公开(公告)号：US20240153735A1

公开(公告)日：2024-05-09

申请号：US17984067

申请日：2022-11-09

Applicant: FEI Company

Inventor： Gerrit Cornelis van Hoften

IPC: H01J37/244 ,  H01J37/04

CPC classification number: H01J37/244 ,  H01J37/04

Abstract: Pixel elements and associated methods are disclosed herein. A pixel element can comprise a radiation-sensitive element configured to generate an electric charge, a floating diffusion node, a charge storage device, and an output stage configured to generate a charge signal. The pixel element is configured to operate in a high-gain mode and a low-gain mode and can have a total dynamic range that is at least 100,000:1. A method of operating a pixel element can comprise reading out a high-gain charge signal with the pixel element in a high-gain mode and reading out a low-gain charge signal with the pixel element in a low-gain mode. The reading out the low-gain charge signal comprises configuring a low-gain channel charge capacity of the pixel element such that a ratio of the low-gain channel charge capacity to a high-gain channel charge capacity is at least 30:1.

公开(公告)号：US11955342B2

公开(公告)日：2024-04-09

申请号：US17199659

申请日：2021-03-12

Applicant: Tokyo Electron Limited

Inventor： Masanori Hosoya ,  Tangkuei Wang

IPC: H01L21/00 ,  H01J37/04 ,  H01J37/32 ,  H01L21/02 ,  H01L21/311

CPC classification number: H01L21/31116 ,  H01J37/04 ,  H01J37/32091 ,  H01J37/32183 ,  H01J37/3244 ,  H01L21/02164 ,  H01L21/0217 ,  H01L21/02263 ,  H01J2237/334

Abstract: A method of an etching includes preparing a substrate having a first region formed of silicon oxide and a second region formed of silicon nitride; etching the first region by exposing the substrate to plasma of a first processing gas including a fluorocarbon gas, and forming a deposit including fluorocarbon on the first region and the second region; etching the first region and the second region by radicals of the fluorocarbon included in the deposit; and removing the deposit by plasma of a second processing gas which does not include oxygen.

公开(公告)号：US11735391B2

公开(公告)日：2023-08-22

申请号：US17234320

申请日：2021-04-19

Applicant: IMS Nanofabrication GmbH

Inventor： Stefan Gerhold ,  Werner Rupp ,  Mattia Capriotti ,  Christoph Spengler

IPC: H01J37/063 ,  H01J37/04 ,  H01J37/147

CPC classification number: H01J37/063 ,  H01J37/04 ,  H01J37/1471 ,  H01J2237/0213 ,  H01J2237/06375

Abstract: A charged-particle source for generating a charged-particle comprises a sequence of electrodes, including an emitter electrode with an emitter surface, a counter electrode held at an electrostatic voltage with respect to the emitter electrode at a sign opposite to that of the electrically charged particles, and one or more adjustment electrodes surrounding the source space between the emitter electrode and the counter electrode. These electrodes have a basic overall rotational symmetry along a central axis, with the exception of one or more steering electrodes which is an electrode which interrupts the radial axial-symmetry of the electric potential of the source, for instance tilted or shifted to an eccentric position or orientation, configured to force unintended, secondary charged particles away from the emission surface.

公开(公告)号：US09972475B2

公开(公告)日：2018-05-15

申请号：US14572016

申请日：2014-12-16

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： James S. Buff ,  Edward W. Bell ,  W. Davis Lee

IPC: H01J37/244 ,  H01J37/317 ,  H01J37/04 ,  H01J37/304

CPC classification number: H01J37/3171 ,  H01J37/04 ,  H01J37/304

Abstract: An apparatus to control a ribbon ion beam. The apparatus may include a coil assembly comprising a plurality of electromagnetic coils configured to generate a magnetic field proximate the ribbon beam, the magnetic field extending in a first direction that forms a non-zero angle with respect to a direction of propagation of the ribbon ion beam; a current source assembly configured to supply current to the coil assembly; and a controller configured to control the current source assembly to send at least one dithering current signal to the coil assembly responsive to a beam current measurement of the ribbon ion beam, wherein the at least one dithering current signal generates a fluctuation in magnetic field strength of the magnetic field.

公开(公告)号：US20170338078A1

公开(公告)日：2017-11-23

申请号：US15601547

申请日：2017-05-22

Applicant: TESCAN Brno, s.r.o.

Inventor： Jaroslav Jiruse ,  Filip Lopour ,  Milos Havelka ,  Jan Polster ,  Josef Rysavka ,  Martin Zadrazil

IPC: H01J37/26 ,  H01J37/147 ,  H01J37/141 ,  H01J37/28 ,  H01J37/12

CPC classification number: H01J37/263 ,  H01J37/04 ,  H01J37/12 ,  H01J37/141 ,  H01J37/1475 ,  H01J37/28 ,  H01J2237/04922

Abstract: A scanning electron microscope comprises three objective lenses, including a distant objective lens and a close objective lens, which are of conventional type, and an immersion objective lens of the immersion type below the distant objective lens and the close objective lens. These three objective lenses can be controlled independently, therefor different combinations of active objective lenses can be achieved. The scanning electron microscope therefore offers various imaging modes. There is a possibility to switch between these imaging modes and therefore, choose the most suitable way of imaging for given application.

公开(公告)号：US20170287674A1

公开(公告)日：2017-10-05

申请号：US15608229

申请日：2017-05-30

Applicant: CARL ZEISS MICROSCOPY GMBH ,  APPLIED MATERIALS ISRAEL LTD.

Inventor： Rainer KNIPPELMEYER ,  Oliver KIENZLE ,  Thomas KEMEN ,  Heiko MUELLER ,  Stephan UHLEMANN ,  Maximilian HAIDER ,  Antonio CASARES ,  Steven ROGERS

IPC: H01J37/04 ,  H01J37/317 ,  H01J37/09 ,  H01J37/28 ,  H01J37/14 ,  H01J37/30 ,  H01J37/153

CPC classification number: H01J37/04 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/10 ,  H01J37/14 ,  H01J37/153 ,  H01J37/28 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/047 ,  H01J2237/04735 ,  H01J2237/04756 ,  H01J2237/06 ,  H01J2237/14 ,  H01J2237/2817 ,  H01J2237/31774

Abstract: A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first regularity.

公开(公告)号：US09687810B2

公开(公告)日：2017-06-27

申请号：US15178958

申请日：2016-06-10

Applicant: XYLECO, INC.

Inventor： Marshall Medoff

IPC: B01J19/08 ,  B01J19/10 ,  B01J19/12 ,  C10L9/00 ,  H01J37/04 ,  H01J37/05 ,  C10L5/44

CPC classification number: B01J19/081 ,  B01J19/085 ,  B01J19/10 ,  B01J19/12 ,  B01J2219/0879 ,  B01J2219/12 ,  C10L1/02 ,  C10L5/44 ,  C10L9/00 ,  C10L2200/0469 ,  C10L2290/26 ,  C10L2290/36 ,  C12P3/00 ,  C12P7/02 ,  H01J37/04 ,  H01J37/05 ,  Y02E50/30

Abstract: Materials such as biomass (e.g., plant biomass, animal biomass, and municipal waste biomass) and hydrocarbon-containing materials are processed to produce useful products, such as fuels. For example, systems are described that can use feedstock materials, such as cellulosic and/or lignocellulosic materials and/or starchy materials, or oil sands, oil shale, tar sands, bitumen, and coal to produce altered materials such as fuels (e.g., ethanol and/or butanol). The processing includes exposing the materials to an ion beam.

公开(公告)号：US20170169996A1

公开(公告)日：2017-06-15

申请号：US15441781

申请日：2017-02-24

Applicant: Kabushiki Kaisha Toshiba

Inventor： Akio UI ,  Hisataka HAYASHI ,  Kazuhiro TOMIOKA ,  Hiroshi YAMAMOTO ,  Tsubasa IMAMURA

IPC: H01J37/32 ,  H01L21/687 ,  H01L21/67 ,  H01L21/683 ,  H01L21/3065 ,  H01L21/308

CPC classification number: H01J37/32422 ,  H01J37/04 ,  H01J37/32091 ,  H01J37/3211 ,  H01J37/32165 ,  H01J37/3244 ,  H01J37/32568 ,  H01J37/32697 ,  H01J37/32715 ,  H01J37/32724 ,  H01J37/32834 ,  H01J2237/3341 ,  H01L21/3065 ,  H01L21/308 ,  H01L21/67069 ,  H01L21/6831 ,  H01L21/68764

Abstract: In one embodiment, a plasma processing apparatus includes: a chamber; an introducing part; a counter electrode; a high-frequency power source; and a plurality of low-frequency power sources. A substrate electrode is disposed in the chamber, a substrate is directly or indirectly placed on the substrate electrode, and the substrate electrode has a plurality of electrode element groups. The introducing part introduces process gas into the chamber. The high-frequency power source outputs a high-frequency voltage for ionizing the process gas to generate plasma. The plurality of low-frequency power sources apply a plurality of low-frequency voltages of 20 MHz or less with mutually different phases for introducing ions from the plasma, to each of the plurality of electrode element groups.

公开(公告)号：US09679738B2

公开(公告)日：2017-06-13

申请号：US14916529

申请日：2014-05-16

Applicant: Hitachi High-Technologies Corporation

Inventor： Hiroaki Matsumoto ,  Takeshi Sato ,  Yoshifumi Taniguchi ,  Ken Harada

IPC: H01J47/00 ,  H01J37/10 ,  H01J37/295 ,  H01J37/04 ,  H01J37/26 ,  G01N23/20 ,  H01J37/09 ,  H01J37/147 ,  H01J37/153 ,  H01J37/24 ,  H01J37/244 ,  H01J37/28 ,  H01J37/05 ,  H01J37/285

CPC classification number: H01J37/10 ,  G01N23/20058 ,  G01N2223/418 ,  H01J37/04 ,  H01J37/05 ,  H01J37/09 ,  H01J37/147 ,  H01J37/1472 ,  H01J37/153 ,  H01J37/24 ,  H01J37/244 ,  H01J37/26 ,  H01J37/261 ,  H01J37/28 ,  H01J37/285 ,  H01J37/295 ,  H01J2237/21 ,  H01J2237/2614

Abstract: The present invention relates to a lens-less Foucault method wherein a transmission electron microscope objective lens (5) is turned off, an electron beam crossover (11, 13) is matched with a selected area aperture (65), and the focal distance of a first imaging lens (61) can be changed to enable switching between a sample image observation mode and a sample diffraction pattern observation mode, characterized in that a deflector (81) is disposed in a stage following the first imaging lens (61), and conditions for an irradiating optical system (4) can be fixed after conditions for the imaging optical system have been determined. This allows a lens-less Foucault method to be implemented in a common general-use transmission electron microscope with no magnetic shielding lens equipped, without burdening the operator.

公开(公告)号：US20170084419A1

公开(公告)日：2017-03-23

申请号：US15366660

申请日：2016-12-01

Applicant: CANON ANELVA CORPORATION

Inventor： Masashi Tsujiyama ,  Yukito Nakagawa ,  Yasushi Yasumatsu

IPC: H01J27/02 ,  H01J9/14 ,  H01J37/08

CPC classification number: H01J27/024 ,  H01J9/14 ,  H01J27/16 ,  H01J37/04 ,  H01J37/08 ,  H01J2237/303 ,  H01J2237/31701 ,  H01J2237/3174

Abstract: A grid of the present invention is a plate-shaped grid provided with a hole. The grid is formed of a carbon-carbon composite including carbon fibers arranged in random directions along a planar direction of the grid, and the hole is formed in the grid so as to cut off the carbon fibers.