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公开(公告)号：US20210238732A1
公开(公告)日：2021-08-05
申请号：US17235351
申请日：2021-04-20
Applicant: APPLIED Materials, Inc.
Inventor： Graham Wright , Klaus Becker
Abstract: An advanced sputter target is disclosed. The advanced sputter target comprises two components, a porous carrier, and a metal material disposed within that porous carrier. The porous carrier is designed to be a high porosity, open cell structure such that molten material may flow through the carrier. The porous carrier also provides structural support for the metal material. The cell sizes of the porous carrier are dimensioned such that the capillary action and surface tension prohibits the metal material from spilling, dripping, or otherwise exiting the porous carrier. In some embodiments, the porous carrier is an open cell foam, a weave of strands or stacked meshes.
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公开(公告)号：US12046443B2
公开(公告)日：2024-07-23
申请号：US17532358
申请日：2021-11-22
Applicant: Applied Materials, Inc.
Inventor： Klaus Becker , Luigi G. Amato , Elvis Gomez , David Burgdorf , Victor Theriault , Thomas Stewart
IPC: H01J37/08 , H01J37/09 , H01J37/317
CPC classification number: H01J37/08 , H01J37/09 , H01J37/3171
Abstract: A Bernas ion source having a shield is disclosed. The shield is disposed between the distal portion of the filament and the first end of the chamber and serves to confine the plasma to the region between the shield and the second end of the chamber. The shield may be electrically connected to the negative leg of the filament so as to be the most negatively biased component in the chamber. In other embodiments, the shield may be electrically floating. In this embodiment, the shield may self-bias. The shield is typically made of a refractory metal. The use of the shield may reduce back heating of the filament by the plasma and reduce the possibility for thermal runaway. This may allow denser plasmas to be generated within the chamber.
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公开(公告)号：US20200157675A1
公开(公告)日：2020-05-21
申请号：US16191526
申请日：2018-11-15
Applicant: APPLIED Materials, Inc.
Inventor： Graham Wright , Klaus Becker
Abstract: An advanced sputter target is disclosed. The advanced sputter target comprises two components, a porous carrier, and a metal material disposed within that porous carrier. The porous carrier is designed to be a high porosity, open cell structure such that molten material may flow through the carrier. The porous carrier also provides structural support for the metal material. The cell sizes of the porous carrier are dimensioned such that the capillary action and surface tension prohibits the metal material from spilling, dripping, or otherwise exiting the porous carrier. In some embodiments, the porous carrier is an open cell foam, a weave of strands or stacked meshes.
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公开(公告)号：US12096548B2
公开(公告)日：2024-09-17
申请号：US17949862
申请日：2022-09-21
Applicant: Applied Materials, Inc.
Inventor： Wai-Ming Tam , Klaus Becker , William Herron Park, Jr. , Frank Sinclair
CPC classification number: H05H7/22 , H05H7/02 , H05H2007/025 , H05H2007/222
Abstract: An apparatus may include a drift tube assembly having a plurality of drift tubes to conduct an ion beam along a beam propagation direction. The plurality of drift tubes may define a multi-gap configuration corresponding to a plurality of acceleration gaps, wherein at least one powered drift tube of the drift tube assembly is coupled to receive an RF voltage signal. The apparatus may also include a DC electrode assembly that includes a conductor line, arranged within a resonator coil that is coupled to receive a DC voltage signal into the at least one powered drift tube. The DC electrode assembly may also include a DC electrode arrangement, connected to the conductor line and disposed within the at least one powered drift tube.
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公开(公告)号：US10896799B1
公开(公告)日：2021-01-19
申请号：US16555064
申请日：2019-08-29
Applicant: Applied Materials, Inc.
Inventor： Klaus Becker , Carlos M. Goulart , Daniel Alvarado , Daniel R. Tieger , Alexander S. Perel
Abstract: An IHC ion source with multiple configurations is disclosed. For example, an IHC ion source comprises a chamber, having at least one electrically conductive wall, and a cathode and a repeller disposed on opposite ends of the chamber. Electrodes are disposed on one or more walls of the ion source. Bias voltages are applied to at least one of the cathode, repeller and the electrodes, relative to the electrically conductive wall of the chamber. Further, the IHC ion source comprises a configuration circuit, which receives the various voltages as input voltages, and provides selected output voltages to the cathode, repeller and electrodes, based on user input. In this way, the IHC ion source can be readily reconfigured for different applications without rewiring the power supplies, as is currently done. This configuration circuit may be utilized with other types of ion sources as well.
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Patent Agency Ranking
公开(公告)号：US10600611B2
公开(公告)日：2020-03-24
申请号：US16190649
申请日：2018-11-14
Applicant: APPLIED Materials, Inc.
Inventor： Klaus Becker , Daniel Alvarado , Michael St. Peter , Graham Wright
Abstract: An ion source with a crucible is disclosed. In some embodiments, the crucible is disposed in one of the ends of the ions source, opposite the cathode. In other embodiments, the crucible is disposed in one of the side walls. A feed material, which may be in solid form is disposed in the crucible. In certain embodiments, the feed material is sputtered by ions and electrons in the plasma. In other embodiments, the feed material is heated so that it vaporizes. The ion source may be oriented so that the crucible is disposed in the lowest wall so that gravity retains the feed material in the crucible.
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公开(公告)号：US20230207247A1
公开(公告)日：2023-06-29
申请号：US17560632
申请日：2021-12-23
Applicant: Applied Materials, Inc.
Inventor： Frank Sinclair , Klaus Becker , Joseph C. Olson , Tseh-Jen Hsieh , Morgan Patrick Dehnel , Anand Mathai George
CPC classification number: H01J27/028 , H01J27/18
Abstract: An apparatus may include a cyclotron to receive an ion beam as an incident ion beam at an initial energy, and output the ion beam as an accelerated ion beam at an accelerated ion energy. The apparatus may further include an RF source to output an RF power signal to the cyclotron chamber, the RF power source comprising a variable power amplifier, and a movable stripper, translatable to intercept the ion beam within the cyclotron at a continuum of different positions.
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公开(公告)号：US20230162941A1
公开(公告)日：2023-05-25
申请号：US17532358
申请日：2021-11-22
Applicant: Applied Materials, Inc.
Inventor： Klaus Becker , Luigi G. Amato , Elvis Gomez , David Burgdorf , Victor Theriault , Thomas Stewart
IPC: H01J37/08 , H01J37/317 , H01J37/09
CPC classification number: H01J37/08 , H01J37/3171 , H01J37/09
Abstract: A Bernas ion source having a shield is disclosed. The shield is disposed between the distal portion of the filament and the first end of the chamber and serves to confine the plasma to the region between the shield and the second end of the chamber. The shield may be electrically connected to the negative leg of the filament so as to be the most negatively biased component in the chamber. In other embodiments, the shield may be electrically floating. In this embodiment, the shield may self-bias. The shield is typically made of a refractory metal. The use of the shield may reduce back heating of the filament by the plasma and reduce the possibility for thermal runaway. This may allow denser plasmas to be generated within the chamber.
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公开(公告)号：US20190180971A1
公开(公告)日：2019-06-13
申请号：US16190649
申请日：2018-11-14
Applicant: APPLIED Materials, Inc.
Inventor： Klaus Becker , Daniel Alvarado , Michael St. Peter , Graham Wright
Abstract: An ion source with a crucible is disclosed. In some embodiments, the crucible is disposed in one of the ends of the ions source, opposite the cathode. In other embodiments, the crucible is disposed in one of the side walls. A feed material, which may be in solid form is disposed in the crucible. In certain embodiments, the feed material is sputtered by ions and electrons in the plasma. In other embodiments, the feed material is heated so that it vaporizes. The ion source may be oriented so that the crucible is disposed in the lowest wall so that gravity retains the feed material in the crucible.
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公开(公告)号：US12106925B2
公开(公告)日：2024-10-01
申请号：US17560632
申请日：2021-12-23
Applicant: Applied Materials, Inc.
Inventor： Frank Sinclair , Klaus Becker , Joseph C. Olson , Tseh-Jen Hsieh , Morgan Patrick Dehnel , Anand Mathai George
CPC classification number: H01J27/028 , H01J27/18
Abstract: An apparatus may include a cyclotron to receive an ion beam as an incident ion beam at an initial energy, and output the ion beam as an accelerated ion beam at an accelerated ion energy. The apparatus may further include an RF source to output an RF power signal to the cyclotron chamber, the RF power source comprising a variable power amplifier, and a movable stripper, translatable to intercept the ion beam within the cyclotron at a continuum of different positions.
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