vacuum chamber along the X, Y and Z axes; a charged particle beam column configured to direct a charged particle beam into the vacuum chamber and focus the beam to collide with a region of interest on the sample; an optical distance measurement device configured to generate and direct electromagnetic radiation into the vacuum chamber through the window, detect photons from the electromagnetic radiation reflected off the sample, and determine a working distance between the sample and charged particle column based on the generated electromagnetic radiation and the detected photons; and one or more mirrors disposed within the vacuum chamber and positioned to direct the electromagnetic radiation generated by the optical distance measurement system to a measured location on the sample that is in close proximity to the region of interest, the one or more mirrors comprising at least one mirror positioned directly under a portion of the charged particle column.

公开(公告)号：US20240071715A1

公开(公告)日：2024-02-29

申请号：US17893836

申请日：2022-08-23

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Sissi Lachmi ,  Hagay Famini

IPC: H01J37/21 ,  H01J37/147 ,  H01J37/28

CPC classification number: H01J37/21 ,  H01J37/1478 ,  H01J37/28 ,  H01J2237/216

Abstract: A charged particle evaluation system that may include a column that includes an opening; an illumination unit that is configured to scan an area of a sample with an electron beam that passes through the opening; and an optical auto-focus unit that is configured to (i) illuminate the sample with an optical beam that is proximate to the electron beam, during the scan of the area with the electron beam; (ii) receive a reflected optical beam from the sample, (iii) determine a focus status of the electron beam, and (iv) participate in a compensating of an electron beam misfocus.

公开(公告)号：US20230411111A1

公开(公告)日：2023-12-21

申请号：US18142119

申请日：2023-05-02

Applicant: Hitachi High-Tech Corporation

Inventor： Tetsuro KADOWAKI ,  Takeyoshi OHASHI ,  Takuma YAMAMOTO

IPC: H01J37/21 ,  H01J37/147 ,  H01J37/28

CPC classification number: H01J37/21 ,  H01J37/1478 ,  H01J2237/24578 ,  H01J2237/216 ,  H01J2237/24585 ,  H01J37/28

Abstract: The present disclosure makes it possible to shorten the time required for measurement of a sample and to measure the sample with high throughput. A charged particle beam apparatus includes a storage device that stores a correction value table corresponding to a recipe and a computer system that executes measurement on a plurality of measurement points of a sample according to a measurement order determined in the recipe. The computer system stores, when executing the recipe on a first sample, an adjustment result of one or more imaging conditions in the correction value table at each of a plurality of measurement points of the first sample, and adjusts, when executing the recipe on a second sample different from the first sample, the imaging condition based on the adjustment result of the one or more imaging conditions stored in the correction value table at each of the plurality of measurement points.

公开(公告)号：US11721517B2

公开(公告)日：2023-08-08

申请号：US17207184

申请日：2021-03-19

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Hiroshi Oba ,  Yasuhiko Sugiyama ,  Yoshitomo Nakagawa ,  Koji Nagahara

IPC: H01J37/12 ,  H01J37/09 ,  H01J37/317 ,  H01J37/08 ,  H01J37/20 ,  H01J37/21

CPC classification number: H01J37/12 ,  H01J37/08 ,  H01J37/09 ,  H01J37/20 ,  H01J37/21 ,  H01J37/3175 ,  H01J2237/31788

Abstract: Provided is a focused ion beam processing apparatus including: an ion source; a sample stage a condenser lens; an aperture having a slit in a straight line shape; a projection lens and the sample stage, wherein, in a transfer mode, by Köhler illumination, with an applied voltage of the condenser lens when a focused ion beam is focused on a main surface of the projection lens scaled to be 100, the applied voltage is set to be less than 100 and greater than or equal to 80; a position of the aperture is set such that the focused ion beam is masked by the aperture with the one side of the aperture at a distance greater than 0 μm and equal to or less than 500 μm from a center of the focused ion beam; and the shape of the slit is transferred onto the sample.

公开(公告)号：US20230230798A1

公开(公告)日：2023-07-20

申请号：US18007588

申请日：2020-06-08

Applicant: Hitachi High-Tech Corporation

Inventor： Keisuke IGARASHI ,  Wei Chean TAN ,  Mai YOSHIHARA ,  Hiroyuki CHIBA

IPC: H01J37/21 ,  H01J37/20 ,  H01J37/22

CPC classification number: H01J37/21 ,  H01J37/20 ,  H01J37/222

Abstract: A technique that enables automatic focus adjustment even for a sample having regions with different heights is proposed. A charged particle beam device according to the disclosure includes: a sample holder configured to hold a sample; a sample stage configured to move the sample; a charged particle gun and a charged particle beam column configured to irradiate the sample with a charged particle beam; an objective lens configured to perform focus adjustment by changing an intensity of a focusing effect on the charged particle beam; a detector configured to detect electrons from the sample and output a signal forming an electron image; an optical imaging device configured to capture an optical image of the sample; and a control device configured to calculate height information of the sample based on the optical image obtained by imaging the sample by the optical imaging device, and automatically set a focus adjustment value of an observation site based on the height information (see FIG. 5).

公开(公告)号：US20230197401A1

公开(公告)日：2023-06-22

申请号：US18083630

申请日：2022-12-19

Applicant: JEOL Ltd.

Inventor： Munehiro Kozuka

IPC: H01J37/21 ,  H01J37/305

CPC classification number: H01J37/21 ,  H01J37/305 ,  H01J2237/083 ,  H01J2237/20214 ,  H01J2237/24578 ,  H01J2237/30477 ,  H01J2237/31749

Abstract: Provided is a sample milling apparatus capable of milling various samples efficiently. The sample milling apparatus includes an anode, a cathode for emitting electrons which are made to collide with gas molecules so that ions are generated, an extraction electrode for causing the generated ions to be extracted as an ion beam, and a focusing electrode disposed between the cathode and the extraction electrode and applied with a focusing voltage. The spatial profile of the ion beam is controlled by varying the focusing voltage applied to the focusing electrode.

公开(公告)号：US20230162945A1

公开(公告)日：2023-05-25

申请号：US17989550

申请日：2022-11-17

Applicant: FEI Company

Inventor： Jaroslav Velcovský ,  Jirí Kutálek ,  Radek Smolka ,  Jirí Vítecek ,  Bronislav Pribyl ,  Dávid Pacura

IPC: H01J37/305 ,  H01J37/28 ,  H01J37/21 ,  H01J37/147 ,  H01J37/30 ,  B23K26/38

CPC classification number: H01J37/305 ,  H01J37/28 ,  H01J37/21 ,  H01J37/1471 ,  H01J37/3005 ,  B23K26/38 ,  H01J2237/31749 ,  H01J2237/24578 ,  H01J2237/216 ,  H01J2237/1506 ,  H01J2237/2803

Abstract: The invention relates to method of milling and imaging a sample. The method comprises the step of providing an imaging system, as well as a milling beam source. The method comprises the steps of milling, using a milling beam from said milling beam source, a sample to remove a layer of the sample; and imaging, using said imaging system, an exposed surface of the sample. As defined herein, the method further comprises the step of determining a relative position of said sample, and using said determined relative position of said sample in said milling step for positioning said sample relative to said milling beam. The relative position of said sample can be a working distance with respect to the imaging system, which can be determined by means of an autofocus procedure.