公开(公告)号：US12080515B2

公开(公告)日：2024-09-03

申请号：US17718225

申请日：2022-04-11

Applicant: ASML Netherlands B.V.

Inventor： Weiming Ren ,  Xuedong Liu ,  Xuerang Hu ,  Zong-wei Chen

IPC: H01J37/28 ,  H01J37/06 ,  H01J37/10 ,  H01J37/147

CPC classification number: H01J37/28 ,  H01J37/06 ,  H01J37/10 ,  H01J37/1474 ,  H01J2237/0492 ,  H01J2237/083 ,  H01J2237/1501 ,  H01J2237/2806

Abstract: Systems and methods for observing a sample in a multi-beam apparatus are disclosed. A charged particle optical system may include a deflector configured to form a virtual image of a charged particle source and a transfer lens configured to form a real image of the charged particle source on an image plane. The image plane may be formed at least near a beam separator that is configured to separate primary charged particles generated by the source and secondary charged particles generated by interaction of the primary charged particles with a sample. The image plane may be formed at a deflection plane of the beam separator. The multi-beam apparatus may include a charged-particle dispersion compensator to compensate dispersion of the beam separator. The image plane may be formed closer to the transfer lens than the beam separator, between the transfer lens and the charged-particle dispersion compensator.

公开(公告)号：US20240290571A1

公开(公告)日：2024-08-29

申请号：US18115688

申请日：2023-02-28

Applicant: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH

Inventor： Benjamin Cook ,  Pieter Kruit

IPC: H01J37/147 ,  H01J37/145 ,  H01J37/20 ,  H01J37/28

CPC classification number: H01J37/1474 ,  H01J37/145 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/0475 ,  H01J2237/1501 ,  H01J2237/151 ,  H01J2237/152 ,  H01J2237/2803

Abstract: A charged particle optics for a charged particle beam apparatus having a charged particle beam and a beam propagation direction of the charged particle beam apparatus is described. The charged particle optics includes a focusing lens. The focusing lens includes a first electrode with a first aperture; a second electrode with a second aperture, the second electrode being mechanically movable at least in a first direction perpendicular to the beam propagation direction; and an actuator coupled to the second electrode to move the second electrode in at least the first direction for displacement of the second aperture with respect to the first aperture. The charged particle optics further includes a deflection system positioned upstream of the second electrode to deflect the charged particle beam, based on the displacement, to guide the charged particle beam through the second aperture.

公开(公告)号：US20240234085A9

公开(公告)日：2024-07-11

申请号：US17972427

申请日：2022-10-24

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Yehuda Zur

IPC: H01J37/305 ,  H01J37/147 ,  H01J37/28 ,  H01L21/263 ,  H01L21/304

CPC classification number: H01J37/305 ,  H01J37/1474 ,  H01J37/28 ,  H01L21/263 ,  H01L21/304 ,  H01J2237/0475 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: A method of milling a diagonal cut in a region of a sample, the method comprising: positioning the sample in a processing chamber having a charged particle beam column; moving the region of the sample under a field of view of the charged particle column; generating a charged particle beam with the charged particle beam column and scanning the charged particle beam over the region of the sample along scan lines arranged parallel to a slope of the diagonal cut; and repeating the generating and scanning step a plurality of times to mill the diagonal cut in the region of the sample; wherein, for each iteration of the generating and scanning steps, a velocity of the charged particle beam is slower when the beam is near a deep end of the diagonal cut than when the beam is near a shallow end of the diagonal cut.

公开(公告)号：US20240203684A1

公开(公告)日：2024-06-20

申请号：US18413612

申请日：2024-01-16

Applicant: Carl Zeiss MultiSEM GmbH

Inventor： David Disterheft

IPC: H01J37/147 ,  H01J37/04 ,  H01J37/28 ,  H01J37/304 ,  H01J37/317

CPC classification number: H01J37/1474 ,  H01J37/045 ,  H01J37/28 ,  H01J37/304 ,  H01J37/3177 ,  H01J2237/30477 ,  H01J2237/30488

Abstract: A method for analyzing disturbing influences in a multi-beam particle microscope which operates using a plurality of individual charged particle beams arranged in a raster arrangement includes the following steps: providing an object; stationary scanning the object at a first position via the plurality of the individual particle beams during a predetermined irradiation time T, as a result of which latent structures are formed on the object; raster scanning the object comprising the first position with the formed latent structures via the plurality of the individual particle beams; and analyzing the latent structures.

公开(公告)号：US20240145209A1

公开(公告)日：2024-05-02

申请号：US18498984

申请日：2023-10-31

Applicant: ASML Netherlands B.V.

Inventor： Shuai LI ,  Zhongwei Chen

IPC: H01J37/145 ,  H01J37/141 ,  H01J37/147

CPC classification number: H01J37/145 ,  H01J37/141 ,  H01J37/1472 ,  H01J37/1474 ,  H01J37/1477

Abstract: The device includes a beam source for generating an electron beam, a beam guiding tube passed through an objective lens, an objective lens for generating a magnetic field in the vicinity of the specimen to focus the particles of the particle beam on the specimen, a control electrode having a potential for providing a retarding field to the particle beam near the specimen to reduce the energy of the particle beam when the beam collides with the specimen, a deflection system including a plurality of deflection units situated along the optical axis for deflecting the particle beam to allow scanning on the specimen with large area, at least one of the deflection units located in the retarding field of the beam, the remainder of the deflection units located within the central bore of the objective lens, and a detection unit to capture secondary electron (SE) and backscattered electrons (BSE).

公开(公告)号：US20240142395A1

公开(公告)日：2024-05-02

申请号：US18386032

申请日：2023-11-01

Applicant: JEOL Ltd.

Inventor： Koki Kato ,  Shinya Fujita ,  Takanori Murano ,  Shigeru Honda

IPC: G01N23/2209 ,  G01N23/2252 ,  H01J37/147

CPC classification number: G01N23/2209 ,  G01N23/2252 ,  H01J37/1474 ,  G01N2223/079 ,  G01N2223/102 ,  G01N2223/32

Abstract: An analyzing method using an analyzer including a wavelength-dispersive X-ray spectrometer that has an analyzing element to analyze an X-ray emitted from a specimen and detects an X-ray of energy corresponding to a position of the analyzing element. The analyzing method includes acquiring a plurality of map data by repeatedly performing a mapping analysis while changing the position of the analyzing element, the mapping analysis being an analysis to detect an X-ray of specific energy with the position of the analyzing element fixed to acquire map data while scanning the specimen with an electron beam; and generating, based on the plurality of map data, a spectrum map in which a position on the specimen and an X-ray spectrum are associated with each other.

公开(公告)号：US20240136150A1

公开(公告)日：2024-04-25

申请号：US17972427

申请日：2022-10-23

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Yehuda Zur

IPC: H01J37/305 ,  H01J37/147 ,  H01J37/28 ,  H01L21/263 ,  H01L21/304

CPC classification number: H01J37/305 ,  H01J37/1474 ,  H01J37/28 ,  H01L21/263 ,  H01L21/304 ,  H01J2237/0475 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: A method of milling a diagonal cut in a region of a sample, the method comprising: positioning the sample in a processing chamber having a charged particle beam column; moving the region of the sample under a field of view of the charged particle column; generating a charged particle beam with the charged particle beam column and scanning the charged particle beam over the region of the sample along scan lines arranged parallel to a slope of the diagonal cut; and repeating the generating and scanning step a plurality of times to mill the diagonal cut in the region of the sample; wherein, for each iteration of the generating and scanning steps, a velocity of the charged particle beam is slower when the beam is near a deep end of the diagonal cut than when the beam is near a shallow end of the diagonal cut.

公开(公告)号：US11955310B2

公开(公告)日：2024-04-09

申请号：US17214719

申请日：2021-03-26

Applicant: FEI Company

Inventor： Peter Christiaan Tiemeijer

IPC: H01J37/28 ,  H01J37/10 ,  H01J37/147 ,  H01J37/20 ,  H01J37/26

CPC classification number: H01J37/28 ,  H01J37/10 ,  H01J37/1474 ,  H01J37/20 ,  H01J37/265 ,  H01J2237/24485 ,  H01J2237/2802 ,  H01J2237/31749

Abstract: The invention relates to a transmission charged particle microscope comprising a charged particle beam source for emitting a charged particle beam, a sample holder for holding a sample, an illuminator for directing the charged particle beam emitted from the charged particle beam source onto the sample, and a control unit for controlling operations of the transmission charged particle microscope. As defined herein, the transmission charged particle microscope is arranged for operating in at least two modes that substantially yield a first magnification whilst keeping said diffraction pattern substantially in focus. Said at least two modes comprise a first mode having first settings of a final projector lens of a projecting system; and a second mode having second settings of said final projector lens.

公开(公告)号：US20230420213A1

公开(公告)日：2023-12-28

申请号：US18339933

申请日：2023-06-22

Applicant: FEI Company

Inventor： Alexander HENSTRA ,  Galen GLEDHILL

IPC: H01J37/153 ,  H01J37/21 ,  H01J37/147 ,  H01J37/305

CPC classification number: H01J37/153 ,  H01J37/21 ,  H01J37/1474 ,  H01J37/305 ,  H01J2237/1534

Abstract: An ion beam system for modifying a sample or workpiece surface, comprises: an ion source for generating ions; an ion beam focusing column configured to direct ions from the ion source to form an ion beam and focus the ion beam towards a target area; and a sample stage for receiving and positioning the sample or workpiece at the target area, wherein the ion beam focusing column comprises: an aperture plate having a non-circular beam limiting aperture configured to limit the extent of a transmitted ion beam; and a multipole aberration compensator configured to apply a four-fold astigmatism to the ion beam to compensate spherical aberration produced by one or more lenses in the ion beam focusing column. The multipole aberration compensator may be a multipole element that generates an octupole field. A corresponding method is provided.

公开(公告)号：US11810749B2

公开(公告)日：2023-11-07

申请号：US17542773

申请日：2021-12-06

Applicant: Carl Zeiss SMT GmbH

Inventor： Eugen Foca ,  Amir Avishai ,  Thomas Korb ,  Daniel Fischer

IPC: H01J37/147 ,  H01J37/10 ,  H01J37/26 ,  H01J37/28

CPC classification number: H01J37/1474 ,  H01J37/10 ,  H01J37/265 ,  H01J37/28

Abstract: The present invention relates to a charged particle beam system comprising a deflection subsystem configured to deflect a charged particle beam in a deflection direction based on a sum of analog signals generated by separate digital to analog conversion of a first digital signal and a second digital signal. The present invention further relates to a method of configuring the charged particle beam system so that each of a plurality of regions of interest can be scanned by varying only the first digital signal while the second digital signal is held constant at a value associated with the respective region of interest. The present invention further relates to a method of recording a plurality of images of the regions of interest at the premise of reduced interference due to charge accumulation.